MY201443A - Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide - Google Patents

Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide

Info

Publication number
MY201443A
MY201443A MYPI2020003296A MYPI2020003296A MY201443A MY 201443 A MY201443 A MY 201443A MY PI2020003296 A MYPI2020003296 A MY PI2020003296A MY PI2020003296 A MYPI2020003296 A MY PI2020003296A MY 201443 A MY201443 A MY 201443A
Authority
MY
Malaysia
Prior art keywords
stabilization
compositions
hydroxide
quaternary trialkylalkanolamine
trialkylalkanolamine hydroxide
Prior art date
Application number
MYPI2020003296A
Inventor
Michael Urschey
Tim Rudolph
Original Assignee
Kurita Water Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurita Water Ind Ltd filed Critical Kurita Water Ind Ltd
Publication of MY201443A publication Critical patent/MY201443A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C213/00—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
    • C07C213/10—Separation; Purification; Stabilisation; Use of additives
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
    • C02F5/12—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
    • C10G75/00—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general
    • C10G75/02—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general by addition of corrosion inhibitors
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
    • C10G75/00—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general
    • C10G75/04—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general by addition of antifouling agents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14—Nitrogen-containing compounds
    • C23F11/141—Amines; Quaternary ammonium compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F14/00—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes
    • C23F14/02—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes by chemical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/08—Corrosion inhibition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Hydrology & Water Resources (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A composition comprising a) a quarternary trialkylalkanolamine hydroxide and b) at least one diamine as component b), which is selected from the group consisting of 1-amino-4-methylpiperazine, 1,2-diaminopropane and mixtures thereof.
MYPI2020003296A 2018-04-26 2018-04-26 Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide MY201443A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2018/016949 WO2019207701A1 (en) 2018-04-26 2018-04-26 Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide

Publications (1)

Publication Number Publication Date
MY201443A true MY201443A (en) 2024-02-22

Family

ID=62218269

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2020003296A MY201443A (en) 2018-04-26 2018-04-26 Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide

Country Status (10)

Country Link
US (1) US11643384B2 (en)
EP (1) EP3784817B1 (en)
JP (1) JP7036212B2 (en)
KR (1) KR102505843B1 (en)
CN (1) CN111712590B (en)
ES (1) ES2912801T3 (en)
MY (1) MY201443A (en)
PL (1) PL3784817T3 (en)
SG (1) SG11202004996XA (en)
WO (1) WO2019207701A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025212880A1 (en) * 2024-04-05 2025-10-09 Ecolab Usa Inc. Use of choline hydroxide for salt displacement in renewable feedstock process
KR20260016166A (en) 2024-07-26 2026-02-03 김하진 a shoe cabinet with a see-through and easy-to-categorize function

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2667487A (en) * 1954-01-26 Condensation products of tri
US2778789A (en) * 1954-06-02 1957-01-22 Mcneill William Electrolytic protective coating for magnesium
BE655880A (en) * 1963-11-18 1965-05-17
US5209858A (en) * 1991-02-06 1993-05-11 E. I. Du Pont De Nemours And Company Stabilization of choline and its derivatives against discoloration
US6417112B1 (en) * 1998-07-06 2002-07-09 Ekc Technology, Inc. Post etch cleaning composition and process for dual damascene system
DE60110072T2 (en) 2001-09-27 2006-01-26 Kurita Europe Gmbh Process for preventing contamination and corrosion by ammonium chloride and ammonium sulfate
JP2004067548A (en) * 2002-08-02 2004-03-04 Japan Hydrazine Co Inc Method for stabilizing quaternary alkylhydroxyalkylammonium hydroxide aqueous solution
JP3962919B2 (en) * 2002-11-12 2007-08-22 栗田工業株式会社 Metal anticorrosive, metal anticorrosion method, hydrogen chloride generation inhibitor and method for preventing hydrogen chloride generation in crude oil atmospheric distillation equipment
US20050260420A1 (en) * 2003-04-01 2005-11-24 Collins Martha J Low dielectric materials and methods for making same
CN1757445B (en) * 2004-03-02 2010-12-01 气体产品与化学公司 Compositions for the preparation of solvent-containing low dielectric materials
KR20070031397A (en) * 2004-07-09 2007-03-19 아크조 노벨 엔.브이. Compositions comprising choline hydroxide and methods for preparing same
CA2573213A1 (en) * 2004-07-09 2006-01-19 Akzo Nobel N.V. Composition comprising choline hydroxide and process for preparing the same
JP6215511B2 (en) * 2010-07-16 2017-10-18 栗田工業株式会社 Anticorrosive for boiler
US20140361217A1 (en) * 2011-11-22 2014-12-11 Taminco Stabilized choline solutions and methods for preparing the same
US20140329184A1 (en) * 2011-11-22 2014-11-06 Taminco Stabilized choline solutions and methods for preparing the same
EP2797873B1 (en) 2011-12-29 2015-12-09 Taminco Process for the production of choline hydroxide
EP2836479A4 (en) * 2012-04-13 2015-10-28 Huntsman Petrochemical Llc Using novel amines to stabilize quaternary trialkylalkanolamines
EP2984068B1 (en) * 2013-04-11 2017-05-03 Taminco Improved process for preparing choline hydroxide
CN110225667B (en) * 2013-09-11 2023-01-10 花王株式会社 Detergent composition for resin mask layer and method for producing circuit board
JP6250454B2 (en) * 2014-03-27 2017-12-20 株式会社フジミインコーポレーテッド Silicone material polishing composition
US9828574B2 (en) * 2015-01-13 2017-11-28 Cabot Microelectronics Corporation Cleaning composition and method for cleaning semiconductor wafers after CMP
CA3021971A1 (en) * 2016-04-26 2017-11-02 Ecolab Usa Inc. Corrosion inhibitor compositions and methods of using same

Also Published As

Publication number Publication date
SG11202004996XA (en) 2020-06-29
PL3784817T3 (en) 2022-08-16
JP2021520445A (en) 2021-08-19
KR20210003080A (en) 2021-01-11
US20210061754A1 (en) 2021-03-04
EP3784817A1 (en) 2021-03-03
WO2019207701A1 (en) 2019-10-31
US11643384B2 (en) 2023-05-09
CN111712590B (en) 2022-03-25
CN111712590A (en) 2020-09-25
ES2912801T3 (en) 2022-05-27
JP7036212B2 (en) 2022-03-15
EP3784817B1 (en) 2022-04-20
KR102505843B1 (en) 2023-03-03

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