KR20200022960A - 플라즈마 이온 가스를 이용한 가압 부상조가 구비된 고도처리 시스템 - Google Patents
플라즈마 이온 가스를 이용한 가압 부상조가 구비된 고도처리 시스템 Download PDFInfo
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- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/24—Treatment of water, waste water, or sewage by flotation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
- B01F23/23105—Arrangement or manipulation of the gas bubbling devices
- B01F23/2312—Diffusers
- B01F23/23121—Diffusers having injection means, e.g. nozzles with circumferential outlet
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2373—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media for obtaining fine bubbles, i.e. bubbles with a size below 100 µm
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- B01F3/04248—
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
- B04C—APPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES
- B04C9/00—Combinations with other devices, e.g. fans, expansion chambers, diffusors, water locks
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/40—Devices for separating or removing fatty or oily substances or similar floating material
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
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- B01F2003/04858—
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- H05H2001/466—
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Abstract
Description
도 2는 도 1에 도시된 플라즈마 발생기의 구조를 개략적으로 보여주는 도면이다.
도 3은 도 1에 도시된 마이크로 버블 발생기의 구조를 개략적으로 보여주는 도면이다.
Claims (5)
- 반응조(3)와, 응집조(5)와, 가압 부상조(7)를 포함하며, 가압 부상조(7)에 플라즈마 이온가스를 마이크로 버블형태로 변환하여 주입하여 부상시킴으로써 이물질을 응집시켜서 제거하는 고도처리장치로서,
가압 부상조(7)에는 공기를 압축하는 공기 압축기(9)와;
공기 압축기(9)로부터 공급된 공기를 이용하여 플라즈마 이온가스를 발생시키는 플라즈마 발생기(11)와;
플라즈마 발생기(11)로부터 공급된 플라즈마 이온가스를 마이크로 버블 형태로 변환하여 가압 부상조(7)로 공급하는 마이크로 버블 발생기(13)를 포함하는 고도처리장치(1). - 제 1항에 있어서,
플라즈마 발생기(11)는 내부에 중공부가 형성된 접지전극(21)과; 접지전극(21)의 중공부에 삽입되는 방전전극(23)과; 접지전극(21)의 중공부를 밀폐시키는 캡부(25)를 포함하며, 방전전극(23)의 주위에 공기 압축기(9)로부터 공급된 기체가 공급됨으로써 전원이 방전전극(23)에 인가되는 경우 방전전극(23)과 접지 전극의 사이에 방전이 일어남으로써 플라즈마 이온가스가 발생하는 것을 특징으로 하는 고도처리장치(1). - 제 1항에 있어서,
마이크로 버블 발생기(13)는 가압펌프(P)와, 인젝터(30) 및 가압탱크(도시안됨)를 포함하는 바,
인젝터(30)는 측면에 장착되어 가압펌프(110)로부터 공급되는 액체가 유입되는 액체 유입구(31)와; 후면에 장착되어 기체를 흡인하는 기체 유입구(33)와; 액체 유입구(31)로부터 유입된 액체가 와류(35)를 형성하여 액체와 기체가 혼합되어 버블 형태로 배출되는 배출구(37)와; 유체가 배출되는 방향으로 내부 직경이 작아지게 형성되는 경사부(39)와; 경사부(39)의 내면에 형성되어 와류를 형성하는 복수개의 돌기(41)를 포함하는 고도처리장치(1). - 제 1항에 있어서,
가압 부상조(7)의 내부에는 다수개의 수평 플레이트를 상하방향으로 서로 일정 간격씩 떨어지도록 배치하되 지그재그 형상으로 배치함으로써 각 수평 플레이트의 사이에 유로가 형성되고, 이 유로를 따라 플라즈마 이온 가스 버블이 이동하면서 상승하게 되므로 용존시간이 증가하고,
또한, 수평 플레이트의 표면에 다수의 돌기를 돌출 형성함으로써 플라즈마 이온 가스 버블이 다른 버블과 합쳐지는 과정을 통하여 부유물질의 처리효율이 향상될 수 있는 것을 특징으로 하는 고도처리장치(1). - 제 1항에 있어서,
반응조(3)에는 입측에 사이클론 여과기(15)가 연결됨으로써 오폐수가 가압 부상조(7)에 유입되기 전에 비중이 높은 SS 및 용존 SS를 제거할 수 있으며,
마이크로 버블 발생기(17) 혹은 약품투입기(18)를 추가로 연결함으로써 약품의 사용량을 저감할 수 있는 것을 특징으로 하는 고도처리장치(1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020180099225A KR20200022960A (ko) | 2018-08-24 | 2018-08-24 | 플라즈마 이온 가스를 이용한 가압 부상조가 구비된 고도처리 시스템 |
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| Application Number | Priority Date | Filing Date | Title |
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| KR1020180099225A KR20200022960A (ko) | 2018-08-24 | 2018-08-24 | 플라즈마 이온 가스를 이용한 가압 부상조가 구비된 고도처리 시스템 |
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| Publication Number | Publication Date |
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| KR20200022960A true KR20200022960A (ko) | 2020-03-04 |
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| KR1020180099225A Ceased KR20200022960A (ko) | 2018-08-24 | 2018-08-24 | 플라즈마 이온 가스를 이용한 가압 부상조가 구비된 고도처리 시스템 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111408481A (zh) * | 2020-04-17 | 2020-07-14 | 神华神东煤炭集团有限责任公司 | 煤泥等离子体浮选脱灰脱硫的方法 |
| CN116871062A (zh) * | 2023-07-05 | 2023-10-13 | 山东理工大学 | 低温等离子体耦合微纳米气泡强化多金属硫化矿浮选分离的选矿方法及其装置 |
| US11970412B2 (en) | 2020-06-23 | 2024-04-30 | Doosan Enerbility Co., Ltd. | Underwater plasma discharge device and water treatment system using same |
-
2018
- 2018-08-24 KR KR1020180099225A patent/KR20200022960A/ko not_active Ceased
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111408481A (zh) * | 2020-04-17 | 2020-07-14 | 神华神东煤炭集团有限责任公司 | 煤泥等离子体浮选脱灰脱硫的方法 |
| US11970412B2 (en) | 2020-06-23 | 2024-04-30 | Doosan Enerbility Co., Ltd. | Underwater plasma discharge device and water treatment system using same |
| CN116871062A (zh) * | 2023-07-05 | 2023-10-13 | 山东理工大学 | 低温等离子体耦合微纳米气泡强化多金属硫化矿浮选分离的选矿方法及其装置 |
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