KR100632425B1 - 슬라이딩 부재 및 그의 제조방법 - Google Patents
슬라이딩 부재 및 그의 제조방법 Download PDFInfo
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- KR100632425B1 KR100632425B1 KR1020017004900A KR20017004900A KR100632425B1 KR 100632425 B1 KR100632425 B1 KR 100632425B1 KR 1020017004900 A KR1020017004900 A KR 1020017004900A KR 20017004900 A KR20017004900 A KR 20017004900A KR 100632425 B1 KR100632425 B1 KR 100632425B1
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- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000000576 coating method Methods 0.000 claims abstract description 67
- 239000011248 coating agent Substances 0.000 claims abstract description 43
- 239000000463 material Substances 0.000 claims abstract description 39
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 36
- 239000013078 crystal Substances 0.000 claims abstract description 33
- 150000004767 nitrides Chemical class 0.000 claims abstract description 25
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 14
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 14
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 14
- 229910052796 boron Inorganic materials 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 42
- 239000010936 titanium Substances 0.000 claims description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 16
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 10
- 230000003068 static effect Effects 0.000 claims description 9
- -1 Nitride Compound Chemical class 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 238000010884 ion-beam technique Methods 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- 238000005260 corrosion Methods 0.000 abstract description 14
- 230000007797 corrosion Effects 0.000 abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 abstract description 11
- 229910052710 silicon Inorganic materials 0.000 abstract description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 3
- 239000011651 chromium Substances 0.000 description 12
- 239000000654 additive Substances 0.000 description 10
- 230000001133 acceleration Effects 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 230000008021 deposition Effects 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 230000000996 additive effect Effects 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 4
- 239000003575 carbonaceous material Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000002513 implantation Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000005524 ceramic coating Methods 0.000 description 3
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910021385 hard carbon Inorganic materials 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 238000009684 ion beam mixing Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910010421 TiNx Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/252—Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Sliding-Contact Bearings (AREA)
Abstract
Description
Claims (18)
- 기판 및 상기 기판 상에 형성된 경질 코팅을 포함하고, 상기 경질 코팅이 질화티탄 및 Cr을 포함하고, 질화물계 재료의 결정에서 0.414 내지 0.423 nm의 범위의 격자 상수를 가지는 면심입방 결정 구조를 가지는 질화물계 재료를 포함하는 것을 특징으로 하는 슬라이딩 부재.
- 삭제
- 기판 및 상기 기판 상에 형성된 경질 코팅을 포함하고, 상기 경질 코팅이 질화티탄 및 B를 포함하고, 평균 크기가 9 nm 이하인 결정자를 포함하는 면심입방 결정 구조를 가지는 질화물계 재료를 포함하는 것을 특징으로 하는 슬라이딩 부재.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 기판 및 상기 기판 상에 형성된 경질 코팅을 포함하고, 상기 경질 코팅이 질화티탄 및 Zr 및 Hf로 이루어진 그룹에서 선택된 하나 이상의 원소를 포함하고, 질화물계 재료의 결정에서 0.414 내지 0.423 nm 범위의 격자 상수를 가지는 면심입방 결정 구조를 가지는 질화물계 재료를 포함하는 것을 특징으로 하는 슬라이딩 부재.
- 제 1항, 제 3항 및 제 10항 중의 어느 한 항에 있어서,상기 질화물계 재료가 불가피한 불순물을 제외하고는, 화학식:Ti(100-x)Mex 질화물 화합물(상기 식에서,Me는 Cr, Zr, Hf 및 B로 구성된 그룹에서 선택된 한 원소를 나타내고, x는 2 원자% ≤x ≤30 원자% 관계의 범위 내에 있다)로 정의된 화학적 조성을 가지는 것을 특징으로 하는 슬라이딩 부재.
- 질소 이온을 함유하는 이온 빔을 사용하여 상기 기판을 조사하면서 진공에서 Ti와 Cr, Zr, Hf 및 B로 구성된 그룹에서 선택된 하나 이상의 원소를 상기 기판 상에 동시에 증착시킴으로써, 상기 기판 상에 경질 코팅을 형성하는 단계를 포함하는 것을 특징으로 하는, 제 1항, 제 3항, 제 10항 및 제 11항 중의 어느 한 항에 따른 슬라이딩 부재의 제조방법.
- 가동 부재와 정적 부재의 조합을 포함하고, 상기 가동 부재 또는 정적 부재가 제 1항, 제 3항, 제 10항 및 제 11항 중의 어느 한 항에 따른 슬라이딩 부재로 제조되거나, 또는 제 12항에 따른 방법으로 제조되고, 나머지 부재는 탄소 함유 재료로 제조되는 것을 특징으로 하는 슬라이딩 부재의 제조방법.
- 제 13항에 있어서,상기 탄소 함유 재료가 탄소가 함유된 재료, 탄소가 침투된 재료 또는 탄소 함유 박막인 것을 특징으로 하는 슬라이딩 부재의 제조방법.
- 제 1항, 제 3항 및 제 10항 중의 어느 한 항에 있어서,상기 기판이 금속 재료인 것을 특징으로 하는 슬라이딩 부재.
- 제 12항에 있어서,상기 기판이 금속 재료인 것을 특징으로 하는 슬라이딩 부재의 제조 방법.
- 제 13항 또는 제 14항에 있어서,상기 기판이 금속 재료인 것을 특징으로 하는 슬라이딩 부재의 제조방법.
