KR20200054170A - 복합적인 블록 코폴리머 아키텍처의 다공성 재료 - Google Patents
복합적인 블록 코폴리머 아키텍처의 다공성 재료 Download PDFInfo
- Publication number
- KR20200054170A KR20200054170A KR1020207005342A KR20207005342A KR20200054170A KR 20200054170 A KR20200054170 A KR 20200054170A KR 1020207005342 A KR1020207005342 A KR 1020207005342A KR 20207005342 A KR20207005342 A KR 20207005342A KR 20200054170 A KR20200054170 A KR 20200054170A
- Authority
- KR
- South Korea
- Prior art keywords
- poly
- block
- blocks
- vinylpyridine
- architecture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 39
- 239000000126 substance Substances 0.000 claims description 36
- 239000002904 solvent Substances 0.000 claims description 26
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 21
- 229920000075 poly(4-vinylpyridine) Polymers 0.000 claims description 19
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- 230000008569 process Effects 0.000 claims description 12
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 11
- 239000012491 analyte Substances 0.000 claims description 11
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 7
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- 238000004519 manufacturing process Methods 0.000 claims description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 6
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
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- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 6
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- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 4
- 241001082241 Lythrum hyssopifolia Species 0.000 claims description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 4
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- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 claims description 3
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- CDXFIRXEAJABAZ-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CDXFIRXEAJABAZ-UHFFFAOYSA-N 0.000 claims description 3
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- 229920000885 poly(2-vinylpyridine) Polymers 0.000 claims description 3
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- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 3
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- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 2
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Classifications
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
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- B01D71/401—Polymers based on the polymerisation of acrylic acid, e.g. polyacrylate
- B01D71/4011—Polymethylmethacrylate
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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Abstract
Description
도면 2는 본 발명에 따른 도 2a (100), 도 2b (110), 도 2d (120), 도 2e (130) 및 도 2c (140)의 다양한 블록 코폴리머 아키텍처 재료들을 도시한다. 상이한 방식의 음영 및/또는 선(예를 들어, 실선, 점선)은 배치적, 구조적 또는 화학적으로 구별되는 영역을 나타낸다.
도면 3은 본 발명에 따른 도 3a (150), 도 3b (160), 도 3c (170) 및 도 3d (180)의 다양한 블록 코폴리머 아키텍처 재료들을 도시한다. 상이한 방식의 음영 및/또는 선(예를 들어, 실선, 점선)은 배치적, 구조적 또는 화학적으로 구별되는 영역을 나타낸다.
도면 4는 본 발명에 따른 도 4a (200), 도 4b (210), 도 4c (220), 도 4d (230), 도 4e (240) 및 도 4f (250)의 다양한 블록 코폴리머 아키텍처 재료들을 도시한 것이다. 상이한 방식의 음영 및/또는 선(예를 들어, 실선, 점선)은 배치적, 구조적 또는 화학적으로 구별되는 영역을 나타낸다.
도면 5는 본 발명에 따른 스타 블록 코폴리머의 합성을 개략적으로 나타낸 것이다. 다관능성 개시제 및 8개의 팔 각각의 제1 블록(260)이 성장하여 스타 폴리머(270)을 형성한다(도 5a); 스타 폴리머(270)에 대한 제2 모노머 첨가(단계 300)는 디블록 스타 구조(280)을 형성하는 제2 블록(305)를 생성한다(도 5b); 제3 모노머 첨가(단계 310)는 제3 블록(320)을 생성하여 각각의 팔이 3개의 상이한 블록들을 포함하는 스타 폴리머(330)를 생성한다(도 5c). 상이한 방식의 음영 및/또는 선(예를 들어, 실선, 점선)은 배치적, 구조적 또는 화학적으로 구별되는 영역을 나타낸다.
도면 6은 A) 자기-조립된 이소포러스 폴리(이소프렌-b-스티렌-b-4-비닐피리딘)(ISV) 재료(비교예), B) 자기-조립된 이소포러스 ISV/폴리(이소프렌-b-스티렌-b-2-하이드록시에틸 메타크릴레이트)(ISH) 재료(ISV:ISH 중량비는 9:1) 및 C) 자기-조립된 다공성 ISV/ISH 재료(ISV:ISH 중량비는 6:4)의 주사전자현미경 이미지를 나타낸다.
