KR20140077894A - 열 어레이 제어 시스템 및 방법 - Google Patents
열 어레이 제어 시스템 및 방법 Download PDFInfo
- Publication number
- KR20140077894A KR20140077894A KR20147008383A KR20147008383A KR20140077894A KR 20140077894 A KR20140077894 A KR 20140077894A KR 20147008383 A KR20147008383 A KR 20147008383A KR 20147008383 A KR20147008383 A KR 20147008383A KR 20140077894 A KR20140077894 A KR 20140077894A
- Authority
- KR
- South Korea
- Prior art keywords
- node
- mode
- column
- power
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0432—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0202—Switches
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0227—Applications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0227—Applications
- H05B1/023—Industrial applications
- H05B1/0233—Industrial applications for semiconductors manufacturing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/06—Heater elements structurally combined with coupling elements or holders
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0434—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0602—Temperature monitoring
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
- H10P72/722—Details of electrostatic chucks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
- H05B2203/005—Heaters using a particular layout for the resistive material or resistive elements using multiple resistive elements or resistive zones isolated from each other
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/013—Heaters using resistive films or coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2213/00—Aspects relating both to resistive heating and to induction heating, covered by H05B3/00 and H05B6/00
- H05B2213/03—Heating plates made out of a matrix of heating elements that can define heating areas adapted to cookware randomly placed on the heating plate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
Landscapes
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Control Of Resistance Heating (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
- Surface Heating Bodies (AREA)
- Chemical Vapour Deposition (AREA)
- Resistance Heating (AREA)
- Control Of Temperature (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Physical Vapour Deposition (AREA)
- Small-Scale Networks (AREA)
- General Induction Heating (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
Description
도 1b는 조정 레이어 또는 조정 히터를 구비하며 그리고 본 발명 개시의 원칙들에 따라서 구축된 히터의 다른 모습의 분해 조립도이다.
도 1c는 본 발명 개시의 원칙들에 따라 베이스 히터용으로 예시적인 4개의 구역들 그리고 조정 히터용으로 18개의 구역들을 예시하는 히터의 원근적인 분해 조립 모습이다.
도 1d는 추가의 조정 레이어를 구비하고 그리고 본 발명 개시의 원칙들에 따라 구축된 고 해상도 히터 시스템의 다른 모습의 측면 모습이다.
도 2는 양방향 열 어레이에 대한 개략도이다.
도 3a는 다중-병렬 열 어레이에 대한 개략도이다.
도 3b는 다중-병렬 및 양방향 열 어레이에 대한 개략도이다.
도 4는 다중-병렬 및 양방향 열 어레이에 대한 다른 개략도이다.
도 5는 주소지정 가능한 스위치들을 구비한 열 어레이에 대한 개략도이다.
도 6a는 열 어레이를 제어하기 위한 방법을 예시한 흐름도이다.
도 6b는 도 6a로부터의 제어 방법을 예시한 타이밍 도면이다.
도 7a는 열 어레이를 위한 다른 제어 방법을 예시한 흐름도이다.
도 7b는 설명된 방법들 중 하나의 예를 위해서 사용된 네 개의 노드 토폴로지이다.
도 8은 열 어레이의 모드 (mode)의 전기적인 특성을 측정하기 위한 방법을 예시한 흐름도이다.
도 9a는 열 어레이를 캘리브레트하기 위한 방법을 예시한 흐름도이다.
도 9b는 열 어레이에 대해 타겟 셋 포인트들을 계산하기 위한 방법을 예시한 흐름도이다.
도 10은 제어기 시스템의 한 구현에 대한 개략도이다.
Claims (26)
- 열 (thermal) 시스템으로서:
복수의 열 엘리먼트들;
복수의 전력 노드들을 구비한 제어 시스템을 포함하며,
각 열 엘리먼트는 상기 복수의 전력 노드들 사이에 연결되며,
상기 제어 시스템은 복수의 모드들 중 각 모드에 대한 시간 주기를 계산하고, 상기 모드에 따라서 상기 복수의 열 엘리먼트들에게 전력을 공급하기 위해서 대응 시간 주기 동안 각 모드를 통해서 인덱스를 부여하도록 구성된, 열 시스템. - 제1항에 있어서,
상기 제어 시스템은 상기 모드에 대해 상기 열 엘리먼트들의 전기적인 특성을 측정하기 위해서 각 모드를 통해서 인덱스를 부여하고, 그리고 각 모드에 대해서 상기 측정된 전기적인 특성을 기반으로 하여 상기 시간 주기를 다시 계산하도록 구성된, 열 시스템. - 제1항에 있어서,
상기 타겟 셋포인트들을 계산하는 것은 상기 열 엘리먼트들의 베이스라인 저항값을 측정하는 것을 포함하는, 열 시스템. - 제3항에 있어서,
상기 타겟 셋포인트들을 계산하는 것은 상기 베이스라인 저항값, 온도 변화, 그리고 각 열 엘리먼트의 저항값의 온도 계수 ((temperature coefficient of resistance (TCR))를 기반으로 하여 타겟 저항값을 계산하는 것을 포함하는, 열 시스템. - 제1항에 있어서,
상기 타겟 셋포인트들을 계산하는 것은 각 모드에 대한 상기 타겟 저항값을 타겟 전압이나 타겟 전류로 변환하는 것을 포함하는, 열 시스템. - 제1항에 있어서,
상기 복수의 열 엘리먼트들 중 제1 열 엘리먼트 그리고 제2 열 엘리먼트는 제1 노드와 제2 노드 사이에 연결되며,
상기 제2 노드에 상대적인 상기 제1 노드의 제1 극성에 의해서 상기 제1 열 엘리먼트는 활성화되며 그리고 상기 제2 열 엘리먼트는 비활성화되며, 상기 제2 노드에 상대적인 상기 제1 노드의 제2 극성에 의해서 상기 제1 열 엘리먼트는 비활성화되며 그리고 상기 제2 열 엘리먼트는 활성화되는, 열 시스템. - 제1항에 있어서,
상기 복수의 열 엘리먼트들 중의 열 엘리먼트는 전력 노드들의 각 쌍 사이에 연결된, 열 시스템. - 제1항에 있어서,
상기 제어 시스템은 활성화 전압, 리턴 전압, 그리고 개방-회로 상태를 상기 전력 노드들 각각에 선택적으로 인가하도록 구성된, 열 시스템. - 제8항에 있어서,
상기 제어 시스템은 복수의 제어 모드들을 정의하도록 구성되며,
각 제어 모드는 상기 복수의 열 엘리먼트들 중 적어도 하나의 열 엘리먼트에게 에너지를 공급하도록 구성된, 열 시스템. - 제9항에 있어서,
상기 제어 시스템은 각 열 엘리먼트에 대해, 각 열 엘리먼트를 미리 정의된 저항값 셋 포인트로 구동시킬 전력 명령 (power command)을 기반으로 하여 각 모드를 활성화시키기 위해서 시간 주기를 결정하도록 구성된, 열 시스템. - 제1항에 있어서,
상기 열 엘리먼트는 에너지 소산성 (dissipative) 엘리먼트인, 열 시스템. - 제11항에 있어서,
상기 열 엘리먼트는 저항성 엘리먼트인, 열 시스템. - 제12항에 있어서,
상기 열 엘리먼트들은 온도 종속적 전기 저항을 가진 전기 전도성 재질로 구성된, 열 시스템. - 제13항에 있어서,
상기 제어 시스템은 상기 저항성 엘리먼트의 온도를 계산하기 위해서 상기 저항성 엘리먼트의 저항값을 측정하도록 구성된, 열 시스템. - 히터 (heater)로서:
베이스 플레이트;
상기 베이스 플레이트에 고정된 베이스 히터;
상기 베이스 히터에 고정된 기층 (substrate);
상기 기층에 고정되며, 복수의 히터 엘리먼트들을 포함하는 조정 (tuning) 히터;
상기 조정 히터에 고정된 척 (chuck); 그리고
복수의 전력 노드들을 구비한 제어 시스템을 포함하며,
각 히터 엘리먼트는 상기 복수의 전력 노드들 사이에 연결되며,
상기 제어 시스템은 복수의 모드들 중 각 모드에 대한 시간 주기를 계산하고, 상기 모드에 따라서 상기 복수의 히터 엘리먼트들에게 전력을 공급하기 위해서 대응 시간 주기 동안 각 모드를 통해서 인덱스를 부여하도록 구성된, 히터. - 제15항에 있어서,
상기 제어 시스템은 상기 모드에 대해 상기 히터 엘리먼트들의 전기적인 특성을 측정하기 위해서 각 모드를 통해서 인덱스를 부여하고, 그리고 각 모드에 대해서 상기 측정된 전기적인 특성을 기반으로 하여 상기 시간 주기를 다시 계산하도록 구성된, 시스템. - 제15항에 있어서,
상기 복수의 히터 엘리먼트들 중 제1 히터 엘리먼트 그리고 제2 히터 엘리먼트는 제1 노드와 제2 노드 사이에 연결되며,
상기 제2 노드에 상대적인 상기 제1 노드의 제1 극성에 의해서 상기 제1 히터 엘리먼트는 활성화되며 그리고 상기 제2 히터 엘리먼트는 비활성화되며, 상기 제2 노드에 상대적인 상기 제1 노드의 제2 극성에 의해서 상기 제1 히터 엘리먼트는 비활성화되며 그리고 상기 제2 히터 엘리먼트는 활성화되는, 시스템. - 제15항에 있어서,
상기 복수의 히터 엘리먼트들 중의 히터 엘리먼트는 전력 노드들의 각 쌍 사이에 연결된, 시스템. - 제15항에 있어서,
상기 제어 시스템은 활성화 전압, 리턴 전압, 그리고 개방-회로 상태를 상기 전력 노드들 각각에 선택적으로 인가하도록 구성된, 시스템. - 열 어레이를 제어하기 위한 방법으로서,
복수의 모드들 중 각 모드에 대한 시간 주기를 계산하는 단계;
대응하는 시간 주기 동안 각 모드를 통해서 인덱스를 부여하여, 각 열 엘리먼트를 셋포인트로 구동하기 위해서 상기 모드에 따라 복수의 열 엘리먼트들에게 전력을 제공하는 단계;
상기 모드의 전기적인 특성을 측정하기 위해서 각 모드를 통해서 인덱스를 부여하는 단계;
각 모드의 상기 측정된 전기적인 특성을 기반으로 하여 각 모드에 대한 시간 주기를 다시 계산하는 단계를 포함하는, 열 어레이 제어 방법. - 제20항에 있어서,
상기 방법은:
복수의 모드들 중 각 모드를 통해서 연속해서 인덱스를 부여하는 단계;
인덱스 부여된 모드로 전력을 공급하며, 그 인덱스 부여된 모드에 대한 열 엘리먼트들의 전기적인 특성을 측정하는 단계를 포함하는, 열 어레이 제어 방법. - 제21항에 있어서,
상기 전기적인 특성의 측정을 기반으로 하여 엘리먼트의 열 플럭스 (heat flux) 및 온도 중 적어도 하나를 계산하는 단계를 더 포함하는, 열 어레이 제어 방법. - 제22항에 있어서,
상기 전기적인 특성은 상기 엘리먼트로 제공된 전력인, 열 어레이 제어 방법. - 제22항에 있어서,
온도 및 열 플럭스 중 적어도 하나가 문턱 양 (threshold amount)을 변경하면 경보를 트리거하는 단계를 더 포함하는, 열 어레이 제어 방법. - 제24항에 있어서,
온도 및 열 플럭스 중 적어도 하나에서의 변화를 기반으로 하여 프로세스 파라미터를 바꾸는 단계를 더 포함하는, 열 어레이 제어 방법. - 제25항에 있어서,
전력을 상기 열 엘리먼트로 제공하는 것은 낮은 평균 전력을 제공하는 것을 포함하는, 열 어레이 제어 방법.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161528939P | 2011-08-30 | 2011-08-30 | |
| US61/528,939 | 2011-08-30 | ||
| US201261635310P | 2012-04-19 | 2012-04-19 | |
| US61/635,310 | 2012-04-19 | ||
