KR910021189A - 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판 - Google Patents

전기회로 또는 전자회로의 성형에 사용되는 세라믹기판 Download PDF

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KR910021189A
KR910021189A KR1019910007202A KR910007202A KR910021189A KR 910021189 A KR910021189 A KR 910021189A KR 1019910007202 A KR1019910007202 A KR 1019910007202A KR 910007202 A KR910007202 A KR 910007202A KR 910021189 A KR910021189 A KR 910021189A
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ceramic
plate
aluminum
base layer
substrates used
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KR0173783B1 (ko
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히데아키 요시다
마코도 도리우미
히로가즈 다나카
마사오 우메자와
미찌오 유자와
요시로오 구로미쓰
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후지무라 마사야
미쓰비시 마테리알 가부시기가이샤
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Priority claimed from JP12175490A external-priority patent/JP2689687B2/ja
Priority claimed from JP22198890A external-priority patent/JP2679375B2/ja
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Abstract

내용 없음

Description

전기회로 또는 전자회로의 성형에 사용되는 세라믹기판
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명에 의한 세라믹기판의 구조를 나타내는 도면.

Claims (7)

  1. a) 세라믹기층(31/31a, 41/43a/43b, 51/52a/52b, 51/56/52a/52b)과, b) 전기한 세라믹기층의 한쪽면에 결합되어서 그것에 접속되는 적어도 하나의 회로부품(35/35b)을 위한 도전로를 구비하고 있는 도전성아일렌드(32/32a, 42a/44a, 53a/55a)로 구성되며, 전기한 도전성아일랜드는 알루미늄-실리콘합금, 알루미늄-게르마늄합금, 알루미늄-실리콘-마그네슘합금, 및 알루미늄-실리콘-게르마늄합금으로 이루어진 군(群)에서 선택되는 접합합금으로 전기한 세라믹기층의 한쪽면에 접합되는 것을 특징으로 하는 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판.
  2. 제1항에 있어서, 전기한 세라믹기층은 약 0.2∼20㎛범위의 산화알루미늄박층(31a)으로 피복된 질화알루미늄으로 주로 이루어진 세라믹판(31)에 의해 실현되는 것을 특징으로 하는 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판.
  3. 제2항에 있어서, 전기한 질화알루미늄은 산화아트륨과 산화칼슘으로 이루어진 군에서 선택되는 적어도 한 종류의 소결보조제를 함유하며, 전기한 소결보조제는 0.1∼10중량%의 범위인 것을 특징으로 하는 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판.
  4. 제1항에 있어서, 전기한 세라믹기층은 주로 탄화규소로 이루어진 세라믹판(41)에 의해 실현되는 것을 특징으로 하는 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판.
  5. 제1항에 있어서, 전기한 세라믹기층은 주로 질화알루미늄으로 이루어진 제1판(51)과, 주로 탄화규소로 이루어진 제2판(5a)의 조합에 의해 실현되는 것을 특징으로 하는 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판.
  6. 제5항에 있어서, 전기한 제1판(51)은 전기한 제2판이 부착되는 제1산화조면(粗面)(56)을 보유하는 것을 특징으로 하는 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판.
  7. 제6항에 있어서, 전기한 세라믹기판은 주로 탄화규소로 이루어져서 전기한 제1산화조면의 반대쪽의 제2산화조면에 부착되는 제3판(52b)과, 전기한 접합합금으로 전기한 제3판에 접합되는 다른 금속아일랜드(53b)가 더 구성되어 있는 것을 특징으로 하는 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910007202A 1990-05-02 1991-05-02 전기회로 또는 전자회로의 성형에 사용되는 세라믹기판 Expired - Lifetime KR0173783B1 (ko)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP???2-?116162? 1990-05-02
JP11616290A JP2689685B2 (ja) 1990-05-02 1990-05-02 半導体装置用軽量基板
JP2-116162 1990-05-02
JP2-121754 1990-05-11
JP???2-?121754? 1990-05-11
JP12175490A JP2689687B2 (ja) 1990-05-11 1990-05-11 Ic実装用基板
JP2-221988 1990-08-23
JP22198890A JP2679375B2 (ja) 1990-08-23 1990-08-23 Ic実装用基板
JP???2-?221988? 1990-08-23

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KR910021189A true KR910021189A (ko) 1991-12-20
KR0173783B1 KR0173783B1 (ko) 1999-05-01

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EP0693776B1 (en) * 1994-07-15 2000-05-31 Mitsubishi Materials Corporation Highly heat-radiating ceramic package
JP3866320B2 (ja) * 1995-02-09 2007-01-10 日本碍子株式会社 接合体、および接合体の製造方法
FR2763204A1 (fr) * 1997-05-12 1998-11-13 Ferraz Echangeur de chaleur pour composants electroniques et appareillages electrotechniques
AT408345B (de) 1999-11-17 2001-10-25 Electrovac Verfahren zur festlegung eines aus metall-matrix- composite-(mmc-) materiales gebildeten körpers auf einem keramischen körper
EP1498946B1 (en) 2002-04-19 2012-04-04 Mitsubishi Materials Corporation Circuit board, process for producing the same and power module
WO2008004851A1 (en) * 2006-07-06 2008-01-10 Globetronics Industries Sdn Bhd (17765-H) A hybrid substrate and method of manufacturing the same
CN119725233B (zh) * 2025-02-27 2025-06-20 山东大学 一种基于双面覆铝的碳化硅绝缘基板及其制备方法

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DE3376829D1 (en) * 1982-06-29 1988-07-07 Toshiba Kk Method for directly bonding ceramic and metal members and laminated body of the same
JPH0653253B2 (ja) * 1986-11-08 1994-07-20 松下電工株式会社 セラミツク基板の粗化法
KR0173782B1 (ko) * 1989-10-09 1999-02-01 나가노 다께시 전기 또는 전자회로의 성형에 사용되는 세라믹기판

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KR0173783B1 (ko) 1999-05-01
EP0455229A2 (en) 1991-11-06
EP0455229B1 (en) 1997-10-15
DE69127927T2 (de) 1998-06-04
EP0455229A3 (en) 1991-12-18

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