LT2020563A - Būdas ir įrenginys, skirti lazerio pagrindo plokštės temperatūrai homogenizuoti - Google Patents

Būdas ir įrenginys, skirti lazerio pagrindo plokštės temperatūrai homogenizuoti

Info

Publication number
LT2020563A
LT2020563A LT2020563A LT2020563A LT2020563A LT 2020563 A LT2020563 A LT 2020563A LT 2020563 A LT2020563 A LT 2020563A LT 2020563 A LT2020563 A LT 2020563A LT 2020563 A LT2020563 A LT 2020563A
Authority
LT
Lithuania
Prior art keywords
base plate
laser base
laser
stainless steel
homogenizing
Prior art date
Application number
LT2020563A
Other languages
English (en)
Other versions
LT6921B (lt
Inventor
Nerijus Rusteika
Ildar GALIN
Kęstutis REGELSKIS
Nikolajus GAVRILINAS
Original Assignee
Litilit, Uab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Litilit, Uab filed Critical Litilit, Uab
Priority to LT2020563A priority Critical patent/LT6921B/lt
Priority to JP2023552397A priority patent/JP7475755B2/ja
Priority to KR1020237019424A priority patent/KR102903218B1/ko
Priority to CN202180080098.4A priority patent/CN116529969A/zh
Priority to PCT/IB2021/061557 priority patent/WO2022130146A1/en
Priority to EP21824686.6A priority patent/EP4260415A1/en
Priority to CA3197091A priority patent/CA3197091A1/en
Publication of LT2020563A publication Critical patent/LT2020563A/lt
Publication of LT6921B publication Critical patent/LT6921B/lt
Priority to US18/257,523 priority patent/US20240047931A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/0405—Conductive cooling, e.g. by heat sinks or thermo-electric elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/0407—Liquid cooling, e.g. by water
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Laser Beam Processing (AREA)

Abstract

Išradimas priklauso lazerinių technologijų sričiai, konkrečiau būdams ir įrenginiams, skirtiems lazerio pagrindo plokštės temperatūrai homogenizuoti, kai prie lazerio pagrindo plokštės tvirtinami optinių komponentų laikikliai, o lazerio pagrindo plokštė apima šilumos perdavimo priemonę. Siekiant padidinti lazerio pagrindo plokštės atsparumą lokaliems temperatūros skirtumams, užtikrinant stabilias optinių komponentų tarpusavio padėtis ir atitinkamai optinių kelių kryptingumą, medžiaga, iš kurios gamina lazerio pagrindo plokštę ir optinių komponentų laikiklius, yra nurūdijantis plienas. Šilumos perdavimo priemonės, yra įtaisytos lazerio pagrindo plokštėje ir turi žymiai didesnį šiluminį laidumą nei nerūdijantis plienas, o jų temperatūrinio plėtimosi koeficientas yra artimas nerūdijančio plieno temperatūrinio plėtimosi koeficientui. Optinių komponentų laikiklius prie minėtos lazerio pagrindo plokštės tvirtina ir paderina naudojant lazerinį taškinį suvirinimą.
LT2020563A 2020-12-14 2020-12-14 Būdas ir įrenginys, skirti lazerio pagrindo plokštės temperatūrai homogenizuoti LT6921B (lt)

Priority Applications (8)

Application Number Priority Date Filing Date Title
LT2020563A LT6921B (lt) 2020-12-14 2020-12-14 Būdas ir įrenginys, skirti lazerio pagrindo plokštės temperatūrai homogenizuoti
JP2023552397A JP7475755B2 (ja) 2020-12-14 2021-12-10 レーザベースプレートの温度を均一化するための方法及び装置
KR1020237019424A KR102903218B1 (ko) 2020-12-14 2021-12-10 레이저 베이스 플레이트의 온도를 균질화하기 위한 방법 및 디바이스
CN202180080098.4A CN116529969A (zh) 2020-12-14 2021-12-10 用于使激光器基板温度均匀化的方法和设备
PCT/IB2021/061557 WO2022130146A1 (en) 2020-12-14 2021-12-10 Method and device for homogenizing the temperature of a laser base plate
EP21824686.6A EP4260415A1 (en) 2020-12-14 2021-12-10 Method and device for homogenizing the temperature of a laser base plate
CA3197091A CA3197091A1 (en) 2020-12-14 2021-12-10 Method and device for homogenizing the temperature of a laser base plate
US18/257,523 US20240047931A1 (en) 2020-12-14 2022-12-10 Method and device for homogenizing the temperature of a laser base plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LT2020563A LT6921B (lt) 2020-12-14 2020-12-14 Būdas ir įrenginys, skirti lazerio pagrindo plokštės temperatūrai homogenizuoti

