KR20170054532A - 가수분해 저항성 카보실록산 연쇄를 포함하는 실론산 모노머들, 그 제조방법 및 그것들을 함유하는 콘텍트 렌즈용 박막 필름 - Google Patents
가수분해 저항성 카보실록산 연쇄를 포함하는 실론산 모노머들, 그 제조방법 및 그것들을 함유하는 콘텍트 렌즈용 박막 필름 Download PDFInfo
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- KR20170054532A KR20170054532A KR1020177011773A KR20177011773A KR20170054532A KR 20170054532 A KR20170054532 A KR 20170054532A KR 1020177011773 A KR1020177011773 A KR 1020177011773A KR 20177011773 A KR20177011773 A KR 20177011773A KR 20170054532 A KR20170054532 A KR 20170054532A
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- silicone
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- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 210000003370 receptor cell Anatomy 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000012049 topical pharmaceutical composition Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001926 trapping method Methods 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
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Abstract
Description
| 실리콘 하이드로겔 | Ex. 3 | CEx. 2 |
| *조성 (중량%) | ||
| 실리콘 모노머 (Ex 1) | 49 | - |
| 실리콘 모노머 (CEx 1) | - | 49 |
| HEMA | 49 | 49 |
| EGDMA | 1 | 1 |
| 벤조일 퍼옥사이드 | 1 | 1 |
| *특성들 | ||
| 평형 함수율 (%) | 27 | 30 |
| 동적 접촉각 (2분에서) | 36°± 4° | 42°± 4° |
| 포획기포 접촉각 | 43°± 4° | 40°± 3° |
| 영 모듈러스 [MPa] | 0.5 ±0.1 | 0.8±0.3 |
| 산소투과성 (Dk) [Barrer] | 347±10 | 305±10 |
Claims (22)
- 하기 일반식(I)을 가지는 카보실록산 연쇄를 적어도 하나 포함하여 구성되는 실리콘 모노머:
{여기서 a는 1 내지 100이고; Y1 은 치환되거나 치환되지 않은 1 내지 10 탄소원자의 2가의 알킬 연결기이고; Y2 는 산소원자이고; R1, R2, R3, R4, R5, R6, 및 R7 은 독립적으로 1 내지 10 탄소원자의 1가의 지방족 탄화수소 기, 3 내지 10 탄소원자의 1가의 지환지방족 탄화수소 기, 6 내지 10 탄소원자의 1가의 방향족 탄화수소 기 또는 1 내지 10 탄소원자의 1가의 할로겐화 탄화수소 기이고;
Z 는 하기 일반식 (II)을 가지며
여기서 R11 은 3 내지 20 탄소원자를 가지는 분지형의(branched), 2가의 알킬 연결기이고; B는 헤테로 원자로 치환된 지방족 틴화수소를 포함하는 2가의 친수성 모이어티, 헤테로 원자로 치환된 지환지방족 탄화수소를 포함하는 2가의 친수성 모이어티 또는 헤테로 원자로 치환된 방향족 탄화수소를 포함하는 2가의 친수성 모이어티이고, X는 아크릴아미드, 치환되거나 치환되지 않은 불포화 지방족 또는 방향족 탄화수소, 아크릴레이트 및 메타크릴레이트로 이루어진 군에서 선택되는 중합가능한 기임}. - 제1항에 있어서, R1, R2, R3, R4, R5, R6 및 R7 은 각각 독립적으로 1 내지 9 탄소원자의 포화된 1가의 탄화수소 기, 플루오르화 탄화수소, 아랄킬 또는 아릴알킬 기를 포함하는, 실리콘 모노머.
- 제1항에 있어서, B는 알킬, 알코올, 에테르, 에스테르, 아미드, 아민, 산 및 그 염, 시아노, 티오, 우레탄, 우레아, 카보네이트, 카바메이트, 술포네이트, 설폰아미드, 및 포스페이트로 이루어진 군에서 선택되는 관능기를 적어도 하나 포함하는, 실리콘 모노머.
- 적어도 하나의 제1항 실리콘 모노머와 적어도 하나의 하이드로겔 코모노머를 포함하여 구성되는 실리콘-하이드로겔 코폴리머.
- 제1항의 실리콘 모노머를 적어도 2종 이상 포함하여 구성되며, 여기서 적어도 하나의 한 실리콘 모노머는 적어도 하나의 다른 실리콘 모노머와 상이한 것인, 실리콘-하이드로겔 코폴리머.
- 적어도 하나의 제1항의 실리콘 모노머와; 비닐계 모노머 및 아크릴계 모노머로 이루어진 군에서 선택되는 적어도 하나의 하이드로겔 모노머를 포함하여 구성되는, 실리콘-하이드로겔 코폴리머.
