MY137770A - Metal finishing apparatus and metal finishing method using the same - Google Patents
Metal finishing apparatus and metal finishing method using the sameInfo
- Publication number
- MY137770A MY137770A MYPI20005951A MYPI20005951A MY137770A MY 137770 A MY137770 A MY 137770A MY PI20005951 A MYPI20005951 A MY PI20005951A MY PI20005951 A MYPI20005951 A MY PI20005951A MY 137770 A MY137770 A MY 137770A
- Authority
- MY
- Malaysia
- Prior art keywords
- metal finishing
- electrode
- electrolyte
- same
- finishing apparatus
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
A METAL FINISHING APPARATUS AND A METAL FINISHING METHOD USING THE SAME ARE PROVIDED. THE METAL FINISHING APPARATUS INCLUDES AN ELECTROLYTIC BATH (21), AN ELECTROLYTE (24) CONTAINED IN THE ELECTROLYTIC BATH, A POSITIVE ELECTRODE (22) DIPPED INTO THE ELECTROLYTE, A NEGATIVE ELECTRODE (23) DIPPED INTO THE ELECTROLYTE, AND A MEMBRANE (200) INSTALLED BETWEEN THE POSITIVE ELECTRODE AND THE NEGATIVE ELECTRODE, AND HAVING FINE PORES TO SELECTIVELY PERMEATE PARTICULAR IONS DISSOLVED IN THE ELECTROLYTE DURING AN ELECTRODE REACTION FROM ONE ELECTRODE TO ANOTHER ELECTRODE. (FIG. 2)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2000-0063436A KR100371564B1 (en) | 2000-10-27 | 2000-10-27 | Metal finishing apparatus and metal finishing method using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY137770A true MY137770A (en) | 2009-03-31 |
Family
ID=19695751
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI20005951A MY137770A (en) | 2000-10-27 | 2000-12-19 | Metal finishing apparatus and metal finishing method using the same |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP3901450B2 (en) |
| KR (1) | KR100371564B1 (en) |
| CN (1) | CN1195906C (en) |
| MY (1) | MY137770A (en) |
| SG (1) | SG99876A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100847752B1 (en) | 2006-12-29 | 2008-07-22 | 주식회사 두산 | Plating Device for Printed Circuit Boards |
| CN103594679B (en) * | 2013-11-15 | 2017-11-10 | 东莞新能源科技有限公司 | A kind of preparation facilities and technique of lithium ion battery richness lithium anode |
| JP6078851B2 (en) * | 2013-12-19 | 2017-02-15 | 日本軽金属株式会社 | Method for electrolytic polishing of aluminum material |
| WO2020106590A1 (en) | 2018-11-19 | 2020-05-28 | Lam Research Corporation | Cross flow conduit for foaming prevention in high convection plating cells |
| KR20220025886A (en) * | 2019-06-28 | 2022-03-03 | 램 리써치 코포레이션 | Removal of byproducts from electroplating solutions |
| JP7492206B1 (en) | 2023-11-28 | 2024-05-29 | オロル株式会社 | Stainless steel components for semiconductor manufacturing equipment and their manufacturing method |
| TWI903850B (en) * | 2024-11-06 | 2025-11-01 | 臺灣永光化學工業股份有限公司 | Device and method for regenerating slurry for polishing silicon carbide substrate |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3896013A (en) * | 1974-02-25 | 1975-07-22 | Industrial Filter Pump Mfg Co | Process for removing metallic ions from an electrolytic solution |
| US4615776A (en) * | 1983-10-21 | 1986-10-07 | Shinko-Pfaudler Company | Electrolytic decontamination process and process for reproducing decontaminating electrolyte by electrodeposition and apparatuses therefore |
| WO1986006418A1 (en) * | 1985-04-25 | 1986-11-06 | Chlorine Engineers Corp., Ltd. | Method of dissolving and recovering noble metals |
-
2000
- 2000-10-27 KR KR10-2000-0063436A patent/KR100371564B1/en not_active Expired - Lifetime
- 2000-12-19 MY MYPI20005951A patent/MY137770A/en unknown
- 2000-12-19 SG SG200007521A patent/SG99876A1/en unknown
- 2000-12-20 CN CNB001355929A patent/CN1195906C/en not_active Expired - Lifetime
- 2000-12-22 JP JP2000390452A patent/JP3901450B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CN1195906C (en) | 2005-04-06 |
| KR100371564B1 (en) | 2003-02-07 |
| CN1351197A (en) | 2002-05-29 |
| SG99876A1 (en) | 2003-11-27 |
| JP3901450B2 (en) | 2007-04-04 |
| KR20020032782A (en) | 2002-05-04 |
| JP2002129399A (en) | 2002-05-09 |
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