KR20200039352A - 내수성 전도성 고분자의 구조 및 형태적 개선 - Google Patents
내수성 전도성 고분자의 구조 및 형태적 개선 Download PDFInfo
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- KR20200039352A KR20200039352A KR1020180119172A KR20180119172A KR20200039352A KR 20200039352 A KR20200039352 A KR 20200039352A KR 1020180119172 A KR1020180119172 A KR 1020180119172A KR 20180119172 A KR20180119172 A KR 20180119172A KR 20200039352 A KR20200039352 A KR 20200039352A
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 43
- 230000000877 morphologic effect Effects 0.000 title description 4
- 229920000144 PEDOT:PSS Polymers 0.000 claims abstract description 60
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 claims abstract description 56
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 54
- 229920001467 poly(styrenesulfonates) Polymers 0.000 claims abstract description 54
- -1 2-hydroxy-3-methacryloyloxypropoxy Chemical group 0.000 claims abstract description 10
- 229960002796 polystyrene sulfonate Drugs 0.000 claims abstract description 8
- 239000011970 polystyrene sulfonate Substances 0.000 claims abstract description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N dimethyl sulfoxide Natural products CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 105
- 239000000654 additive Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 10
- 230000000996 additive effect Effects 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 4
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- 238000005191 phase separation Methods 0.000 description 8
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- 230000015572 biosynthetic process Effects 0.000 description 4
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- 230000000694 effects Effects 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 238000001237 Raman spectrum Methods 0.000 description 3
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 3
- 239000011149 active material Substances 0.000 description 3
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- 239000000835 fiber Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 229960002479 isosorbide Drugs 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- 230000008707 rearrangement Effects 0.000 description 3
- NHQDETIJWKXCTC-UHFFFAOYSA-N 3-chloroperbenzoic acid Chemical compound OOC(=O)C1=CC=CC(Cl)=C1 NHQDETIJWKXCTC-UHFFFAOYSA-N 0.000 description 2
- KLDXJTOLSGUMSJ-JGWLITMVSA-N Isosorbide Chemical compound O[C@@H]1CO[C@@H]2[C@@H](O)CO[C@@H]21 KLDXJTOLSGUMSJ-JGWLITMVSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004630 atomic force microscopy Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
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- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 2
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 2
- 241000283690 Bos taurus Species 0.000 description 1
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- 230000005526 G1 to G0 transition Effects 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- XOJVVFBFDXDTEG-UHFFFAOYSA-N Norphytane Natural products CC(C)CCCC(C)CCCC(C)CCCC(C)C XOJVVFBFDXDTEG-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 241001074085 Scophthalmus aquosus Species 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 1
- LJSAJMXWXGSVNA-UHFFFAOYSA-N a805044 Chemical compound OC1=CC=C(O)C=C1.OC1=CC=C(O)C=C1 LJSAJMXWXGSVNA-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000013375 chromatographic separation Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000002009 diols Chemical group 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000006266 etherification reaction Methods 0.000 description 1
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- 230000001939 inductive effect Effects 0.000 description 1
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- 230000006855 networking Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000004809 thin layer chromatography Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/15—Heterocyclic compounds having oxygen in the ring
- C08K5/151—Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
- C08K5/1535—Five-membered rings
- C08K5/1539—Cyclic anhydrides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/18—Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
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- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
도 2는 본 발명의 일 실시예에 의한 분석결과로 상이한 Iso-GMA첨가된 PEDOT : PSS / DMSO 필름의 (a) XRD 패턴, (b) PEDOT의 쇄간적층(interchain stacking) 정도 및 PSS의 라멜라 적층 정도, (c) 라만 스펙트럼 및 (d) 평균 표면 저항을 각각 나타낸다.
도 3은 본 발명의 일 실시예에 의한 상이한 Iso-GMA 농도를 갖는 PEDOT : PSS / DMSO에서 (a) 피브릴 및 (b) 피브릴 네트워크 형성의 개략도이다.
도 4는 본 발명의 일 실시예에 의한 상이한 Iso-GMA 농도를 갖는 PEDOT : PSS / DMSO 필름의 기계적 경도 및 상대 표면 저항을 나타낸다. 이때 t는 습도 챔버의 샘플 보관 시간이다.
도 5는 본 발명의 일 실시예에 의한 분석결과로 Iso-GMA 농도가 다른 PEDOT : PSS / DMSO 필름의 (a) 평균 전기 전도도 및 Seebeck 계수, (b) 평균 파워 펙터(power factor), (c) XPS 스펙트럼 및 (d) 상대 Seebeck 계수를 나타낸다. 이때 t는 습도 챔버의 샘플 보관 시간이다.
도 6은 본 발명의 일 실시예에 의한 첨가제(DMSO/Iso-GMA)를 사용하지 않은 PEDOT : PSS 필름의 AFM이미지로 (a)는 topographic, (b)는 phase를 각각 나타낸 그림이다.
