MY146294A - Plasma generation and control using dual frequency rf signals - Google Patents

Plasma generation and control using dual frequency rf signals

Info

Publication number
MY146294A
MY146294A MYPI20062104A MYPI20062104A MY146294A MY 146294 A MY146294 A MY 146294A MY PI20062104 A MYPI20062104 A MY PI20062104A MY PI20062104 A MYPI20062104 A MY PI20062104A MY 146294 A MY146294 A MY 146294A
Authority
MY
Malaysia
Prior art keywords
frequency
signals
control
plasma generation
dual frequency
Prior art date
Application number
MYPI20062104A
Inventor
Steven C Shannon
Alexander Paterson
Theodoros Panagopoulos
John P Holland
Dennis Grimard
Daniel Hoffman
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/843,914 external-priority patent/US7431857B2/en
Priority claimed from US11/416,468 external-priority patent/US7510665B2/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of MY146294A publication Critical patent/MY146294A/en

Links

Abstract

A METHOD FOR CONTROLLING A PLASMA IN A SEMICONDUCTOR SUBSTRATE PROCESSING CHAMBER (100) IS PROVIDED. THE METHOD INCLUDES THE STEPS OF SUPPLYING A FIRST RIF SIGNAL TO A FIRST ELECTRODE (108) WITHIN THE PROCESSING CHAMBER (100) AT A FIRST FREQUENCY SELECTED TO CAUSE PLASMA SHEATH OSCILLATION AT THE FIRST FREQUENCY; AND SUPPLYING A SECOND RF SIGNAL FROM THE SOURCE TO THE FIRST ELECTRODE (108) AT A SECOND FREQUENCY SELECTED TO CAUSE PLASMA SHEATH OSCILLATION AT THE SECOND FREQUENCY, WHEREIN THE SECOND FREQUENCY IS DIFFERENT FROM THE FIRST FREQUENCY BY A DIFFERENTIAL EQUAL TO A DESIRED FREQUENCY SELECTED TO CAUSE PLASMA SHEATH OSCILLATION AT THE DESIRED FREQUENCY.
MYPI20062104A 2003-08-15 2006-05-08 Plasma generation and control using dual frequency rf signals MY146294A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US49552303P 2003-08-15 2003-08-15
US10/843,914 US7431857B2 (en) 2003-08-15 2004-05-12 Plasma generation and control using a dual frequency RF source
US67904205P 2005-05-09 2005-05-09
US11/416,468 US7510665B2 (en) 2003-08-15 2006-05-02 Plasma generation and control using dual frequency RF signals

Publications (1)

Publication Number Publication Date
MY146294A true MY146294A (en) 2012-07-31

Family

ID=48040717

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20062104A MY146294A (en) 2003-08-15 2006-05-08 Plasma generation and control using dual frequency rf signals

Country Status (1)

Country Link
MY (1) MY146294A (en)

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