NL1014545C2 - Oxim-derivaten en de toepassing daarvan als latente zuren. - Google Patents

Oxim-derivaten en de toepassing daarvan als latente zuren. Download PDF

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Publication number
NL1014545C2
NL1014545C2 NL1014545A NL1014545A NL1014545C2 NL 1014545 C2 NL1014545 C2 NL 1014545C2 NL 1014545 A NL1014545 A NL 1014545A NL 1014545 A NL1014545 A NL 1014545A NL 1014545 C2 NL1014545 C2 NL 1014545C2
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NL
Netherlands
Prior art keywords
phenyl
alkyl
substituted
alkylsulfonyl
unsubstituted
Prior art date
Application number
NL1014545A
Other languages
English (en)
Dutch (nl)
Other versions
NL1014545A1 (nl
Inventor
Kurt Dietliker
Jean-Luc Birbaum
Hitoshi Yamato
Toshikage Asakura
Masaki Ohwa
Junichi Tanabe
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27240245&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NL1014545(C2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of NL1014545A1 publication Critical patent/NL1014545A1/xx
Application granted granted Critical
Publication of NL1014545C2 publication Critical patent/NL1014545C2/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G7/00—Selection of materials for use in image-receiving members, i.e. for reversal by physical contact; Manufacture thereof
    • G03G7/0006—Cover layers for image-receiving members; Strippable coversheets
    • G03G7/002—Organic components thereof
    • G03G7/0026—Organic components thereof being macromolecular
    • G03G7/004—Organic components thereof being macromolecular obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/26—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C317/32—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/10—1,4-Dioxanes; Hydrogenated 1,4-dioxanes
    • C07D319/14—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems
    • C07D319/16—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems condensed with one six-membered ring
    • C07D319/18—Ethylenedioxybenzenes, not substituted on the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
NL1014545A 1999-03-31 2000-03-02 Oxim-derivaten en de toepassing daarvan als latente zuren. NL1014545C2 (nl)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
EP99810273 1999-03-31
EP99810273 1999-03-31
EP99810287 1999-04-07
EP99810287 1999-04-07
EP99810779 1999-08-30
EP99810779 1999-08-30

Publications (2)

Publication Number Publication Date
NL1014545A1 NL1014545A1 (nl) 2000-10-03
NL1014545C2 true NL1014545C2 (nl) 2002-02-26

Family

ID=27240245

Family Applications (2)

Application Number Title Priority Date Filing Date
NL1014545A NL1014545C2 (nl) 1999-03-31 2000-03-02 Oxim-derivaten en de toepassing daarvan als latente zuren.
NL1019981A NL1019981C2 (nl) 1999-03-31 2002-02-15 Oxim-derivaten en de toepassing daarvan als latente zuren.

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL1019981A NL1019981C2 (nl) 1999-03-31 2002-02-15 Oxim-derivaten en de toepassing daarvan als latente zuren.

Country Status (12)

Country Link
US (1) US6512020B1 (de)
KR (1) KR100700901B1 (de)
AT (1) AT410262B (de)
AU (1) AU766803B2 (de)
BE (1) BE1013627A3 (de)
CA (1) CA2302875A1 (de)
CH (1) CH694663A5 (de)
ES (1) ES2168953B1 (de)
IT (1) IT1318431B1 (de)
MY (1) MY116074A (de)
NL (2) NL1014545C2 (de)
SE (1) SE522082C2 (de)

Families Citing this family (71)

* Cited by examiner, † Cited by third party
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US6824954B2 (en) * 2001-08-23 2004-11-30 Jsr Corporation Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same
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US7098463B2 (en) * 2003-03-03 2006-08-29 Heuris Pharma, Llc Three-dimensional dosimeter for penetrating radiation and method of use
US7687220B2 (en) * 2004-07-20 2010-03-30 Ciba Specialty Chemicals Corporation Oxime derivatives and use thereof as latent acids
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EP3253735B1 (de) 2015-02-02 2021-03-31 Basf Se Latente säuren und ihre verwendung
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WO2018155547A1 (ja) * 2017-02-23 2018-08-30 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品
WO2020031240A1 (ja) 2018-08-06 2020-02-13 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品
JP7269346B2 (ja) 2018-12-07 2023-05-08 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング ポリスチレン－ｂ－ポリ（メチルメタクリレート）ジブロックコポリマーのコンタクトホール自己集合のための高速架橋可能な中性下層及びそれらの調合物
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US6512020B1 (en) 2003-01-28
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ITMI20000662A1 (it) 2001-09-30
KR20000063080A (ko) 2000-10-25
CA2302875A1 (en) 2000-09-30
BE1013627A3 (fr) 2002-05-07
AU2420000A (en) 2000-10-05
NL1019981C2 (nl) 2002-10-03
ITMI20000662A0 (it) 2000-03-30
CH694663A5 (de) 2005-05-31
SE0001090L (sv) 2000-10-01
IT1318431B1 (it) 2003-08-25
ATA5422000A (de) 2002-07-15
ES2168953A1 (es) 2002-06-16
MY116074A (en) 2003-10-31
AU766803B2 (en) 2003-10-23
AT410262B (de) 2003-03-25
SE522082C2 (sv) 2004-01-13
SE0001090D0 (sv) 2000-03-28
NL1014545A1 (nl) 2000-10-03
KR100700901B1 (ko) 2007-03-29

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