LU87933A1 - Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes - Google Patents

Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes Download PDF

Info

Publication number: LU87933A1
Authority: LU; Luxembourg
Prior art keywords: standard; pyrometer; temperature; zone; wafer
Prior art date: 1991-05-02

Application number

LU87933A

Other languages

English (en)

French (fr)

Inventor

Jean Marie Dilhac

Christian Ganibal

Bernard Rousset

Original Assignee

Europ Communities

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-05-02

Filing date

1991-05-02

Publication date

1992-12-15

1991-05-02 Application filed by Europ Communities filed Critical Europ Communities

1991-05-02 Priority to LU87933A priority Critical patent/LU87933A1/fr

1992-05-04 Priority to PCT/FR1992/000406 priority patent/WO1992019943A1/fr

1992-05-04 Priority to CA002108571A priority patent/CA2108571A1/fr

1992-05-04 Priority to AT92910985T priority patent/ATE115721T1/de

1992-05-04 Priority to EP92910985A priority patent/EP0582645B1/de

1992-05-04 Priority to DE69200926T priority patent/DE69200926D1/de

1992-05-04 Priority to JP4509843A priority patent/JPH06509638A/ja

1992-05-04 Priority to PT100448A priority patent/PT100448A/pt

1992-05-04 Priority to US08/140,157 priority patent/US5553939A/en

1992-07-01 Priority to IE921487A priority patent/IE72191B1/en

1992-12-15 Publication of LU87933A1 publication Critical patent/LU87933A1/fr

Links

230000003287 optical effect Effects 0.000 title claims abstract description 23
238000000034 method Methods 0.000 title claims abstract description 15
239000010410 layer Substances 0.000 claims description 39
239000011149 active material Substances 0.000 claims description 22
238000002844 melting Methods 0.000 claims description 22
230000008018 melting Effects 0.000 claims description 22
230000005855 radiation Effects 0.000 claims description 11
238000000926 separation method Methods 0.000 claims description 9
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
239000000463 material Substances 0.000 claims description 8
239000011241 protective layer Substances 0.000 claims description 8
229910052732 germanium Inorganic materials 0.000 claims description 5
GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
230000003071 parasitic effect Effects 0.000 claims description 4
229910052710 silicon Inorganic materials 0.000 claims description 4
239000010703 silicon Substances 0.000 claims description 4
229910052814 silicon oxide Inorganic materials 0.000 claims description 4
229910052581 Si3N4 Inorganic materials 0.000 claims description 3
239000007788 liquid Substances 0.000 claims description 3
230000015654 memory Effects 0.000 claims description 3
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
239000007787 solid Substances 0.000 claims description 3
238000001914 filtration Methods 0.000 claims description 2
235000012431 wafers Nutrition 0.000 description 34
238000010438 heat treatment Methods 0.000 description 5
238000005259 measurement Methods 0.000 description 5
238000011065 in-situ storage Methods 0.000 description 4
230000006870 function Effects 0.000 description 3
238000001514 detection method Methods 0.000 description 2
238000009434 installation Methods 0.000 description 2
239000010453 quartz Substances 0.000 description 2
JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
PMVSDNDAUGGCCE-TYYBGVCCSA-L Ferrous fumarate Chemical compound [Fe+2].[O-]C(=O)\C=C\C([O-])=O PMVSDNDAUGGCCE-TYYBGVCCSA-L 0.000 description 1
229910001218 Gallium arsenide Inorganic materials 0.000 description 1
238000010276 construction Methods 0.000 description 1
230000008021 deposition Effects 0.000 description 1
239000000428 dust Substances 0.000 description 1
238000009413 insulation Methods 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
239000012768 molten material Substances 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
238000005476 soldering Methods 0.000 description 1
238000001228 spectrum Methods 0.000 description 1
230000001360 synchronised effect Effects 0.000 description 1
230000008685 targeting Effects 0.000 description 1
239000012808 vapor phase Substances 0.000 description 1

Classifications

- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
- G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
- G01J5/53—Reference sources, e.g. standard lamps; Black bodies

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Testing Or Measuring Of Semiconductors Or The Like (AREA)
Radiation Pyrometers (AREA)

LU87933A 1991-05-02 1991-05-02 Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes LU87933A1 (fr)

Priority Applications (10)

