MD3174F1 - Compozit fotosensibil din semiconductor calcogenic amorf si polimer organic - Google Patents

Compozit fotosensibil din semiconductor calcogenic amorf si polimer organic Download PDF

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Publication number
MD3174F1
MD3174F1 MDA20060023A MD20060023A MD3174F1 MD 3174 F1 MD3174 F1 MD 3174F1 MD A20060023 A MDA20060023 A MD A20060023A MD 20060023 A MD20060023 A MD 20060023A MD 3174 F1 MD3174 F1 MD 3174F1
Authority
MD
Moldova
Prior art keywords
chalcogenide semiconductor
organic polymer
photosensitive composite
amorphous chalcogenide
composite
Prior art date
Application number
MDA20060023A
Other languages
English (en)
Other versions
MD3174G2 (ro
Inventor
Andrei Andries
Valerii Bivol
Svetlana BUZURNIUC
Alexei Mesalchin
Stefan Robu
Victor VERLAN
Original Assignee
Centrul De Optoelectronica Al Institutului De Fizica Aplicata Al Academiei De Stiinte A Republicii Moldova
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centrul De Optoelectronica Al Institutului De Fizica Aplicata Al Academiei De Stiinte A Republicii Moldova filed Critical Centrul De Optoelectronica Al Institutului De Fizica Aplicata Al Academiei De Stiinte A Republicii Moldova
Priority to MDA20060023A priority Critical patent/MD3174G2/ro
Publication of MD3174F1 publication Critical patent/MD3174F1/ro
Publication of MD3174G2 publication Critical patent/MD3174G2/ro

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Abstract

Inventia se refera la compozite fotosensibile utilizate pentru fabricarea senzorilor optici, purtatorilor de imagini optice sau informatiei holografice. Compozitul fotosensibil din semiconductor calcogenic amorf si polimer organic se obtine prin amestecarea solutiilor de As2Se3 sau As2S3 in monoetanolamina cu solutia hidro-alcoolica de alcool polivinilic si eliminarea solventilor. Compozitia finala a compozitului este urmatoarea, % de masa:semiconductor calcogenic 17,0…83,0liant organic restul.Rezultatul consta in obtinerea compozitelor cu fotosensibilitateinalta.
MDA20060023A 2006-01-05 2006-01-05 Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic MD3174G2 (ro)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDA20060023A MD3174G2 (ro) 2006-01-05 2006-01-05 Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDA20060023A MD3174G2 (ro) 2006-01-05 2006-01-05 Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic

Publications (2)

Publication Number Publication Date
MD3174F1 true MD3174F1 (ro) 2006-10-31
MD3174G2 MD3174G2 (ro) 2007-05-31

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ID=37397481

Family Applications (1)

Application Number Title Priority Date Filing Date
MDA20060023A MD3174G2 (ro) 2006-01-05 2006-01-05 Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic

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MD (1) MD3174G2 (ro)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD3634G2 (ro) * 2007-05-23 2009-01-31 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a compozitului fotosensibil în bază de semiconductor calcogenic amorf compus şi polimer organic

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD214Z (ro) * 2009-04-24 2010-12-31 Государственный Университет Молд0 Purtător fototermoplastic pentru înregistrarea informaţiei optice
MD193Z (ro) * 2009-06-04 2010-11-30 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a peliculei polisulfidice

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD3634G2 (ro) * 2007-05-23 2009-01-31 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a compozitului fotosensibil în bază de semiconductor calcogenic amorf compus şi polimer organic

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Publication number Publication date
MD3174G2 (ro) 2007-05-31

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FG4A Patent for invention issued
KA4A Patent for invention lapsed due to non-payment of fees (with right of restoration)
MM4A Patent for invention definitely lapsed due to non-payment of fees