NL7016493A - - Google Patents

Info

Publication number
NL7016493A
NL7016493A NL7016493A NL7016493A NL7016493A NL 7016493 A NL7016493 A NL 7016493A NL 7016493 A NL7016493 A NL 7016493A NL 7016493 A NL7016493 A NL 7016493A NL 7016493 A NL7016493 A NL 7016493A
Authority
NL
Netherlands
Application number
NL7016493A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7016493A publication Critical patent/NL7016493A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL7016493A 1969-11-21 1970-11-11 NL7016493A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1958485A DE1958485C3 (de) 1969-11-21 1969-11-21 Strahlungsempfindliches Aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
NL7016493A true NL7016493A (fr) 1971-05-25

Family

ID=5751695

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7016493A NL7016493A (fr) 1969-11-21 1970-11-11

Country Status (9)

Country Link
US (1) US3645967A (fr)
JP (1) JPS4927696B1 (fr)
AT (1) AT306505B (fr)
BE (1) BE759113A (fr)
DE (1) DE1958485C3 (fr)
FR (1) FR2069741A5 (fr)
GB (1) GB1327804A (fr)
NL (1) NL7016493A (fr)
SE (1) SE361954B (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2735718B1 (fr) * 1995-06-22 1997-08-08 Photomeca Egg Procede de fabrication de plaques photopolymeres par phototransformation selective
US20140306168A1 (en) * 2013-04-12 2014-10-16 Spectra Group Limited, Inc. Photosensitization of persulfate for photo-induced polymerization

Also Published As

Publication number Publication date
DE1958485C3 (de) 1979-10-25
DE1958485A1 (de) 1971-05-27
JPS4927696B1 (fr) 1974-07-19
SE361954B (fr) 1973-11-19
DE1958485B2 (de) 1979-03-01
BE759113A (fr) 1971-05-18
GB1327804A (en) 1973-08-22
US3645967A (en) 1972-02-29
AT306505B (de) 1973-04-10
FR2069741A5 (fr) 1971-09-03

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