KR102748044B1 - 알칼리 현상형 광경화성 열경화성 수지 조성물 - Google Patents
알칼리 현상형 광경화성 열경화성 수지 조성물 Download PDFInfo
- Publication number
- KR102748044B1 KR102748044B1 KR1020217022297A KR20217022297A KR102748044B1 KR 102748044 B1 KR102748044 B1 KR 102748044B1 KR 1020217022297 A KR1020217022297 A KR 1020217022297A KR 20217022297 A KR20217022297 A KR 20217022297A KR 102748044 B1 KR102748044 B1 KR 102748044B1
- Authority
- KR
- South Korea
- Prior art keywords
- photopolymerization initiator
- resin composition
- composition
- curable resin
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
Claims (6)
- (A) 알칼리 가용성 수지, (B) 옥심 결합을 갖는 광중합 개시제, (C) 반응성 희석제 및 (D) 열경화성 수지를 적어도 함유하고, 또한 상기 (B) 옥심 결합을 갖는 광중합 개시제가 상기 (A) 알칼리 가용성 수지와는 다른 조성물에 배합되는, 적어도 2액계로 조성되어 있는 알칼리 현상형 경화성 수지 조성물로서,
적어도 1종의 (E) 오르토에스테르 화합물이, 상기 옥심 결합을 갖는 광중합 개시제와 함께 배합되어 이루어지는
것을 특징으로 하는 상기 알칼리 현상형 경화성 수지 조성물. - 제1항에 있어서, 상기 (E) 오르토에스테르 화합물이, 오르토포름산트리메틸, 오르토포름산트리에틸, 오르토포름산트리프로필, 오르토포름산트리부틸, 오르토아세트산트리메틸, 오르토아세트산트리에틸, 오르토아세트산트리프로필, 오르토아세트산트리부틸, 오르토프로피온산트리메틸, 오르토프로피온산트리에틸, 오르토프로피온산프로필 및 오르토프로피온산부틸로 이루어지는 군에서 선택되는 적어도 1종인 알칼리 현상형 경화성 수지 조성물.
- 제1항 또는 제2항에 있어서, 상기 (E) 오르토에스테르 화합물이, 오르토포름산트리메틸, 오르토포름산트리에틸 및 오르토아세트산트리에틸로 이루어지는 군에서 선택되는 적어도 1종인 알칼리 현상형 경화성 수지 조성물.
- 제1항 또는 제2항에 있어서, 상기 (E) 오르토에스테르 화합물이 오르토포름산트리에틸인 알칼리 현상형 경화성 수지 조성물.
- 제1항 또는 제2항에 기재된 알칼리 현상형 경화성 수지 조성물을 경화하여 얻어지는 것을 특징으로 하는 경화물.
- 제5항에 기재된 경화물을 갖는 전자 부품.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019037477A JP7330719B2 (ja) | 2019-03-01 | 2019-03-01 | アルカリ現像型光硬化性熱硬化性樹脂組成物 |
| JPJP-P-2019-037477 | 2019-03-01 | ||
| PCT/JP2019/047553 WO2020179163A1 (ja) | 2019-03-01 | 2019-12-05 | アルカリ現像型光硬化性熱硬化性樹脂組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20210135991A KR20210135991A (ko) | 2021-11-16 |
| KR102748044B1 true KR102748044B1 (ko) | 2024-12-31 |
Family
ID=72280461
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020217022297A Active KR102748044B1 (ko) | 2019-03-01 | 2019-12-05 | 알칼리 현상형 광경화성 열경화성 수지 조성물 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7330719B2 (ko) |
| KR (1) | KR102748044B1 (ko) |
| CN (1) | CN113383274B (ko) |
| TW (1) | TWI813829B (ko) |
| WO (1) | WO2020179163A1 (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023163209A1 (ja) * | 2022-02-28 | 2023-08-31 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、ドライフィルム、硬化物、および、プリント配線板 |
| JPWO2024204644A1 (ko) | 2023-03-31 | 2024-10-03 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009042643A (ja) | 2007-08-10 | 2009-02-26 | Jsr Corp | 感光性樹脂組成物 |
| JP2011018024A (ja) * | 2009-06-08 | 2011-01-27 | Jsr Corp | 感放射線性組成物、保護膜、層間絶縁膜、及びそれらの形成方法 |