| PCT/US2012/053067 WO2013033348A1 (en) | 2011-08-30 | 2012-08-30 | System and method for controlling a thermal array |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20140077894A true KR20140077894A (ko) | 2014-06-24 |
| KR101813635B1 KR101813635B1 (ko) | 2017-12-29 |
Family
ID=47003204
Family Applications (10)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147008066A Active KR101731566B1 (ko) | 2011-08-30 | 2012-08-30 | 유체 매질을 구비한 고정밀 히터 시스템 |
| KR1020147008067A Active KR101914731B1 (ko) | 2011-08-30 | 2012-08-30 | 고정밀 히터 시스템의 제조 방법 |
| KR1020147008412A Active KR101966305B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 시스템 |
| KR1020177027998A Active KR101941245B1 (ko) | 2011-08-30 | 2012-08-30 | 고정밀 히터 |
| KR1020147008383A Active KR101813635B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 제어 시스템 및 방법 |
| KR1020147008410A Active KR101831439B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 제어 시스템 및 방법 |
| KR1020147008065A Active KR101785503B1 (ko) | 2011-08-30 | 2012-08-30 | 고정밀 히터 |
| KR1020147008411A Active KR101778718B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 시스템 |
| KR1020177025252A Active KR101868130B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 시스템 |
| KR1020147008413A Active KR101750406B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 시스템 |
Family Applications Before (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147008066A Active KR101731566B1 (ko) | 2011-08-30 | 2012-08-30 | 유체 매질을 구비한 고정밀 히터 시스템 |
| KR1020147008067A Active KR101914731B1 (ko) | 2011-08-30 | 2012-08-30 | 고정밀 히터 시스템의 제조 방법 |
| KR1020147008412A Active KR101966305B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 시스템 |
| KR1020177027998A Active KR101941245B1 (ko) | 2011-08-30 | 2012-08-30 | 고정밀 히터 |
Family Applications After (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147008410A Active KR101831439B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 제어 시스템 및 방법 |
| KR1020147008065A Active KR101785503B1 (ko) | 2011-08-30 | 2012-08-30 | 고정밀 히터 |
| KR1020147008411A Active KR101778718B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 시스템 |
| KR1020177025252A Active KR101868130B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 시스템 |
| KR1020147008413A Active KR101750406B1 (ko) | 2011-08-30 | 2012-08-30 | 열 어레이 시스템 |
Country Status (11)
| Country | Link |
|---|---|
| US (13) | US10002779B2 (ko) |
| EP (8) | EP2752085B1 (ko) |
| JP (13) | JP6133870B2 (ko) |
| KR (10) | KR101731566B1 (ko) |
| CN (9) | CN104067691B (ko) |
| AU (8) | AU2012301903B2 (ko) |
| BR (8) | BR112014004911A2 (ko) |
| CA (9) | CA2847342C (ko) |
| IL (8) | IL231260A (ko) |
| MX (8) | MX337204B (ko) |
| WO (8) | WO2013033332A1 (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160078332A (ko) * | 2013-10-25 | 2016-07-04 | 도쿄엘렉트론가부시키가이샤 | 온도 제어 기구, 온도 제어 방법 및 기판 처리 장치 |
Families Citing this family (144)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120154974A1 (en) * | 2010-12-16 | 2012-06-21 | Applied Materials, Inc. | High efficiency electrostatic chuck assembly for semiconductor wafer processing |
| AU2012301903B2 (en) * | 2011-08-30 | 2015-07-09 | Watlow Electric Manufacturing Company | High definition heater system having a fluid medium |
| US10163668B2 (en) | 2011-08-30 | 2018-12-25 | Watlow Electric Manufacturing Company | Thermal dynamic response sensing systems for heaters |
| JP5973731B2 (ja) | 2012-01-13 | 2016-08-23 | 東京エレクトロン株式会社 | プラズマ処理装置及びヒータの温度制御方法 |
| US8937800B2 (en) * | 2012-04-24 | 2015-01-20 | Applied Materials, Inc. | Electrostatic chuck with advanced RF and temperature uniformity |
| WO2014015886A1 (en) | 2012-07-26 | 2014-01-30 | Hewlett-Packard Development Company, L.P. | Electrical resistor heating |
| US10049948B2 (en) * | 2012-11-30 | 2018-08-14 | Lam Research Corporation | Power switching system for ESC with array of thermal control elements |
| TW201448108A (zh) | 2013-03-12 | 2014-12-16 | 應用材料股份有限公司 | 用於電漿處理腔室的多重區域加熱及冷卻靜電夾盤 |
| US10332772B2 (en) | 2013-03-13 | 2019-06-25 | Applied Materials, Inc. | Multi-zone heated ESC with independent edge zones |
| FR3007229B1 (fr) * | 2013-06-17 | 2015-06-19 | Valeo Systemes Thermiques | Commande d'un circuit de chauffage electrique, notamment pour vehicule automobile |
| US20150016083A1 (en) * | 2013-07-05 | 2015-01-15 | Stephen P. Nootens | Thermocompression bonding apparatus and method |
| TW201518538A (zh) | 2013-11-11 | 2015-05-16 | 應用材料股份有限公司 | 像素化冷卻溫度控制的基板支撐組件 |
| US10460968B2 (en) | 2013-12-02 | 2019-10-29 | Applied Materials, Inc. | Electrostatic chuck with variable pixelated magnetic field |
| US9518946B2 (en) * | 2013-12-04 | 2016-12-13 | Watlow Electric Manufacturing Company | Thermographic inspection system |
| US9716022B2 (en) | 2013-12-17 | 2017-07-25 | Lam Research Corporation | Method of determining thermal stability of a substrate support assembly |
| US9622375B2 (en) | 2013-12-31 | 2017-04-11 | Applied Materials, Inc. | Electrostatic chuck with external flow adjustments for improved temperature distribution |
| US9520315B2 (en) | 2013-12-31 | 2016-12-13 | Applied Materials, Inc. | Electrostatic chuck with internal flow adjustments for improved temperature distribution |
| US11158526B2 (en) | 2014-02-07 | 2021-10-26 | Applied Materials, Inc. | Temperature controlled substrate support assembly |
| US9472410B2 (en) | 2014-03-05 | 2016-10-18 | Applied Materials, Inc. | Pixelated capacitance controlled ESC |
| JP6219227B2 (ja) * | 2014-05-12 | 2017-10-25 | 東京エレクトロン株式会社 | ヒータ給電機構及びステージの温度制御方法 |
| US9543171B2 (en) | 2014-06-17 | 2017-01-10 | Lam Research Corporation | Auto-correction of malfunctioning thermal control element in a temperature control plate of a semiconductor substrate support assembly that includes deactivating the malfunctioning thermal control element and modifying a power level of at least one functioning thermal control element |
| CN106471609B (zh) | 2014-07-02 | 2019-10-15 | 应用材料公司 | 用于使用嵌入光纤光学器件及环氧树脂光学散射器的基板温度控制的装置、系统与方法 |
| TWI603416B (zh) * | 2014-07-08 | 2017-10-21 | 瓦特洛威電子製造公司 | 具有接合層之整合溫度感測技術的接合總成 |
| KR101758087B1 (ko) * | 2014-07-23 | 2017-07-14 | 어플라이드 머티어리얼스, 인코포레이티드 | 튜닝가능한 온도 제어되는 기판 지지 어셈블리 |
| EP3213598B1 (en) * | 2014-10-31 | 2023-07-05 | Watlow Electric Manufacturing Company | Thermal dynamic response sensing systems for heaters |
| CN104466840B (zh) * | 2014-11-18 | 2017-01-18 | 河南省通信电缆有限公司 | 室内布线结构及使用该室内布线结构的布线系统 |
| KR102233925B1 (ko) * | 2014-11-20 | 2021-03-30 | 스미토모 오사카 세멘토 가부시키가이샤 | 정전 척 장치 |
| JP6513938B2 (ja) * | 2014-11-21 | 2019-05-15 | 日本特殊陶業株式会社 | 静電チャックの製造方法 |
| JP6325424B2 (ja) * | 2014-11-21 | 2018-05-16 | 日本特殊陶業株式会社 | 静電チャック |
| US20160149733A1 (en) * | 2014-11-26 | 2016-05-26 | Applied Materials, Inc. | Control architecture for devices in an rf environment |
| JP6530220B2 (ja) * | 2015-03-30 | 2019-06-12 | 日本特殊陶業株式会社 | セラミックヒータ及びその制御方法、並びに、静電チャック及びその制御方法 |
