MY121957A - Lithographic developer and lithographic process. - Google Patents

Lithographic developer and lithographic process.

Info

Publication number
MY121957A
MY121957A MYPI93000187A MYPI9300187A MY121957A MY 121957 A MY121957 A MY 121957A MY PI93000187 A MYPI93000187 A MY PI93000187A MY PI9300187 A MYPI9300187 A MY PI9300187A MY 121957 A MY121957 A MY 121957A
Authority
MY
Malaysia
Prior art keywords
resist
lithographic
developer
dissolving
region
Prior art date
Application number
MYPI93000187A
Inventor
Tadahiro Ohmi
Hisayuki Shimada
Shigeki Shimomura
Original Assignee
Canon Kk
Tadahiro Ohmi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk, Tadahiro Ohmi filed Critical Canon Kk
Publication of MY121957A publication Critical patent/MY121957A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PROVIDED IS A LITHOGRAPHIC DEVELOPER USED TO DEVELOP A RESIST PATTERN HAVING REGIONS WITH DIFFERENT SIZES AND SHAPES, BY DISSOLVING AND REMOVING A RESIST REGION OF A RESIST LATER FORMED IN THE RESIST PATTERN, WHEREIN SAID DEVELOPER COMPRISES A SURFACTANT CAPABLE OF INCREASING THE DISSOLUTION OF A RESIST IN THE RESIST REGION TO THE DISSOLVED AND REMOVED, HAVING A SMALLER DISSOLVING-AND-REMOVING AREA ON THE SURFACE OF SAID RESIST LAYER.
MYPI93000187A 1992-02-07 1993-02-05 Lithographic developer and lithographic process. MY121957A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP5708192 1992-02-07
JP4233080A JPH05303207A (en) 1992-02-07 1992-08-07 Lithography developer and lithography process
JP4233082A JPH05303208A (en) 1992-02-07 1992-08-07 Lithography developer and lithography process

Publications (1)

Publication Number Publication Date
MY121957A true MY121957A (en) 2006-03-31

Family

ID=13045534

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI93000187A MY121957A (en) 1992-02-07 1993-02-05 Lithographic developer and lithographic process.

Country Status (4)

Country Link
JP (2) JPH05303207A (en)
KR (1) KR960015482B1 (en)
MY (1) MY121957A (en)
TW (1) TW259850B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0150146B1 (en) * 1995-12-20 1998-12-01 김광호 Control method of automatic adjusting transfer voltage in electrophotography developing type printer
JP4015823B2 (en) 2001-05-14 2007-11-28 株式会社東芝 Alkali developer manufacturing method, alkali developer, pattern forming method, resist film peeling method, and chemical solution coating apparatus
JP5619458B2 (en) * 2010-03-31 2014-11-05 Hoya株式会社 Resist pattern forming method and mold manufacturing method
JP7422530B2 (en) * 2019-12-17 2024-01-26 三井化学株式会社 Solvent for cloud point measurement of alkylene oxide polymers
JP7357535B2 (en) * 2019-12-17 2023-10-06 三井化学株式会社 Method for producing alkylene oxide polymer

Also Published As

Publication number Publication date
JPH05303207A (en) 1993-11-16
KR930018651A (en) 1993-09-22
KR960015482B1 (en) 1996-11-14
JPH05303208A (en) 1993-11-16
TW259850B (en) 1995-10-11

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