- 제9항에 있어서, 상기 아크릴계 모노머는 2-하이드록시-에틸-메타크릴레이트 (HEMA), 2-하이드록시-에틸-아크릴레이트 (HEA), 하이드록실프로필 메타크릴레이트, 트리메틸암모늄 2-하이드록시 프로필 메타크릴레이트 하이드로클로라이드, 디메틸아미노에틸 메타크릴레이트, 글리세롤 메타크릴레이트, N,N-디메틸 아크릴아미드, N-이소프로필아크릴아미드, 아크릴아미드, 2-아크릴아미도-2-메틸프로판 설폰산, 메타크릴아미드, 아타크릴산, 메타크릴산, 양이온 및 쯔비터이온 모이어티를 함유하는 기타 아크릴계 모노머, 및 이들의 혼합물로 이루어진 군에서 선택되는 것인, 코폴리머.
- 제9항에 있어서, 상기 비닐계 모노머는 N-비닐-피롤리돈, N-비닐-카프로락탐, N-비닐-아세트아미드, N-비닐-포름아미드, N-비닐-이소프로필아미드, 비닐 벤젠, 비닐 나프탈렌, 비닐 피리딘, 및 비닐 알코올로 이루어진 군에서 선택되는 것인, 코폴리머.
- 제9항에 있어서, 상기 실리콘 모노머 대 상기 하이드로겔 모노머의 비가 1:100 내지 100:1인, 실리콘-하이드로겔 코폴리머.
- 제6항의 실리콘 모노머와; 친수성 아크릴계 코모노머 및 친수성 비닐계 코모노머로 이루어진 군에서 선택되는 적어도 하나의 성분; 그리고 임의선택적으로 가교제, 라디칼 개시제, 항미생물제, UV-흡수제, 바이오활성제 및 가시성 조색제(visibility tinting agent)를 포함하여 구성되는. 실리콘-하이드로겔 코폴리머 조성물.
- 제13항에 있어서, 상기 가교제는 에틸렌 글리콜 디메타크릴레이트, 트리메틸로일프로판 트리메타크릴레이트, 디에틸렌글리콜 디메타크릴레이트, 비스페놀 A 디메타크릴레이트, 디글리시딜 비스페놀 A 디메타크릴레이트, 디메타크릴레이트-말단 폴리에틸렌 글리콜 및 반응성 선형 폴리에테르 개질 실리콘으로 이루어진 군에서 선택되는 것인, 코폴리머 조성물.
- 제7항 내지 제12항 중 어느 한 항의 코폴리머를 포함하여 구성되는 실리콘-하이드로겔 필름.
- 제13항 또는 제14항의 코폴리머 조성물을 포함하여 구성되는 실리콘-하이드로겔 필름.
- 제15항의 실리콘-하이드로겔 필름으로부터 형성된, 콘택트렌즈.
- 제16항의 실리콘-하이드로겔 필름으로부터 형성된, 콘택트렌즈.
- 제17항에 있어서, 상기 실리콘-하이드로겔 필름이 모노머를 용매 또는 상용화제의 부재 하에 열 또는 광 경화법으로 중합하여 제조한 투명하고 균질한 실리콘-하이드로겔 필름인, 콘텍트렌즈.
- 제18항에 있어서, 상기 실리콘-하이드로겔 필름이 모노머를 용매 또는 상용화제의 부재 하에 열 또는 광 경화법으로 중합하여 제조한 투명하고 균질한 필름인, 콘텍트렌즈.
