MY150117A - Method of manufacturing mask blank and method of manufacturing photomask - Google Patents

Method of manufacturing mask blank and method of manufacturing photomask

Info

Publication number
MY150117A
MY150117A MYPI20082068A MYPI20082068A MY150117A MY 150117 A MY150117 A MY 150117A MY PI20082068 A MYPI20082068 A MY PI20082068A MY PI20082068 A MYPI20082068 A MY PI20082068A MY 150117 A MY150117 A MY 150117A
Authority
MY
Malaysia
Prior art keywords
substrate
face
coating nozzle
manufacturing
resist liquid
Prior art date
Application number
MYPI20082068A
Inventor
Keishi Asakawa
Ryoji Miyata
Original Assignee
Hoya Corp
Hoya Electronics Malaysia Sendirian Berhad
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Malaysia Sendirian Berhad filed Critical Hoya Corp
Publication of MY150117A publication Critical patent/MY150117A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)

Abstract

A METHOD OF MANUFACTURING A MASK BLANK WITH A RESIST FILM HAVING A STEP OF APPLYING A RESIST LIQUID (21). IN THE STEP, A COATING NOZZLE (22) AND A FACE TO BE COATED (10A) OF A SUBSTRATE (10) ARE RELATIVELY SCANNED IN A DIRECTION CROSSING ONE DIRECTION WHILE EJECTING THE RESIST LIQUID (21) FROM THE COATING NOZZLE (22) HAVING A FEED OPENING OF THE RESIST LIQUID (21) IN THE ONE DIRECTION TO APPLY THE RESIST LIQUID (21) ONTO THE FACE TO BE COATED (10A). THE METHOD HAS A STEP OF PREPARING A SUBSTRATE (10) HAVING A THIN FILM (11) FOR FORMING A MASK PATTERN IN A REGION EXCEPTING AN OUTER PERIPHERAL PORTION ALONG THE PERIPHERY OF THE PRIMARY SURFACE OF THE SUBSTRATE (10), AND A STEP OF INITIATING LIQUID CONTACT WITH THE INTERVAL BETWEEN THE TIP END OF THE COATING NOZZLE (22) AND THE EXPOSURE FACE OF THE SUBSTRATE SURFACE BEING RELATIVELY SMALL, AND THEN COMPLETING THE LIQUID CONTACT WITH THE ABOVE-MENTIONED INTERVAL WIDENED TO BE RELATIVELY LARGE, WHEN THE LIQUID CONTACT OF THE RESIST LIQUID (21) IS MADE WITH THE EXPOSURE FACE OF THE SUBSTRATE FACE BY MAKING THE EXPOSURE FACE OF THE SUBSTRATE SURFACE AND THE TIP END OF THE COATING NOZZLE (22) CLOSER, WITH THE EXPOSURE FACE OF THE SUBSTRATE SURFACE IN THE OUTER PERIPHERAL PORTION ALONG THE PERIPHERY OF THE PRIMARY SURFACE OF THE SUBSTRATE (10) SET TO BE AN INITIATION SITE.
MYPI20082068A 2007-06-13 2008-06-12 Method of manufacturing mask blank and method of manufacturing photomask MY150117A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007155937A JP5073375B2 (en) 2007-06-13 2007-06-13 Mask blank manufacturing method and photomask manufacturing method

Publications (1)

Publication Number Publication Date
MY150117A true MY150117A (en) 2013-11-29

Family

ID=40238700

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20082068A MY150117A (en) 2007-06-13 2008-06-12 Method of manufacturing mask blank and method of manufacturing photomask

Country Status (5)

Country Link
JP (1) JP5073375B2 (en)
KR (1) KR101487550B1 (en)
CN (1) CN101419398B (en)
MY (1) MY150117A (en)
TW (1) TWI439803B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5086714B2 (en) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 Mask blank manufacturing method and photomask manufacturing method
JP2011013321A (en) * 2009-06-30 2011-01-20 Hoya Corp Method of manufacturing photomask blank, method of manufacturing photomask, and coating device
JP6659422B2 (en) * 2016-03-29 2020-03-04 アルバック成膜株式会社 Coating device, mask blank manufacturing method
CN114082602A (en) * 2021-11-30 2022-02-25 Tcl华星光电技术有限公司 Gluing mechanism and gluing device

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445985A1 (en) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Method and device for coating or coating a substrate
JP2000343015A (en) * 1999-06-08 2000-12-12 Dainippon Screen Mfg Co Ltd Coating device
JP3252325B2 (en) * 1999-10-29 2002-02-04 株式会社ヒラノテクシード Coating method and coating device
JP3808741B2 (en) * 2001-10-01 2006-08-16 東京エレクトロン株式会社 Processing equipment
KR20070017228A (en) * 2003-07-17 2007-02-08 호야 가부시키가이샤 Method for manufacturing substrate with resist film
JP2005051220A (en) * 2003-07-17 2005-02-24 Hoya Corp Method for manufacturing substrate with resist film
JP2005246274A (en) * 2004-03-05 2005-09-15 Nidek Co Ltd Coating method and coating apparatus
JP4169719B2 (en) * 2004-03-30 2008-10-22 Ｈｏｙａ株式会社 Method for manufacturing substrate with resist film
JP4410063B2 (en) * 2004-09-06 2010-02-03 東京エレクトロン株式会社 Substrate processing equipment
JP4673157B2 (en) * 2004-10-01 2011-04-20 株式会社ヒラノテクシード Coating equipment
JP2006269599A (en) * 2005-03-23 2006-10-05 Sony Corp Pattern forming method, organic field effect transistor manufacturing method, and flexible printed circuit board manufacturing method

Also Published As

Publication number Publication date
TWI439803B (en) 2014-06-01
CN101419398A (en) 2009-04-29
KR101487550B1 (en) 2015-02-26
JP2008311327A (en) 2008-12-25
CN101419398B (en) 2012-06-20
TW200912518A (en) 2009-03-16
KR20080109650A (en) 2008-12-17
JP5073375B2 (en) 2012-11-14

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