도면 7은 폴리(스티렌-b-4-비닐피리딘) 및 폴리(이소프렌-b-스티렌-b-4-비닐피리딘)을 포함하는 자기-조립된 이소포러스 재료의 주사전자현미경 이미지를 나타낸다.
도면 8은 폴리(이소프렌-b-스티렌-b-2-비닐피리딘-랜덤-4-비닐피리딘)을 포함하는 자기-조립된 이소포러스 재료의 주사전자현미경 이미지를 나타낸다.
도면 9는 폴리(이소프렌-b-스티렌-b-2-비닐피리딘-b-2-비닐피리딘-랜덤-4-비닐피리딘)을 포함하는 자기-조립된 이소포러스 재료의 주사전자현미경 이미지를 나타낸 것으로, 상기 2-비닐피리딘 "블록"은 단지 몇 개의 모노머 유닛들의 짧은 접합 블록이다.
도면 10은 폴리(이소프렌-b-스티렌-랜덤-이소프렌-b-4-비닐피리딘)을 포함하는 자기-조립된 이소포러스 재료의 주사전자현미경 이미지를 나타낸다.
도면 11은 복합적인 아키텍처를 포함하는 하나 이상의 BCP를 포함하는 자기-조립된 이소포러스 재료(350)를 포함하는 분리 장치의 개략도를 도시한다. 상기 장치는 분리될 매질을 위한 주입구(340) 및 분리된 매질이 나가기 위한 배출구(360)을 포함한다.
도면 12는 복합적인 아키텍처를 포함하는 하나 이상의 BCP를 포함하는 자기-조립된 이소포러스 재료(350)를 포함하는 센서 장치의 개략도를 도시한다. 상기 장치는 분리될 매질을 위한 주입구(340) 및 분리된 매질이 나가기 위한 배출구(360)뿐만 아니라 관심 분석물을 검출하기 위한 전극과 같은 센서(370)을 포함한다. 또한 직교류(crossflow) 배치에 사용하기 위한 선택적 잔류물 포트(345)가 도시된다.
도면 13은 폴리(이소프렌-b-스티렌-b-4-비닐피리딘)-OH를 포함하는 자기-조립된 이소포러스 재료의 주사전자현미경 이미지를 나타낸다. 또한 직교류 배치에 사용하기 위한 선택적 잔류물 포트(345)가 도시된다.
| 성질 | 폴리머/블록 화학 |
| 낮은 Tg(25℃ 이하) | 폴리(이소부틸렌), 폴리(이소프렌), 폴리(부타디엔), 폴리(프로필렌 글리콜), 폴리(에틸렌 옥사이드), 폴리(디메틸실록세인) |
| 높은 Tg(25℃ 초과) | 폴리(에테르설폰), 폴리(설폰), 폴리(하이드록시스티렌), 폴리(메틸스티렌) |
| 친수성 | 폴리(에틸렌 글리콜), 폴리(2-하이드록시메틸 메타크릴레이트), 폴리(아크릴아마이드), 폴리(N,N-디메틸아크릴아마이드), 폴리(프로필렌 옥사이드), 폴리(스티렌 설포네이트) |
| 소수성 | 폴리(스티렌), 폴리(에틸렌), 폴리(비닐 클로라이드), 폴리(2-(퍼플루오로헥실)에틸 메타크릴레이트) |
| 내화학성 | 폴리(테트라플루오로에틸렌), 폴리(비닐리덴 플루오라이드), 폴리(펜타플루오로스티렌) |
| 화학적 반응성 | 폴리(아크릴산), 폴리(2-비닐피리딘), 폴리(4-비닐피리딘), 폴리(3-비닐피리딘), 폴리(N-이소프로필아크릴아마이드), 폴리(디메틸아미노에틸 메타크릴레이트) |
| 화학적 기능성 | 폴리(글리시딜 메타크릴레이트), 폴리(에틸렌이민), 폴리(젖산), 폴리(아크릴로니트릴), 폴리(메틸 아크릴레이트), 폴리(부틸 메타크릴레이트), 폴리(메틸 메타크릴레이트), 폴리(n-부틸 아크릴레이트), 폴리(아믹산), 폴리(이소시아네이트), 폴리(에틸 시아노아크릴레이트), 폴리(알릴아민 하이드로클로라이드), 폴리(메타크릴산) |