- (i) 하기 일반 식(IV)를 가지는 실리콘-함유 화합물을 하기 일반식(V)을 가지는 말단불포화기와 반응시켜 관능화된 카보실록산을 생성하는 단계
{여기서 a는 1 내지 100이고; Y1 는 치환되거나 치환되지 않은 1 내지 10 탄소원자의 2가의 알킬 연결기이고; Y2 는 산소원자이고; R1, R2, R3, R4, R5, R6, 및 R7 은 독립적으로 1 내지 10 탄소원자의 1가의 지방족 탄화수소 기, 3 내지 10 탄소원자의 1가의 지환지방족 탄화수소 기, 6 내지 10 탄소원자의 1가의 방향족 탄화수소 기 또는 1 내지 10 탄소원자의 1가의 할로겐화 탄화수소 기임},
-R11-B-M (V)
{여기서 R11 은 3 내지 20 탄소원자를 가지는 분지형의, 2가의 알킬기로 이루어진 군에서 선택되고; B는 헤테로 원자로 치환된 지방족 틴화수소를 포함하는 2가의 친수성 모이어티, 헤테로 원자로 치환된 지환지방족 탄화수소를 포함하는 2가의 친수성 모이어티, 또는 헤테로 원자로 치환된 방향족 탄화수소를 포함하는 2가의 친수성 모이어티로서, 여기서 B는 알킬, 알코올, 에테르, 에스테르, 아미드, 아민, 산 및 그 염, 시아노, 티오, 우레탄, 우레아, 카보네이트, 카바메이트, 술포네이트, 설폰아미드, 및 포스페이트로 이루어진 군에서 선택되는 관능기를 포함하며; M은 하이드록실, 할로겐, 에폭시 및 카복실산 기로 이루어진 군에서 선택됨}; 및
(ii) 상기 관능화된 카보실록산을 하기 식 (VI)을 가지는 알킬아크릴로일 화합물과 반응시켜 제1항의 일반식(I)을 가지는 실리콘 모노머를 생성하는 단계
{여기서 G는 할로겐, 하이드록실 및 1 내지 10 탄소원자를 가지는 알킬옥시로 이루어진 군에서 선택되고, R12, R13 및 R14 는 각각 독립적으로 수소, 치환되거나 치환되지 않은 1 내지 20 탄소원자를 가지는 1가의 포화 탄화수소 기로 이루어진 군에서 선택됨}
를 포함하여 구성되는, 실리콘 모노머의 제조방법. - 제21항에 있어서, 상기 관능화된 카보실록산과 상기 알킬아크릴로일 화합물과의 반응은, 적어도 하나의 3급 아민 염기 또는 적어도 하나의 이온 교환 수지 (IER)와, 헥산, 헵탄, 톨루엔, 이소프로필알코올 또는 메틸에틸케톤 용매의 존재하에 수행되는 것인, 실리콘 모노머의 제조방법.
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| PCT/US2011/029165 WO2012128752A1 (en) | 2011-03-21 | 2011-03-21 | Siloxane monomers containing hydrolysis resistance carbosiloxane linkage, process for their preparation and thin films containing the same for contact lens application |
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| KR1020137027407A Division KR20130133878A (ko) | 2011-03-21 | 2011-03-21 | 가수분해 저항성 카보실록산 연쇄를 포함하는 실론산 모노머들, 그 제조방법 및 그것들을 함유하는 콘텍트 렌즈용 박막 필름 |
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| KR1020137027407A Ceased KR20130133878A (ko) | 2011-03-21 | 2011-03-21 | 가수분해 저항성 카보실록산 연쇄를 포함하는 실론산 모노머들, 그 제조방법 및 그것들을 함유하는 콘텍트 렌즈용 박막 필름 |
| KR1020167003983A Expired - Fee Related KR101771564B1 (ko) | 2011-03-21 | 2011-03-21 | 가수분해 저항성 카보실록산 연쇄를 포함하는 실론산 모노머, 그 제조방법 및 이를 포함하는 콘텍트 렌즈용 박막 |
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| JP (1) | JP5947875B2 (ko) |
| KR (3) | KR20170054532A (ko) |
| CN (1) | CN103547585B (ko) |
| AU (1) | AU2011363044A1 (ko) |
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Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9039174B2 (en) | 2009-07-09 | 2015-05-26 | Bausch & Lomb Incorporated | Ethylenically unsaturated polymerizable groups comprising polycarbosiloxane monomers |
| BR112013024116A2 (pt) * | 2011-03-21 | 2016-12-13 | Momentive Performance Mat Inc | monômeros de carbossiloxano organomodificados contendo composições e usos dos mesmos |
| US9395468B2 (en) | 2012-08-27 | 2016-07-19 | Ocular Dynamics, Llc | Contact lens with a hydrophilic layer |
| WO2014143926A1 (en) * | 2013-03-15 | 2014-09-18 | Bausch & Lomb Incorporated | Ethylenically unsaturated polymerizable groups comprising polycarbosiloxane monomers |
| AU2014348502B2 (en) | 2013-11-15 | 2019-08-15 | Tangible Science, Inc. | Contact lens with a hydrophilic layer |
| WO2015164582A1 (en) * | 2014-04-25 | 2015-10-29 | Novartis Ag | Hydrophilized carbosiloxane vinylic monomers |
| CA2940203C (en) * | 2014-04-25 | 2019-08-06 | Novartis Ag | Carbosiloxane vinylic monomers |
| EP3171836A4 (en) * | 2014-07-21 | 2018-05-30 | Tangible Science, LLC | Contact lenses and methods of making contact lenses |
| CN107206119B (zh) | 2014-12-09 | 2021-01-29 | 实体科学公司 | 具有生物相容性层的医疗设备涂层 |
