NL2015259A - A vibration isolation system to support a structure, a lithographic apparatus and device manufacturing method. - Google Patents
A vibration isolation system to support a structure, a lithographic apparatus and device manufacturing method. Download PDFInfo
- Publication number
- NL2015259A NL2015259A NL2015259A NL2015259A NL2015259A NL 2015259 A NL2015259 A NL 2015259A NL 2015259 A NL2015259 A NL 2015259A NL 2015259 A NL2015259 A NL 2015259A NL 2015259 A NL2015259 A NL 2015259A
- Authority
- NL
- Netherlands
- Prior art keywords
- force
- vibration isolation
- isolation system
- support
- substrate
- Prior art date
Links
- 238000002955 isolation Methods 0.000 title description 63
- 238000004519 manufacturing process Methods 0.000 title description 7
- 239000000758 substrate Substances 0.000 claims description 56
- 230000005855 radiation Effects 0.000 claims description 28
- 238000000059 patterning Methods 0.000 claims description 26
- 238000001459 lithography Methods 0.000 claims description 4
- 230000033001 locomotion Effects 0.000 description 48
- 238000005259 measurement Methods 0.000 description 6
- 230000001133 acceleration Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 4
- 238000006731 degradation reaction Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
- F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Aviation & Aerospace Engineering (AREA)
- Mechanical Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP14183676 | 2014-09-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2015259A true NL2015259A (en) | 2016-08-18 |
Family
ID=51483328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2015259A NL2015259A (en) | 2014-09-05 | 2015-08-04 | A vibration isolation system to support a structure, a lithographic apparatus and device manufacturing method. |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP3189247A1 (de) |
| NL (1) | NL2015259A (de) |
| WO (1) | WO2016034348A1 (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10866529B2 (en) * | 2017-02-10 | 2020-12-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6170622B1 (en) * | 1997-03-07 | 2001-01-09 | Canon Kabushiki Kaisha | Anti-vibration apparatus and anti-vibration method thereof |
| US6029764A (en) * | 1997-11-12 | 2000-02-29 | Case Corporation | Coordinated control of an active suspension system for a work vehicle |
| US7170582B2 (en) * | 2004-12-13 | 2007-01-30 | Asml Netherlands B.V. | Support device and lightographic apparatus |
| US20140061428A1 (en) * | 2012-08-30 | 2014-03-06 | Darren Chao | Isolation system and method thereof |
-
2015
- 2015-08-04 NL NL2015259A patent/NL2015259A/en unknown
- 2015-08-04 EP EP15744599.0A patent/EP3189247A1/de not_active Withdrawn
- 2015-08-04 WO PCT/EP2015/067889 patent/WO2016034348A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2016034348A1 (en) | 2016-03-10 |
| EP3189247A1 (de) | 2017-07-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9915880B2 (en) | Stage apparatus, lithographic apparatus and method of positioning an object table | |
| US8619232B2 (en) | Method for damping an object, an active damping system, and a lithographic apparatus | |
| US8300208B2 (en) | Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus | |
| US8730451B2 (en) | Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method | |
| US10649347B2 (en) | Lithographic apparatus and device manufacturing method | |
| US8044373B2 (en) | Lithographic apparatus and device manufacturing method | |
| US20110171759A1 (en) | Lithographic Apparatus and Device Manufacturing Method | |
| US10921720B2 (en) | Support structure, method and lithographic apparatus | |
| CN101452222A (zh) | 光刻设备、投影组件、组合装置以及主动阻尼方法 | |
| US10409175B2 (en) | Lithographic apparatus and device manufacturing method | |
| WO2010020481A1 (en) | Projection system, lithographic apparatus, method of projecting a beam of radiation onto a target and device manufacturing method | |
| NL2017808A (en) | Positioning device, lithographic apparatus and device manufacturing method | |
| US10578983B2 (en) | Lithographic apparatus having an active base frame support | |
| NL2015259A (en) | A vibration isolation system to support a structure, a lithographic apparatus and device manufacturing method. | |
| US10866529B2 (en) | Lithographic apparatus and device manufacturing method | |
| US20160252827A1 (en) | Object positioning in lithography | |
| WO2019134775A1 (en) | Lithographic apparatus and method | |
| US20140293251A1 (en) | Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing Method | |
| WO2019134776A1 (en) | Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method |