| ISV | ISV:ISH (9:1) |
ISV:ISH (6:4) |
|
| 투과성, Lm-2h-1bar-1 | 196 | 232 | 257 |
| 감마 글로불린 흡착, ㎍/cm2 | 308 | 217 | 83 |
20 주쇄와 다른 조성의 가지들을 포함하는 블록 아키텍처
30 주쇄와 동일한 조성을 포함하는 다수의 가지들을 분지 위치들에서 포함하는 블록 아키텍처
40 주쇄와 동일한 조성 및 다른 조성을 포함하는 다수의 가지들을 분지 위치들에서 갖는 블록 아키텍처
50 주쇄와 다른 조성을 갖는 다수의 가지들을 분지 위치들에서 갖는 블록 아키텍처
60 블록간 그래디언트 조성/구조 변화를 갖는 블록 아키텍처
70 조성/구조가 다른 짧은 올리고머를 함유하는 블록 아키텍처
80 조성/구조가 다른 두 개의 짧고 인접한 올리고머들을 함유하는 블록 아키텍처
90 조성/구조가 다른 두 개의 짧고 인접하지 않은 올리고머들을 함유하는 블록 아키텍처
100 하나의 블록의 고리 아키텍처를 포함하는 트리블록 코폴리머 아키텍처
110 세 개의 블록들 모두의 고리 아키텍처를 포함하는 트리블록 코폴리머 아키텍처
120 세 개의 블록들 모두의 고리 아키텍처 및 주쇄와 다른 조성을 가진 가지들을 포함하는 하나의 블록의 분지된 아키텍처를 포함하는 트리블록 코폴리머 아키텍처
130 각각의 팔이 수지상으로 다수의 후속하는 가지들을 갖는 과분지된 스타 트리블록 코폴리머 아키텍처
140 각각의 팔이 다관능성 개시제 코어로부터 성장된 세 개의 별개 선형 블록들을 포함하는 스타 트리블록 코폴리머 아키텍처
150 가지들이 주쇄와 조성이 다른 분지된 블록을 포함하는 트리블록 코폴리머 아키텍처
160 모든 가지들이 중간 블록의 종점으로부터 시작되는 분지된 블록을 포함하는 트리블록 코폴리머 아키텍처
170 모든 가지들이 다른 두 개의 블록들의 종점들로부터 시작되는 동일한 조성의 두 개의 분지된 말단 블록들을 포함하는 테트라 블록 코폴리머 아키텍처
180 가교된 블록을 포함하는 트리블록 코폴리머 아키텍처
200 두 블록들 사이에서 서로 인접한 두 개의 별개의 작은 올리고머 링커들을 포함하는 디블록 코폴리머 아키텍처
210 두 블록들 사이에서 서로 인접한 두 개의 별개의 작은 올리고머 링커들을 포함하는 트리블록 코폴리머 아키텍처
220 폴리머 구조의 한 말단에 작은 올리고머를 포함하는 트리블록 코폴리머 아키텍처
230 폴리머 구조의 각 말단에 동일한 조성의 두 개의 작은 올리고머들을 포함하는 트리블록 코폴리머 아키텍처
240 폴리머 구조의 각 말단에 두 개의 작은 별개 올리고머들을 포함하는 트리블록 코폴리머
250 두 개의 분지된 블록들을 포함하는 트리블록 코폴리머 아키텍처로서, 하나의 블록은 중간 블록의 종점으로부터 시작된 모든 가지들을 갖고, 인접한 블록은 주쇄와 다른 조성의 가지들을 포함하는 트리블록 코폴리머 아키텍처
260 제1 폴리머 블록, 폴리(이소프렌)
270 다관능성 개시제로부터 성장된 여덟 개의 팔이 있는 스타 폴리(이소프렌) 폴리머의 구조
280 다관능성 개시제로부터 성장된 여덟 개의 팔이 있는 스타 폴리(이소프렌)-블록-폴리(스티렌) 디블록 코폴리머의 구조
300 제2 블록 중합반응을 위한 제2 모노머(스티렌)의 첨가
305 제2 폴리머 블록, 폴리(스티렌)
