MY181595A - Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium - Google Patents

Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium

Info

Publication number
MY181595A
MY181595A MYPI2016703962A MYPI2016703962A MY181595A MY 181595 A MY181595 A MY 181595A MY PI2016703962 A MYPI2016703962 A MY PI2016703962A MY PI2016703962 A MYPI2016703962 A MY PI2016703962A MY 181595 A MY181595 A MY 181595A
Authority
MY
Malaysia
Prior art keywords
magnetic recording
recording medium
target material
magnetic
sputtering target
Prior art date
Application number
MYPI2016703962A
Inventor
Hasegawa Hiroyuki
Matsubara Noriaki
SHINMURA Yumeki
Hayashi Ryoji
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of MY181595A publication Critical patent/MY181595A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

There are provided a Co-based soft magnetic alloy for magnetic recording, used as a soft magnetic layer in a perpendicular magnetic recording medium, a sputtering target material, and a magnetic recording medium. The soft magnetic alloy for magnetic recording is a soft magnetic alloy for magnetic recording, comprising: in at. %, 0.5 to 29.5% of one or more of A group elements selected from Ta, Nb, and V; 0.0 to 29.5% of one or more of B group elements selected from Cr, Mo, and W; and the balance being Co, Fe, and unavoidable impurities, wherein: a ratio of Fe:Co is 10:90 to 70:30; a total content of the A group elements and the B group elements is 10 to 30%; and a hydrogen content is less than 20 ppm.
MYPI2016703962A 2014-05-01 2015-04-02 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium MY181595A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014094550 2014-05-01
JP2015027251A JP6405261B2 (en) 2014-05-01 2015-02-16 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium

Publications (1)

Publication Number Publication Date
MY181595A true MY181595A (en) 2020-12-29

Family

ID=54358499

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2016703962A MY181595A (en) 2014-05-01 2015-04-02 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium

Country Status (6)

Country Link
JP (1) JP6405261B2 (en)
CN (1) CN106415720B (en)
MY (1) MY181595A (en)
SG (1) SG11201609093UA (en)
TW (1) TWI641705B (en)
WO (1) WO2015166762A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6116928B2 (en) * 2013-02-18 2017-04-19 山陽特殊製鋼株式会社 CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium
JP6660130B2 (en) 2015-09-18 2020-03-04 山陽特殊製鋼株式会社 CoFeB alloy target material
WO2017047754A1 (en) * 2015-09-18 2017-03-23 山陽特殊製鋼株式会社 Sputtering target material
JP2017057490A (en) 2015-09-18 2017-03-23 山陽特殊製鋼株式会社 Co-Fe-B based alloy target material
JP6442460B2 (en) * 2016-10-27 2018-12-19 山陽特殊製鋼株式会社 CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium
JP6226093B1 (en) * 2017-01-30 2017-11-08 Tdk株式会社 Soft magnetic alloys and magnetic parts
JP6784733B2 (en) * 2018-08-20 2020-11-11 山陽特殊製鋼株式会社 Co-based alloy for soft magnetic layer of magnetic recording medium
JP7552600B2 (en) 2019-08-26 2024-09-18 株式会社プロテリアル Fe-Co-Si-B-Nb target
JP6998431B2 (en) 2020-08-03 2022-02-04 山陽特殊製鋼株式会社 Co-based alloy for soft magnetic layer of magnetic recording medium
CN116870804B (en) * 2023-07-10 2025-08-26 浙江德力装备有限公司 A device and process for preparing cyclohexene

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10317082A (en) * 1997-05-20 1998-12-02 Sumitomo Metal Mining Co Ltd Al-based alloy for target material and method for producing the same
JP5605787B2 (en) * 2008-07-14 2014-10-15 山陽特殊製鋼株式会社 Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method
JP2010150591A (en) * 2008-12-25 2010-07-08 Hitachi Metals Ltd Cobalt-iron based alloy for soft-magnetic film
JP5631659B2 (en) * 2010-08-24 2014-11-26 山陽特殊製鋼株式会社 Soft magnetic alloy and sputtering target material for perpendicular magnetic recording medium, and magnetic recording medium
JP5714397B2 (en) * 2010-10-26 2015-05-07 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
JP5698023B2 (en) * 2011-02-16 2015-04-08 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
JP5917045B2 (en) * 2011-08-17 2016-05-11 山陽特殊製鋼株式会社 Alloy and sputtering target material for soft magnetic thin film layer in perpendicular magnetic recording medium
JP5474902B2 (en) * 2011-09-26 2014-04-16 山陽特殊製鋼株式会社 An alloy used for a soft magnetic thin film layer in a perpendicular magnetic recording medium, a sputtering target material, and a perpendicular magnetic recording medium having a soft magnetic thin film layer.
JP6302153B2 (en) * 2011-09-28 2018-03-28 山陽特殊製鋼株式会社 Soft magnetic thin film layer and perpendicular magnetic recording medium in perpendicular magnetic recording medium
JP5778052B2 (en) * 2012-02-03 2015-09-16 山陽特殊製鋼株式会社 Alloy for soft magnetic film layer having low saturation magnetic flux density used for magnetic recording medium and sputtering target material
JP6210503B2 (en) * 2012-08-13 2017-10-11 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording and sputtering target material

Also Published As

Publication number Publication date
WO2015166762A1 (en) 2015-11-05
TW201604289A (en) 2016-02-01
JP2015222609A (en) 2015-12-10
JP6405261B2 (en) 2018-10-17
TWI641705B (en) 2018-11-21
SG11201609093UA (en) 2016-12-29
CN106415720A (en) 2017-02-15
CN106415720B (en) 2019-04-12

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