| JP7247095B2 (ja) * | 2017-02-16 | 2023-03-28 | モメンティブ パフォーマンス マテリアルズ インコーポレイテッド | イオン変性シリコーン、組成物、およびそれから形成された医療機器 |
| JP7575190B2 (ja) * | 2017-06-26 | 2024-10-29 | ダウ シリコーンズ コーポレーション | シリコーンポリエーテルコポリマー組成物、その調製方法、およびシーラント |
| EP3818401B1 (en) * | 2018-07-03 | 2024-10-30 | Bausch & Lomb Incorporated | Water extractable ophthalmic devices |
| CN113164793B (zh) * | 2018-12-12 | 2024-05-17 | 陶氏环球技术有限责任公司 | 用于个人护理配制物的聚合物共混物 |
| US20210154050A1 (en) * | 2019-11-27 | 2021-05-27 | Jennifer Gloeckner Powers | Dressing for a nursing mother |
| US12503556B2 (en) | 2020-01-22 | 2025-12-23 | Dow Silicones Corporation | Silicone-acrylate polymers, copolymers, and related methods and compositions |
| EP4093783A1 (en) * | 2020-01-22 | 2022-11-30 | Dow Silicones Corporation | Silicone-acrylate polymers, copolymers, and related methods and compositions |
| CN114316160A (zh) * | 2021-11-17 | 2022-04-12 | 科思创树脂制造(佛山)有限公司 | 一种丙烯酸乳液聚合物及基于聚合物的水性涂料制备方法 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL128305C (ko) | 1963-09-11 | |||
| DE1570359B2 (de) | 1964-07-02 | 1970-12-10 | Ceskoslovenskä akademie v§d, Prag | Verfahren zur Herstellung von Kontaktlinsen |
| US3377371A (en) | 1964-09-03 | 1968-04-09 | Dow Corning | Tris-siloxy acrylic silanes |
| US3808178A (en) | 1972-06-16 | 1974-04-30 | Polycon Laboratories | Oxygen-permeable contact lens composition,methods and article of manufacture |
| US4197266A (en) | 1974-05-06 | 1980-04-08 | Bausch & Lomb Incorporated | Method for forming optical lenses |
| US4084459A (en) | 1977-03-07 | 1978-04-18 | Bausch & Lomb Incorporated | Method and apparatus for lens turning |
| US4259467A (en) | 1979-12-10 | 1981-03-31 | Bausch & Lomb Incorporated | Hydrophilic contact lens made from polysiloxanes containing hydrophilic sidechains |
| US4260725A (en) | 1979-12-10 | 1981-04-07 | Bausch & Lomb Incorporated | Hydrophilic contact lens made from polysiloxanes which are thermally bonded to polymerizable groups and which contain hydrophilic sidechains |
| AU546039B2 (en) * | 1982-05-08 | 1985-08-08 | Menicon Co., Ltd | Oxygen permeable hard contact lens |
| NO166371C (no) * | 1983-07-15 | 1991-07-10 | Shinetsu Chemical Co | Vinylklorid-kopolymer som har hoey permeabilitet for oksygen. |
| JPS6020910A (ja) * | 1983-07-15 | 1985-02-02 | Shin Etsu Chem Co Ltd | 塩化ビニル系共重合体の製造方法 |
| EP0194277A4 (en) * | 1984-08-17 | 1987-02-03 | Mc Carry John D | CONTACT GLASS AND ALCOYLESILANE POLYMER. |
| JPH0699517B2 (ja) * | 1987-02-06 | 1994-12-07 | 株式会社メニコン | ソフトコンタクトレンズ材料 |
| US4954587A (en) | 1988-07-05 | 1990-09-04 | Ciba-Geigy Corporation | Dimethylacrylamide-copolymer hydrogels with high oxygen permeability |
| US5115056A (en) | 1989-06-20 | 1992-05-19 | Ciba-Geigy Corporation | Fluorine and/or silicone containing poly(alkylene-oxide)-block copolymers and contact lenses thereof |
| US5079319A (en) | 1989-10-25 | 1992-01-07 | Ciba-Geigy Corporation | Reactive silicone and/or fluorine containing hydrophilic prepolymers and polymers thereof |
| US5010141A (en) | 1989-10-25 | 1991-04-23 | Ciba-Geigy Corporation | Reactive silicone and/or fluorine containing hydrophilic prepolymers and polymers thereof |
| EP0603268B1 (en) | 1991-09-12 | 1996-12-18 | BAUSCH & LOMB INCORPORATED | Wettable silicone hydrogel compositions and methods |
| DE69211152T2 (de) | 1991-11-05 | 1997-01-02 | Bausch & Lomb | Zusammensetzungen von benetzbaren siliconhydrogels und verfahren zu deren herstellung |
