LT2014090A - Lazerinio pluošto skersinio profilio formuotuvas, išsaugantis bangos fronto kreivumą, ir jo panaudojimo būdas - Google Patents

Lazerinio pluošto skersinio profilio formuotuvas, išsaugantis bangos fronto kreivumą, ir jo panaudojimo būdas

Info

Publication number
LT2014090A
LT2014090A LT2014090A LT2014090A LT2014090A LT 2014090 A LT2014090 A LT 2014090A LT 2014090 A LT2014090 A LT 2014090A LT 2014090 A LT2014090 A LT 2014090A LT 2014090 A LT2014090 A LT 2014090A
Authority
LT
Lithuania
Prior art keywords
polarisation
optical element
nanogratings
txy
anisotropic layer
Prior art date
Application number
LT2014090A
Other languages
English (en)
Other versions
LT6250B (lt
Inventor
Titas Gertus
Andrejus Michailovas
Original Assignee
Uab "Altechna R&D"
Uab "Ekspla"
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uab "Altechna R&D", Uab "Ekspla" filed Critical Uab "Altechna R&D"
Priority to LT2014090A priority Critical patent/LT6250B/lt
Priority to EP15176241.6A priority patent/EP2965852B1/en
Priority to LTEP15176241.6T priority patent/LT2965852T/lt
Publication of LT2014090A publication Critical patent/LT2014090A/lt
Publication of LT6250B publication Critical patent/LT6250B/lt

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0652—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Polarising Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

Lazerinio pluošto skersinio profilio formuotuvas apima poliarizaciją transformuojantį optinį elementą ir poliarizaciją analizuojantį optinį elementą, kurie bendrai veikdami įneša lokalinius pluošto galios nuostolius bei sukuria tam tikrą pralaidumo raštą, aprašomą skirstiniu TXY. Poliarizaciją transformuojantis optinis elementas yra pagamintas tiesioginio lazerinio įrašymo metodu iš skaidrios optiškai izotropinės medžiagos, pavyzdžiui lydyto kvarco, jos tūryje suformuojant bent vieną anizotropinį sluoksnį su įrašytomis dvejopai šviesą laužiančiomis nanogardelėmis, atsirandančiomis dėl savaiminio medžiagos struktūros persitvarkymo paveikus femtosekundiniais tiesiškai poliarizuotos lazerinės spinduliuotės impulsais. Visose skersinėse anizotropinio sluoksnio padėtyse yra suformuojamas vienodas fazės vėlinimas tarp dviejų statmenų poliarizacijos dedamųjų. Skirtingai orientuojant dvejopai šviesą laužiančias nanogardeles yra pasiekiamas nevienodas poliarizaciją transformuojančio optinio elemento poveikis pluošto spindulių poliarizacijai ir reikiamas formuotuvo pralaidumo skirstinys TXY. Išradimas gali būti panaudotas didelės galios lazerinėse sistemose pageidaujamos formos pluošto skersiniam profiliui suformuoti. Transformuojant gausinį pluoštą į plokščios viršūnės pluoštą, galios naudingumo koeficientas yra ne mažesnis kaip 50%.
LT2014090A 2014-07-10 2014-07-10 Lazerinio pluošto skersinio profilio formuotuvas, išsaugantis bangos fronto kreivumą, ir jo panaudojimo būdas LT6250B (lt)

Priority Applications (3)

Application Number Priority Date Filing Date Title
LT2014090A LT6250B (lt) 2014-07-10 2014-07-10 Lazerinio pluošto skersinio profilio formuotuvas, išsaugantis bangos fronto kreivumą, ir jo panaudojimo būdas
EP15176241.6A EP2965852B1 (en) 2014-07-10 2015-07-10 Optical arrangement for laser beam shaping
LTEP15176241.6T LT2965852T (lt) 2014-07-10 2015-07-10 Lazerinio pluošto formuotuvas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LT2014090A LT6250B (lt) 2014-07-10 2014-07-10 Lazerinio pluošto skersinio profilio formuotuvas, išsaugantis bangos fronto kreivumą, ir jo panaudojimo būdas

Publications (2)

Publication Number Publication Date
LT2014090A true LT2014090A (lt) 2016-01-11
LT6250B LT6250B (lt) 2016-02-25

Family

ID=53610778

Family Applications (2)

Application Number Title Priority Date Filing Date
LT2014090A LT6250B (lt) 2014-07-10 2014-07-10 Lazerinio pluošto skersinio profilio formuotuvas, išsaugantis bangos fronto kreivumą, ir jo panaudojimo būdas
LTEP15176241.6T LT2965852T (lt) 2014-07-10 2015-07-10 Lazerinio pluošto formuotuvas

Family Applications After (1)