- 제 1항, 제 3항 및 제 10항 중의 어느 한 항에 따른 슬라이딩 부재를 포함하거나, 또는 제 12항에 따른 방법에 의해 만들어진 슬라이딩 부재를 포함하는 드레싱 공구.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10-302259 | 1998-10-23 | ||
| JP30225998A JP3797807B2 (ja) | 1998-10-23 | 1998-10-23 | 高温摺動部材用硬質膜 |
| JP10-302260 | 1998-10-23 | ||
| JP30226098A JP3838796B2 (ja) | 1998-10-23 | 1998-10-23 | 摺動部材用硬質膜 |
| PCT/JP1999/005838 WO2000024947A1 (en) | 1998-10-23 | 1999-10-22 | Sliding member and manufacturing method therefor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20010080244A KR20010080244A (ko) | 2001-08-22 |
| KR100632425B1 true KR100632425B1 (ko) | 2006-10-09 |
Family
ID=26563041
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020017004900A Expired - Lifetime KR100632425B1 (ko) | 1998-10-23 | 1999-10-22 | 슬라이딩 부재 및 그의 제조방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6767657B1 (ko) |
| EP (1) | EP1135541B1 (ko) |
| KR (1) | KR100632425B1 (ko) |
| DE (1) | DE69925753T2 (ko) |
| WO (1) | WO2000024947A1 (ko) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6558822B2 (en) | 2000-05-25 | 2003-05-06 | Ebara Corporation | Cr-containing titanium nitride film |
| ATE322562T1 (de) * | 2001-11-28 | 2006-04-15 | Metaplas Ionon Gmbh | Mit hartschichten überzogene komponenten |
| US7220098B2 (en) * | 2003-05-27 | 2007-05-22 | General Electric Company | Wear resistant variable stator vane assemblies |
| US7455890B2 (en) * | 2003-08-05 | 2008-11-25 | General Electric Company | Ion implantation of turbine engine rotor component |
| US20050238801A1 (en) * | 2004-04-27 | 2005-10-27 | Chia-Te Lin | Method for fabricating an alignment layer for liquid crystal applications |
| US20070045966A1 (en) * | 2005-08-31 | 2007-03-01 | Caterpillar Inc. | Coatings for metal-metal seal surfaces |
| WO2007039982A1 (ja) * | 2005-09-30 | 2007-04-12 | Konica Minolta Opto, Inc. | 樹脂成形装置 |
| US20070148428A1 (en) * | 2005-12-28 | 2007-06-28 | Akebono Brake Industry Co., Ltd. | Friction material and manufacturing method thereof |
| CN102605321A (zh) * | 2011-01-24 | 2012-07-25 | 鸿富锦精密工业(深圳)有限公司 | 镀膜件及其制备方法 |
| WO2012173236A1 (ja) | 2011-06-17 | 2012-12-20 | 株式会社神戸製鋼所 | 硬質皮膜被覆部材 |
| CN114059023B (zh) * | 2021-10-29 | 2022-09-23 | 东莞市华升真空镀膜科技有限公司 | 涂层及其制备方法和器具 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55120936A (en) * | 1979-02-27 | 1980-09-17 | Hitachi Metals Ltd | Covered tool |
| JPS6115967A (ja) * | 1984-06-29 | 1986-01-24 | Sumitomo Electric Ind Ltd | 表面処理方法 |
| CH669347A5 (ko) * | 1986-05-28 | 1989-03-15 | Vni Instrument Inst | |
| JPH05250770A (ja) * | 1992-03-03 | 1993-09-28 | Nissin Electric Co Ltd | 磁気ヘッドとその製造方法 |
| JP3198636B2 (ja) * | 1992-06-30 | 2001-08-13 | 三菱マテリアル株式会社 | 傾斜硬質層被覆超硬合金製切削工具 |
| DE4317758A1 (de) * | 1993-05-28 | 1994-12-01 | Berliner Schreibfeder Gmbh | Schreibfeder und Verfahren zu ihrer Herstellung |
| US5624766A (en) * | 1993-08-16 | 1997-04-29 | Sumitomo Electric Industries, Ltd. | Cemented carbide and coated cemented carbide for cutting tool |
| JP3291552B2 (ja) | 1994-05-30 | 2002-06-10 | 独立行政法人産業技術総合研究所 | シール又は軸受 |
| US5700551A (en) * | 1994-09-16 | 1997-12-23 | Sumitomo Electric Industries, Ltd. | Layered film made of ultrafine particles and a hard composite material for tools possessing the film |
| US5681653A (en) | 1995-05-11 | 1997-10-28 | Si Diamond Technology, Inc. | Diamond cutting tools |
| DE59607891D1 (de) * | 1995-08-19 | 2001-11-15 | Widia Gmbh | Verbundkörper und verfahren zu dessen herstellung |
-
1999
- 1999-10-22 KR KR1020017004900A patent/KR100632425B1/ko not_active Expired - Lifetime
- 1999-10-22 US US09/807,436 patent/US6767657B1/en not_active Expired - Lifetime
- 1999-10-22 WO PCT/JP1999/005838 patent/WO2000024947A1/en not_active Ceased
- 1999-10-22 DE DE69925753T patent/DE69925753T2/de not_active Expired - Lifetime
- 1999-10-22 EP EP99949366A patent/EP1135541B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6767657B1 (en) | 2004-07-27 |
| WO2000024947A1 (en) | 2000-05-04 |
| EP1135541A1 (en) | 2001-09-26 |
| KR20010080244A (ko) | 2001-08-22 |
| DE69925753T2 (de) | 2006-03-16 |
| DE69925753D1 (de) | 2005-07-14 |
| EP1135541B1 (en) | 2005-06-08 |
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