| KR20180011119A (ko) * | 2015-05-22 | 2018-01-31 | 어플라이드 머티어리얼스, 인코포레이티드 | 방위방향으로 튜닝가능한 다중-구역 정전 척 |
| US10386821B2 (en) | 2015-06-22 | 2019-08-20 | Lam Research Corporation | Systems and methods for calibrating scalar field contribution values for a limited number of sensors including a temperature value of an electrostatic chuck and estimating temperature distribution profiles based on calibrated values |
| US10381248B2 (en) * | 2015-06-22 | 2019-08-13 | Lam Research Corporation | Auto-correction of electrostatic chuck temperature non-uniformity |
| US10763142B2 (en) | 2015-06-22 | 2020-09-01 | Lam Research Corporation | System and method for determining field non-uniformities of a wafer processing chamber using a wafer processing parameter |
| US9779974B2 (en) | 2015-06-22 | 2017-10-03 | Lam Research Corporation | System and method for reducing temperature transition in an electrostatic chuck |
| US10074512B2 (en) * | 2015-07-09 | 2018-09-11 | Applied Materials Israel Ltd. | System and method for setting a temperature of an object within a chamber |
| US10237916B2 (en) * | 2015-09-30 | 2019-03-19 | Tokyo Electron Limited | Systems and methods for ESC temperature control |
| US10186437B2 (en) * | 2015-10-05 | 2019-01-22 | Lam Research Corporation | Substrate holder having integrated temperature measurement electrical devices |
| US10631370B2 (en) * | 2015-10-30 | 2020-04-21 | Ngk Insulators, Ltd. | Member for semiconductor manufacturing apparatus, method for producing the same, and heater including shaft |
| US9826574B2 (en) * | 2015-10-28 | 2017-11-21 | Watlow Electric Manufacturing Company | Integrated heater and sensor system |
| US9623679B1 (en) * | 2015-11-18 | 2017-04-18 | Xerox Corporation | Electrostatic platen for conductive pet film printing |
| US9812342B2 (en) * | 2015-12-08 | 2017-11-07 | Watlow Electric Manufacturing Company | Reduced wire count heater array block |
| US10690414B2 (en) * | 2015-12-11 | 2020-06-23 | Lam Research Corporation | Multi-plane heater for semiconductor substrate support |
| US10582570B2 (en) | 2016-01-22 | 2020-03-03 | Applied Materials, Inc. | Sensor system for multi-zone electrostatic chuck |
| US12540757B2 (en) | 2016-03-02 | 2026-02-03 | Watlow Electric Manufacturing Company | Heater bundles with local power switching |
| WO2017151965A1 (en) * | 2016-03-02 | 2017-09-08 | Watlow Electric Manufacturint Company | Heater element having targeted decreasing temperature resistance characteristics |
| US12270577B2 (en) | 2016-03-02 | 2025-04-08 | Watlow Electric Manufacturing Company | Heater bundles for thermal gradient compensation |
| US10247445B2 (en) | 2016-03-02 | 2019-04-02 | Watlow Electric Manufacturing Company | Heater bundle for adaptive control |
| US10619888B2 (en) | 2016-03-02 | 2020-04-14 | Watlow Electric Manufacturing Company | Heater bundle for adaptive control and method of reducing current leakage |
| US12560356B2 (en) | 2016-03-02 | 2026-02-24 | Watlow Electric Manufacturing Company | Heater bundles having virtual sensing for thermal gradient compensation |
| JP6226092B2 (ja) * | 2016-03-14 | 2017-11-08 | Toto株式会社 | 静電チャック |
| KR102513443B1 (ko) * | 2016-03-15 | 2023-03-24 | 삼성전자주식회사 | 정전 척 및 그를 포함하는 기판 처리 장치 |
| US10973088B2 (en) | 2016-04-18 | 2021-04-06 | Applied Materials, Inc. | Optically heated substrate support assembly with removable optical fibers |
| JP6982126B2 (ja) * | 2016-05-06 | 2021-12-17 | 日本特殊陶業株式会社 | 加熱部材及び静電チャック |
| KR102360248B1 (ko) * | 2016-05-10 | 2022-02-07 | 램 리써치 코포레이션 | 상이한 히터 트레이스 재료를 사용한 적층된 히터 |
| US10340171B2 (en) | 2016-05-18 | 2019-07-02 | Lam Research Corporation | Permanent secondary erosion containment for electrostatic chuck bonds |
| WO2017218791A1 (en) * | 2016-06-15 | 2017-12-21 | Watlow Electric Manufacturing Company | Power converter for a thermal system |
| US10908195B2 (en) | 2016-06-15 | 2021-02-02 | Watlow Electric Manufacturing Company | System and method for controlling power to a heater |
| TWI664873B (zh) * | 2016-07-07 | 2019-07-01 | 美商瓦特洛威電子製造公司 | 用於適應性控制之加熱器束及減少電流洩漏之方法 |
| US11069553B2 (en) * | 2016-07-07 | 2021-07-20 | Lam Research Corporation | Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity |
| JP6238097B1 (ja) * | 2016-07-20 | 2017-11-29 | Toto株式会社 | 静電チャック |
| US10366867B2 (en) | 2016-08-19 | 2019-07-30 | Applied Materials, Inc. | Temperature measurement for substrate carrier using a heater element array |
| US20180053666A1 (en) * | 2016-08-19 | 2018-02-22 | Applied Materials, Inc. | Substrate carrier with array of independently controllable heater elements |
| US10685861B2 (en) | 2016-08-26 | 2020-06-16 | Applied Materials, Inc. | Direct optical heating of substrates through optical guide |
| US10679873B2 (en) * | 2016-09-30 | 2020-06-09 | Ngk Spark Plug Co., Ltd. | Ceramic heater |
| US10708979B2 (en) | 2016-10-07 | 2020-07-07 | De-Ice Technologies | Heating a bulk medium |
| JP2018063974A (ja) * | 2016-10-11 | 2018-04-19 | 東京エレクトロン株式会社 | 温度制御装置、温度制御方法、および載置台 |
| US10448458B2 (en) * | 2016-10-21 | 2019-10-15 | Watlow Electric Manufacturing Company | Electric heaters with low drift resistance feedback |
| ES2673131B1 (es) | 2016-12-19 | 2019-03-28 | Bsh Electrodomesticos Espana Sa | Dispositivo de aparato domestico de coccion por induccion con una matriz de elementos de calentamiento |
| ES2673130B1 (es) | 2016-12-19 | 2019-03-28 | Bsh Electrodomesticos Espana Sa | Dispositivo de aparato domestico de coccion por induccion con una matriz de elementos de calentamiento |
| US10910195B2 (en) | 2017-01-05 | 2021-02-02 | Lam Research Corporation | Substrate support with improved process uniformity |
| US11508600B2 (en) * | 2017-04-10 | 2022-11-22 | Ngk Spark Plug Co., Ltd. | Holding device |
| US11276590B2 (en) | 2017-05-17 | 2022-03-15 | Applied Materials, Inc. | Multi-zone semiconductor substrate supports |
| US10363845B2 (en) * | 2017-05-30 | 2019-07-30 | Ford Global Technologies, Llc | Conductive system |
| JP7158131B2 (ja) * | 2017-05-30 | 2022-10-21 | 東京エレクトロン株式会社 | ステージ及びプラズマ処理装置 |
| JP6905399B2 (ja) * | 2017-06-23 | 2021-07-21 | 新光電気工業株式会社 | 基板固定装置 |
| CN107300426B (zh) * | 2017-06-23 | 2019-06-25 | 北京金风科创风电设备有限公司 | 温度检测系统和温度检测方法 |
| KR102435888B1 (ko) * | 2017-07-04 | 2022-08-25 | 삼성전자주식회사 | 정전 척, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법 |
| TWI858475B (zh) * | 2017-08-10 | 2024-10-11 | 美商瓦特洛威電子製造公司 | 控制送至加熱器之電力的系統及方法 |
| CN109429382A (zh) * | 2017-08-24 | 2019-03-05 | 江苏威能电气有限公司 | 快速升降温加热器 |
| CN109561526B (zh) * | 2017-09-26 | 2023-04-25 | 杜邦电子公司 | 加热元件和加热装置 |
| TWI829367B (zh) * | 2017-11-16 | 2024-01-11 | 日商東京威力科創股份有限公司 | 電漿處理裝置、溫度控制方法及溫度控制程式 |
| US11236422B2 (en) | 2017-11-17 | 2022-02-01 | Lam Research Corporation | Multi zone substrate support for ALD film property correction and tunability |
