MX2016005757A - Ajuste de la fabricacion de elementos computacionales integrados. - Google Patents

Ajuste de la fabricacion de elementos computacionales integrados.

Info

Publication number
MX2016005757A
MX2016005757A MX2016005757A MX2016005757A MX2016005757A MX 2016005757 A MX2016005757 A MX 2016005757A MX 2016005757 A MX2016005757 A MX 2016005757A MX 2016005757 A MX2016005757 A MX 2016005757A MX 2016005757 A MX2016005757 A MX 2016005757A
Authority
MX
Mexico
Prior art keywords
ice
design
layers
performance
target
Prior art date
Application number
MX2016005757A
Other languages
English (en)
Other versions
MX362272B (es
Inventor
michael jones Christopher
l perkins David
Paul Freese Robert
Neal Gardner Richard
M Price James
B Nayak Aditya
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016005757A publication Critical patent/MX2016005757A/es
Publication of MX362272B publication Critical patent/MX362272B/es

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level
    • G06F30/398—Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N2021/8411—Application to online plant, process monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Laminated Bodies (AREA)

Abstract

Las técnicas incluyen recibir un diseño de un elemento computacional integrado (ICE) que incluye (1) descripción de un sustrato y múltiples capas, sus espesores e índices de refracción diana respectivos, donde los índices de refracción de las capas adyacentes son diferentes entre sí, y donde un ICE hipotético fabricado según el diana de ICE está relacionado con una característica de una muestra, y (2) indicación de un rendimiento de ICE diana; formar una o más de las capas de un ICE en función del diseño de ICE; en respuesta a la determinación de que un rendimiento de ICE no cumple con el rendimiento diana si el ICE que tiene las capas formadas se completa en base al diseño de ICE recibido, actualizar el diseño de ICE a una nueva cantidad total de capas y nuevos espesores de capa diana, de manera que el rendimiento del ICE terminado en base al diseño de ICE actualizado cumple con el rendimiento diana; y formar algunas de las capas posteriores según el diseño de ICE actualizado.
MX2016005757A 2013-12-24 2013-12-24 Ajuste de la fabricacion de elementos computacionales integrados. MX362272B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2013/077683 WO2015099706A1 (en) 2013-12-24 2013-12-24 Adjusting fabrication of integrated computational elements

Publications (2)

Publication Number Publication Date
MX2016005757A true MX2016005757A (es) 2017-05-11
MX362272B MX362272B (es) 2019-01-10

Family

ID=53479372

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016005757A MX362272B (es) 2013-12-24 2013-12-24 Ajuste de la fabricacion de elementos computacionales integrados.

Country Status (4)

Country Link
US (1) US9495505B2 (es)
EP (1) EP2909763A4 (es)
MX (1) MX362272B (es)
WO (1) WO2015099706A1 (es)

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WO2017204814A1 (en) 2016-05-27 2017-11-30 Halliburton Energy Services, Inc. Reverse design technique for optical processing elements
US11717910B2 (en) 2020-11-03 2023-08-08 General Electric Company Monitoring operation of electron beam additive manufacturing with piezoelectric crystals

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Also Published As

Publication number Publication date
EP2909763A1 (en) 2015-08-26
US20160196380A1 (en) 2016-07-07
US9495505B2 (en) 2016-11-15
EP2909763A4 (en) 2015-12-23
MX362272B (es) 2019-01-10
WO2015099706A1 (en) 2015-07-02

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