| JP2014167510A (ja) | 2013-02-28 | 2014-09-11 | Kaneka Corp | 感光性樹脂組成物作製キット及びその利用 |
| JP2015094910A (ja) | 2013-11-14 | 2015-05-18 | 日本ゼオン株式会社 | 感放射線性樹脂組成物、及び積層体 |
| JP2015141414A (ja) | 2014-01-28 | 2015-08-03 | 達興材料股▲ふん▼有限公司 | 感光性樹脂組成物、電子素子およびその製造方法 |
| JP2018072789A (ja) | 2015-12-25 | 2018-05-10 | 旭化成株式会社 | 感光性樹脂組成物、感光性樹脂積層体、樹脂パターン製造方法、硬化膜パターン製造方法及び表示装置 |
| JP2018072397A (ja) | 2016-10-24 | 2018-05-10 | 東京応化工業株式会社 | 感光性組成物、感光性組成物の製造方法、光重合開始剤、及び光重合開始剤の調製方法 |
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| US5834565A (en) * | 1996-11-12 | 1998-11-10 | General Electric Company | Curable polyphenylene ether-thermosetting resin composition and process |
| TW200417294A (en) * | 2002-11-28 | 2004-09-01 | Taiyo Ink Mfg Co Ltd | Photo- and thermo-setting resin composition and printed wiring boards made by using the same |
| KR101490224B1 (ko) * | 2007-06-01 | 2015-02-05 | 후지필름 가부시키가이샤 | 컬러 필터용 경화성 조성물, 컬러 필터용 경화성 조성물의 제조 방법, 착색 경화성 수지 조성물, 착색 패턴 형성 방법, 착색 패턴, 컬러 필터의 제조 방법, 컬러 필터 및 액정 표시 소자 |
| KR101736237B1 (ko) * | 2009-06-08 | 2017-05-16 | 제이에스알 가부시끼가이샤 | 감방사선성 조성물, 보호막 및 층간 절연막 및, 그들의 형성 방법 |
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2019
- 2019-03-01 JP JP2019037477A patent/JP7330719B2/ja active Active
- 2019-12-05 WO PCT/JP2019/047553 patent/WO2020179163A1/ja not_active Ceased
- 2019-12-05 CN CN201980091234.2A patent/CN113383274B/zh active Active
- 2019-12-05 KR KR1020217022297A patent/KR102748044B1/ko active Active
- 2019-12-17 TW TW108146091A patent/TWI813829B/zh active
Patent Citations (7)
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| JP2009042643A (ja) | 2007-08-10 | 2009-02-26 | Jsr Corp | 感光性樹脂組成物 |
| JP2011018024A (ja) * | 2009-06-08 | 2011-01-27 | Jsr Corp | 感放射線性組成物、保護膜、層間絶縁膜、及びそれらの形成方法 |
| JP2014167510A (ja) | 2013-02-28 | 2014-09-11 | Kaneka Corp | 感光性樹脂組成物作製キット及びその利用 |
| JP2015094910A (ja) | 2013-11-14 | 2015-05-18 | 日本ゼオン株式会社 | 感放射線性樹脂組成物、及び積層体 |
| JP2015141414A (ja) | 2014-01-28 | 2015-08-03 | 達興材料股▲ふん▼有限公司 | 感光性樹脂組成物、電子素子およびその製造方法 |
| JP2018072789A (ja) | 2015-12-25 | 2018-05-10 | 旭化成株式会社 | 感光性樹脂組成物、感光性樹脂積層体、樹脂パターン製造方法、硬化膜パターン製造方法及び表示装置 |
| JP2018072397A (ja) | 2016-10-24 | 2018-05-10 | 東京応化工業株式会社 | 感光性組成物、感光性組成物の製造方法、光重合開始剤、及び光重合開始剤の調製方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020179163A1 (ja) | 2020-09-10 |
| KR20210135991A (ko) | 2021-11-16 |
| JP7330719B2 (ja) | 2023-08-22 |
| CN113383274B (zh) | 2025-08-19 |
| CN113383274A (zh) | 2021-09-10 |
| TWI813829B (zh) | 2023-09-01 |
| TW202043917A (zh) | 2020-12-01 |
| JP2020140161A (ja) | 2020-09-03 |
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