KR970077454A - 반도체 제조설비의 진공장치 - Google Patents
반도체 제조설비의 진공장치 Download PDFInfo
- Publication number
- KR970077454A KR970077454A KR1019960016481A KR19960016481A KR970077454A KR 970077454 A KR970077454 A KR 970077454A KR 1019960016481 A KR1019960016481 A KR 1019960016481A KR 19960016481 A KR19960016481 A KR 19960016481A KR 970077454 A KR970077454 A KR 970077454A
- Authority
- KR
- South Korea
- Prior art keywords
- vacuum
- solenoid valve
- connection pipe
- line
- vacuum line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims (7)
- 진공펌프로부터 진공라인으로 연결되어 웨이퍼를 흡착하도록 형성된 진공척과, 상기 진공라인에 설치되어 진공압을 선택적으로 차단하는 솔레노이드 밸브 및 상기 솔레노이드 밸브와 상기 진공펌프 사이에 설치되어 진공압이 전달되는 통로를 수동적으로 개폐시키는 수동밸브로 구성된 진공장치에 있어서, 상기 솔레노이드 밸브와 상기 진공펌프 사이의 진공라인 내에 찌꺼기를 제거하는 세정수단이 설치됨을 특징으로 하는 반도체 제조설비의 진공장치.
- 제1항에 있어서, 상기 세정수단은 상기 솔레노이드 밸브와 상기 진공펌프 사이의 진공라인에 연결 설치되는 연결관과, 상기 연결관의 다른 일단부와 연결되어 상기 솔레노이드 밸브 내부 및 상기 진공라인을 순환하여 상기 진공척의 진공통로를 통해 찌꺼지와 함께 방출되도록 소정 압력으로 세정 가스를 공급하는 가스 공급부로 구성됨을 특징으로 하는 상기 반도체 제조설비의 진공장치.
- 제2항에 있어서, 상기 세정 가스는 질소 가스임을 특징으로 하는 상기 반도체 제조설비의 진공장치.
- 제1항에 있어서, 상기 세정수단은 상기 솔레노이드 밸브와 상기 진공펌프 사이의 진공라인에 연결 설치되는 연결관과, 상기 연결관의 다른 일단부와 연결되는 상기 솔레노이드 밸브 내부 및 상기 진공라인을 순환하여 상기 진공척의 진공통로를 통해 찌꺼기와 함게 방출되도록 소정 압력으로 청정 공기를 공급하는 공기 공급부로 구성됨을 특징으로 하는 상기 반도체 제조설비의 진공장치.
- 제2항 또는 제4항에 있어서, 상기 연결관은 상기 수동밸브에 연결됨을 특징으로 하는 상기 반도체 제조설비의 진공장치.
- 제2항 또는 제4항에 있어서, 상기 연결관은 상기 솔레노이드 밸브와 상기 수동 밸브 사이의 연결관에 설치됨을 특징으로 하는 상기 반도체 제조설비의 진공장치.
- 제6항에 있어서, 상기 연결관에 수동밸브가 설치됨을 특징으로 하는 상기 반도체 제조설비의 진공장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960016481A KR100234527B1 (ko) | 1996-05-16 | 1996-05-16 | 반도체 제조설비의 진공장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960016481A KR100234527B1 (ko) | 1996-05-16 | 1996-05-16 | 반도체 제조설비의 진공장치 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970077454A true KR970077454A (ko) | 1997-12-12 |
| KR100234527B1 KR100234527B1 (ko) | 1999-12-15 |
Family
ID=19458932
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960016481A Expired - Fee Related KR100234527B1 (ko) | 1996-05-16 | 1996-05-16 | 반도체 제조설비의 진공장치 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100234527B1 (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040001423A (ko) * | 2002-06-28 | 2004-01-07 | 삼성전자주식회사 | 웨이퍼 이송장치의 로봇 암 청소장치 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR950025911A (ko) * | 1994-02-02 | 1995-09-18 | 김광호 | 포토 공정 도포장치의 드레인 포토레지스트 재사용 시스템 |
-
1996
- 1996-05-16 KR KR1019960016481A patent/KR100234527B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR100234527B1 (ko) | 1999-12-15 |
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