MD3789F1 - Process for random microlaser obtaining - Google Patents

Process for random microlaser obtaining Download PDF

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Publication number
MD3789F1
MD3789F1 MDA20080114A MD20080114A MD3789F1 MD 3789 F1 MD3789 F1 MD 3789F1 MD A20080114 A MDA20080114 A MD A20080114A MD 20080114 A MD20080114 A MD 20080114A MD 3789 F1 MD3789 F1 MD 3789F1
Authority
MD
Moldova
Prior art keywords
random
microlaser
obtaining
source
temperature
Prior art date
Application number
MDA20080114A
Other languages
Romanian (ro)
Other versions
MD3789G2 (en
Inventor
Veaceslav Ursachi
Emil Rusu
Gheorghe Stratan
Alexandru Burlacu
Ion Tighineanu
Original Assignee
Institutul De Fizica Aplicata Al Academiei De Stiinte A Moldovei
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institutul De Fizica Aplicata Al Academiei De Stiinte A Moldovei filed Critical Institutul De Fizica Aplicata Al Academiei De Stiinte A Moldovei
Priority to MDA20080114A priority Critical patent/MD3789G2/en
Publication of MD3789F1 publication Critical patent/MD3789F1/en
Publication of MD3789G2 publication Critical patent/MD3789G2/en

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  • Investigating Or Analysing Biological Materials (AREA)
  • Luminescent Compositions (AREA)

Abstract

Inventia se refera la optoelectronica, in specialla microlasere aleatorii, care pot fi utilizate in spectroscopie, diagnostica medicala, producerea display-urilor etc. Procedeul de obtinere a microlaserului aleatoriu se efectueaza prin transportul intr-un flux de argon/oxigen de la o sursa formatadintr-un amestec de pulberi de oxid de zinc si carbon spre un suport amplasat in fata sursei intr-osoba orizontala cu un gradient de temperatura de 2…100°C/cm descrescator spre suportul mentionat, totodata temperatura sursei se mentine in intervalul 1020…1100°C.The invention relates to optoelectronics, in particular random microles, which can be used in spectroscopy, medical diagnostics, production of displays, etc. The process of obtaining the random microlaser is carried out by transporting a stream of argon / oxygen from a source formed by a mixture of zinc oxide and carbon powders to a support located in front of the source in a horizontal osoba with a temperature gradient. of 2… 100 ° C / cm decreasing to the mentioned support, at the same time the source temperature is maintained in the range 1020… 1100 ° C.

MDA20080114A 2008-04-24 2008-04-24 Process for random microlaser obtaining MD3789G2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDA20080114A MD3789G2 (en) 2008-04-24 2008-04-24 Process for random microlaser obtaining

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDA20080114A MD3789G2 (en) 2008-04-24 2008-04-24 Process for random microlaser obtaining

Publications (2)

Publication Number Publication Date
MD3789F1 true MD3789F1 (en) 2008-12-31
MD3789G2 MD3789G2 (en) 2009-07-31

Family

ID=40255090

Family Applications (1)

Application Number Title Priority Date Filing Date
MDA20080114A MD3789G2 (en) 2008-04-24 2008-04-24 Process for random microlaser obtaining

Country Status (1)

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MD (1) MD3789G2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000038282A2 (en) * 1998-12-01 2000-06-29 The Regents Of The University Of Michigan Ultrafine powders and their use as lasing media
US6586095B2 (en) * 2001-01-12 2003-07-01 Georgia Tech Research Corp. Semiconducting oxide nanostructures

Also Published As

Publication number Publication date
MD3789G2 (en) 2009-07-31

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FG4A Patent for invention issued
KA4A Patent for invention lapsed due to non-payment of fees (with right of restoration)
MM4A Patent for invention definitely lapsed due to non-payment of fees