Publications (2)

Publication Number Publication Date
LT2020563A true LT2020563A (lt) 2022-06-10
LT6921B LT6921B (lt) 2022-06-27

Family

ID=75278316

Family Applications (1)

Application Number Title Priority Date Filing Date
LT2020563A LT6921B (lt) 2020-12-14 2020-12-14 Būdas ir įrenginys, skirti lazerio pagrindo plokštės temperatūrai homogenizuoti

Country Status (8)

Country Link
US (1) US20240047931A1 (lt)
EP (1) EP4260415A1 (lt)
JP (1) JP7475755B2 (lt)
KR (1) KR102903218B1 (lt)
CN (1) CN116529969A (lt)
CA (1) CA3197091A1 (lt)
LT (1) LT6921B (lt)
WO (1) WO2022130146A1 (lt)

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6043680B2 (ja) 1979-09-21 1985-09-30 日本電信電話株式会社 温度安定化レ−ザ装置
US5181214A (en) 1991-11-18 1993-01-19 Harmonic Lightwaves, Inc. Temperature stable solid-state laser package
JPH0895104A (ja) 1994-09-26 1996-04-12 Agency Of Ind Science & Technol レーザ共振装置
US6172997B1 (en) 1998-06-16 2001-01-09 Aculight Corporation Integrated semiconductor diode laser pumped solid state laser
JP2000277843A (ja) * 1999-03-23 2000-10-06 Nec Corp 半導体レーザモジュールとその製造方法
JP2002280661A (ja) * 2001-03-16 2002-09-27 Furukawa Electric Co Ltd:The レーザダイオードモジュールからなる光源
JP2005317925A (ja) * 2004-04-02 2005-11-10 Ricoh Co Ltd 光源装置、記録装置、製版装置及び画像形成装置
JP4714434B2 (ja) * 2004-07-20 2011-06-29 古河スカイ株式会社 ヒートパイプヒートシンク
US8276873B2 (en) * 2004-10-22 2012-10-02 Newport Corporation Instrumented platform for vibration-sensitive equipment
CN101505029B (zh) * 2008-02-04 2011-11-30 北京中视中科光电技术有限公司 激光器及其散热装置
FR2938323B1 (fr) * 2008-11-12 2010-12-24 Astrium Sas Dispositif de regulation thermique a reseau de caloducs capillaires interconnectes
US8213471B2 (en) 2010-01-22 2012-07-03 Integral Laser Solutions, Llc Thin disk laser operations with unique thermal management
US8669697B2 (en) * 2010-03-11 2014-03-11 Phoseon Technology, Inc. Cooling large arrays with high heat flux densities
JP2012074603A (ja) * 2010-09-29 2012-04-12 Furukawa Electric Co Ltd:The 光ファイバレーザモジュール
CN103415799B (zh) * 2011-05-18 2016-06-08 松下知识产权经营株式会社 半导体激光模块及其制造方法
US8867582B2 (en) * 2012-04-04 2014-10-21 Osram Opto Semiconductors Gmbh Laser diode assembly
CN103322541A (zh) * 2013-06-28 2013-09-25 华南理工大学 一种基于泡沫铜和微槽道的一体化散热器及其加工方法
KR102429095B1 (ko) * 2015-08-21 2022-08-04 엘지전자 주식회사 광원모듈 패키지
JP6547562B2 (ja) * 2015-09-30 2019-07-24 日亜化学工業株式会社 光源装置
JP2018174184A (ja) * 2017-03-31 2018-11-08 株式会社 エヌ・テック 冷却装置及び冷却装置を備えた照明装置
JP2020115527A (ja) * 2019-01-18 2020-07-30 パナソニック株式会社 半導体レーザ装置

Also Published As

Publication number Publication date
LT6921B (lt) 2022-06-27
KR20230119129A (ko) 2023-08-16
US20240047931A1 (en) 2024-02-08
CN116529969A (zh) 2023-08-01
EP4260415A1 (en) 2023-10-18
JP7475755B2 (ja) 2024-04-30
JP2023551069A (ja) 2023-12-06
KR102903218B1 (ko) 2025-12-22
WO2022130146A1 (en) 2022-06-23
CA3197091A1 (en) 2022-06-23

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