KR970077293A - Etching apparatus - Google Patents

Etching apparatus Download PDF

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Publication number
KR970077293A
KR970077293A KR1019960014697A KR19960014697A KR970077293A KR 970077293 A KR970077293 A KR 970077293A KR 1019960014697 A KR1019960014697 A KR 1019960014697A KR 19960014697 A KR19960014697 A KR 19960014697A KR 970077293 A KR970077293 A KR 970077293A
Authority
KR
South Korea
Prior art keywords
etching
holder
etching apparatus
moving
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019960014697A
Other languages
Korean (ko)
Inventor
이원태
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960014697A priority Critical patent/KR970077293A/en
Publication of KR970077293A publication Critical patent/KR970077293A/en
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0416—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches

Landscapes

  • Weting (AREA)

Abstract

본 발명은 식각장치에 관한 것이다.The present invention relates to an etching apparatus.

본 발명에 따른 식각장치는 : 식각 용액이 수용되어 있는 식각조와; 상기 식각조 내에서 식각되는 시편을 파지하는 홀더와; 상기 홀더를 상하이동시키는 이송수단과; 상기 이동수단을 제어하는 제어부를 구비하여 레이어의 조성, 광 루미니센스 강도, 격자 부정합, 결정성 등을 정화히 계산할 수 있다.An etching apparatus according to the present invention includes: an etching tank in which an etching solution is accommodated; A holder for holding a specimen to be etched in the etching bath; Conveying means for moving the holder up and down; And a control unit for controlling the moving means, so that the composition of the layer, the optical ruminance intensity, the lattice mismatch, the crystallinity, and the like can be calculated in a clean manner.

Description

식각장치Etching apparatus

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제2도는 본 발명에 따른 식각장치의 개요도.FIG. 2 is an outline view of an etching apparatus according to the present invention; FIG.

Claims (1)

식각 용액이 수용되어 있는 식각조와, 상기 식각조 내에서 식각되는 시편을 파지하는 홀더와, 상기 홀더를 상하 이동시키는 이송수단과; 상기 이동수단을 제어하는 제어부를 구비하는 것을 특징으로 하는 식각장치.A holder for holding a specimen to be etched in the etching bath; a conveying means for moving the holder up and down; And a control unit for controlling the moving unit. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960014697A 1996-05-06 1996-05-06 Etching apparatus Withdrawn KR970077293A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960014697A KR970077293A (en) 1996-05-06 1996-05-06 Etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960014697A KR970077293A (en) 1996-05-06 1996-05-06 Etching apparatus

Publications (1)

Publication Number Publication Date
KR970077293A true KR970077293A (en) 1997-12-12

Family

ID=66217557

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960014697A Withdrawn KR970077293A (en) 1996-05-06 1996-05-06 Etching apparatus

Country Status (1)

Country Link
KR (1) KR970077293A (en)

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