MX2021007760A - Placa de aleacion de cobre, placa de aleacion de cobre con pelicula de recubrimiento unida y metodos respectivos para la fabrica cion de estos productos. - Google Patents

Placa de aleacion de cobre, placa de aleacion de cobre con pelicula de recubrimiento unida y metodos respectivos para la fabrica cion de estos productos.

Info

Publication number
MX2021007760A
MX2021007760A MX2021007760A MX2021007760A MX2021007760A MX 2021007760 A MX2021007760 A MX 2021007760A MX 2021007760 A MX2021007760 A MX 2021007760A MX 2021007760 A MX2021007760 A MX 2021007760A MX 2021007760 A MX2021007760 A MX 2021007760A
Authority
MX
Mexico
Prior art keywords
copper alloy
alloy plate
concentration
products
manufacturing
Prior art date
Application number
MX2021007760A
Other languages
English (en)
Inventor
Kazunari Maki
Kenji Kubota
Shinichi Funaki
Naoki Miyashima
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2019114466A external-priority patent/JP6863409B2/ja
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of MX2021007760A publication Critical patent/MX2021007760A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C25D5/505—After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/22—Polishing of heavy metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C13/00—Alloys based on tin
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12903—Cu-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Una placa de aleación de cobre incluyendo del 0.3% en masa o más y del 1.2% en masa o menos de Mg, del 0.001% en masa o más y del 0.2% en masa o menos de P, y el resto de Cu con impurezas inevitables en una parte central del grosor en una dirección del grosor de la placa; la concentración de Mg en una superficie de la placa es del 30% o menos de la concentración total de Mg en la parte central del grosor; una parte de capa superficial teniendo una profundidad desde la superficie de la placa hasta el sitio donde es proporcionada una concentración total del Mg del 90% de la concentración total de Mg; y en la parte de la capa superficial, la concentración de Mg aumenta a partir de la superficie de la placa hacia la parte central del grosor con un gradiente de concentración del 1.8% en masa/µm o más y del 50% en masa/µm o menos.
MX2021007760A 2018-12-26 2019-12-18 Placa de aleacion de cobre, placa de aleacion de cobre con pelicula de recubrimiento unida y metodos respectivos para la fabrica cion de estos productos. MX2021007760A (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018243431 2018-12-26
JP2019114466A JP6863409B2 (ja) 2018-12-26 2019-06-20 銅合金板、めっき皮膜付銅合金板及びこれらの製造方法
PCT/JP2019/049547 WO2020137726A1 (ja) 2018-12-26 2019-12-18 銅合金板、めっき皮膜付銅合金板及びこれらの製造方法

Publications (1)

Publication Number Publication Date
MX2021007760A true MX2021007760A (es) 2021-08-05

Family

ID=71129119

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2021007760A MX2021007760A (es) 2018-12-26 2019-12-18 Placa de aleacion de cobre, placa de aleacion de cobre con pelicula de recubrimiento unida y metodos respectivos para la fabrica cion de estos productos.

Country Status (5)

Country Link
US (1) US11781234B2 (es)
FI (1) FI3904549T3 (es)
MX (1) MX2021007760A (es)
MY (1) MY203803A (es)
WO (1) WO2020137726A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7116870B2 (ja) * 2019-03-29 2022-08-12 三菱マテリアル株式会社 銅合金板、めっき皮膜付銅合金板及びこれらの製造方法
JP7443737B2 (ja) * 2019-12-10 2024-03-06 三菱マテリアル株式会社 銅合金板、めっき皮膜付銅合金板及びこれらの製造方法
JP7604778B2 (ja) * 2020-03-19 2024-12-24 三菱マテリアル株式会社 Ｃｕ－Ｎｉ－Ｓｉ系銅合金板、めっき皮膜付Ｃｕ－Ｎｉ－Ｓｉ系銅合金板及びこれらの製造方法
KR20250145049A (ko) * 2023-02-06 2025-10-13 와이케이케이 가부시끼가이샤 도금재, 및 파스너 스트링거

