KR20200022331A - 연마 패드 - Google Patents
연마 패드 Download PDFInfo
- Publication number
- KR20200022331A KR20200022331A KR1020190086529A KR20190086529A KR20200022331A KR 20200022331 A KR20200022331 A KR 20200022331A KR 1020190086529 A KR1020190086529 A KR 1020190086529A KR 20190086529 A KR20190086529 A KR 20190086529A KR 20200022331 A KR20200022331 A KR 20200022331A
- Authority
- KR
- South Korea
- Prior art keywords
- polishing
- layer
- groove
- workpiece
- polishing layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0015—Hanging grinding machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
-
- H01L21/304—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
[해결 수단] 원반상의 기재와, 상면측이 기재에 첩착되는 연마층을 갖는 연마 패드로서, 연마층은, 연마층을 상하로 관통하도록 형성되어 연마액이 공급되는 복수의 관통공과, 연마층의 하면측에 형성되어 관통공과 연결된 복수의 홈을 구비하고, 복수의 관통공은, 연마층의 중심을 둘러싸도록 형성되어 있고, 복수의 홈은, 복수의 관통공으로부터 연마층의 외주를 향하여 방사상으로 형성되어 있다.
Description
도 2 는 연마 패드를 나타내는 사시도이다.
도 3 은 연마 패드를 나타내는 바닥면도이다.
도 4 는 연마 유닛을 나타내는 단면도이다.
도 5 는 연마 패드를 나타내는 바닥면도이다.
도 6 은 연마 패드를 나타내는 바닥면도이다.
도 7 은 연마 패드를 나타내는 바닥면도이다.
도 8 은 연마 패드를 나타내는 바닥면도이다.
3 : 보호 테이프
2 : 연마 장치
4 : 기대
4a : 개구
4b : 개구
6a, 6b : 카세트 재치대
8a, 8b : 카세트
10 : 제 1 반송 기구
12 : 조작 패널
14 : 위치 조정 기구
16 : 제 2 반송 기구
18 : X 축 이동 기구
20 : 방진 방적 커버
22 : 이동 테이블
24 : 척 테이블
24a : 유지면
24b : 흡인로
26 : 지지 구조
28 : Z 축 이동 기구
30 : Z 축 가이드 레일
32 : Z 축 이동 플레이트
34 : Z 축 볼 나사
36 : Z 축 펄스 모터
38 : 지지구
40 : 연마 유닛
42 : 스핀들 하우징
44 : 스핀들
46 : 마운트
46a : 관통공
48 : 연마 패드
50 : 볼트
52 : 연마액 공급로
54 : 연마액 공급원
56 : 제 3 반송 기구
58 : 세정 기구
70 : 기재
70a : 상면
70b : 하면
70c : 나사공
70d : 관통공
72 : 연마층
72a : 상면
72b : 하면
72c : 관통공
72d : 홈
72e : 홈
74 : 연마액
80 : 연마 패드
82 : 연마층
82b : 하면
82c : 관통공
82d : 제 1 홈
82e : 제 2 홈
82f : 제 3 홈
90 : 연마 패드
92 : 연마층
92b : 하면
92c : 관통공
92d : 제 1 홈
92e : 제 2 홈
92f : 제 3 홈
Claims (3)
- 원반상의 기재와, 상면측이 그 기재에 첩착되는 연마층을 갖는 연마 패드로서,
그 연마층은, 그 연마층을 상하로 관통하도록 형성되어 연마액이 공급되는 복수의 관통공과, 그 연마층의 하면측에 형성되어 그 관통공과 연결된 복수의 홈을 구비하고,
그 복수의 관통공은, 그 연마층의 중심을 둘러싸도록 형성되어 있고,
그 복수의 홈은, 그 복수의 관통공으로부터 그 연마층의 외주를 향하여 방사상으로 형성되어 있는 것을 특징으로 하는 연마 패드. - 제 1 항에 있어서,
그 연마층의 하면측의, 그 복수의 관통공보다 그 연마층의 외주측에 위치하는 영역에는, 그 홈과 연결된 복수의 동심원상의 홈이 형성되어 있는 것을 특징으로 하는 연마 패드. - 제 1 항 또는 제 2 항에 있어서,
그 관통공과 연결된 그 홈은, 그 연마층의 외주에 도달하지 않도록 형성되어 있는 것을 특징으로 하는 연마 패드.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018155656A JP7098240B2 (ja) | 2018-08-22 | 2018-08-22 | 研磨パッド |
| JPJP-P-2018-155656 | 2018-08-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20200022331A true KR20200022331A (ko) | 2020-03-03 |
| KR102705100B1 KR102705100B1 (ko) | 2024-09-09 |
Family
ID=69412756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020190086529A Active KR102705100B1 (ko) | 2018-08-22 | 2019-07-17 | 연마 패드 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11612979B2 (ko) |
| JP (1) | JP7098240B2 (ko) |
| KR (1) | KR102705100B1 (ko) |
| CN (1) | CN110856908B (ko) |
| DE (1) | DE102019212581A1 (ko) |
| TW (1) | TWI823988B (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111805412A (zh) * | 2020-07-17 | 2020-10-23 | 中国科学院微电子研究所 | 一种抛光液施配器及抛光装置 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113103077A (zh) * | 2021-04-13 | 2021-07-13 | 深圳微米智能装备科技有限公司 | 一种微晶玻璃加工设备及加工方法 |
| US12427618B2 (en) * | 2021-07-16 | 2025-09-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | Chemical-mechanical planarization pad and methods of use |
