KR20140065901A - 분할 타겟 펄스 레이저 증착 장치 및 이를 이용한 초박막 다층구조 증착 방법 - Google Patents
분할 타겟 펄스 레이저 증착 장치 및 이를 이용한 초박막 다층구조 증착 방법 Download PDFInfo
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- KR20140065901A KR20140065901A KR1020120132942A KR20120132942A KR20140065901A KR 20140065901 A KR20140065901 A KR 20140065901A KR 1020120132942 A KR1020120132942 A KR 1020120132942A KR 20120132942 A KR20120132942 A KR 20120132942A KR 20140065901 A KR20140065901 A KR 20140065901A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
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Abstract
Description
도 2는 본 발명의 일 실시예에 따라 구획 또는 분할된 표면을 갖는 분할 타겟을 나타내는 개념도이다.
도 3은 본 발명의 일 실시예에 따라 형성된 YSZ:GDC 초박 다층구조의 이미지이다.
12 : 기체배출구 13 : 레이저 투과창
20 : 타겟 21: 증착 물질
22 : 타겟 회전용 모터 23 : 구동축
30 : 기판 31 : 기판 지지대
40 : 레이저 발생기
Claims (10)
- 기판 및 증착 물질이 위치하는 챔버;
상기 챔버 내부에 위치하고, 상기 증착 물질을 지지하며 회전하는 타겟; 및
상기 타겟 일부분에 레이저를 조사하여 상기 증착 물질을 분해함으로써, 분해된 증착 물질로부터 상기 기판 상에 박막을 증착하는 레이저 발생기;를 포함하고,
상기 타겟은 2 가지 이상의 증착 물질을 지지하되, 증착 물질에 따른 물리적인 구획 표면을 구비하여, 타겟의 회전에 따라 레이저가 조사하는 증착 물질이 교체되는 것을 특징으로 하는 펄스 레이저 증착 장치. - 제1항에 있어서,
상기 펄스 레이저 증착 장치는 타겟 회전용 모터를 더 포함하는 것을 특징으로 하는 펄스 레이저 증착 장치. - 제2항에 있어서,
상기 타겟 회전용 모터는 회전 속도 조절용 장치를 더 포함하는 것을 특징으로 하는 펄스 레이저 증착 장치. - 제1항에 있어서,
상기 타겟은 단일층으로 도포된 2 내지 10 가지의 증착 물질을 구획 포함하여 지지하는 것을 특징으로 하는 펄스 레이저 증착 장치. - 제1항에 있어서,
상기 레이저 발생기는 레이저의 파장을 조절하기 위한 단일 또는 복수개의 파장 조절 장치를 더 포함하는 것을 특징으로 하는 펄스 레이저 증착 장치. - 제1항에 있어서,
상기 레이저 발생기는 레이저의 펄스 주파수를 조절하기 위한 단일 또는 복수개의 펄스 주파수 조절 장치를 더 포함하는 것을 특징으로 하는 펄스 레이저 증착 장치. - a) 챔버 내에 기판; 및 2개 이상의 증착 물질이 구획되어 지지되는 타겟;을 위치시키는 단계;
b) 레이저 발생기를 가동하여 상기 타겟의 일 부분에 레이저를 조사하여 증착 물질을 분해시키고, 동시에 상기 타겟을 회전시키는 단계; 및
c) 상기 기판 상에, 타겟에 지지되는 2개 이상의 증착 물질이, 타겟의 회전에 따라 교체되어 주기적으로 증착되는 단계;를 포함하는 것을 특징으로 하는 초박막 다층구조 증착 방법. - 제7항에 있어서,
상기 a)단계는, 타겟의 표면에 2 내지 10 가지의 증착 물질을 각각 2 내지 10 개의 구획으로 나누어 도포 또는 증착하는 단계를 포함하는 것을 특징으로 하는 초박막 다층구조 증착 방법. - 제7항에 있어서,
상기 b)단계는, 레이저 발생기로부터 발생하는 레이저의 펄스 주파수 또는 파장을 조절하는 단계를 포함하는 것을 특징으로 하는 초박막 다층구조 증착 방법. - 제7항에 있어서,
상기 b)단계는, 상기 타겟의 회전속도를 조절하는 단계를 포함하는 것을 특징으로 하는 초박막 다층구조 증착 방법.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| KR1020120132942A KR101502449B1 (ko) | 2012-11-22 | 2012-11-22 | 분할 타겟 펄스 레이저 증착 장치 및 이를 이용한 초박막 다층구조 증착 방법 |
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| Application Number | Priority Date | Filing Date | Title |
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| KR1020120132942A KR101502449B1 (ko) | 2012-11-22 | 2012-11-22 | 분할 타겟 펄스 레이저 증착 장치 및 이를 이용한 초박막 다층구조 증착 방법 |
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| Publication Number | Publication Date |
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| KR20140065901A true KR20140065901A (ko) | 2014-05-30 |
| KR101502449B1 KR101502449B1 (ko) | 2015-03-13 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105925938A (zh) * | 2016-07-08 | 2016-09-07 | 合肥工业大学 | 一种Cs2SnI6薄膜的激光脉冲沉积制备方法 |
| KR20200031926A (ko) * | 2018-09-17 | 2020-03-25 | 광주과학기술원 | 자속고정점을 가지는 초전도체 박막 제작 장치 및 초전도체 박막 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05179429A (ja) * | 1991-12-28 | 1993-07-20 | Nec Corp | レーザアブレーション法を用いた複合系材料薄膜の製造方法 |
| JP3465041B2 (ja) * | 1999-12-01 | 2003-11-10 | 独立行政法人産業技術総合研究所 | Yag第5高調波パルスレーザ蒸着による薄膜の作製方法およびその装置 |
| KR20120049554A (ko) * | 2010-11-09 | 2012-05-17 | 경희대학교 산학협력단 | 회전 원통형 대향 타겟 스퍼터링 시스템 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105925938A (zh) * | 2016-07-08 | 2016-09-07 | 合肥工业大学 | 一种Cs2SnI6薄膜的激光脉冲沉积制备方法 |
| KR20200031926A (ko) * | 2018-09-17 | 2020-03-25 | 광주과학기술원 | 자속고정점을 가지는 초전도체 박막 제작 장치 및 초전도체 박막 |
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| KR101502449B1 (ko) | 2015-03-13 |
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