| JP7303820B2 (ja) | 2017-11-21 | 2023-07-05 | ワトロー エレクトリック マニュファクチュアリング カンパニー | ビアを有さない複数領域ペデスタルヒーター |
| US10681778B2 (en) * | 2017-11-21 | 2020-06-09 | Watlow Electric Manufacturing Company | Integrated heater and method of manufacture |
| US10761041B2 (en) * | 2017-11-21 | 2020-09-01 | Watlow Electric Manufacturing Company | Multi-parallel sensor array system |
| US11083050B2 (en) | 2017-11-21 | 2021-08-03 | Watlow Electric Manufacturing Company | Integrated heater and method of manufacture |
| US12009185B2 (en) | 2018-02-09 | 2024-06-11 | Applied Materials, Inc. | Semiconductor processing apparatus having improved temperature control |
| KR20200105717A (ko) * | 2018-02-16 | 2020-09-08 | 니뽄 도쿠슈 도교 가부시키가이샤 | 유지 장치 |
| US20190320501A1 (en) | 2018-04-17 | 2019-10-17 | Watlow Electric Manufacturing Company | All aluminum heater |
| US10633742B2 (en) | 2018-05-07 | 2020-04-28 | Lam Research Foundation | Use of voltage and current measurements to control dual zone ceramic pedestals |
| WO2019231502A1 (en) * | 2018-05-31 | 2019-12-05 | Valmet, Inc. | Through air drying and bonding systems and methods |
| CN118360588A (zh) | 2018-07-05 | 2024-07-19 | 朗姆研究公司 | 衬底处理系统中的衬底支撑件的动态温度控制 |
| US11087962B2 (en) * | 2018-07-20 | 2021-08-10 | Lam Research Corporation | Real-time control of temperature in a plasma chamber |
| US11209878B2 (en) * | 2018-07-31 | 2021-12-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Discrete time loop based thermal control |
| US11183400B2 (en) | 2018-08-08 | 2021-11-23 | Lam Research Corporation | Progressive heating of components of substrate processing systems using TCR element-based heaters |
| US10872747B2 (en) | 2018-08-08 | 2020-12-22 | Lam Research Corporation | Controlling showerhead heating via resistive thermal measurements |
| ES2952373T3 (es) | 2018-08-27 | 2023-10-31 | De Ice Tech Inc | Sistemas de deshielo |
| JP7112915B2 (ja) * | 2018-09-07 | 2022-08-04 | 東京エレクトロン株式会社 | 温調システム |
| JP2022534141A (ja) * | 2018-10-12 | 2022-07-28 | アプライド マテリアルズ インコーポレイテッド | ヒータが一体化されたチャンバリッド |
| JP7571017B2 (ja) * | 2018-11-20 | 2024-10-22 | ラム リサーチ コーポレーション | 半導体製造における二相冷却 |
| CN111383891B (zh) | 2018-12-29 | 2023-03-10 | 中微半导体设备(上海)股份有限公司 | 用于半导体处理设备的温度控制装置及其温度控制方法 |
| US11562913B2 (en) * | 2019-04-25 | 2023-01-24 | Watlow Electric Manufacturing Company | Multi-zone azimuthal heater |
| JP7299756B2 (ja) * | 2019-05-24 | 2023-06-28 | 日本特殊陶業株式会社 | 保持装置 |
| JP7292115B2 (ja) * | 2019-06-07 | 2023-06-16 | 東京エレクトロン株式会社 | 温度調整装置及び温度制御方法。 |
| TWI796572B (zh) * | 2019-06-07 | 2023-03-21 | 美商瓦特洛威電子製造公司 | 用以校準操作電熱器的控制系統之系統及方法 |
| US11533783B2 (en) * | 2019-07-18 | 2022-12-20 | Applied Materials, Inc. | Multi-zone heater model-based control in semiconductor manufacturing |
| US11515190B2 (en) * | 2019-08-27 | 2022-11-29 | Watlow Electric Manufacturing Company | Thermal diffuser for a semiconductor wafer holder |
| KR102612972B1 (ko) * | 2019-10-11 | 2023-12-13 | 한온시스템 주식회사 | 냉각수 히터 및 냉각수 히터의 전류를 측정하기 위한 방법 |
| CN110940695B (zh) * | 2019-11-28 | 2022-04-26 | 航天特种材料及工艺技术研究所 | 一种热量汇聚装置 |
| DE102020000642A1 (de) * | 2019-12-17 | 2021-06-17 | Mahle International Gmbh | Elektrische Heizeinrichtung und Verfahren zum Betreiben der elektrischen Heizeinrichtung |
| US11937516B2 (en) * | 2020-03-04 | 2024-03-19 | International Business Machines Corporation | Fabrication of a flux bias line local heating device |
| US12022749B2 (en) | 2020-03-04 | 2024-06-25 | International Business Machines Corporation | Flux bias line local heating device |
| CN111372336B (zh) * | 2020-03-25 | 2021-10-26 | 广州智慧医疗科技有限公司 | 一种红外电热膜及其制备方法 |
| US11450546B2 (en) * | 2020-04-09 | 2022-09-20 | Applied Materials, Inc. | Semiconductor substrate support with internal channels |
| US11551951B2 (en) | 2020-05-05 | 2023-01-10 | Applied Materials, Inc. | Methods and systems for temperature control for a substrate |
| KR102440415B1 (ko) * | 2020-05-07 | 2022-09-13 | 주식회사 유진테크 | 다구역 온도 제어를 위한 기판 지지 어셈블리 및 그 기판 지지 어셈블리를 포함하는 플라즈마 프로세싱 시스템 |
| JP7731373B2 (ja) * | 2020-05-19 | 2025-08-29 | ワトロー エレクトリック マニュファクチュアリング カンパニー | 抵抗ヒーターのための受動的及び能動的な較正方法 |
| KR102776505B1 (ko) | 2020-07-09 | 2025-03-07 | 삼성전자주식회사 | 플라즈마 처리 장치 및 이를 이용한 반도체 소자 제조방법 |
| JP7578359B2 (ja) | 2020-07-10 | 2024-11-06 | 東京エレクトロン株式会社 | 載置台装置及び基板処理装置 |
| CN114496692B (zh) * | 2020-11-11 | 2024-03-12 | 中微半导体设备(上海)股份有限公司 | 加热组件、基片承载组件及其等离子体处理装置 |
| KR102578703B1 (ko) * | 2020-11-24 | 2023-09-18 | 세메스 주식회사 | 지지 유닛 및 이를 포함하는 기판 처리 장치 및 온도 제어 방법 |
| KR20220089390A (ko) * | 2020-12-21 | 2022-06-28 | 세메스 주식회사 | 온도 조절 장치 |
| KR102287443B1 (ko) * | 2020-12-22 | 2021-08-09 | 주식회사 오토콘시스템 | 정전척 히터의 온도 제어 시스템 |
| KR102935423B1 (ko) | 2020-12-30 | 2026-03-06 | 세메스 주식회사 | 히터 어레이 및 히터 어레이를 포함하는 기판 처리 장치 |
| KR102951107B1 (ko) | 2020-12-31 | 2026-04-13 | 델타 디자인, 인코포레이티드 | 열 시스템 제어가 결합된 집적 회로 테스트 장치 |
| US12317378B2 (en) * | 2021-02-04 | 2025-05-27 | Applied Materials, Inc. | Multi-zone heater control for wafer processing equipment |
| JP7407752B2 (ja) * | 2021-02-05 | 2024-01-04 | 日本碍子株式会社 | ウエハ支持台 |
| CN112986983B (zh) * | 2021-02-06 | 2023-12-19 | 中国人民解放军国防科技大学 | 一种全息穿透成像雷达杂波抑制方法 |
| KR102695408B1 (ko) * | 2021-02-26 | 2024-08-16 | 세메스 주식회사 | 지지 유닛 및 이를 포함하는 기판 처리 장치 |
| KR102883317B1 (ko) | 2021-03-10 | 2025-11-06 | 와틀로 일렉트릭 매뉴팩츄어링 컴파니 | 열구배 보상을 위한 히터 번들 |
| KR20220127174A (ko) | 2021-03-10 | 2022-09-19 | 와틀로 일렉트릭 매뉴팩츄어링 컴파니 | 열적 그래디언트 보상을 위한 가상 감지를 가진 히트 번들 |
| KR20220127173A (ko) | 2021-03-10 | 2022-09-19 | 와틀로 일렉트릭 매뉴팩츄어링 컴파니 | 로컬 파워 스위치를 가진 히터 번들 |
| KR20220127171A (ko) | 2021-03-10 | 2022-09-19 | 와틀로 일렉트릭 매뉴팩츄어링 컴파니 | 구역들 내부에서 가변 출력을 가지는 히터 번들 |
| KR102654892B1 (ko) * | 2021-07-28 | 2024-04-05 | 세메스 주식회사 | 지지 유닛, 가열 유닛 및 이를 포함하는 기판 처리 장치 |
| KR102654890B1 (ko) * | 2021-08-27 | 2024-04-05 | 세메스 주식회사 | 기판 처리 장치 및 발열체의 온도 제어 방법 |
| JP7780131B2 (ja) | 2022-03-29 | 2025-12-04 | Toto株式会社 | 静電チャック |
| WO2023235492A1 (en) * | 2022-06-01 | 2023-12-07 | Ignik Outdoors, Inc. | A system and method for controlling a portable heated product |
| JPWO2024048273A1 (ko) * | 2022-08-29 | 2024-03-07 | ||
| US12444655B2 (en) | 2023-03-28 | 2025-10-14 | Applied Materials, Inc. | Machine learning model for semiconductor manufacturing processes |
| JP2025187295A (ja) * | 2024-06-13 | 2025-12-25 | 株式会社日立製作所 | 回路装置、素子温度一定化方法、及び電子装置 |
| CN119690165B (zh) * | 2024-12-16 | 2025-05-27 | 中国人民解放军总医院第一医学中心 | 一种药品恒温系统控制优化方法 |
| CN119916863B (zh) * | 2025-04-01 | 2025-07-11 | 四川味滋美食品科技有限公司 | 一种用于底料加热的温度控制方法、系统及存储介质 |
Family Cites Families (164)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1631484A (en) * | 1925-03-30 | 1927-06-07 | Hudson Heating Systems Inc | Electric heater |
| US2008541A (en) * | 1933-02-28 | 1935-07-16 | Drury T Boyd | Electric heating device |
| US2108964A (en) * | 1936-02-03 | 1938-02-22 | Nestle Lemur Company | Electrical circuit for hair waving machines |