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3796784B2 (ja) 1995-12-01 2006-07-12 三菱伸銅株式会社 コネクタ製造用銅合金薄板およびその薄板で製造したコネクタ
DE60211808T2 (de) 2001-07-31 2006-10-19 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe Plattierte Kupferlegierung und Verfahren zu ihre Herstellung
JP4090302B2 (ja) 2001-07-31 2008-05-28 株式会社神戸製鋼所 接続部品成形加工用導電材料板
JP4024244B2 (ja) 2004-12-27 2007-12-19 株式会社神戸製鋼所 接続部品用導電材料及びその製造方法
EP1788585B1 (en) 2004-09-10 2015-02-18 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Conductive material for connecting part and method for fabricating the conductive material
JP4402132B2 (ja) 2007-05-18 2010-01-20 日鉱金属株式会社 リフローＳｎめっき材及びそれを用いた電子部品
JP4516154B1 (ja) 2009-12-23 2010-08-04 三菱伸銅株式会社 Ｃｕ−Ｍｇ−Ｐ系銅合金条材及びその製造方法
JP5054160B2 (ja) 2010-06-28 2012-10-24 三菱伸銅株式会社 Ｃｕ−Ｍｇ−Ｐ系銅合金条材及びその製造方法
JP2013218866A (ja) 2012-04-09 2013-10-24 Auto Network Gijutsu Kenkyusho:Kk 端子付き電線及びその製造方法
JP5908796B2 (ja) 2012-06-05 2016-04-26 三菱伸銅株式会社 機械的な成形性に優れたＣｕ−Ｍｇ−Ｐ系銅合金板及びその製造方法
JP6055242B2 (ja) 2012-08-30 2016-12-27 三菱伸銅株式会社 Ｃｕ−Ｍｇ−Ｐ系銅合金Ｓｎめっき板及びその製造方法
JP6001420B2 (ja) 2012-11-07 2016-10-05 株式会社フジクラ Ｃｕ−Ｍｇ合金体、Ｃｕ−Ｍｇ合金体の製造方法および伸線材の製造方法
JP2015133306A (ja) 2014-01-16 2015-07-23 株式会社オートネットワーク技術研究所 コネクタ用電気接点材料及びその製造方法
JP2016166397A (ja) * 2015-03-10 2016-09-15 三菱マテリアル株式会社 錫めっき銅合金端子材及びその製造方法並びに電線端末部構造
US11203806B2 (en) 2016-03-30 2021-12-21 Mitsubishi Materials Corporation Copper alloy for electronic and electrical equipment, copper alloy plate strip for electronic and electrical equipment, component for electronic and electrical equipment, terminal, busbar, and movable piece for relay
JP6226098B2 (ja) 2016-03-30 2017-11-08 三菱マテリアル株式会社 電子・電気機器用銅合金、電子・電気機器用銅合金板条材、電子・電気機器用部品、端子、バスバー、及び、リレー用可動片
JP6226097B2 (ja) 2016-03-30 2017-11-08 三菱マテリアル株式会社 電子・電気機器用銅合金、電子・電気機器用銅合金板条材、電子・電気機器用部品、端子、バスバー、及び、リレー用可動片
WO2017170733A1 (ja) 2016-03-30 2017-10-05 三菱マテリアル株式会社 電子・電気機器用銅合金、電子・電気機器用銅合金板条材、電子・電気機器用部品、端子、バスバー、及び、リレー用可動片
JP6734185B2 (ja) 2016-12-06 2020-08-05 Ｄｏｗａメタルテック株式会社 Ｓｎめっき材およびその製造方法
DE112017005628B4 (de) 2016-12-06 2023-09-14 Dowa Metaltech Co., Ltd. Verzinntes Produkt und elektrische Drahtanschlussklemme mit einem verzinnten Produkt
JP6940380B2 (ja) 2017-03-22 2021-09-29 Ｄｏｗａメタルテック株式会社 Ｓｎめっき材およびその製造方法
JP2019114466A (ja) 2017-12-25 2019-07-11 カルソニックカンセイ株式会社 シーズヒータの製造方法
JP7116870B2 (ja) * 2019-03-29 2022-08-12 三菱マテリアル株式会社 銅合金板、めっき皮膜付銅合金板及びこれらの製造方法
JP7443737B2 (ja) * 2019-12-10 2024-03-06 三菱マテリアル株式会社 銅合金板、めっき皮膜付銅合金板及びこれらの製造方法

Also Published As

Publication number Publication date
FI3904549T3 (fi) 2023-10-19
US11781234B2 (en) 2023-10-10
US20220081738A1 (en) 2022-03-17
WO2020137726A1 (ja) 2020-07-02
MY203803A (en) 2024-07-19

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