Application Number	Priority Date	Filing Date	Title
LU87933A LU87933A1 (fr)	1991-05-02	1991-05-02	Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes
PCT/FR1992/000406 WO1992019943A1 (fr)	1991-05-02	1992-05-04	Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes
CA002108571A CA2108571A1 (fr)	1991-05-02	1992-05-04	Methode et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes
AT92910985T ATE115721T1 (de)	1991-05-02	1992-05-04	Verfahren und anordnung zum eichen eines optischen pyrometers und standardplättchen dafür.
EP92910985A EP0582645B1 (de)	1991-05-02	1992-05-04	Verfahren und anordnung zum eichen eines optischen pyrometers und standardplättchen dafür
DE69200926T DE69200926D1 (de)	1991-05-02	1992-05-04	Verfahren und anordnung zum eichen eines optischen pyrometers und standardplättchen dafür.
JP4509843A JPH06509638A (ja)	1991-05-02	1992-05-04	光高温計の較正方法及びそのための装置、並びにこれに用いられる標準的なチップ
PT100448A PT100448A (pt)	1991-05-02	1992-05-04	Processo e dispositivo de afericao de um pirometro optico e placas de calibracao correspondentes
US08/140,157 US5553939A (en)	1991-05-02	1992-05-04	Method and device for calibrating an optical pyrometer and associated reference wafers
IE921487A IE72191B1 (en)	1991-05-02	1992-07-01	Method and device for calibrating an optical pyrometer and corresponding calibration wafers

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
LU87933A LU87933A1 (fr)	1991-05-02	1991-05-02	Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes

Publications (1)

Publication Number	Publication Date
LU87933A1 true LU87933A1 (fr)	1992-12-15

Family

ID=19731294

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
LU87933A LU87933A1 (fr)	1991-05-02	1991-05-02	Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes

Country Status (10)

Country	Link
US (1)	US5553939A (de)
EP (1)	EP0582645B1 (de)
JP (1)	JPH06509638A (de)
AT (1)	ATE115721T1 (de)
CA (1)	CA2108571A1 (de)
DE (1)	DE69200926D1 (de)
IE (1)	IE72191B1 (de)
LU (1)	LU87933A1 (de)
PT (1)	PT100448A (de)
WO (1)	WO1992019943A1 (de)

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DE19513951C2 (de) *	1995-04-12	2002-04-11	Zinser Textilmaschinen Gmbh	Verfahren für das Überwachen einer temperaturgeregelten Heizvorrichtung
IL117951A (en) *	1995-09-06	1999-09-22	3T True Temperature Technologi	Method and apparatus for true temperature determination
US5938335A (en) *	1996-04-08	1999-08-17	Applied Materials, Inc.	Self-calibrating temperature probe
US6536944B1 (en) *	1996-10-09	2003-03-25	Symyx Technologies, Inc.	Parallel screen for rapid thermal characterization of materials
US5988874A (en) *	1997-09-05	1999-11-23	Advanced Micro Devices, Inc.	Black body reference for RTA
KR100266328B1 (ko) *	1997-12-23	2000-10-02	김규현	티타늄실리사이드형성방법및이를이용한티타늄실리사이드의형성온도보정방법
DE19934299C2 (de) *	1998-07-28	2003-04-03	Steag Ast Elektronik Gmbh	Verfahren und Vorrichtung zum Kalibrieren von emissivitätsunabhängigen Temperaturmessungen
EP1101085B1 (de)	1998-07-28	2002-10-09	STEAG RTP Systems GmbH	Verfahren und vorrichtung zum kalibrieren von emissivitätsunabhängigen temperaturmessungen
US6293696B1 (en) *	1999-05-03	2001-09-25	Steag Rtp Systems, Inc.	System and process for calibrating pyrometers in thermal processing chambers
DE19922278B4 (de) *	1999-05-11	2004-02-12	Virtualfab Technologie Gmbh	Verfahren zur Bestimmung des Emissions- bzw. Absorptionsgrades von Objekten
KR20030044378A (ko) *	2001-11-29	2003-06-09	주식회사 포스코	반사정보를 이용한 방사율 보정 온도계
US7445382B2 (en) *	2001-12-26	2008-11-04	Mattson Technology Canada, Inc.	Temperature measurement and heat-treating methods and system
US7052180B2 (en) *	2002-01-04	2006-05-30	Kelvin Shih	LED junction temperature tester
AU2003287837A1 (en) *	2002-12-20	2004-07-14	Vortek Industries Ltd	Methods and systems for supporting a workpiece and for heat-treating the workpiece
DE102004018578B4 (de) *	2004-04-16	2007-02-22	Siemens Ag	Verfahren und Vorrichtung zur Erfassung eines Verschmutzungsgrades eines betriebenen Umrichtergerätes
JP4683869B2 (ja) *	2004-07-08	2011-05-18	独立行政法人理化学研究所	半導体デバイスの故障診断方法と装置
US7275861B2 (en) *	2005-01-31	2007-10-02	Veeco Instruments Inc.	Calibration wafer and method of calibrating in situ temperatures
DE102007042779B4 (de) *	2007-09-07	2009-07-09	Mattson Thermal Products Gmbh	Kalibrationssubstrat und -verfahren
US8523427B2 (en) *	2008-02-27	2013-09-03	Analog Devices, Inc.	Sensor device with improved sensitivity to temperature variation in a semiconductor substrate
WO2009137940A1 (en)	2008-05-16	2009-11-19	Mattson Technology Canada, Inc.	Workpiece breakage prevention method and apparatus
EP2365307B1 (de) *	2009-05-12	2012-07-18	LayTec Aktiengesellschaft	Verfahren zur Kalibrierung eines Pyrometers, Verfahren zur Bestimmung der Temperatur eines Halbleiterwafers und System zur Bestimmung der Temperatur eines Halbleiterwafers
JP5590454B2 (ja) *	2010-10-05	2014-09-17	株式会社リコー	電気素子、集積素子及び電子回路
JP5590460B2 (ja) *	2010-12-08	2014-09-17	株式会社リコー	露点計測装置および気体特性測定装置
JP5590459B2 (ja) *	2010-12-08	2014-09-17	株式会社リコー	露点計測装置および気体特性測定装置
JP5590461B2 (ja) *	2010-12-08	2014-09-17	株式会社リコー	露点計測装置および気体特性測定装置
US8749629B2 (en) *	2011-02-09	2014-06-10	Siemens Energy, Inc.	Apparatus and method for temperature mapping a turbine component in a high temperature combustion environment

