MY181764A - Transportable rotation device and film formation device - Google Patents

Transportable rotation device and film formation device

Info

Publication number
MY181764A
MY181764A MYPI2015704375A MYPI2015704375A MY181764A MY 181764 A MY181764 A MY 181764A MY PI2015704375 A MYPI2015704375 A MY PI2015704375A MY PI2015704375 A MYPI2015704375 A MY PI2015704375A MY 181764 A MY181764 A MY 181764A
Authority
MY
Malaysia
Prior art keywords
rotation
film formation
transportable
dome
substrate holders
Prior art date
Application number
MYPI2015704375A
Inventor
Takanobu Ishii
Koki Chiba
Yasuhiro Sato
Original Assignee
Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Publication of MY181764A publication Critical patent/MY181764A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention is to provide a transportable rotation device (11) capable of realizing substrate film formation by planetary gear rotation with a simple work, and a film formation device. A transportable rotation device subsincludes a rotation dome (21), to be rotated by a servomotor (M) provided in a vacuum deposition device (1), substrate holders (12) rotatably supported on the rotation dome, the substrate holders on which substrates subjected-to-film formation (14) are disposed, an inner frame (11a) attached onto the rotation dome via a revolving gear bearing (21c, 21d), an outer frame (24) provided on the outer side of the inner frame to be meshed with outer circumferential sides of the substrate holders, and coupling arms (41) coupling the inner frame and the outer frame. The rotation dome is rotated about a revolving axis (R1) of a planetary gear mechanism, and each of the substrate holders is retained around the revolving axis by the rotation dome and supported rotatably about a spinning axis (R2, R3) of the planetary gear mechanism. Fig. 1
MYPI2015704375A 2014-06-03 2015-06-02 Transportable rotation device and film formation device MY181764A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014115098A JP5727073B1 (en) 2014-06-03 2014-06-03 Portable rotating apparatus and film forming apparatus
PCT/JP2015/065900 WO2015186702A1 (en) 2014-06-03 2015-06-02 Portable rotary apparatus and film formation apparatus

Publications (1)

Publication Number Publication Date
MY181764A true MY181764A (en) 2021-01-06

Family

ID=53437866

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015704375A MY181764A (en) 2014-06-03 2015-06-02 Transportable rotation device and film formation device

Country Status (5)

Country Link
JP (1) JP5727073B1 (en)
CN (1) CN105324513B (en)
MY (1) MY181764A (en)
TW (1) TWI586906B (en)
WO (1) WO2015186702A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11358168B2 (en) * 2019-06-18 2022-06-14 Visera Technologies Company Limited Coating apparatus
DE102020118367A1 (en) * 2020-07-13 2022-01-13 Carl Zeiss Vision International Gmbh Device for picking up an object in a vacuum coating system
CN114807865A (en) * 2022-04-18 2022-07-29 兰州交通大学 Vacuum evaporation equipment capable of coating films on two sides
CN114752911B (en) * 2022-04-22 2024-04-05 捷捷微电(南通)科技有限公司 Planet type dome mounting frame and vacuum coating machine
JP7454874B2 (en) * 2022-07-22 2024-03-25 株式会社オプトラン Substrate holder transfer system
CN117802459A (en) * 2022-09-30 2024-04-02 芝浦机械电子装置株式会社 Film forming device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689442B2 (en) * 1987-06-05 1994-11-09 新明和工業株式会社 Vacuum deposition equipment
US5124013A (en) * 1988-02-08 1992-06-23 Optical Coating Laboratory, Inc. High ratio planetary drive system and method for vacuum chamber
JP2981682B2 (en) * 1990-11-30 1999-11-22 新明和工業株式会社 Vacuum evaporation system of continuous film formation method
JP3579074B2 (en) * 1993-11-16 2004-10-20 オリンパス株式会社 Thin film deposition apparatus and thin film deposition method
JPH07228974A (en) * 1994-02-17 1995-08-29 Asahi Optical Co Ltd Vapor deposition equipment
TW200712238A (en) * 2005-09-07 2007-04-01 Bohhen Optronics Co Ltd Fixture for large-sized sheet of film-deposition
JP5034578B2 (en) * 2007-03-15 2012-09-26 パナソニック株式会社 Thin film processing equipment
US20110100806A1 (en) * 2008-06-17 2011-05-05 Shincron Co., Ltd. Bias sputtering device
CN101407906B (en) * 2008-10-20 2011-04-27 舟山市汉邦机械科技有限公司 Vacuum film plating apparatus
JP2012227231A (en) * 2011-04-15 2012-11-15 Japan Pionics Co Ltd Vapor-phase growth device of group iii nitride semiconductor

Also Published As

Publication number Publication date
TWI586906B (en) 2017-06-11
TW201546386A (en) 2015-12-16
JP5727073B1 (en) 2015-06-03
CN105324513B (en) 2017-03-15
HK1215877A1 (en) 2016-09-23
CN105324513A (en) 2016-02-10
JP2015229779A (en) 2015-12-21
WO2015186702A1 (en) 2015-12-10

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