MY182259A - Method for producing polishing slurry, method for manufacturing glass substrate, and mass of raw-material abrasive particles - Google Patents

Method for producing polishing slurry, method for manufacturing glass substrate, and mass of raw-material abrasive particles

Info

Publication number
MY182259A
MY182259A MYPI2016704793A MYPI2016704793A MY182259A MY 182259 A MY182259 A MY 182259A MY PI2016704793 A MYPI2016704793 A MY PI2016704793A MY PI2016704793 A MYPI2016704793 A MY PI2016704793A MY 182259 A MY182259 A MY 182259A
Authority
MY
Malaysia
Prior art keywords
abrasive particles
raw
polishing
glass substrate
mass
Prior art date
Application number
MYPI2016704793A
Inventor
Ken Tamura
Masanori Tamaki
Kyosuke Iiizumi
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of MY182259A publication Critical patent/MY182259A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Provided is a method for producing a polishing slurry, polishing abrasive particles, and a polishing slurry, according to which a polishing rate is improved, and the formation of marks on a glass substrate can be suppressed. Also provided is a method for manufacturing a glass substrate using such a polishing slurry and polishing abrasive particles. The method for producing the polishing slurry of the present invention is a method for producing a polishing slurry including polishing abrasive particles for use in processing for polishing a glass substrate, including: adding processing in which binders are added to a raw-material slurry including raw-material abrasive particles serving as a raw material for the polishing abrasive particles; drying processing in which the raw-material slurry including the binders is dried to produce a mass of the raw-material abrasive particles including the binders; and firing processing in which the mass of the raw-material abrasive particles is fired to produce a cluster of the raw-material abrasive particles including the binders.
MYPI2016704793A 2014-07-31 2015-07-31 Method for producing polishing slurry, method for manufacturing glass substrate, and mass of raw-material abrasive particles MY182259A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014156776 2014-07-31
JP2014156779 2014-07-31
PCT/JP2015/071894 WO2016017819A1 (en) 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive grains, polishing slurry, and method for producing glass substrate

Publications (1)

Publication Number Publication Date
MY182259A true MY182259A (en) 2021-01-18

Family

ID=55217713

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2016704793A MY182259A (en) 2014-07-31 2015-07-31 Method for producing polishing slurry, method for manufacturing glass substrate, and mass of raw-material abrasive particles

Country Status (5)

Country Link
JP (1) JP6357536B2 (en)
CN (1) CN106661428B (en)
MY (1) MY182259A (en)
SG (2) SG10202102010YA (en)
WO (1) WO2016017819A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019164722A1 (en) * 2018-02-20 2019-08-29 Engis Corporation Fixed abrasive three-dimensional lapping and polishing plate and methods of making and using the same
JP7074644B2 (en) * 2018-10-31 2022-05-24 信越化学工業株式会社 A method for manufacturing abrasive particles for polishing a synthetic quartz glass substrate, and a method for polishing a synthetic quartz glass substrate.
CN110756006B (en) * 2019-07-10 2021-09-28 内蒙古中泰汇金环保科技有限公司 Quenching absorption tower for treating waste gas generated by recycling hazardous waste inorganic salt

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3446988B2 (en) * 1997-04-10 2003-09-16 三井金属鉱業株式会社 Method for recovering abrasive raw materials from waste cerium abrasive
JP2001009723A (en) * 1999-07-02 2001-01-16 Kurita Water Ind Ltd Abrasive recovery equipment
JP2001277132A (en) * 2000-03-31 2001-10-09 Ando Michihiro Grinding wheel and method of manufacturing the same
TWI281493B (en) * 2000-10-06 2007-05-21 Mitsui Mining & Smelting Co Polishing material
EP1770145B1 (en) * 2000-10-06 2011-06-22 3M Innovative Properties Company Agglomerate abrasive grain and a method of making the same
US6551366B1 (en) * 2000-11-10 2003-04-22 3M Innovative Properties Company Spray drying methods of making agglomerate abrasive grains and abrasive articles
US6797023B2 (en) * 2002-05-14 2004-09-28 Saint-Gobain Abrasives Technology Company Coated abrasives
JP4301434B2 (en) * 2003-03-04 2009-07-22 株式会社リコー Polishing abrasive grains and polishing tool
JP2004306210A (en) * 2003-04-08 2004-11-04 Speedfam Co Ltd Processing method and processing equipment for reusing cerium oxide-based polishing agent and water, in drainage in glass polishing
JP4849590B2 (en) * 2004-12-28 2012-01-11 株式会社リコー Polishing tool and manufacturing method thereof
JP2007136559A (en) * 2005-11-15 2007-06-07 Kurenooton Kk Vitrified grinding stone, and its manufacturing method
JP4729428B2 (en) * 2006-04-07 2011-07-20 Ａｇｃセイミケミカル株式会社 Regeneration method of cerium-based abrasive
JP5150833B2 (en) * 2006-07-07 2013-02-27 国立大学法人 熊本大学 Method for producing composite particles
BRPI0806887A8 (en) * 2007-01-23 2019-01-02 Saint Gobain Abrasifs Sa coated abrasives containing aggregates
WO2010149434A1 (en) * 2009-06-25 2010-12-29 Evonik Degussa Gmbh Dispersion comprising cerium oxide and silicon dioxide
JP2011011307A (en) * 2009-07-03 2011-01-20 Sumco Corp Recycling method and recycling apparatus of slurry for use in wafer polishing
JP2012011525A (en) * 2010-07-02 2012-01-19 Admatechs Co Ltd Abrasive and manufacturing method thereof
EP2658944A4 (en) * 2010-12-30 2017-08-02 Saint-Gobain Abrasives, Inc. Coated abrasive aggregates and products containg same
JP2013129056A (en) * 2011-11-21 2013-07-04 Tosoh Corp Zirconia composite powder for polishing and method for producing the same

Also Published As

Publication number Publication date
JPWO2016017819A1 (en) 2017-05-25
WO2016017819A1 (en) 2016-02-04
CN106661428A (en) 2017-05-10
SG11201610743PA (en) 2017-02-27
JP6357536B2 (en) 2018-07-11
SG10202102010YA (en) 2021-04-29
CN106661428B (en) 2020-01-31

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