Family Cites Families (8)

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Publication number	Priority date	Publication date	Assignee	Title
US4475823A (en) *	1982-04-09	1984-10-09	Piezo Electric Products, Inc.	Self-calibrating thermometer
US4502792A (en) *	1982-12-20	1985-03-05	Shell Oil Company	Apparatus for calibrating a pyrometer
DE3601537A1 (de) *	1986-01-20	1987-07-23	Messerschmitt Boelkow Blohm	Verfahren zum radiometrischen kalibrieren optoelektronischer sensoren
GB2186968B (en) *	1986-02-20	1990-03-21	Metal Box Co Ltd	Temperature monitoring systems
US4854727A (en) *	1987-10-26	1989-08-08	Ag Processing Technologies, Inc.	Emissivity calibration apparatus and method
US4969748A (en) *	1989-04-13	1990-11-13	Peak Systems, Inc.	Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing
US5221142A (en) *	1991-05-20	1993-06-22	Peak Systems, Inc.	Method and apparatus for temperature measurement using thermal expansion
US5265957A (en) *	1992-08-11	1993-11-30	Texas Instruments Incorporated	Wireless temperature calibration device and method

1991
- 1991-05-02 LU LU87933A patent/LU87933A1/fr unknown
1992
- 1992-05-04 US US08/140,157 patent/US5553939A/en not_active Expired - Fee Related
- 1992-05-04 DE DE69200926T patent/DE69200926D1/de not_active Expired - Lifetime
- 1992-05-04 EP EP92910985A patent/EP0582645B1/de not_active Expired - Lifetime
- 1992-05-04 CA CA002108571A patent/CA2108571A1/fr not_active Abandoned
- 1992-05-04 PT PT100448A patent/PT100448A/pt not_active Application Discontinuation
- 1992-05-04 AT AT92910985T patent/ATE115721T1/de not_active IP Right Cessation
- 1992-05-04 WO PCT/FR1992/000406 patent/WO1992019943A1/fr not_active Ceased
- 1992-05-04 JP JP4509843A patent/JPH06509638A/ja active Pending
- 1992-07-01 IE IE921487A patent/IE72191B1/en not_active IP Right Cessation

Also Published As

Publication number	Publication date
EP0582645A1 (de)	1994-02-16
IE921487A1 (en)	1992-11-04
PT100448A (pt)	1994-04-29
EP0582645B1 (de)	1994-12-14
JPH06509638A (ja)	1994-10-27
DE69200926D1 (de)	1995-01-26
IE72191B1 (en)	1997-03-26
US5553939A (en)	1996-09-10
CA2108571A1 (fr)	1992-11-03
WO1992019943A1 (fr)	1992-11-12
ATE115721T1 (de)	1994-12-15

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FR2553910A1 (fr)	1985-04-26	Detecteur thermoelectrique d'alignement d'un faisceau laser et dispositif d'asservissement utilisant ce detecteur, pour l'alignement automatique d'un faisceau laser
FR2763699A1 (fr)	1998-11-27	Detecteur-optoelectronique
FR2491615A1 (fr)	1982-04-09	Procede de mesure optoelectronique et dispositifs pour la determination de la qualite de surfaces a reflexion diffuse
EP0712009A1 (de)	1996-05-15	Integriertes Winkelabweichungs-Messsystem
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WO2000009978A1 (fr)	2000-02-24	Appareil de mesure de la longueur d'onde d'un faisceau lumineux
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