도 7은 본 발명의 일 실시예에 의한 서로 다른 Iso-GMA 농도를 갖는 PEDOT : PSS / DMSO 필름의 AFM topographic 이미지로 a) 0.0, b) 0.2, c) 0.4, d) 0.8, e) 1.2 및 f) 1.6vol%의 Iso-GMA농도에 따른 사진이다.
도 8은 본 발명의 일 실시예에 의한 상이한 Iso-GMA 농도를 갖는 PEDOT : PSS / DMSO 필름에서의 PEDOT의 평균 입자 크기로, 입자 크기는 Bruker의 NanoScope Analysis 소프트웨어 v. 1.40에서 입자 분석을 사용하여 계산되었다.
도 9는 본 발명의 일 실시예에 의한 수분 저항성 실험결과로, a) 첨가제 (DMSO 및 Iso-GMA)를 사용하지 않은 순수한 PEDOT : PSS 필름이며, (b) 0.0, c) 0.2, d) 0.4 및 e) 0.8 vol %의 Iso-GMA를 사용한 PEDOT : PSS / DMSO 필름의 실험결과 이다.
| sample | Thermoelectric properties | |||||
| Electrical conductivity (Scm-1) |
Seebeck coefficient (μVK-1) |
Power factor (μWm-1K-2) |
||||
| Value | Percentage increase (%) | Value | Percentage increase (%) | Value | Percentage increase (%) | |
| Pristine PEDOT:PSS film without additives (DMSO and Iso-GMA) | 0.26 | - | 6.58 | - | 0.01 | - |
| PEDOT:PSS/DMSOa film with 0.8 vol% Iso-GMA |
1063.52 | 4.09X105 | 11.98 | 1.82X102 | 15.26 | 1.53X105 |
Claims (8)
- 2,5-비스(2-하이드록시-3-메타아크릴올옥시프로폭시)-1,4:3,6-디안하이드로-솔비톨(2,5-bis(2-hydroxy-3-methacryloyloxypropoxy)-1,4:3,6-dianhydro-sorbitol, Iso-GMA) 0.1~5부피%를 함유하는 내수성 전도성 고분자.
- 제1항에 있어서,
상기 전도성 고분자는 폴리3,4-에틸렌디옥시티오펜:폴리스티렌 설포네이트(poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate), PEDOT:PSS)인 것을 특징으로 하는 내수성 전도성 고분자.
- 제1항에 있어서,
상기 Iso-GMA는 상기 전도성 고분자와 자기조립을 통해 가교된 피브릴(fibril) 네트워크를 형성하는 것을 특징으로 하는 내수성 전도성 고분자.
- 제1항에 있어서,
상기 내수성 전도성 고분자는 수분의 존재하에서 10시간 이상 열전 변환 특성을 유지하는 것을 특징으로 하는 내수성 전도성 고분자.
- (a) 전도성 고분자 용액에 첨가제를 용해하는 단계; 및
(b) 상기 (a) 단계에서 제조된 용액에 2,5-비스(2-하이드록시-3-메타아크릴올옥시프로폭시)-1,4:3,6-디안하이드로-솔비톨(2,5-bis(2-hydroxy-3-methacryloyloxypropoxy)-1,4:3,6-dianhydro-sorbitol, Iso-GMA) 0.1~5부피%를 첨가하는 단계;
를 포함하는 제1항 내지 제4항 중 어느 한 항의 내수성 전도성 고분자의 제조방법.
- 제5항에 있어서,
상기 첨가제는 디메틸설폭사이드(DMSO) 이며 상기 전도성 고분자는 폴리3,4-에틸렌디옥시티오펜:폴리스티렌 설포네이트(poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate), PEDOT:PSS)인 것을 특징으로 하는 내수성 전도성 고분자의 제조방법.
- 제1항 내지 제4항 중 어느 한 항의 전도성 고분자를 포함하는 전도성 필름.
- 제1항 내지 제4항 중 어느 한 항의 전도성 고분자를 포함하는 열전소자.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220021140A (ko) * | 2020-08-13 | 2022-02-22 | 원광대학교산학협력단 | 전도성 고분자 필름 및 전도성 고분자 필름의 제조방법 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100548045B1 (ko) | 2001-08-17 | 2006-02-01 | 학교법인고려중앙학원 | 전도성 고분자 필름 및 그 제조방법 |
| KR20120077112A (ko) | 2010-12-30 | 2012-07-10 | 삼성전기주식회사 | Pedot/pss 조성물 및 이를 이용한 pedot/pss 필름 |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100548045B1 (ko) | 2001-08-17 | 2006-02-01 | 학교법인고려중앙학원 | 전도성 고분자 필름 및 그 제조방법 |
| KR20120077112A (ko) | 2010-12-30 | 2012-07-10 | 삼성전기주식회사 | Pedot/pss 조성물 및 이를 이용한 pedot/pss 필름 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220021140A (ko) * | 2020-08-13 | 2022-02-22 | 원광대학교산학협력단 | 전도성 고분자 필름 및 전도성 고분자 필름의 제조방법 |
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