KR0152425B1 - Aligner - Google Patents

Aligner

Info

Publication number: KR0152425B1
Authority: KR; South Korea
Prior art keywords: aligner
Prior art date: 1992-10-09
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

KR1019980005700A

Other languages

English (en)

Inventor

Minoru Tanaka

Akira Nagai

Original Assignee

Adtec Eng Co Ltd

Canon Components Kk

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1992-10-09

Filing date

1998-02-24

Publication date

1999-10-01

1992-10-09 Priority claimed from JP4298087A external-priority patent/JP2509134B2/ja

1992-12-04 Priority claimed from JP4350226A external-priority patent/JPH0822571B2/ja

1993-09-03 Priority claimed from JP5242220A external-priority patent/JPH0772552A/ja

1998-02-24 Application filed by Adtec Eng Co Ltd, Canon Components Kk filed Critical Adtec Eng Co Ltd

1999-10-01 Application granted granted Critical

1999-10-01 Publication of KR0152425B1 publication Critical patent/KR0152425B1/ko

2013-10-08 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/074—Features related to the fluid pressure
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Manufacturing & Machinery (AREA)
Microelectronics & Electronic Packaging (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

KR1019980005700A 1992-10-09 1998-02-24 Aligner Expired - Lifetime KR0152425B1 (en)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP4298087A JP2509134B2 (ja)	1992-10-09	1992-10-09	プリント配線基板の露光方法及び装置
JP4350226A JPH0822571B2 (ja)	1992-12-04	1992-12-04	露光装置におけるフィルムの加圧装置
JP5242220A JPH0772552A (ja)	1993-09-03	1993-09-03	露光装置
KR1019930020824A KR100205199B1 (ko)	1992-10-09	1993-10-08	필름마스크를 이용한 노광방법 및 장치

Publications (1)

Publication Number	Publication Date
KR0152425B1 true KR0152425B1 (en)	1999-10-01

Family

ID=27333020

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
KR1019930020824A Expired - Lifetime KR100205199B1 (ko)	1992-10-09	1993-10-08	필름마스크를 이용한 노광방법 및 장치
KR1019980005700A Expired - Lifetime KR0152425B1 (en)	1992-10-09	1998-02-24	Aligner

Family Applications Before (1)

Application Number	Title	Priority Date	Filing Date
KR1019930020824A Expired - Lifetime KR100205199B1 (ko)	1992-10-09	1993-10-08	필름마스크를 이용한 노광방법 및 장치

Country Status (3)

Country	Link
KR (2)	KR100205199B1 (ko)
GB (1)	GB2271430A (ko)
TW (1)	TW329340U (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5970310A (en) *	1996-06-12	1999-10-19	Hitachi, Ltd.	Method for manufacturing multilayer wiring board and wiring pattern forming apparatus
JP3678144B2 (ja) *	2000-12-22	2005-08-03	ウシオ電機株式会社	フィルム回路基板の周辺露光装置
JP2003029414A (ja) *	2001-07-19	2003-01-29	Adtec Engineeng Co Ltd	露光装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH04225360A (ja) *	1990-12-26	1992-08-14	Adotetsuku Eng:Kk	プリント配線基板の製造におけるフィルムマスクの密着方法及びその装置

1993
- 1993-09-25 TW TW086209914U patent/TW329340U/zh unknown
- 1993-09-28 GB GB9319933A patent/GB2271430A/en not_active Withdrawn
- 1993-10-08 KR KR1019930020824A patent/KR100205199B1/ko not_active Expired - Lifetime
1998
- 1998-02-24 KR KR1019980005700A patent/KR0152425B1/ko not_active Expired - Lifetime

Also Published As

Publication number	Publication date
KR940010872A (ko)	1994-05-26
KR100205199B1 (ko)	1999-07-01
GB2271430A (en)	1994-04-13
GB9319933D0 (en)	1993-11-17
TW329340U (en)	1998-04-01

Legal Events

Date	Code	Title	Description
1998-02-24	A107	Divisional application of patent
1998-02-24	A201	Request for examination
1998-02-24	PA0107	Divisional application	Comment text: Divisional Application of Patent Patent event date: 19980224 Patent event code: PA01071R01D
1998-02-24	PA0201	Request for examination	Patent event code: PA02012R01D Patent event date: 19980224 Comment text: Request for Examination of Application
1998-05-16	E701	Decision to grant or registration of patent right
1998-05-16	PE0701	Decision of registration	Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19980516
1998-06-26	GRNT	Written decision to grant
1998-06-26	PR0701	Registration of establishment	Comment text: Registration of Establishment Patent event date: 19980626 Patent event code: PR07011E01D
1998-06-26	PR1002	Payment of registration fee	Payment date: 19980626 End annual number: 3 Start annual number: 1
1999-10-01	PG1601	Publication of registration
2001-06-11	PR1001	Payment of annual fee	Payment date: 20010612 Start annual number: 4 End annual number: 4
2002-02-15	PR1001	Payment of annual fee	Payment date: 20020216 Start annual number: 5 End annual number: 5
2003-03-26	PR1001	Payment of annual fee	Payment date: 20030326 Start annual number: 6 End annual number: 6
2004-02-19	PR1001	Payment of annual fee	Payment date: 20040219 Start annual number: 7 End annual number: 7
2005-03-24	PR1001	Payment of annual fee	Payment date: 20050324 Start annual number: 8 End annual number: 8
2006-03-17	PR1001	Payment of annual fee	Payment date: 20060317 Start annual number: 9 End annual number: 9
2007-02-08	PR1001	Payment of annual fee	Payment date: 20070208 Start annual number: 10 End annual number: 10
2008-01-02	PR1001	Payment of annual fee	Payment date: 20080102 Start annual number: 11 End annual number: 11
2009-04-27	PR1001	Payment of annual fee	Payment date: 20090427 Start annual number: 12 End annual number: 12
2010-01-26	PR1001	Payment of annual fee	Payment date: 20100126 Start annual number: 13 End annual number: 13
2011-05-18	PR1001	Payment of annual fee	Payment date: 20110518 Start annual number: 14 End annual number: 14
2012-02-06	PR1001	Payment of annual fee	Payment date: 20120206 Start annual number: 15 End annual number: 15
2013-01-02	FPAY	Annual fee payment	Payment date: 20130102 Year of fee payment: 16
2013-01-02	PR1001	Payment of annual fee	Payment date: 20130102 Start annual number: 16 End annual number: 16
2013-10-09	EXPY	Expiration of term
2013-10-09	PC1801	Expiration of term

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