MD3174F1 - Compozit fotosensibil din semiconductor calcogenic amorf si polimer organic - Google Patents

Compozit fotosensibil din semiconductor calcogenic amorf si polimer organic Download PDF

Info

Publication number
MD3174F1
MD3174F1 MDA20060023A MD20060023A MD3174F1 MD 3174 F1 MD3174 F1 MD 3174F1 MD A20060023 A MDA20060023 A MD A20060023A MD 20060023 A MD20060023 A MD 20060023A MD 3174 F1 MD3174 F1 MD 3174F1
Authority
MD
Moldova
Prior art keywords
chalcogenide semiconductor
organic polymer
photosensitive composite
amorphous chalcogenide
composite
Prior art date
Application number
MDA20060023A
Other languages
English (en)
Other versions
MD3174G2 (ro
Inventor
Andrei Andries
Valerii Bivol
Svetlana BUZURNIUC
Alexei Mesalchin
Stefan Robu
Victor VERLAN
Original Assignee
Centrul De Optoelectronica Al Institutului De Fizica Aplicata Al Academiei De Stiinte A Republicii Moldova
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centrul De Optoelectronica Al Institutului De Fizica Aplicata Al Academiei De Stiinte A Republicii Moldova filed Critical Centrul De Optoelectronica Al Institutului De Fizica Aplicata Al Academiei De Stiinte A Republicii Moldova
Priority to MDA20060023A priority Critical patent/MD3174G2/ro
Publication of MD3174F1 publication Critical patent/MD3174F1/ro
Publication of MD3174G2 publication Critical patent/MD3174G2/ro

Links

Landscapes

  • Holo Graphy (AREA)

Abstract

Inventia se refera la compozite fotosensibile utilizate pentru fabricarea senzorilor optici, purtatorilor de imagini optice sau informatiei holografice. Compozitul fotosensibil din semiconductor calcogenic amorf si polimer organic se obtine prin amestecarea solutiilor de As2Se3 sau As2S3 in monoetanolamina cu solutia hidro-alcoolica de alcool polivinilic si eliminarea solventilor. Compozitia finala a compozitului este urmatoarea, % de masa:semiconductor calcogenic 17,0…83,0liant organic restul.Rezultatul consta in obtinerea compozitelor cu fotosensibilitateinalta.
MDA20060023A 2006-01-05 2006-01-05 Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic MD3174G2 (ro)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDA20060023A MD3174G2 (ro) 2006-01-05 2006-01-05 Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDA20060023A MD3174G2 (ro) 2006-01-05 2006-01-05 Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic

Publications (2)

Publication Number Publication Date
MD3174F1 true MD3174F1 (ro) 2006-10-31
MD3174G2 MD3174G2 (ro) 2007-05-31

Family

ID=37397481

Family Applications (1)

Application Number Title Priority Date Filing Date
MDA20060023A MD3174G2 (ro) 2006-01-05 2006-01-05 Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic

Country Status (1)

Country Link
MD (1) MD3174G2 (ro)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD3634G2 (ro) * 2007-05-23 2009-01-31 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a compozitului fotosensibil în bază de semiconductor calcogenic amorf compus şi polimer organic

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD214Z (ro) * 2009-04-24 2010-12-31 Государственный Университет Молд0 Purtător fototermoplastic pentru înregistrarea informaţiei optice
MD193Z (ro) * 2009-06-04 2010-11-30 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a peliculei polisulfidice

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD3634G2 (ro) * 2007-05-23 2009-01-31 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a compozitului fotosensibil în bază de semiconductor calcogenic amorf compus şi polimer organic

Also Published As

Publication number Publication date
MD3174G2 (ro) 2007-05-31

Similar Documents

Publication Publication Date Title
TW201129529A (en) Fluorourethanes as additives in a photopolymer formulation
AR060091A1 (es) Procedimiento para preparar lentes oftalmicas
TW200636384A (en) Half-tone stacked film, photomask-blank, photomask and fabrication method thereof
TW200726829A (en) Functionalized photoreactive compounds
BRPI0519106A2 (pt) compostos, uso destes, processo para sua fabricaÇço, composiÇÕes farmacÊuticas, mÉtodo para o tratamento e/ou profilaxia de doenÇas que sço associadas com a dpp-iv
NO20085357L (no) Fremgangsmate for fremstilling av renset hydrokinon og dannelse av det samme
DE602007005987D1 (de) Harzzusammensetzung und ihre verwendung
WO2013071174A3 (en) Styrene-siloxane triblock copolymers as membranes for selective transport of alcohols and other organic compounds in aqueous mixtures
ATE535582T1 (de) Beschichtungszusammensetzung mit polydextrose, verfahren zu ihrer herstellung und ihre verwendung zur beschichtung einnehmbarer feststoffe
MD3174F1 (ro) Compozit fotosensibil din semiconductor calcogenic amorf si polimer organic
TW200622501A (en) Polymer for forming anti-reflective coating layer
WO2011021561A9 (ja) レリーフ印刷版の製版方法及びレリーフ印刷版製版用リンス液
MD3888G2 (ro) Procedeu de obţinere a nanocompozitului fotoluminescent din CdS şi polimeri organici
JP2011530484A5 (ro)
TW200641073A (en) Polymer for forming anti-reflective coating layer
MY153129A (en) Composition for formation of antireflective film, and pattern formation method using the composition
BRPI1007233A2 (pt) "processo para purificar 1, 2-propanodiol para remover impurezas por destilação, uso de 1, 2-propanodiol purificado, e, dispositivo para realizar o processo"
MD3327G2 (ro) Procedeu de obţinere a compozitului fotosensibil din semiconductor calcogenic amorf şi polimer organic
ATE252589T1 (de) Aluminosiloxanverbindungen und verfahren zu ihrer herstellung
WO2008138609A3 (de) Reflektiv beschichtetes halbleiterbauelement, verfahren zu dessen herstellung sowie dessen verwendung
TW200634110A (en) Polymer for forming anti-reflective coating layer
ATE373026T1 (de) Abformzusammensetzung zur herstellung von präzisionsoptik
ATE523484T1 (de) Optische lösung a us 3-carbamoylmethyl-5-methyl- hexansäure
JP2006321794A5 (ro)
WO2007052301A3 (en) Process for the preparation of irbesartan

Legal Events

Date Code Title Description
FG4A Patent for invention issued
KA4A Patent for invention lapsed due to non-payment of fees (with right of restoration)
MM4A Patent for invention definitely lapsed due to non-payment of fees