MY172956A - Shower-type wet texturing equipment for solar silicon wafers and method thereof - Google Patents

Shower-type wet texturing equipment for solar silicon wafers and method thereof

Info

Publication number
MY172956A
MY172956A MYPI2015701061A MYPI2015701061A MY172956A MY 172956 A MY172956 A MY 172956A MY PI2015701061 A MYPI2015701061 A MY PI2015701061A MY PI2015701061 A MYPI2015701061 A MY PI2015701061A MY 172956 A MY172956 A MY 172956A
Authority
MY
Malaysia
Prior art keywords
silicon wafers
liquid
shower
component
transporting
Prior art date
Application number
MYPI2015701061A
Inventor
Guojun Zuo
Original Assignee
Changzhou S C Exact Equip Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou S C Exact Equip Co Ltd filed Critical Changzhou S C Exact Equip Co Ltd
Publication of MY172956A publication Critical patent/MY172956A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/137—Batch treatment of the devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Weting (AREA)

Abstract

The invention discloses a shower-type wet texturing equipment for solar silicon wafers, comprising a transporting component for forwards transporting the silicon wafers (3), a spraying component arranged above the transporting component, and a liquid supplying component arranged below the transporting component. The silicon wafers (3) are placed on the transporting component at intervals and are forwards transported by the transporting component, corrosive liquid is sprayed by spraying boxes (4) downward, and the corrosive liquid flowed down from the transporting component is gathered in a liquid receiving trough. The invention further provides a method for texturing the solar silicon wafers in a wet process via the shower-type wet texturing equipment. According to the invention, the corrosion liquid is sprayed or dropped on the silicon wafers (3) in a showering manner, the unnecessary corrosion liquid and reaction products flow into the liquid receiving trough (1), so as to ensure the corrosion uniformity of the silicon wafers (3). (FIG. 1)
MYPI2015701061A 2015-01-19 2015-04-01 Shower-type wet texturing equipment for solar silicon wafers and method thereof MY172956A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510024996.4A CN104538503B (en) 2015-01-19 2015-01-19 The shower type wet-method etching equipment and method of solar silicon wafers

Publications (1)

Publication Number Publication Date
MY172956A true MY172956A (en) 2019-12-16

Family

ID=52854002

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015701061A MY172956A (en) 2015-01-19 2015-04-01 Shower-type wet texturing equipment for solar silicon wafers and method thereof

Country Status (3)

Country Link
CN (1) CN104538503B (en)
MY (1) MY172956A (en)
WO (1) WO2016115721A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105220235B (en) * 2015-10-12 2017-12-08 常州捷佳创精密机械有限公司 A kind of single polycrystalline etching method
CN105717720A (en) * 2016-03-18 2016-06-29 深圳市华星光电技术有限公司 Copper wiring device with anti-explosion function and copper wiring anti-explosion method
CN107230651B (en) * 2016-03-25 2020-10-27 盟立自动化股份有限公司 Integrated liquid bath for wet processing
CN107968134B (en) * 2017-11-09 2020-08-11 常州捷佳创精密机械有限公司 Liquid medicine adding system and method
CN108376663B (en) * 2018-04-25 2023-07-25 通威太阳能（安徽）有限公司 Multi-outlet type uniform liquid discharge device of RENA (red, green and blue) texturing equipment
CN109326684A (en) * 2018-09-27 2019-02-12 苏州润阳光伏科技有限公司 A method to solve the EL black spot of PERC battery
CN109078818A (en) * 2018-09-29 2018-12-25 浙江华立智能装备股份有限公司 A kind of stirred type pre-treatment spray liquid bath
CN109841704A (en) * 2019-02-26 2019-06-04 镇江仁德新能源科技有限公司 A kind of black silicon fluff making device of anti-sticking sheet
CN110752269A (en) * 2019-09-20 2020-02-04 常州捷佳创精密机械有限公司 Etching equipment and preparation system for solar silicon wafers
CN111063763B (en) * 2019-12-03 2021-11-09 山西潞安太阳能科技有限责任公司 Method for improving capacity of photovoltaic wet-process texturing equipment
GB2590499A (en) * 2019-12-20 2021-06-30 Singulus Tech Ag Method and wet bench for selectively removing an emitter layer on a single side of a silicon substrate
CN111889443A (en) * 2020-06-28 2020-11-06 北京北方华创微电子装备有限公司 Wafer cleaning equipment
CN119677212B (en) * 2024-11-21 2026-04-17 中建材浚鑫科技有限公司 A high-efficient fountain texturing device for silicon chip pretreatment

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10328845B4 (en) * 2003-06-26 2005-10-20 Siltronic Ag Process for the surface treatment of a semiconductor wafer
CN101740657A (en) * 2008-11-11 2010-06-16 徐竹林 Leaf-type solar wool-making device and method
CN201570510U (en) * 2009-12-15 2010-09-01 南安市三晶阳光电力有限公司 Novel silicon wafer texturing device
CN202308013U (en) * 2011-11-01 2012-07-04 宁波市鑫友光伏有限公司 Surface fluff making device for solar silicon chip
CN103441070B (en) * 2013-08-22 2015-12-09 常州捷佳创精密机械有限公司 A kind of etching device of crystal silicon chip and process for etching method
CN204361118U (en) * 2015-01-19 2015-05-27 常州捷佳创精密机械有限公司 The shower type wet-method etching equipment of solar silicon wafers

Also Published As

Publication number Publication date
CN104538503A (en) 2015-04-22
CN104538503B (en) 2017-06-13
WO2016115721A1 (en) 2016-07-28

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