| US2237808A (en) * | 1939-09-07 | 1941-04-08 | Edison General Elec Appliance | Water heater and control therefor |
| GB1256694A (ko) * | 1968-03-18 | 1971-12-15 | ||
| US3659155A (en) * | 1969-03-03 | 1972-04-25 | Robertshaw Controls Co | Current sensing apparatus |
| US3584291A (en) * | 1969-07-30 | 1971-06-08 | Powers Regulator Co | Proportional electric heat control system |
| US3745308A (en) * | 1971-07-01 | 1973-07-10 | Heinemann Electric Co | Temperature control circuits |
| US3774151A (en) * | 1971-09-02 | 1973-11-20 | Allied Chem | Diagnostic firing circuit adapted for use with inflatable restraint systems in vehicles |
| US3752956A (en) * | 1972-05-03 | 1973-08-14 | Du Pont | Electrical resistance heating control circuit |
| SE373963B (ko) * | 1973-06-14 | 1975-02-17 | Janson Sven Olof | |
| US3953711A (en) * | 1973-11-06 | 1976-04-27 | E.G.O. Elektro-Geraete Blanc Und Fischer | Cooking units |
| SE7806238L (sv) * | 1977-07-02 | 1979-01-03 | Fischer Karl | Elektriskt stralningsvermeelement, serskilt for glaskeramikkokhell |
| US4316078A (en) * | 1978-01-09 | 1982-02-16 | Sweetheart Plastics, Inc. | Food serving system |
| DE2844650A1 (de) * | 1978-10-13 | 1980-04-17 | Schickedanz Willi | Brotroester |
| US4320285A (en) * | 1979-05-10 | 1982-03-16 | Koether Bernard G | Primary thermostat using cooking computer temperature probe with control transfer upon probe failure |
| US4339649A (en) * | 1980-06-03 | 1982-07-13 | Emhart Industries, Inc. | Apparatus and method for R-C time constant circuit |
| JPS58145084A (ja) * | 1981-09-18 | 1983-08-29 | 国際技術開発株式会社 | 発熱体の温度制御方式 |
| DE3204598A1 (de) * | 1982-02-10 | 1983-08-18 | Bosch Siemens Hausgeraete | Schaltungsanordnung fuer heizungselemente in kochherdmulden |
| DE3303449A1 (de) * | 1983-02-02 | 1984-08-02 | Siemens AG, 1000 Berlin und 8000 München | Schutzeinrichtung fuer eine supraleitende magnetspulenanordnung |
| US4748445A (en) * | 1983-07-13 | 1988-05-31 | Citizen Watch Co., Ltd. | Matrix display panel having a diode ring structure as a resistive element |
| EP0176027B1 (de) * | 1984-09-22 | 1989-02-01 | E.G.O. Elektro-Geräte Blanc u. Fischer | Strahlheizkörper für Kochgeräte |
| EP0205669B1 (en) * | 1985-06-18 | 1990-04-04 | Agfa-Gevaert N.V. | Electric heating circuit |
| US4713525A (en) * | 1986-07-23 | 1987-12-15 | Kowah, Inc. | Microcomputer controlled instant electric water heating and delivery system |
| JP2659363B2 (ja) * | 1986-09-09 | 1997-09-30 | 三菱電機株式会社 | 緊急消磁装置付き超電導マグネツト装置 |
| JP2587233B2 (ja) | 1987-04-24 | 1997-03-05 | 四国化工機株式会社 | 焼印装置 |
| US5103367A (en) * | 1987-05-06 | 1992-04-07 | Unisearch Limited | Electrostatic chuck using A.C. field excitation |
| JP2779950B2 (ja) * | 1989-04-25 | 1998-07-23 | 東陶機器株式会社 | 静電チャックの電圧印加方法および電圧印加装置 |
| US5001594A (en) * | 1989-09-06 | 1991-03-19 | Mcnc | Electrostatic handling device |
| US5105067A (en) * | 1989-09-08 | 1992-04-14 | Environwear, Inc. | Electronic control system and method for cold weather garment |
| US5023430A (en) * | 1989-09-08 | 1991-06-11 | Environwear, Inc. | Hybrid electronic control system and method for cold weather garment |
| US5280422A (en) * | 1990-11-05 | 1994-01-18 | Watlow/Winona, Inc. | Method and apparatus for calibrating and controlling multiple heaters |
| US5446576A (en) * | 1990-11-26 | 1995-08-29 | Donnelly Corporation | Electrochromic mirror for vehicles with illumination and heating control |
| US5325261A (en) * | 1991-05-17 | 1994-06-28 | Unisearch Limited | Electrostatic chuck with improved release |
| US5280434A (en) * | 1991-07-01 | 1994-01-18 | Thermoforming Technologies, Inc. | Heating system for thermoforming |
| JPH05326112A (ja) * | 1992-05-21 | 1993-12-10 | Shin Etsu Chem Co Ltd | 複層セラミックスヒーター |
| US5684669A (en) * | 1995-06-07 | 1997-11-04 | Applied Materials, Inc. | Method for dechucking a workpiece from an electrostatic chuck |
| US5493101A (en) * | 1993-12-15 | 1996-02-20 | Eaton Corporation | Positive temperature coefficient transition sensor |
| JP2651793B2 (ja) * | 1993-12-20 | 1997-09-10 | 坂口電熱株式会社 | セラミックファイバーヒーター |
| JPH07199722A (ja) * | 1993-12-29 | 1995-08-04 | Nippon Dennetsu Co Ltd | 抵抗変化を利用した温度制御装置 |
| US5459632A (en) * | 1994-03-07 | 1995-10-17 | Applied Materials, Inc. | Releasing a workpiece from an electrostatic chuck |
| IT1281843B1 (it) † | 1995-01-25 | 1998-03-03 | Meneghetti Ampelio & C S N C | Dispositivo di controllo particolarmente per fornelli ad induzione multipiastra |
| JP3364063B2 (ja) * | 1995-08-25 | 2003-01-08 | 本田技研工業株式会社 | 車輌の電気負荷異常検出装置 |
| US5796074A (en) * | 1995-11-28 | 1998-08-18 | Applied Materials, Inc. | Wafer heater assembly |
| JPH09270454A (ja) * | 1996-04-01 | 1997-10-14 | Kyocera Corp | ウエハ保持装置 |
| AT1469U1 (de) | 1996-04-10 | 1997-05-26 | E & E Elektronik Gmbh | Verfahren zum ermitteln der absoluten luftfeuchtigkeit |
| US6108189A (en) * | 1996-04-26 | 2000-08-22 | Applied Materials, Inc. | Electrostatic chuck having improved gas conduits |
| JPH09326555A (ja) * | 1996-06-05 | 1997-12-16 | Nippon Avionics Co Ltd | 接合装置 |
| US5802856A (en) * | 1996-07-31 | 1998-09-08 | Stanford University | Multizone bake/chill thermal cycling module |
| EP0827187A3 (en) * | 1996-08-26 | 2004-01-07 | Applied Materials, Inc. | Method and apparatus for cooling a workpiece using an electrostatic chuck |
| DE19650038A1 (de) * | 1996-12-03 | 1998-06-04 | Bosch Gmbh Robert | Verfahren zum Betreiben eines Widerstandsheizelementes und Vorrichtung zum Durchführen des Verfahrens |
| JP3502233B2 (ja) * | 1997-03-10 | 2004-03-02 | シャープ株式会社 | ヒーター制御装置 |
| JP3437410B2 (ja) * | 1997-06-02 | 2003-08-18 | シャープ株式会社 | ヒータ制御装置 |
| JPH11111823A (ja) * | 1997-10-06 | 1999-04-23 | Dainippon Screen Mfg Co Ltd | 基板熱処理装置 |
| AU1308699A (en) * | 1997-11-07 | 1999-05-31 | Shell Oil Company | Heater control |
| US5880924A (en) * | 1997-12-01 | 1999-03-09 | Applied Materials, Inc. | Electrostatic chuck capable of rapidly dechucking a substrate |
| US6342997B1 (en) * | 1998-02-11 | 2002-01-29 | Therm-O-Disc, Incorporated | High sensitivity diode temperature sensor with adjustable current source |
| US6073577A (en) | 1998-06-30 | 2000-06-13 | Lam Research Corporation | Electrode for plasma processes and method for manufacture and use thereof |
| US7218503B2 (en) * | 1998-09-30 | 2007-05-15 | Lam Research Corporation | Method of determining the correct average bias compensation voltage during a plasma process |
| US6361645B1 (en) * | 1998-10-08 | 2002-03-26 | Lam Research Corporation | Method and device for compensating wafer bias in a plasma processing chamber |
| JP4040814B2 (ja) * | 1998-11-30 | 2008-01-30 | 株式会社小松製作所 | 円盤状ヒータ及び温度制御装置 |
| JP2000235886A (ja) * | 1998-12-14 | 2000-08-29 | Tokyo Electron Ltd | 加熱手段の温度制御装置および温度制御方法 |
