KR970077282A - 반도체 기판 세정 용액 - Google Patents
반도체 기판 세정 용액 Download PDFInfo
- Publication number
- KR970077282A KR970077282A KR1019960018521A KR19960018521A KR970077282A KR 970077282 A KR970077282 A KR 970077282A KR 1019960018521 A KR1019960018521 A KR 1019960018521A KR 19960018521 A KR19960018521 A KR 19960018521A KR 970077282 A KR970077282 A KR 970077282A
- Authority
- KR
- South Korea
- Prior art keywords
- cleaning solution
- semiconductor substrate
- substrate cleaning
- hydrofluoric acid
- ammonium fluoride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
Abstract
Description
Claims (3)
- 하기 식( I )로 표시되는 불화암모늄, 불산 및 탈이온수를 포함하는 것을 특징으로 하는 반도체 기판 세정용액.RNH3F ( I )여기에서, R은 C2∼C18탄화수소임.
- 제1항에 있어서, 상기 불화암모늄의 함유량은 상기 불산 1몰에 대하여 2내지 7몰인 것을 특징으로 하는 반도체 기판 세정 용액.
- 제1항에 있어서, 상기 탈이온수는 상기 불화암모늄 및 불산의 총중량에 대하여 100중량% 이하인 것을 특징으로 하는 반도체 기판 세정 용액.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960018521A KR100190042B1 (ko) | 1996-05-29 | 1996-05-29 | 반도체 기판 세정 용액 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960018521A KR100190042B1 (ko) | 1996-05-29 | 1996-05-29 | 반도체 기판 세정 용액 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970077282A true KR970077282A (ko) | 1997-12-12 |
| KR100190042B1 KR100190042B1 (ko) | 1999-06-01 |
Family
ID=19460081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960018521A Expired - Fee Related KR100190042B1 (ko) | 1996-05-29 | 1996-05-29 | 반도체 기판 세정 용액 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100190042B1 (ko) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6369008B1 (en) | 1999-09-20 | 2002-04-09 | Samsung Electronics Co., Ltd. | Cleaning solutions for removing contaminants from the surfaces of semiconductor substrates and cleaning methods using the same |
| KR100554515B1 (ko) * | 2003-02-27 | 2006-03-03 | 삼성전자주식회사 | 세정액 및 이를 이용한 기판의 세정방법 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102612978B1 (ko) | 2022-08-02 | 2023-12-13 | 나가세 엔지니어링 서비스 코리아(주) | 혼합 시스템 |
-
1996
- 1996-05-29 KR KR1019960018521A patent/KR100190042B1/ko not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6369008B1 (en) | 1999-09-20 | 2002-04-09 | Samsung Electronics Co., Ltd. | Cleaning solutions for removing contaminants from the surfaces of semiconductor substrates and cleaning methods using the same |
| KR100338764B1 (ko) * | 1999-09-20 | 2002-05-30 | 윤종용 | 반도체 기판의 오염 물질을 제거하기 위한 세정액 및 이를 이용한 세정방법 |
| KR100554515B1 (ko) * | 2003-02-27 | 2006-03-03 | 삼성전자주식회사 | 세정액 및 이를 이용한 기판의 세정방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100190042B1 (ko) | 1999-06-01 |
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