NL7609045A - Werkwijze ter vervaardiging van een licht- gevoelige massa. - Google Patents

Werkwijze ter vervaardiging van een licht- gevoelige massa.

Info

Publication number
NL7609045A
NL7609045A NL7609045A NL7609045A NL7609045A NL 7609045 A NL7609045 A NL 7609045A NL 7609045 A NL7609045 A NL 7609045A NL 7609045 A NL7609045 A NL 7609045A NL 7609045 A NL7609045 A NL 7609045A
Authority
NL
Netherlands
Prior art keywords
manufacture
light
sensitive mass
sensitive
mass
Prior art date
Application number
NL7609045A
Other languages
English (en)
Dutch (nl)
Original Assignee
Alusuisse
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alusuisse filed Critical Alusuisse
Publication of NL7609045A publication Critical patent/NL7609045A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
NL7609045A 1975-08-14 1976-08-13 Werkwijze ter vervaardiging van een licht- gevoelige massa. NL7609045A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1057675 1975-08-14

Publications (1)

Publication Number Publication Date
NL7609045A true NL7609045A (nl) 1977-02-16

Family

ID=4364675

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7609045A NL7609045A (nl) 1975-08-14 1976-08-13 Werkwijze ter vervaardiging van een licht- gevoelige massa.

Country Status (9)

Country Link
US (1) US4075015A (fr)
AT (1) AT348329B (fr)
BE (1) BE845241A (fr)
DE (1) DE2551372A1 (fr)
ES (1) ES450698A1 (fr)
FR (1) FR2321141A1 (fr)
GB (1) GB1521145A (fr)
IT (1) IT1066124B (fr)
NL (1) NL7609045A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4576766A (en) * 1983-09-07 1986-03-18 The Plessey Company Plc Photochromic compounds and their use in photoreactive lenses
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
JP2002341558A (ja) * 2001-05-11 2002-11-27 Fuji Photo Film Co Ltd 平版印刷版の印刷処理方法及び平版印刷版

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1023396A (fr) * 1950-07-24 1953-03-18 Plaque offset et procédé de fabrication
DE1572155A1 (de) * 1965-08-10 1970-01-02 Dr Eduard Roell Licht-bzw.strahlungsempfindliches Material und Verfahren zu dessen Herstellung
GB1235281A (en) * 1967-02-18 1971-06-09 Howson Algraphy Ltd Improvements in or relating to lithographic printing plates
US3926638A (en) * 1971-11-18 1975-12-16 Sun Chemical Corp Photopolymerizable compositions comprising monocarboxyl-substituted benzophenone reaction products

Also Published As

Publication number Publication date
DE2551372A1 (de) 1977-02-24
ES450698A1 (es) 1977-07-16
BE845241A (fr) 1977-02-16
AT348329B (de) 1979-02-12
ATA605176A (de) 1978-06-15
GB1521145A (en) 1978-08-16
FR2321141A1 (fr) 1977-03-11
US4075015A (en) 1978-02-21
IT1066124B (it) 1985-03-04

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Legal Events

Date Code Title Description
BV The patent application has lapsed