| US20020036881A1 (en) * | 1999-05-07 | 2002-03-28 | Shamouil Shamouilian | Electrostatic chuck having composite base and method |
| US6490146B2 (en) * | 1999-05-07 | 2002-12-03 | Applied Materials Inc. | Electrostatic chuck bonded to base with a bond layer and method |
| JP2001059694A (ja) | 1999-08-20 | 2001-03-06 | Zexel Valeo Climate Control Corp | 熱交換器 |
| CN1207939C (zh) | 1999-09-29 | 2005-06-22 | 东京电子株式会社 | 多区电阻加热器 |
| JP2001126851A (ja) | 1999-10-26 | 2001-05-11 | Keihin Sokki Kk | 半導体ウエハーにおけるヒータ装置およびその製造方法 |
| US6884972B2 (en) * | 1999-12-09 | 2005-04-26 | Ibiden Co., Ltd. | Ceramic plate for a semiconductor producing/inspecting apparatus |
| US6307728B1 (en) * | 2000-01-21 | 2001-10-23 | Applied Materials, Inc. | Method and apparatus for dechucking a workpiece from an electrostatic chuck |
| US6444957B1 (en) * | 2000-04-26 | 2002-09-03 | Sumitomo Osaka Cement Co., Ltd | Heating apparatus |
| WO2002007312A2 (en) * | 2000-07-13 | 2002-01-24 | Isothermal Systems Research, Inc. | Power semiconductor switching devices, power converters, integrated circuit assemblies, integrated circuitry, power current switching methods, methods of forming a power semiconductor switching device, power conversion methods, power semiconductor switching device packaging methods, and methods of forming a power transistor |
| JP4415467B2 (ja) * | 2000-09-06 | 2010-02-17 | 株式会社日立製作所 | 画像表示装置 |
| US6632523B1 (en) * | 2000-09-28 | 2003-10-14 | Sumitomo Bakelite Company Limited | Low temperature bonding adhesive composition |
| US6581275B2 (en) * | 2001-01-22 | 2003-06-24 | Applied Materials Inc. | Fabricating an electrostatic chuck having plasma resistant gas conduits |
| US6508062B2 (en) * | 2001-01-31 | 2003-01-21 | Applied Materials, Inc. | Thermal exchanger for a wafer chuck |
| US20050211385A1 (en) * | 2001-04-30 | 2005-09-29 | Lam Research Corporation, A Delaware Corporation | Method and apparatus for controlling spatial temperature distribution |
| JP3713220B2 (ja) * | 2001-06-15 | 2005-11-09 | 日本特殊陶業株式会社 | セラミックヒータ |
| KR100431658B1 (ko) | 2001-10-05 | 2004-05-17 | 삼성전자주식회사 | 기판 가열 장치 및 이를 갖는 장치 |
| ES2567796T3 (es) * | 2001-10-12 | 2016-04-26 | Whirlpool Corporation | Placa de cocina con elementos de calentamiento discretos distribuidos |
| JP3856293B2 (ja) * | 2001-10-17 | 2006-12-13 | 日本碍子株式会社 | 加熱装置 |
| JP3982674B2 (ja) * | 2001-11-19 | 2007-09-26 | 日本碍子株式会社 | セラミックヒーター、その製造方法および半導体製造装置用加熱装置 |
| CN1596557A (zh) * | 2001-11-30 | 2005-03-16 | 揖斐电株式会社 | 陶瓷加热器 |
| WO2003047088A2 (en) * | 2001-11-30 | 2003-06-05 | Koninklijke Philips Electronics N.V. | Frequency modulator using switched capacitors |
| WO2003069324A1 (en) | 2002-02-15 | 2003-08-21 | Lm Glasfiber A/S | A method and an apparatus for the detection of the presence of polymer in a wind turbine blade |
| JP2003258065A (ja) * | 2002-02-27 | 2003-09-12 | Kyocera Corp | ウエハ載置ステージ |
| JP2005522834A (ja) * | 2002-04-10 | 2005-07-28 | フレックスコン・カンパニー・インコーポレーテッド | 水不感応性エレクトロルミネッセンスデバイス及びその製造方法 |
| US7060991B2 (en) | 2002-04-11 | 2006-06-13 | Reilly Thomas L | Method and apparatus for the portable identification of material thickness and defects along uneven surfaces using spatially controlled heat application |
| US6884973B2 (en) * | 2002-08-09 | 2005-04-26 | Sunbeam Products, Inc. | Heating pad controller with multiple position switch and diodes |
| JP3833974B2 (ja) * | 2002-08-21 | 2006-10-18 | 日本碍子株式会社 | 加熱装置の製造方法 |
| JP4323232B2 (ja) * | 2002-12-04 | 2009-09-02 | 芝浦メカトロニクス株式会社 | 静電吸着方法、静電吸着装置及び貼り合せ装置 |
| ES2335981T3 (es) * | 2003-01-20 | 2010-04-07 | Whirlpool Corporation | Placa de cocina electrica y metodo para determinar la posicion de utensilios de cocina sobre esta. |
| WO2004095560A1 (ja) * | 2003-04-18 | 2004-11-04 | Hitachi Kokusai Electric Inc. | 半導体製造装置および半導体装置の製造方法 |
| JP2005012172A (ja) | 2003-05-23 | 2005-01-13 | Dainippon Screen Mfg Co Ltd | 熱処理装置 |
| CN2634776Y (zh) * | 2003-08-12 | 2004-08-18 | 刘键 | 电热毯 |
| US7053560B1 (en) * | 2003-11-17 | 2006-05-30 | Dr. Led (Holdings), Inc. | Bi-directional LED-based light |
| US7196295B2 (en) * | 2003-11-21 | 2007-03-27 | Watlow Electric Manufacturing Company | Two-wire layered heater system |
| US8680443B2 (en) | 2004-01-06 | 2014-03-25 | Watlow Electric Manufacturing Company | Combined material layering technologies for electric heaters |
| US7178353B2 (en) * | 2004-02-19 | 2007-02-20 | Advanced Thermal Sciences Corp. | Thermal control system and method |
| US7697260B2 (en) * | 2004-03-31 | 2010-04-13 | Applied Materials, Inc. | Detachable electrostatic chuck |
| JP4761723B2 (ja) * | 2004-04-12 | 2011-08-31 | 日本碍子株式会社 | 基板加熱装置 |
| US7116535B2 (en) * | 2004-04-16 | 2006-10-03 | General Electric Company | Methods and apparatus for protecting an MR imaging system |
| US7460604B2 (en) * | 2004-06-03 | 2008-12-02 | Silicon Laboratories Inc. | RF isolator for isolating voltage sensing and gate drivers |
| JP2005347612A (ja) | 2004-06-04 | 2005-12-15 | Matsushita Electric Ind Co Ltd | ウェハトレイ及びウェハバーンインユニット、それを用いたウェハレベルバーンイン装置並びに半導体ウェハの温度制御方法 |
| CN101019208B (zh) * | 2004-06-28 | 2010-12-08 | 京瓷株式会社 | 晶片加热装置及半导体制造装置 |
| US20060000551A1 (en) * | 2004-06-30 | 2006-01-05 | Saldana Miguel A | Methods and apparatus for optimal temperature control in a plasma processing system |
| JP4319602B2 (ja) * | 2004-08-31 | 2009-08-26 | 株式会社日立製作所 | クエンチ保護回路を備える超電導マグネット装置 |
| US7544251B2 (en) * | 2004-10-07 | 2009-06-09 | Applied Materials, Inc. | Method and apparatus for controlling temperature of a substrate |
| US8038796B2 (en) * | 2004-12-30 | 2011-10-18 | Lam Research Corporation | Apparatus for spatial and temporal control of temperature on a substrate |
| US7126092B2 (en) * | 2005-01-13 | 2006-10-24 | Watlow Electric Manufacturing Company | Heater for wafer processing and methods of operating and manufacturing the same |
| KR20060103864A (ko) * | 2005-03-28 | 2006-10-04 | 타이코 일렉트로닉스 코포레이션 | Pptc 층들 사이에 능동 소자를 갖는 표면 장착식 다층전기 회로 보호 장치 |
| US7332692B2 (en) * | 2005-05-06 | 2008-02-19 | Illinois Tool Works Inc. | Redundant control circuit for hot melt adhesive assembly heater circuits and temperature sensors |
| US7287902B2 (en) | 2005-06-07 | 2007-10-30 | The Boeing Company | Systems and methods for thermographic inspection of composite structures |
| US20060289447A1 (en) | 2005-06-20 | 2006-12-28 | Mohamed Zakaria A | Heating chuck assembly |
| SG163536A1 (en) * | 2005-06-29 | 2010-08-30 | Watlow Electric Mfg | Smart layered heater surfaces |
| JP4763380B2 (ja) * | 2005-08-25 | 2011-08-31 | 株式会社アルバック | 吸着装置の製造方法 |
| US7551960B2 (en) * | 2005-09-08 | 2009-06-23 | Medtronic, Inc. | External presentation of electrical stimulation parameters |
| JP2009509155A (ja) * | 2005-09-23 | 2009-03-05 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | アクティブマトリックスの原理に基づくマイクロ流体素子 |