310 제2 블록 중합반응을 위한 제3 모노머(4-비닐피리딘)의 첨가
320 제3 폴리머 블록, 폴리(4-비닐피리딘)
330 다관능성 개시제로부터 성장된 여덟 개의 팔이 있는 스타 폴리(이소프렌-b-스티렌-b-4-비닐피리딘) 트리블록 코폴리머의 구조
335 분리 장치
335' 센서들을 가진 분리 장치
340 장치 주입구
345 선택적 장치 잔류물 포트
350 복합적인 아키텍처를 포함하는 하나 이상의 BCP를 포함하는 이소포러스 재료
360 장치 배출구
370 관심 분석물을 검출하기 위한 전극들과 같은 센서들
새로운 것으로서 청구되며 US 특허증에 의해 보호되고 싶은 것:
Claims (20)
- 자기-조립 폴리머 재료로서,
상기 재료는 매크로(macro), 메조(meso) 또는 마이크로(micro) 포어 중 하나 이상을 함유하고,
상기 포어들의 적어도 일부는 이소포러스(isoporous)이며,
상기 재료는 둘 이상의 화학적으로 구별되는 블록들을 갖는 블록 코폴리머 또는 블록 코폴리머들(block copolymers, BCPs)을 포함하고,
상기 블록 코폴리머는 복합적인 아키텍처(architecture)를 더 포함하는, 자기-조립 폴리머 재료. - 제1항에 있어서,
상기 재료의 적어도 일부는, 하나 이상의 블록 내에 또는 하나 이상의 블록에 인접해서 한 종을 초과하는 모노머/화학/배치(configuration)/구조/조성을 함유하는 블록 코폴리머인, 재료. - 제1항에 있어서,
상기 재료의 적어도 일부는, 하나 이상의 블록 내에 또는 하나 이상의 블록에 인접해서 한 종을 초과하는 모노머/화학/배치/구조/조성을 갖는 디블록 코폴리머, 트리블록 코폴리머 또는 4차 이상의 고차 블록(즉, 테트라블록, 펜타블록 등)인, 재료. - 제1항에 있어서,
상기 재료은 약 1nm 내지 약 200nm의 직경을 포함하는 메조 포어들을 갖는, 재료. - 제1항에 있어서,
상기 하나 이상의 블록 코폴리머는 약 1 x 103 내지 약 1 x 107 g/mol의 Mn을 갖는, 재료. - 제1항에 있어서,
상기 하나 이상의 블록 코폴리머는 1.0 내지 3.0의 PDI를 갖는, 재료. - 제1항에 있어서,
상기 BCP의 하나 이상의 블록이 하기 특성들 중 하나 이상을 갖는, 재료:
a. 낮은 Tg(25℃ 이하)
b. 높은 Tg(25℃ 초과)
c. 친수성
d. 소수성
e. 내화학성
f. 화학적 반응성
g. 화학적 기능성. - 제1항에 있어서,
상기 재료의 적어도 일부는 하기의 폴리머 블록들 또는 이의 유도체들로 부터 선택된 적어도 하나의 유닛을 포함하는, 재료:
a. 폴리(부타디엔)
b. 폴리(이소부틸렌)
c. 폴리(이소프렌)
d. 폴리(에틸렌)
e. 폴리(스티렌)
f. 폴리(메틸 아크릴레이트)
g. 폴리(부틸 메타크릴레이트)
h. 폴리(에테르설폰)
i. 폴리(메틸 메타크릴레이트)
j. 폴리(n-부틸 아크릴레이트)
k. 폴리(2-하이드록시에틸 메타크릴레이트)
l. 폴리(글리시딜 메타크릴레이트)
m. 폴리(아크릴산)
n. 폴리(아크릴아마이드)
o. 폴리(설폰)
p. 폴리(비닐리덴 플루오라이드)
q. 폴리(N,N-디메틸아크릴아마이드)
r. 폴리(2-비닐피리딘)
s. 폴리(3-비닐피리딘)
t. 폴리(4-비닐피리딘)
u. 폴리(에틸렌 글리콜)
v. 폴리(프로필렌 글리콜)
w. 폴리(비닐 클로라이드)