| CN114274043B (zh) * | 2021-12-29 | 2023-02-24 | 湖北鼎汇微电子材料有限公司 | 一种抛光垫 |
| DE102024109581A1 (de) * | 2024-04-05 | 2025-10-09 | Lapmaster Wolters Gmbh | Läppscheibe für eine Läppmaschine, Läppmaschine und Verfahren zum Läppen eines Werkstücks mit einer Läppmaschine |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0899265A (ja) | 1994-09-30 | 1996-04-16 | Disco Abrasive Syst Ltd | 研磨装置 |
| JP2000288881A (ja) | 1999-04-06 | 2000-10-17 | Disco Abrasive Syst Ltd | 研削装置及び研削方法 |
| JP2002059360A (ja) * | 2000-08-22 | 2002-02-26 | Nagase Integrex Co Ltd | ラップ盤 |
| KR20060046093A (ko) * | 2004-05-20 | 2006-05-17 | 제이에스알 가부시끼가이샤 | 화학 기계 연마 패드 및 화학 기계 연마 방법 |
| US20080220702A1 (en) * | 2006-07-03 | 2008-09-11 | Sang Fang Chemical Industry Co., Ltd. | Polishing pad having surface texture |
| KR20090051641A (ko) * | 2007-11-19 | 2009-05-22 | 조선대학교산학협력단 | 화학적 기계적 연마장치 |
| JP2011000676A (ja) * | 2009-06-19 | 2011-01-06 | Disco Abrasive Syst Ltd | 研磨パッド |
| KR20110125615A (ko) * | 2010-05-13 | 2011-11-21 | 아사히 가라스 가부시키가이샤 | 연마 패드 및 연마 패드를 사용한 연마 장치 |
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| CN206998624U (zh) * | 2017-05-26 | 2018-02-13 | 天津以科美科技发展有限公司 | 一种单轴传动动梁式研磨加工装置 |
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-
2018
- 2018-08-22 JP JP2018155656A patent/JP7098240B2/ja active Active
-
2019
- 2019-07-17 KR KR1020190086529A patent/KR102705100B1/ko active Active
- 2019-07-30 CN CN201910692943.8A patent/CN110856908B/zh active Active
- 2019-08-15 US US16/541,708 patent/US11612979B2/en active Active
- 2019-08-19 TW TW108129537A patent/TWI823988B/zh active
- 2019-08-22 DE DE102019212581.6A patent/DE102019212581A1/de active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0899265A (ja) | 1994-09-30 | 1996-04-16 | Disco Abrasive Syst Ltd | 研磨装置 |
| JP2000288881A (ja) | 1999-04-06 | 2000-10-17 | Disco Abrasive Syst Ltd | 研削装置及び研削方法 |
| JP2002059360A (ja) * | 2000-08-22 | 2002-02-26 | Nagase Integrex Co Ltd | ラップ盤 |
| KR20060046093A (ko) * | 2004-05-20 | 2006-05-17 | 제이에스알 가부시끼가이샤 | 화학 기계 연마 패드 및 화학 기계 연마 방법 |
| US20080220702A1 (en) * | 2006-07-03 | 2008-09-11 | Sang Fang Chemical Industry Co., Ltd. | Polishing pad having surface texture |
| KR20090051641A (ko) * | 2007-11-19 | 2009-05-22 | 조선대학교산학협력단 | 화학적 기계적 연마장치 |
| JP2011000676A (ja) * | 2009-06-19 | 2011-01-06 | Disco Abrasive Syst Ltd | 研磨パッド |
| KR20110125615A (ko) * | 2010-05-13 | 2011-11-21 | 아사히 가라스 가부시키가이샤 | 연마 패드 및 연마 패드를 사용한 연마 장치 |
| KR20130124281A (ko) * | 2010-07-12 | 2013-11-13 | 제이에스알 가부시끼가이샤 | 화학 기계 연마 패드 및 화학 기계 연마 방법 |
| CN206998624U (zh) * | 2017-05-26 | 2018-02-13 | 天津以科美科技发展有限公司 | 一种单轴传动动梁式研磨加工装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111805412A (zh) * | 2020-07-17 | 2020-10-23 | 中国科学院微电子研究所 | 一种抛光液施配器及抛光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7098240B2 (ja) | 2022-07-11 |
| CN110856908A (zh) | 2020-03-03 |
| TW202009100A (zh) | 2020-03-01 |
| US20200061773A1 (en) | 2020-02-27 |
| KR102705100B1 (ko) | 2024-09-09 |
| JP2020028944A (ja) | 2020-02-27 |
| US11612979B2 (en) | 2023-03-28 |
| TWI823988B (zh) | 2023-12-01 |
| DE102019212581A1 (de) | 2020-02-27 |
| CN110856908B (zh) | 2023-05-05 |
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