| US8519566B2 (en) * | 2006-03-28 | 2013-08-27 | Wireless Environment, Llc | Remote switch sensing in lighting devices |
| US7669426B2 (en) * | 2006-05-11 | 2010-03-02 | Bio-Rad Laboratories, Inc. | Shared switching for multiple loads |
| JP5134533B2 (ja) * | 2006-05-17 | 2013-01-30 | 積水化学工業株式会社 | 研磨パッド固定用両面テープ |
| JP2007317772A (ja) * | 2006-05-24 | 2007-12-06 | Shinko Electric Ind Co Ltd | 静電チャック装置 |
| NL1031878C2 (nl) | 2006-05-24 | 2007-11-27 | Netherlands Inst For Metals Re | Niet-destructief onderzoek. |
| JP2007329008A (ja) * | 2006-06-07 | 2007-12-20 | Tokyo Electron Ltd | 熱板及びその製造方法 |
| US7501605B2 (en) * | 2006-08-29 | 2009-03-10 | Lam Research Corporation | Method of tuning thermal conductivity of electrostatic chuck support assembly |
| US7901509B2 (en) * | 2006-09-19 | 2011-03-08 | Momentive Performance Materials Inc. | Heating apparatus with enhanced thermal uniformity and method for making thereof |
| JP2008085283A (ja) | 2006-09-26 | 2008-04-10 | Momentive Performance Materials Inc | 熱均一性が強化された加熱装置及びその製造方法 |
| US7445446B2 (en) * | 2006-09-29 | 2008-11-04 | Tokyo Electron Limited | Method for in-line monitoring and controlling in heat-treating of resist coated wafers |
| JP2008118052A (ja) * | 2006-11-07 | 2008-05-22 | Shinko Electric Ind Co Ltd | 基板加熱装置 |
| TW200836625A (en) | 2007-03-13 | 2008-09-16 | Otsuka Pharma Co Ltd | Evaluation method for tissue-preserving liquid |
| CN101269790B (zh) * | 2007-03-21 | 2010-08-25 | 台达电子工业股份有限公司 | 微机电元件及其制造方法 |
| US8049112B2 (en) * | 2007-04-13 | 2011-11-01 | 3M Innovative Properties Company | Flexible circuit with cover layer |
| JP4898556B2 (ja) | 2007-05-23 | 2012-03-14 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| JP2009054932A (ja) | 2007-08-29 | 2009-03-12 | Shinko Electric Ind Co Ltd | 静電チャック |
| JP2009087928A (ja) * | 2007-09-13 | 2009-04-23 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
| US8680440B2 (en) * | 2007-09-14 | 2014-03-25 | T-Ink, Inc. | Control circuit for controlling heating element power |
| US9533006B2 (en) * | 2007-11-19 | 2017-01-03 | University Of Washington | Marine coatings |
| JP2011508436A (ja) * | 2007-12-21 | 2011-03-10 | アプライド マテリアルズ インコーポレイテッド | 基板の温度を制御するための方法及び装置 |
| US8193473B2 (en) * | 2008-02-08 | 2012-06-05 | Ngk Insulators, Ltd. | Uniform temperature heater |
| US8092637B2 (en) * | 2008-02-28 | 2012-01-10 | Hitachi High-Technologies Corporation | Manufacturing method in plasma processing apparatus |
| CN101572850A (zh) * | 2008-04-11 | 2009-11-04 | 王文 | 在低温下制作的带应力释放膜的电容式麦克风及其制作方法 |
| JP5163349B2 (ja) | 2008-08-01 | 2013-03-13 | 住友大阪セメント株式会社 | 静電チャック装置 |
| JP5037465B2 (ja) * | 2008-09-12 | 2012-09-26 | 株式会社オートネットワーク技術研究所 | グロープラグ制御装置、制御方法及びコンピュータプログラム |
| US8532832B2 (en) | 2008-09-23 | 2013-09-10 | Be Aerospace, Inc. | Method and apparatus for thermal exchange with two-phase media |
| TW201017790A (en) * | 2008-10-17 | 2010-05-01 | Inotera Memories Inc | A furnace temperature flip method for thermal budget balance and minimum electric parameter variation |
| CN102217054B (zh) | 2008-11-25 | 2013-05-08 | 京瓷株式会社 | 晶片加热装置、静电卡盘以及晶片加热装置的制造方法 |
| JP5185790B2 (ja) * | 2008-11-27 | 2013-04-17 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| JP5250408B2 (ja) * | 2008-12-24 | 2013-07-31 | 新光電気工業株式会社 | 基板温調固定装置 |
| JP2010153730A (ja) | 2008-12-26 | 2010-07-08 | Omron Corp | 配線構造、ヒータ駆動装置、計測装置および制御システム |
| US8092000B2 (en) * | 2009-01-19 | 2012-01-10 | Xerox Corporation | Heat element configuration for a reservoir heater |
| WO2010095720A1 (ja) * | 2009-02-20 | 2010-08-26 | 日本碍子株式会社 | セラミックス-金属接合体及びその製法 |
| US8400178B2 (en) * | 2009-04-29 | 2013-03-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and system of testing a semiconductor device |
| US7956653B1 (en) * | 2009-05-04 | 2011-06-07 | Supertex, Inc. | Complementary high voltage switched current source integrated circuit |
| US8785821B2 (en) * | 2009-07-06 | 2014-07-22 | Sokudo Co., Ltd. | Substrate processing apparatus with heater element held by vacuum |
| CN101662888B (zh) * | 2009-09-28 | 2011-02-16 | 深南电路有限公司 | 带有阶梯槽的pcb板的制备方法 |
| US8637794B2 (en) * | 2009-10-21 | 2014-01-28 | Lam Research Corporation | Heating plate with planar heating zones for semiconductor processing |
| EP2491758A1 (en) * | 2009-10-22 | 2012-08-29 | Datec Coating Corporation | Method of melt bonding high-temperature thermoplastic based heating element to a substrate |
| KR101644673B1 (ko) * | 2009-12-15 | 2016-08-01 | 램 리써치 코포레이션 | Cd 균일성을 향상시키기 위한 기판 온도의 조절 |
| ES2388303B1 (es) † | 2010-03-03 | 2013-08-23 | BSH Electrodomésticos España S.A. | Encimera de cocción con al menos una zona de cocción, y procedimiento para accionar una encimera de cocción. |
| US8791392B2 (en) * | 2010-10-22 | 2014-07-29 | Lam Research Corporation | Methods of fault detection for multiplexed heater array |
| US8546732B2 (en) * | 2010-11-10 | 2013-10-01 | Lam Research Corporation | Heating plate with planar heater zones for semiconductor processing |
| AU2012301903B2 (en) * | 2011-08-30 | 2015-07-09 | Watlow Electric Manufacturing Company | High definition heater system having a fluid medium |
| US9324589B2 (en) * | 2012-02-28 | 2016-04-26 | Lam Research Corporation | Multiplexed heater array using AC drive for semiconductor processing |
| US8809747B2 (en) * | 2012-04-13 | 2014-08-19 | Lam Research Corporation | Current peak spreading schemes for multiplexed heated array |
| US20150016083A1 (en) * | 2013-07-05 | 2015-01-15 | Stephen P. Nootens | Thermocompression bonding apparatus and method |
-
2012
- 2012-08-30 AU AU2012301903A patent/AU2012301903B2/en not_active Ceased
- 2012-08-30 WO PCT/US2012/053049 patent/WO2013033332A1/en not_active Ceased
- 2012-08-30 BR BR112014004911A patent/BR112014004911A2/pt not_active IP Right Cessation
- 2012-08-30 BR BR112014004906A patent/BR112014004906A2/pt not_active IP Right Cessation
- 2012-08-30 WO PCT/US2012/053054 patent/WO2013033336A1/en not_active Ceased
- 2012-08-30 AU AU2012301944A patent/AU2012301944A1/en not_active Abandoned
- 2012-08-30 AU AU2012301890A patent/AU2012301890A1/en not_active Abandoned
- 2012-08-30 CA CA2847342A patent/CA2847342C/en active Active
- 2012-08-30 BR BR112014004912A patent/BR112014004912A2/pt not_active Application Discontinuation
- 2012-08-30 US US13/598,995 patent/US10002779B2/en active Active
- 2012-08-30 MX MX2014002425A patent/MX337204B/es active IP Right Grant
- 2012-08-30 EP EP12772154.6A patent/EP2752085B1/en active Active
- 2012-08-30 MX MX2014002429A patent/MX344029B/es active IP Right Grant
- 2012-08-30 CA CA2847279A patent/CA2847279C/en active Active
- 2012-08-30 MX MX2014002431A patent/MX338215B/es active IP Right Grant
- 2012-08-30 CA CA2847284A patent/CA2847284C/en active Active
- 2012-08-30 KR KR1020147008066A patent/KR101731566B1/ko active Active
- 2012-08-30 JP JP2014528589A patent/JP6133870B2/ja active Active
