KR20220132487A - Cvd 코팅된 절삭 공구 - Google Patents
Cvd 코팅된 절삭 공구 Download PDFInfo
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- KR20220132487A KR20220132487A KR1020220116232A KR20220116232A KR20220132487A KR 20220132487 A KR20220132487 A KR 20220132487A KR 1020220116232 A KR1020220116232 A KR 1020220116232A KR 20220116232 A KR20220116232 A KR 20220116232A KR 20220132487 A KR20220132487 A KR 20220132487A
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- 238000005520 cutting process Methods 0.000 title claims abstract description 60
- 239000000758 substrate Substances 0.000 claims abstract description 45
- 238000000576 coating method Methods 0.000 claims abstract description 29
- 239000011248 coating agent Substances 0.000 claims abstract description 21
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 150000002739 metals Chemical class 0.000 claims abstract description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 23
- 239000011230 binding agent Substances 0.000 claims description 12
- 238000007514 turning Methods 0.000 claims description 12
- 229910000831 Steel Inorganic materials 0.000 claims description 11
- 239000010959 steel Substances 0.000 claims description 11
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 10
- 238000002441 X-ray diffraction Methods 0.000 claims description 9
- 150000001247 metal acetylides Chemical class 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 6
- 229910000975 Carbon steel Inorganic materials 0.000 claims description 5
- 239000010962 carbon steel Substances 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910000851 Alloy steel Inorganic materials 0.000 claims description 3
- 229910000760 Hardened steel Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000011195 cermet Substances 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 12
- 238000003754 machining Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 95
- 229910002091 carbon monoxide Inorganic materials 0.000 description 14
- 238000000151 deposition Methods 0.000 description 13
- 230000008021 deposition Effects 0.000 description 13
- 239000013078 crystal Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 239000002245 particle Substances 0.000 description 6
- 238000005422 blasting Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910000967 As alloy Inorganic materials 0.000 description 2
- 102220530046 N-chimaerin_E13S_mutation Human genes 0.000 description 2
- 102220513475 Rab-interacting lysosomal protein_E35S_mutation Human genes 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000002447 crystallographic data Methods 0.000 description 1
- 238000007405 data analysis Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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- B23B27/148—Composition of the cutting inserts
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
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- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2222/00—Materials of tools or workpieces composed of metals, alloys or metal matrices
- B23B2222/28—Details of hard metal, i.e. cemented carbide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/04—Aluminium oxide
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- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/32—Titanium carbide nitride (TiCN)
