NL2006647A - Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device. - Google Patents
Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device. Download PDFInfo
- Publication number
- NL2006647A NL2006647A NL2006647A NL2006647A NL2006647A NL 2006647 A NL2006647 A NL 2006647A NL 2006647 A NL2006647 A NL 2006647A NL 2006647 A NL2006647 A NL 2006647A NL 2006647 A NL2006647 A NL 2006647A
- Authority
- NL
- Netherlands
- Prior art keywords
- grazing incidence
- radiation
- range
- reflector
- mirror layer
- Prior art date
Links
- 238000009304 pastoral farming Methods 0.000 title description 182
- 238000000034 method Methods 0.000 title description 31
- 238000004519 manufacturing process Methods 0.000 title description 18
- 230000005855 radiation Effects 0.000 claims description 153
- 239000000758 substrate Substances 0.000 claims description 44
- 238000000059 patterning Methods 0.000 claims description 34
- 238000001459 lithography Methods 0.000 claims description 8
- 239000010410 layer Substances 0.000 description 131
- 239000000463 material Substances 0.000 description 30
- 238000005286 illumination Methods 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 13
- 239000007789 gas Substances 0.000 description 9
- 238000004088 simulation Methods 0.000 description 8
- 108010001267 Protein Subunits Proteins 0.000 description 7
- 229910052776 Thorium Inorganic materials 0.000 description 7
- 229910052750 molybdenum Inorganic materials 0.000 description 7
- 239000000446 fuel Substances 0.000 description 6
- 229910052707 ruthenium Inorganic materials 0.000 description 6
- 238000000231 atomic layer deposition Methods 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 239000000356 contaminant Substances 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 150000002222 fluorine compounds Chemical class 0.000 description 4
- 229910001385 heavy metal Inorganic materials 0.000 description 4
- 150000001247 metal acetylides Chemical class 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- -1 for example Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Claims (1)
1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2006647A NL2006647A (en) | 2011-04-20 | 2011-04-20 | Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2006647A NL2006647A (en) | 2011-04-20 | 2011-04-20 | Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device. |
| NL2006647 | 2011-04-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2006647A true NL2006647A (en) | 2011-06-15 |
Family
ID=44484750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2006647A NL2006647A (en) | 2011-04-20 | 2011-04-20 | Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device. |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2006647A (nl) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10520827B2 (en) | 2016-07-07 | 2019-12-31 | Carl Zeiss Smt Gmbh | Optical system, in particular for a microlithographic projection exposure apparatus |
-
2011
- 2011-04-20 NL NL2006647A patent/NL2006647A/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10520827B2 (en) | 2016-07-07 | 2019-12-31 | Carl Zeiss Smt Gmbh | Optical system, in particular for a microlithographic projection exposure apparatus |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2678743B1 (en) | Grazing incidence reflector, lithographic apparatus, method for manufacturing a grazing incidence reflector and method for manufacturing a device | |
| EP2283388B1 (en) | Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter | |
| WO2013152921A1 (en) | Pellicle, reticle assembly and lithographic apparatus | |
| JP2006310793A (ja) | 多層ミラー用のスペクトル純化フィルタ、このような多層ミラーを含むリソグラフィ機器、所望の放射と望ましくない放射の比を拡大する方法、及びデバイスの製作方法 | |
| US9472313B2 (en) | Reflective optical components for lithographic apparatus and device manufacturing method | |
| US9448492B2 (en) | Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus | |
| NL2008391A (en) | Radiation source-collector and lithographic apparatus. | |
| US9366973B2 (en) | Lithographic apparatus and device manufacturing method | |
| WO2013113537A2 (en) | Optical element, lithographic apparatus incorporating such an element, method of manufacturing an optical element | |
| NL2009352A (en) | Radiation source. | |
| NL2017272A (en) | Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter | |
| TWI510821B (zh) | 光譜純度濾光器 | |
| NL2006647A (en) | Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device. | |
| NL2010626A (en) | Radiation source-collector and method for refurbishment. | |
| NL2006627A (en) | Reflective optical components for lithographic apparatus and device manufacturing method. | |
| NL2004992A (en) | Spectral purity filter. | |
| NL2004984A (en) | Spectral purity filter. | |
| NL2007853A (en) | Multilayer mirror, method and lithographic apparatus. | |
| NL2006602A (en) | Lithographic apparatus and device manufacturing method. | |
| NL2005763A (en) | Lithographic apparatus. |