- 2012-08-30 JP JP2014528585A patent/JP6133868B2/ja active Active
- 2012-08-30 CA CA2847444A patent/CA2847444C/en active Active
- 2012-08-30 US US13/598,977 patent/US9177840B2/en active Active
- 2012-08-30 KR KR1020147008067A patent/KR101914731B1/ko active Active
- 2012-08-30 CA CA2991157A patent/CA2991157C/en active Active
- 2012-08-30 JP JP2014528587A patent/JP6133869B2/ja active Active
- 2012-08-30 CA CA2847429A patent/CA2847429C/en active Active
- 2012-08-30 CA CA2847437A patent/CA2847437C/en active Active
- 2012-08-30 US US13/598,985 patent/US9196513B2/en active Active
- 2012-08-30 CA CA2847435A patent/CA2847435C/en active Active
- 2012-08-30 JP JP2014528579A patent/JP5945327B2/ja active Active
- 2012-08-30 WO PCT/US2012/053069 patent/WO2013033350A1/en not_active Ceased
- 2012-08-30 US US13/598,956 patent/US9123756B2/en active Active
- 2012-08-30 BR BR112014004901A patent/BR112014004901A2/pt not_active IP Right Cessation
- 2012-08-30 EP EP12772555.4A patent/EP2752080B1/en active Active
- 2012-08-30 BR BR112014004913A patent/BR112014004913A2/pt not_active IP Right Cessation
- 2012-08-30 KR KR1020147008412A patent/KR101966305B1/ko active Active
- 2012-08-30 CN CN201280052655.2A patent/CN104067691B/zh active Active
- 2012-08-30 CN CN201280052548.XA patent/CN103931270B/zh active Active
- 2012-08-30 KR KR1020177027998A patent/KR101941245B1/ko active Active
- 2012-08-30 BR BR112014004907A patent/BR112014004907A2/pt not_active IP Right Cessation
- 2012-08-30 MX MX2014002435A patent/MX2014002435A/es active IP Right Grant
- 2012-08-30 US US13/599,692 patent/US9553006B2/en active Active
- 2012-08-30 CN CN201280052551.1A patent/CN103959897B/zh active Active
- 2012-08-30 MX MX2014002432A patent/MX337205B/es active IP Right Grant
- 2012-08-30 CN CN201710705400.6A patent/CN107507791B/zh active Active
- 2012-08-30 JP JP2014528598A patent/JP6184958B2/ja active Active
- 2012-08-30 US US13/599,781 patent/US10049903B2/en active Active
- 2012-08-30 KR KR1020147008383A patent/KR101813635B1/ko active Active
- 2012-08-30 MX MX2014002427A patent/MX340786B/es active IP Right Grant
- 2012-08-30 KR KR1020147008410A patent/KR101831439B1/ko active Active
- 2012-08-30 WO PCT/US2012/053067 patent/WO2013033348A1/en not_active Ceased
- 2012-08-30 MX MX2014002426A patent/MX338005B/es active IP Right Grant
- 2012-08-30 EP EP12773421.8A patent/EP2752082B1/en active Active
- 2012-08-30 EP EP12769785.2A patent/EP2752078B1/en active Active
- 2012-08-30 WO PCT/US2012/053137 patent/WO2013033394A2/en not_active Ceased
- 2012-08-30 CN CN201280052496.6A patent/CN104025702B/zh active Active
- 2012-08-30 EP EP12769784.5A patent/EP2769597B1/en active Active
- 2012-08-30 KR KR1020147008065A patent/KR101785503B1/ko active Active
- 2012-08-30 KR KR1020147008411A patent/KR101778718B1/ko active Active
- 2012-08-30 CN CN201280052498.5A patent/CN103947287B/zh active Active
- 2012-08-30 JP JP2014528599A patent/JP6199865B2/ja active Active
- 2012-08-30 WO PCT/US2012/053148 patent/WO2013033402A1/en not_active Ceased
- 2012-08-30 AU AU2012301952A patent/AU2012301952A1/en not_active Abandoned
- 2012-08-30 WO PCT/US2012/053117 patent/WO2013033381A2/en not_active Ceased
- 2012-08-30 CN CN201280052730.5A patent/CN103907395B/zh active Active
- 2012-08-30 BR BR112014004903A patent/BR112014004903A2/pt not_active IP Right Cessation
- 2012-08-30 CA CA2847596A patent/CA2847596C/en active Active
- 2012-08-30 WO PCT/US2012/053058 patent/WO2013033340A1/en not_active Ceased
- 2012-08-30 JP JP2014528603A patent/JP6133871B2/ja active Active
- 2012-08-30 EP EP12772556.2A patent/EP2752081B2/en active Active
- 2012-08-30 KR KR1020177025252A patent/KR101868130B1/ko active Active
- 2012-08-30 EP EP12772150.4A patent/EP2752079B1/en active Active
- 2012-08-30 CN CN201280052769.7A patent/CN103999545B/zh active Active
- 2012-08-30 US US13/598,941 patent/US9123755B2/en active Active
- 2012-08-30 US US13/599,648 patent/US9263305B2/en active Active
- 2012-08-30 MX MX2014002424A patent/MX338214B/es active IP Right Grant
- 2012-08-30 JP JP2014528582A patent/JP6118322B2/ja active Active
- 2012-08-30 EP EP12773422.6A patent/EP2752083B1/en active Active
- 2012-08-30 AU AU2012301940A patent/AU2012301940A1/en not_active Abandoned
- 2012-08-30 AU AU2012301869A patent/AU2012301869A1/en not_active Abandoned
- 2012-08-30 AU AU2012301936A patent/AU2012301936A1/en not_active Abandoned
- 2012-08-30 CN CN201280052543.7A patent/CN103918347B/zh active Active
- 2012-08-30 AU AU2012301816A patent/AU2012301816B2/en not_active Ceased
- 2012-08-30 KR KR1020147008413A patent/KR101750406B1/ko active Active
- 2012-08-30 BR BR112014004909A patent/BR112014004909A2/pt not_active Application Discontinuation
-
2014
- 2014-03-02 IL IL231260A patent/IL231260A/en active IP Right Grant
- 2014-03-02 IL IL231261A patent/IL231261A/en active IP Right Grant
- 2014-03-02 IL IL231258A patent/IL231258A/en active IP Right Grant
- 2014-03-02 IL IL231259A patent/IL231259B/en active IP Right Grant
- 2014-03-02 IL IL231257A patent/IL231257B/en active IP Right Grant
- 2014-03-02 IL IL231256A patent/IL231256A/en active IP Right Grant
- 2014-03-02 IL IL231255A patent/IL231255A/en active IP Right Grant
- 2014-03-02 IL IL231254A patent/IL231254A/en active IP Right Grant
-
2016
- 2016-01-07 US US14/990,109 patent/US10043685B2/en active Active
- 2016-01-07 US US14/990,118 patent/US10734256B2/en active Active
- 2016-12-13 US US15/377,110 patent/US10361103B2/en active Active
- 2016-12-13 US US15/377,088 patent/US11133201B2/en active Active
-
2017
- 2017-04-19 JP JP2017082475A patent/JP6556781B2/ja active Active
- 2017-04-19 JP JP2017082474A patent/JP6498718B2/ja active Active
- 2017-04-19 JP JP2017082476A patent/JP6389917B2/ja active Active
- 2017-04-20 JP JP2017083515A patent/JP6389918B2/ja active Active
- 2017-05-02 JP JP2017091551A patent/JP6655044B2/ja active Active
-
2018
- 2018-03-02 US US15/910,687 patent/US20180197757A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160078332A (ko) * | 2013-10-25 | 2016-07-04 | 도쿄엘렉트론가부시키가이샤 | 온도 제어 기구, 온도 제어 방법 및 기판 처리 장치 |
Also Published As
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101813635B1 (ko) | 열 어레이 제어 시스템 및 방법 | |
| AU2015203200B2 (en) | Thermal array system | |
| AU2015203195B2 (en) | System and method for controlling a thermal array | |
| AU2015203212B2 (en) | System and method for controlling a thermal array | |
| AU2015203215B2 (en) | Thermal array system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| A302 | Request for accelerated examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PA0302 | Request for accelerated examination |
St.27 status event code: A-1-2-D10-D17-exm-PA0302 St.27 status event code: A-1-2-D10-D16-exm-PA0302 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |



