x. 폴리(테트라플루오로에틸렌)
y. 폴리(에틸렌 옥사이드)
z. 폴리(프로필렌 옥사이드)
aa. 폴리(N-이소프로필아크릴아마이드)
bb. 폴리(디메틸아미노에틸 메타크릴레이트)
cc. 폴리(아믹산)
dd. 폴리(디메틸실록세인)
ee. 폴리(락트산)
ff. 폴리(이소시아네이트)
gg. 폴리(에틸 시아노아크릴레이트)
hh. 폴리(아크릴로니트릴)
ii. 폴리(하이드록시스티렌)
jj. 폴리(메틸스티렌)
kk. 폴리(에틸렌이민)
ll. 폴리(스티렌 설포네이트)
mm. 폴리(알릴아민 하이드로클로라이드)
nn. 폴리(펜타플루오로스티렌)
oo. 폴리(2-(퍼플루오로헥실)에틸 메타크릴레이트)
pp. 폴리(메타크릴산)
qq. 폴리(에틸렌 설파이드)
rr. 폴리(프로필렌 설파이드). - 제1항의 재료의 제조방법으로서,
a. 하나 이상의 화학 용매에 폴리머를 용해시키는 단계
b. 폴리머 용액을 기판 또는 몰드 상으로, 또는 다이(die) 또는 템플릿을 통에 분배하는 단계
c. 화학 용매의 적어도 일부를 제거하는 단계
d. 상기 폴리머의 적어도 일부의 침전을 유발하는 비용매에 노출시키는 단계
e. 임의로, 세척하는 단계
를 포함하는 방법. - 제9항에 있어서,
상기 화학 용매의 적어도 일부는 하기의 종류들로 부터 선택된 방법:
a. 알코올,
b. 알데하이드,
c. 알칸,
d. 아마이드,
e. 아민,
f. 사이클릭 방향족,
g. 카복실산,
h. 에스테르,
i. 에테르,
j. 케톤,
k. 락탐,
l. 니트릴,
m. 유기할로겐화물,
n. 폴리올,
o. 설폰, 또는
p. 설폭사이드. - 제9항에 있어서,
상기 화학 용매의 적어도 일부가 하기의 것들 또는 이들의 유도체들 중 적어도 하나를 함유하는 방법:
a. 아세톤,
b. 아세트알데하이드,
c. 메탄올,
d. 에탄올,
e. 에틸 아세테이트,
f. 디메톡시에탄,
g. 헥산,
h. 클로로포름,
i. 디클로로메탄,
j. 아세토니트릴,
k. 테트라하이드로퓨란,
l. 사이클로헥산,
m. 벤젠,
n. 톨루엔,
o. 디메틸 설폭사이드,
p. 디메틸포름아마이드,
q. 디메틸아세트아마이드,
r. N-메틸-2-피롤리돈.
s. 피리딘,
t. 1,4-디옥세인,
u. 아세트산,
v. 포름산, 또는
w. 프로판올,
x. 설포레인. - 제9항에 있어서,
상기 BCP 용액이 하나 이상의 추가 거대분자 또는 소분자를 더 포함하는, 방법. - 관심 분석물을 함유하는 매질을 하나 이상의 제1항의 재료와 접촉시킴으로써 관심 분석물을 분리 또는 검출하는 공정.
- 액체들 또는 기체들을 분리 또는 여과하기 위해 하나 이상의 제1항의 재료를 사용하는 공정.
- 액체 또는 기체로부터 하나 이상의 바이러스를 여과, 분리 또는 제거하기 위해 하나 이상의 제1항의 재료를 사용하는 공정.
- 제1항에 있어서,
상기 재료는 하나 보다 많은 BCP를 포함하는, 재료. - 제1항에 있어서,
하나 이상의 BCP의 적어도 일부는, 하나 이상의 블록 내에, 블록들 사이, 또는 적어도 하나의 블록의 말단에서 하나 보다 많은 별개의 모노머 유형을 포함하는, 재료. - 제1항에 있어서,
하나 이상의 BCP의 적어도 일부는 분지된 것인, 재료. - 제1항에 있어서,
하나 이상의 BCP의 적어도 일부는 가교된 것인, 재료. - 제1항에 있어서,
하나 이상의 BCP의 적어도 일부는 고리 아키텍처인, 재료.