| US5358995A (en) | 1992-05-15 | 1994-10-25 | Bausch & Lomb Incorporated | Surface wettable silicone hydrogels |
| US5260000A (en) | 1992-08-03 | 1993-11-09 | Bausch & Lomb Incorporated | Process for making silicone containing hydrogel lenses |
| US5336797A (en) | 1992-12-30 | 1994-08-09 | Bausch & Lomb Incorporated | Siloxane macromonomers |
| CA2221389C (en) | 1996-11-18 | 2009-01-27 | Kenrick M. Lewis | Treatment of polyethers prior to hydrosilylation |
| US5998498A (en) | 1998-03-02 | 1999-12-07 | Johnson & Johnson Vision Products, Inc. | Soft contact lenses |
| DE19934407A1 (de) | 1999-07-22 | 2001-01-25 | Espe Dental Ag | Hydrolysierbare und polymerisierbare Silane mit geringer Viskosität und deren Verwendung |
| US7645720B2 (en) | 2005-12-13 | 2010-01-12 | Momentive Performance Materials Inc. | Extreme environment surfactant compositions comprising hydrolysis resistant organomodified disiloxane surfactants |
| US7507775B2 (en) | 2005-10-13 | 2009-03-24 | Momentive Performance Materials Inc. | Hydrolysis resistant organomodified disiloxane surfactants |
| US7700797B2 (en) | 2006-05-22 | 2010-04-20 | Momentive Performance Materials Inc. | Use of hydrolysis resistant organomodified silylated surfactants |
| US7259220B1 (en) | 2006-07-13 | 2007-08-21 | General Electric Company | Selective hydrosilylation method |
| US7838698B2 (en) | 2006-09-29 | 2010-11-23 | Johnson & Johnson Vision Care, Inc. | Hydrolysis-resistant silicone compounds |
| NZ591948A (en) * | 2008-10-03 | 2012-04-27 | Momentive Performance Mat Inc | Hydrophilic silicone monomers, process for their preparation and thin films containing the same |
| US7994356B2 (en) * | 2009-07-09 | 2011-08-09 | Bausch & Lomb Incorporated | Mono ethylenically unsaturated polycarbosiloxane monomers |
| JP5800369B2 (ja) * | 2009-07-09 | 2015-10-28 | ボシュ・アンド・ロム・インコーポレイテッドBausch & Lomb Incorporated | モノエチレン系不飽和重合性基含有ポリカルボシロキサンモノマー |
| BR112013024116A2 (pt) | 2011-03-21 | 2016-12-13 | Momentive Performance Mat Inc | monômeros de carbossiloxano organomodificados contendo composições e usos dos mesmos |
-
2011
- 2011-03-21 KR KR1020177011773A patent/KR20170054532A/ko not_active Ceased
- 2011-03-21 WO PCT/US2011/029165 patent/WO2012128752A1/en not_active Ceased
- 2011-03-21 BR BR112013024165A patent/BR112013024165A2/pt not_active Application Discontinuation
- 2011-03-21 CA CA2829357A patent/CA2829357A1/en not_active Abandoned
- 2011-03-21 EP EP11712723.3A patent/EP2688892B1/en active Active
- 2011-03-21 CN CN201180071095.0A patent/CN103547585B/zh active Active
- 2011-03-21 KR KR1020137027407A patent/KR20130133878A/ko not_active Ceased
- 2011-03-21 AU AU2011363044A patent/AU2011363044A1/en not_active Abandoned
- 2011-03-21 KR KR1020167003983A patent/KR101771564B1/ko not_active Expired - Fee Related
- 2011-03-21 JP JP2014501046A patent/JP5947875B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014517083A (ja) | 2014-07-17 |
| BR112013024165A2 (pt) | 2016-12-06 |
| WO2012128752A1 (en) | 2012-09-27 |
| AU2011363044A1 (en) | 2013-09-26 |
| EP2688892B1 (en) | 2020-11-18 |
| KR20160027206A (ko) | 2016-03-09 |
| EP2688892A1 (en) | 2014-01-29 |
| KR20130133878A (ko) | 2013-12-09 |
| CN103547585B (zh) | 2016-12-14 |
| CA2829357A1 (en) | 2012-09-27 |
| CN103547585A (zh) | 2014-01-29 |
| JP5947875B2 (ja) | 2016-07-06 |
| KR101771564B1 (ko) | 2017-09-05 |
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