NL6409341A - - Google Patents

Info

Publication number
NL6409341A
NL6409341A NL6409341A NL6409341A NL6409341A NL 6409341 A NL6409341 A NL 6409341A NL 6409341 A NL6409341 A NL 6409341A NL 6409341 A NL6409341 A NL 6409341A NL 6409341 A NL6409341 A NL 6409341A
Authority
NL
Netherlands
Application number
NL6409341A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6409341A publication Critical patent/NL6409341A/xx

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/08Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D115/00Coating compositions based on rubber derivatives
    • C09D115/02Rubber derivatives containing halogen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL6409341A 1963-08-23 1964-08-13 NL6409341A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK50617A DE1224147B (de) 1963-08-23 1963-08-23 Verfahren zur Umkehrentwicklung von Diazo-verbindungen enthaltenden Kopierschichten

Publications (1)

Publication Number Publication Date
NL6409341A true NL6409341A (de) 1965-02-24

Family

ID=7225687

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6409341A NL6409341A (de) 1963-08-23 1964-08-13

Country Status (5)

Country Link
US (1) US3406065A (de)
CH (1) CH442988A (de)
DE (1) DE1224147B (de)
GB (1) GB1066366A (de)
NL (1) NL6409341A (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1188527A (en) * 1966-05-31 1970-04-15 Algraphy Ltd Development of Light-Sensitive Layers
GB1220808A (en) * 1967-05-18 1971-01-27 Howson Algraphy Ltd Processing of presensitized photolithographic printing plate
GB1365891A (en) * 1970-08-19 1974-09-04 Howson Algraphy Ltd Lithographic printing plates
FR2274072A1 (fr) * 1974-06-06 1976-01-02 Ibm Procede de formation d'images en materiau photoresistant, applicable notamment dans l'industrie des semi-conducteurs
US4007047A (en) * 1974-06-06 1977-02-08 International Business Machines Corporation Modified processing of positive photoresists
DE2447225C2 (de) * 1974-10-03 1983-12-22 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Ablösen von positiven Photolack
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
GB1584350A (en) * 1976-07-26 1981-02-11 Vickers Ltd Lithographic printing
CA1120763A (en) * 1977-11-23 1982-03-30 James A. Carothers Enhancement of resist development
US4355095A (en) * 1980-11-26 1982-10-19 Cousins William Walter Method for producing a photomechanical color image using a strippable photostencil and water-permeable, water-insoluble color media
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
GB2171530B (en) * 1985-02-27 1989-06-28 Imtec Products Inc Method of producing reversed photoresist images by vapour diffusion

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2875046A (en) * 1954-03-01 1959-02-24 Dick Co Ab Positive working photolithographic plate and method for manufacturing same
NL130926C (de) * 1959-09-04
US3287128A (en) * 1963-04-22 1966-11-22 Martin Mariatta Corp Lithographic plates and coatings

Also Published As

Publication number Publication date
GB1066366A (en) 1967-04-26
CH442988A (de) 1967-08-31
DE1224147B (de) 1966-09-01
US3406065A (en) 1968-10-15

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