NL7005770A - - Google Patents
Info
- Publication number
- NL7005770A NL7005770A NL7005770A NL7005770A NL7005770A NL 7005770 A NL7005770 A NL 7005770A NL 7005770 A NL7005770 A NL 7005770A NL 7005770 A NL7005770 A NL 7005770A NL 7005770 A NL7005770 A NL 7005770A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
- H10P14/69215—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material being a silicon oxide, e.g. SiO2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6326—Deposition processes
- H10P14/6328—Deposition from the gas or vapour phase
- H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
- H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
- H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
- H10P14/6682—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/118—Oxide films
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/935—Gas flow control
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19691933664 DE1933664C3 (de) | 1969-07-02 | Verfahren zum Überziehen von Halbleiterscheiben mit einer Schicht aus Siliciumdioxyd |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7005770A true NL7005770A (fr) | 1971-01-05 |
Family
ID=5738701
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7005770A NL7005770A (fr) | 1969-07-02 | 1970-04-21 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3681132A (fr) |
| AT (1) | AT324423B (fr) |
| CA (1) | CA942602A (fr) |
| CH (1) | CH542936A (fr) |
| FR (1) | FR2056427A5 (fr) |
| GB (1) | GB1281298A (fr) |
| NL (1) | NL7005770A (fr) |
| SE (1) | SE359195B (fr) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3991234A (en) * | 1974-09-30 | 1976-11-09 | American Optical Corporation | Process for coating a lens of synthetic polymer with a durable abrasion resistant vitreous composition |
| US4052520A (en) * | 1974-09-30 | 1977-10-04 | American Optical Corporation | Process for coating a synthetic polymer sheet material with a durable abrasion-resistant vitreous composition |
| DE2447224A1 (de) * | 1974-10-03 | 1976-04-15 | Ibm Deutschland | Verfahren zum aufwachsen von pyrolitischen siliciumdioxidschichten |
| JPS51144183A (en) * | 1975-06-06 | 1976-12-10 | Hitachi Ltd | Semiconductor element containing surface protection film |
| DE3585901D1 (de) * | 1984-02-13 | 1992-05-27 | Iii Jerome J Schmitt | Verfahren und vorrichtung fuer gasstrahlniederschlag von leitfaehigen und dielektrischen duennen festfilmen und so hergestellte erzeugnisse. |
| US4707313A (en) * | 1986-07-02 | 1987-11-17 | A. O. Smith Corporation | Method of making a laminated structure for use in an electrical apparatus |
| KR0170391B1 (ko) * | 1989-06-16 | 1999-03-30 | 다카시마 히로시 | 피처리체 처리장치 및 처리방법 |
| DE3936654C1 (fr) * | 1989-11-03 | 1990-12-20 | Schott Glaswerke, 6500 Mainz, De | |
| US5262204A (en) * | 1989-11-03 | 1993-11-16 | Schott Glaswerke | Glass-ceramic article decorated with ceramic color and process for its production |
| FR2679898B1 (fr) * | 1991-07-31 | 1993-11-05 | Air Liquide | Procede de formation d'une couche de silice sur une surface d'un objet en verre. |
| WO2006114686A1 (fr) * | 2005-04-25 | 2006-11-02 | CARL ZEISS VISION SOUTH AFRICA (Pty) LTD | Procede et appareil d'enrobage d'objets |
| US20060266793A1 (en) * | 2005-05-24 | 2006-11-30 | Caterpillar Inc. | Purging system having workpiece movement device |
-
1970
- 1970-04-21 NL NL7005770A patent/NL7005770A/xx unknown
- 1970-06-24 CA CA086,393A patent/CA942602A/en not_active Expired
- 1970-06-25 US US49618A patent/US3681132A/en not_active Expired - Lifetime
- 1970-06-30 CH CH985270A patent/CH542936A/de not_active IP Right Cessation
- 1970-06-30 FR FR7024184A patent/FR2056427A5/fr not_active Expired
- 1970-06-30 AT AT588570A patent/AT324423B/de not_active IP Right Cessation
- 1970-07-01 GB GB31837/70A patent/GB1281298A/en not_active Expired
- 1970-07-02 SE SE09223/70A patent/SE359195B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| SE359195B (fr) | 1973-08-20 |
| GB1281298A (en) | 1972-07-12 |
| FR2056427A5 (fr) | 1971-05-14 |
| CA942602A (en) | 1974-02-26 |
| DE1933664A1 (de) | 1971-01-14 |
| CH542936A (de) | 1973-10-15 |
| US3681132A (en) | 1972-08-01 |
| AT324423B (de) | 1975-08-25 |
| DE1933664B2 (de) | 1976-01-22 |