Application Number Title Priority Date Filing Date
LTEP15176241.6T LT2965852T (lt) 2014-07-10 2015-07-10 Lazerinio pluošto formuotuvas

Country Status (2)

Country Link
EP (1) EP2965852B1 (lt)
LT (2) LT6250B (lt)

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US11892292B2 (en) 2017-06-06 2024-02-06 RD Synergy Ltd. Methods and systems of holographic interferometry
WO2019012642A1 (ja) * 2017-07-13 2019-01-17 ギガフォトン株式会社 レーザシステム
JP6674422B2 (ja) * 2017-09-14 2020-04-01 フタバ産業株式会社 レーザ溶接装置、及び、部材の製造方法
DE102017126453A1 (de) * 2017-11-10 2019-05-16 Amphos GmbH Verfahren zur Laserverstärkung
CN108489931A (zh) * 2018-05-29 2018-09-04 天津大学 一种提高太赫兹参量振荡源测量稳定性的装置及方法
US11719531B2 (en) * 2018-10-30 2023-08-08 RD Synergy Ltd. Methods and systems of holographic interferometry
CN109541736B (zh) * 2018-11-27 2021-01-05 河海大学 一种基于多层梯度折射率透膜的布儒斯特角起偏器
CN113498488A (zh) * 2019-03-19 2021-10-12 株式会社村田制作所 光学装置
LT6781B (lt) * 2019-03-20 2020-11-25 Uab "Ekspla" Depoliarizacijos kompensatorius
JP7278135B2 (ja) * 2019-04-02 2023-05-19 キヤノン株式会社 インプリント装置および物品製造方法
GB201912337D0 (en) 2019-08-28 2019-10-09 Univ Southampton Method of forming birefringent structures in an optical element
CN110385521B (zh) * 2019-08-29 2021-03-16 西安交通大学 一种用于碳化硅快速深刻蚀的飞秒激光加工装置及方法
CN111221132B (zh) * 2019-11-20 2021-10-26 中国科学院光电技术研究所 一种扇形子孔径微透镜阵列测量涡旋光束拓扑荷数的方法和装置
CN111240012B (zh) * 2020-01-17 2021-11-16 中国工程物理研究院激光聚变研究中心 一种基于导模共振亚波长光栅编码的光束近场整形方法
DE102020204123A1 (de) * 2020-03-30 2021-09-30 Trumpf Laser- Und Systemtechnik Gmbh Verfahren zum Herstellen einer Lichtablenkungsstruktur, Verwendung eines Substrats mit einer solchen Lichtablenkungsstruktur, und Lichtablenkeinheit mit einer solchen Lichtablenkungsstruktur
CN111736423A (zh) * 2020-07-16 2020-10-02 南京诚芯集成电路技术研究院有限公司 一种基于模型仿真的激光直写光学邻近效应校正方法
CN113231750B (zh) * 2021-03-18 2022-07-19 武汉大学 一种脉冲激光打孔系统及打孔方法
CN113960826B (zh) * 2021-06-10 2023-12-22 北京航空航天大学 一种抽运激光的光束整形方法及装置
IL284740B2 (en) 2021-07-08 2023-05-01 Elbit Systems Electro Optics Elop Ltd Optical correction component for coherent beam combining systems and coherent beam combining methods and systems using an optical correction component
DE102021122754A1 (de) 2021-09-02 2023-03-02 Trumpf Laser Gmbh Vorrichtung zum Bearbeiten eines Materials
CN114077066B (zh) * 2021-10-13 2023-09-29 深圳朗光科技有限公司 扩束准直器
IL294523B2 (en) * 2022-07-04 2026-01-01 Elbit Systems Electro Optics Elop Ltd Systems, definitions, units and methods for profiling a change fund
CN115220313A (zh) * 2022-08-02 2022-10-21 苏州大学 一种激光干涉光刻系统及硅透镜阵列制备方法
CN116068775B (zh) * 2023-01-31 2024-04-26 西安交通大学 一种多波长异形光束的整形装置及方法
EP4535070A1 (en) * 2023-10-05 2025-04-09 Pasqal A device for dynamical adaptation of the phase of an input laser beam and associated system for generating trapping sites for particles
EP4632468A1 (en) 2024-04-12 2025-10-15 UAB "Ekspla" Laser beam apodizator for high-energy laser systems, high-energy laser system, and generation method of high-energy laser radiation

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Also Published As

Publication number Publication date
EP2965852B1 (en) 2017-03-08
EP2965852A1 (en) 2016-01-13
LT6250B (lt) 2016-02-25
LT2965852T (lt) 2017-06-26

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Legal Events

Date Code Title Description
BB1A Patent application published

Effective date: 20160111

FG9A Patent granted

Effective date: 20160225

MM9A Lapsed patents

Effective date: 20170710