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- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/36—Titanium nitride
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- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2226/00—Materials of tools or workpieces not comprising a metal
- B23B2226/18—Ceramic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/04—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner applied by chemical vapour deposition [CVD]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
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Abstract
Description
Claims (15)
- α-Al2O3 층을 포함하는 코팅으로 코팅된 기재를 포함하는 코팅된 절삭 공구로서,
상기 α-Al2O3 층은, CuKα 방사선과 θ-2θ 스캔을 사용하여 X-선 회절에 의해 측정했을 때, Harris 공식
에 따라 정의된 조직 계수 TC(hkl) 를 나타내고,
여기서 I(hkl) 는 (hkl) 반사의 측정된 강도 (적분 면적; integrated area) 이고, I0(hkl) 는 ICDD 의 PDF-card No. 00-010-0173 에 따른 표준 강도이고, n 은 연산에 사용된 반사들의 수이고, 여기서 사용된 (hkl) 반사들은 (1 0 4), (1 1 0), (1 1 3), (0 2 4), (1 1 6), (2 1 4), (3 0 0) 및 (0 0 12) 이고,
TC(0 0 12) 는 7.2 이상, 또는 7.4 이상, 또는 7.5 이상, 또는 7.6 이상, 또는 7.7 이상이고,
I(0 0 12)/I(0 1 14) 의 비는 1 이상, 또는 1.5 이상, 또는 1.7 이상, 또는 2 이상이고,
상기 코팅은 상기 기재와 상기 α-Al2O3 층 사이에 위치된 MTCVD TiCN 층을 추가로 포함하고,
상기 α-Al2O3 층과 상기 기재 사이에 위치된 TiCN 층은, CuKα 방사선과 θ-2θ 스캔을 사용하여 X-선 회절에 의해 측정했을 때, Harris 공식에 따라 정의된 조직 계수 TC(hkl) 를 나타내고, 여기서 I(hkl) 는 (hkl) 반사의 측정된 강도 (적분 면적) 이고, I0(hkl) 는 ICDD 의 PDF-card No. 42-1489 에 따른 표준 강도이고, n 은 반사들의 수이고, 연산에 사용된 반사들은 (1 1 1), (2 0 0), (2 2 0), (3 1 1), (3 3 1), (4 2 0), (4 2 2) 및 (5 1 1) 이고,
상기 TiCN 층의 TC(3 1 1) + TC(4 2 2) 는 4 이상, 또는 5 이상, 또는 6 이상, 또는 7 이상인 것을 특징으로 하는, 코팅된 절삭 공구. - 제 1 항에 있어서,
상기 TiCN 층은 3 이상의, 또는 3.5 이상의 TC(4 2 2) 를 나타내는 것을 특징으로 하는, 코팅된 절삭 공구. - 제 1 항에 있어서,
상기 코팅된 절삭 공구의 기재는 4 - 12 wt% Co,
주기율표의 IVb, Vb 및 VIb 족으로부터의 금속들의 0.1 - 10 wt% 입방정 탄화물, 질화물 또는 탄질화물, 및
잔부 WC 를 포함하는 초경 합금으로 이루어지는, 코팅된 절삭 공구. - 제 1 항에 있어서,
상기 코팅된 절삭 공구의 기재는 6 - 8 wt% Co,
Ti, Nb, Ta 또는 그의 조합의 0.1 - 10 wt% 입방정 탄화물, 질화물 또는 탄질화물, 및
잔부 WC 를 포함하는 초경 합금으로 이루어지는, 코팅된 절삭 공구. - 제 1 항에 있어서,
상기 기재는 바인더 상이 농후한 표면 구역을 갖는 초경 합금으로 이루어지고,
상기 바인더 상이 농후한 표면 구역의 두께는, 상기 기재의 표면으로부터 상기 기재의 중심을 향해 측정했을 때에 5 - 35㎛ 인, 코팅된 절삭 공구. - 제 5 항에 있어서,
상기 바인더 상이 농후한 표면 구역은 상기 기재의 중심에서의 바인더 상 함량보다 적어도 50 % 더 높은 평균 바인더 상 함량을 갖는, 코팅된 절삭 공구. - 제 1 항에 있어서,
상기 기재는 입방정 탄화물이 없는 표면 구역을 갖는 초경 합금으로 이루어지고,
상기 입방정 탄화물이 없는 표면 구역의 두께는, 상기 기재의 표면으로부터 상기 기재의 중심을 향해 측정했을 때에 5 - 35 ㎛ 인, 코팅된 절삭 공구. - 제 1 항에 있어서,
TC(2 2 0) 는 0.5 이하, 또는 0.3 이하, 또는 0.2 이하, 또는 0.1 이하인, 코팅된 절삭 공구. - 제 1 항에 있어서,
상기 α-Al2O3 층의 두께는 2 - 20 ㎛ 인 것을 특징으로 하는, 코팅된 절삭 공구. - 제 1 항에 있어서,
상기 MTCVD TiCN 층의 두께는 4 - 20 ㎛ 인 것을 특징으로 하는, 코팅된 절삭 공구. - 제 1 항에 있어서,
상기 코팅은, HTCVD 증착된 TiN, TiCN, TiCNO, TiCO 또는 그 조합을 포함하는 접합층으로서, 상기 MTCVD TiCN 층의 최외측에 위치되고 또한 상기 α-Al2O3 층에 인접하는 상기 접합층을 추가로 포함하는 것을 특징으로 하는, 코팅된 절삭 공구. - 제 11 항에 있어서,
상기 접합층의 두께는 0.5 - 2 ㎛ 인 것을 특징으로 하는, 코팅된 절삭 공구. - 제 1 항 내지 제 12 항 중 어느 한 항에 있어서,
상기 기재는 초경 합금, 서멧 (cermet), 또는 세라믹인 것을 특징으로 하는, 코팅된 절삭 공구. - 제 1 항 내지 제 12 항 중 어느 한 항에 있어서,
상기 코팅된 절삭 공구는 강, 또는 합금강, 탄소강 또는 강인강 (tough hardened steel) 의 선삭 작업에서 사용되는 것을 특징으로 하는, 코팅된 절삭 공구. - 제 13 항에 있어서,
상기 코팅된 절삭 공구는 강, 또는 합금강, 탄소강 또는 강인강 (tough hardened steel) 의 선삭 작업에서 사용되는 것을 특징으로 하는, 코팅된 절삭 공구.
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| CN105714268A (zh) | 2016-06-29 |
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| JP2022126683A (ja) | 2022-08-30 |
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