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| US62/564,669 | 2017-09-28 | ||
| US201862625633P | 2018-02-02 | 2018-02-02 | |
| US62/625,633 | 2018-02-02 | ||
| PCT/US2018/043303 WO2019023135A1 (en) | 2017-07-25 | 2018-07-23 | POROUS MATERIALS FROM COMPLEX BLOCK COPOLYMER ARCHITECTURES |
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| EP3860748A4 (en) * | 2018-10-05 | 2022-08-10 | Terapore Technologies, Inc. | METHOD OF FILTRATION OF LIQUIDS OR GASES FOR ELECTRONICS MANUFACTURE |
| EP3738988B1 (en) | 2019-05-16 | 2022-07-13 | 3M Innovative Properties Company | Amphiphilic triblock copolymer |
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| GB2600317B (en) * | 2019-06-24 | 2024-02-14 | Flexenable Tech Limited | Modification of stress response and adhesion behavior of dielectric through tuning of mechanical properties |
| EP4007911A1 (en) * | 2019-08-03 | 2022-06-08 | King Abdullah University Of Science And Technology | Device for detecting analytes in a sample, and methods of use thereof |
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| CN116997404A (zh) | 2021-03-19 | 2023-11-03 | 环球生命科学解决方案运营英国有限公司 | 病毒过滤器及病毒过滤方法 |
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| US7151120B2 (en) * | 2001-10-17 | 2006-12-19 | The Regents Of The University Of Michigan | Degradable porous materials with high surface areas |
| WO2011098851A1 (en) * | 2010-02-11 | 2011-08-18 | King Abdullah University Of Science And Technology | Self-assembled block copolymer membrane |
| KR20160020404A (ko) * | 2013-03-11 | 2016-02-23 | 유니버시티 오브 노트르 담 디락 | 다중블록 공중합체 및 사용 방법 |
| US20160229969A1 (en) * | 2013-09-25 | 2016-08-11 | Cornell University | Multiblock copolymer films with inorganic nanoparticles, methods of making same, and uses thereof |
| FR3014876B1 (fr) * | 2013-12-13 | 2017-03-31 | Arkema France | Procede de realisation d'un film de copolymere a blocs sur un substrat |
| DE102014213027A1 (de) * | 2014-07-04 | 2016-01-07 | Helmholtz-Zentrum Geesthacht Zentrum für Material- und Küstenforschung GmbH | Verfahren zur Herstellung einer Membran mit isoporöser trennaktiver Schicht mit einstellbarer Porengröße, Membran, Filtrationsmodul und Verwendung |
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2018
- 2018-07-23 CA CA3071140A patent/CA3071140A1/en active Pending
- 2018-07-23 JP JP2020503958A patent/JP2020528952A/ja active Pending
- 2018-07-23 KR KR1020207005342A patent/KR102640611B1/ko active Active
- 2018-07-23 CN CN201880055509.2A patent/CN111032200A/zh active Pending
- 2018-07-23 EP EP18837375.7A patent/EP3658262A4/en not_active Withdrawn
- 2018-07-23 SG SG11202000664YA patent/SG11202000664YA/en unknown
- 2018-07-23 WO PCT/US2018/043303 patent/WO2019023135A1/en not_active Ceased
- 2018-07-23 US US16/633,508 patent/US20200238227A1/en not_active Abandoned
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| US20140217012A1 (en) * | 2011-05-04 | 2014-08-07 | Yale University | Multiblock copolymer films, methods of making same, and uses thereof |
| KR20160081807A (ko) * | 2014-12-30 | 2016-07-08 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | 유도 자기 조립용 코폴리머 배합물, 이의 제조방법 및 이를 포함하는 물품 |
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|---|---|
| CN111032200A (zh) | 2020-04-17 |
| SG11202000664YA (en) | 2020-02-27 |
| EP3658262A1 (en) | 2020-06-03 |
| WO2019023135A1 (en) | 2019-01-31 |
| MX2020000970A (es) | 2020-09-28 |
| JP2020528952A (ja) | 2020-10-01 |
| EP3658262A4 (en) | 2021-04-07 |
| KR102640611B1 (ko) | 2024-02-27 |
| CA3071140A1 (en) | 2019-01-31 |
| US20200238227A1 (en) | 2020-07-30 |
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