MY141998A - Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof - Google Patents
Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereofInfo
- Publication number
- MY141998A MY141998A MYPI20061559A MY141998A MY 141998 A MY141998 A MY 141998A MY PI20061559 A MYPI20061559 A MY PI20061559A MY 141998 A MY141998 A MY 141998A
- Authority
- MY
- Malaysia
- Prior art keywords
- microelectronic
- derivatives
- salts
- composition containing
- cleaning composition
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 5
- 238000004377 microelectronic Methods 0.000 title abstract 5
- 239000000203 mixture Substances 0.000 title abstract 4
- 229910052736 halogen Inorganic materials 0.000 title abstract 2
- -1 halogen oxygen acids Chemical class 0.000 title abstract 2
- 150000003839 salts Chemical class 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 abstract 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000011651 chromium Substances 0.000 abstract 1
- 229910017052 cobalt Inorganic materials 0.000 abstract 1
- 239000010941 cobalt Substances 0.000 abstract 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract 1
- 239000003989 dielectric material Substances 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 239000010931 gold Substances 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052741 iridium Inorganic materials 0.000 abstract 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 abstract 1
- 238000001465 metallisation Methods 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 239000011733 molybdenum Substances 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052763 palladium Inorganic materials 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 229910052703 rhodium Inorganic materials 0.000 abstract 1
- 239000010948 rhodium Substances 0.000 abstract 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 abstract 1
- 229910052707 ruthenium Inorganic materials 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 239000010937 tungsten Substances 0.000 abstract 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
MICROELECTRONIC CLEANING COMPOSITIONS FOR CLEANING MICROELECTRONIC SUBSTRATES, AND PARTICULARLY CLEANING COMPOSITIONS USEFUL WITH AND HAVING IMPROVED COMPATIBILITY WITH MICROELECTRONIC SUBSTRATES CHARACTERIZED BY SILICON DIOXIDE, SENSITIVE LOW- OR HIGH- DIELECTRICS AND COPPER, TUNGSTEN, TANTALUM, NICKEL, GOLD, COBALT, PALLADIUM, PLATINUM, CHROMIUM, RUTHENIUM, RHODIUM, IRIDIUM, HAFNIUM, TITANIUM, MOLYBDENUM, TIN AND OTHER METALLIZATION, AS WELL AS SUBSTRATES OF AL OR AL(CU) METALLIZATIONS AND ADVANCED INTERCONNECT TECHNOLOGIES, ARE PROVIDED BY MICROELECTRONIC CLEANING COMPOSITIONS COMPRISING HALOGEN ACIDS, SALTS AND DERIVATIVES THEREOF.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MYPI20061559 MY141998A (en) | 2006-04-06 | 2006-04-06 | Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MYPI20061559 MY141998A (en) | 2006-04-06 | 2006-04-06 | Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY141998A true MY141998A (en) | 2010-08-16 |
Family
ID=44256657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI20061559 MY141998A (en) | 2006-04-06 | 2006-04-06 | Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
Country Status (1)
| Country | Link |
|---|---|
| MY (1) | MY141998A (en) |
-
2006
- 2006-04-06 MY MYPI20061559 patent/MY141998A/en unknown
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