MY141430A - Laser lithography light source with beam delivery - Google Patents

Laser lithography light source with beam delivery

Info

Publication number
MY141430A
MY141430A MYPI20023233A MY141430A MY 141430 A MY141430 A MY 141430A MY PI20023233 A MYPI20023233 A MY PI20023233A MY 141430 A MY141430 A MY 141430A
Authority
MY
Malaysia
Prior art keywords
production line
laser
line machine
light source
lithography
Prior art date
Application number
Inventor
Brian C Klene
Palash P Das
Steven L Grove
Alexander I Ershov
Scott T Smith
Xiaojiang Pan
Richard L Sandstrom
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/943,343 external-priority patent/US6567450B2/en
Priority claimed from US10/000,991 external-priority patent/US6795474B2/en
Priority claimed from US10/006,913 external-priority patent/US6535531B1/en
Priority claimed from US10/036,676 external-priority patent/US6882674B2/en
Priority claimed from US10/036,727 external-priority patent/US6865210B2/en
Priority claimed from US10/141,216 external-priority patent/US6693939B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of MY141430A publication Critical patent/MY141430A/en

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

THE PRESENT INVENTION PROVIDES A MODULAR HIGH REPETITION RATE ULTRAVIOLET GAS DISCHARGE LASER LIGHT SOURCE FOR A PRODUCTION LINE MACHINE. THE SYSTEM INCLUDES AN ENCLOSED AND PURGED BEAM PATH FOR DELIVERY THE LASER BEAM TO A DESIRED LOCATION SUCH AS THE ENTRANCE PORT OF THE PRODUCTION LINE MACHINE. IN PREFERRED EMBODIMENTS, THE PRODUCTION LINE MACHINE IS A LITHOGRAPHY MACHINE AND TWO SEPARATE DISCHARGE CHAMBERS ARE PROVIDED, ONE OF WHICH IS A PART OF A MASTER OSCILLATOR PRODUCING A VERY NARROW BAND SEED BEAM WHICH IS AMPLIFIED IN THE SECOND DISCHARGE CHAMBER. THIS MOPA SYSTEM IS CAPABLE OF OUTPUT PULSE ENERGIES APPROXIMATELY DOUBLE THE COMPARABLE SINGLE CHAMBER LASER SYSTEM WITH GREATLY IMPROVED BEAM QUALITY. A PULSE STRETCHER MORE THAN DOUBLES THE OUTPUT PULSE LENGTH RESULTING IN A REDUCTION IN PULSE POWER (MJ/NS) AS COMPARED TO PRIOR ART LASER SYSTEMS. THIS PREFERRED EMBODIMENT IS CAPABLE OF PROVIDING ILLUMINATION AT A LITHOGRAPHY SYSTEM WAFER PLANE WHICH IS APPROXIMATELY CONSTANT THROUGHOUT THE OPERATING LIFE OF THE LITHOGRAPHY SYSTEM, DESPITE SUBSTANTIAL DEGRADATION OF OPTICAL COMPONENTS.
MYPI20023233 2001-08-29 2002-08-29 Laser lithography light source with beam delivery MY141430A (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US09/943,343 US6567450B2 (en) 1999-12-10 2001-08-29 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/000,991 US6795474B2 (en) 2000-11-17 2001-11-14 Gas discharge laser with improved beam path
US10/006,913 US6535531B1 (en) 2001-11-29 2001-11-29 Gas discharge laser with pulse multiplier
US10/036,676 US6882674B2 (en) 1999-12-27 2001-12-21 Four KHz gas discharge laser system
US10/036,727 US6865210B2 (en) 2001-05-03 2001-12-21 Timing control for two-chamber gas discharge laser system
US10/141,216 US6693939B2 (en) 2001-01-29 2002-05-07 Laser lithography light source with beam delivery

Publications (1)

Publication Number Publication Date
MY141430A true MY141430A (en) 2010-04-30

Family

ID=44256721

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20023233 MY141430A (en) 2001-08-29 2002-08-29 Laser lithography light source with beam delivery

Country Status (1)

Country Link
MY (1) MY141430A (en)

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