JPS6489574A - Pattern formation of superconductor circuit - Google Patents

Pattern formation of superconductor circuit

Info

Publication number
JPS6489574A
JPS6489574A JP62248362A JP24836287A JPS6489574A JP S6489574 A JPS6489574 A JP S6489574A JP 62248362 A JP62248362 A JP 62248362A JP 24836287 A JP24836287 A JP 24836287A JP S6489574 A JPS6489574 A JP S6489574A
Authority
JP
Japan
Prior art keywords
ion
implantation
superconducting
oxgen
crystallinity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62248362A
Other languages
Japanese (ja)
Inventor
Shinji Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62248362A priority Critical patent/JPS6489574A/en
Publication of JPS6489574A publication Critical patent/JPS6489574A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To simplify the formation of a circuit pattern, by a method wherein a local selective doping is performed on a high-temp. ceramic superconductor by ion (except oxgen and fluorine ions) implantation to destroy the crystallinity of the selected doping parts and turning those part to non-superconducting ones. CONSTITUTION:A Y-Ba-Cu-O or other ceramic superconductor is formed on a substrate 11 by magnetron sputtering and a resist mask 13 is formed on the thin superconductor film 12. Then, the crystallinity of implanted areas 14 is destroyed by ion (Ne<+>, etc.) implantation (a) to make the areas non- superconducting. The larger is ion implantation dose, the heavier is damage to the crystal and the lower is a critical temperature. This means an ion implan tation dose can control a critical temperature. Next, the resist mask 13 is re moved by oxgen plasma etching (b). As described above, a superconducting pattern is formed by ion implantation.
JP62248362A 1987-09-30 1987-09-30 Pattern formation of superconductor circuit Pending JPS6489574A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62248362A JPS6489574A (en) 1987-09-30 1987-09-30 Pattern formation of superconductor circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62248362A JPS6489574A (en) 1987-09-30 1987-09-30 Pattern formation of superconductor circuit

Publications (1)

Publication Number Publication Date
JPS6489574A true JPS6489574A (en) 1989-04-04

Family

ID=17176972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62248362A Pending JPS6489574A (en) 1987-09-30 1987-09-30 Pattern formation of superconductor circuit

Country Status (1)

Country Link
JP (1) JPS6489574A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2670201A1 (en) * 1990-12-06 1992-06-12 Dornier Gmbh PROCESS FOR MICROSTRUCTURING SUPERCONDUCTING OXIDE CERAMICS.

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132381A (en) * 1981-02-10 1982-08-16 Nippon Telegr & Teleph Corp <Ntt> Manufacture of high melting point compound thin film
JPS58157182A (en) * 1982-02-23 1983-09-19 サントル・ナシヨナル・ド・ラ・ルシユルシエ・シアンテイフイツク Small circuit using josephson effect or the like and method of producing same
JPS63258082A (en) * 1987-04-15 1988-10-25 Semiconductor Energy Lab Co Ltd Superconductive material
JPS63265473A (en) * 1987-04-23 1988-11-01 Agency Of Ind Science & Technol Manufacture of superconducting electronic circuit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132381A (en) * 1981-02-10 1982-08-16 Nippon Telegr & Teleph Corp <Ntt> Manufacture of high melting point compound thin film
JPS58157182A (en) * 1982-02-23 1983-09-19 サントル・ナシヨナル・ド・ラ・ルシユルシエ・シアンテイフイツク Small circuit using josephson effect or the like and method of producing same
JPS63258082A (en) * 1987-04-15 1988-10-25 Semiconductor Energy Lab Co Ltd Superconductive material
JPS63265473A (en) * 1987-04-23 1988-11-01 Agency Of Ind Science & Technol Manufacture of superconducting electronic circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2670201A1 (en) * 1990-12-06 1992-06-12 Dornier Gmbh PROCESS FOR MICROSTRUCTURING SUPERCONDUCTING OXIDE CERAMICS.

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