NL7810885A - Voor electronen gevoelige beschermingsmaterialen of beschermingslagen. - Google Patents

Voor electronen gevoelige beschermingsmaterialen of beschermingslagen.

Info

Publication number: NL7810885A
Authority: NL; Netherlands
Prior art keywords: electronics; protective materials; coatings sensitive; coatings; sensitive
Prior art date: 1977-11-07

Application number

NL7810885A

Other languages

English (en)

Dutch (nl)

Original Assignee

Ceskoslovenska Akademie Ved

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-11-07

Filing date

1978-11-01

Publication date

1979-05-09

1978-11-01 Application filed by Ceskoslovenska Akademie Ved filed Critical Ceskoslovenska Akademie Ved

1979-05-09 Publication of NL7810885A publication Critical patent/NL7810885A/xx

Links

230000001681 protective effect Effects 0.000 title 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

NL7810885A 1977-11-07 1978-11-01 Voor electronen gevoelige beschermingsmaterialen of beschermingslagen. NL7810885A (nl)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CS777258A CS193322B1 (en)	1977-11-07	1977-11-07	Electron resisit

Publications (1)

Publication Number	Publication Date
NL7810885A true NL7810885A (nl)	1979-05-09

Family

ID=5421395

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NL7810885A NL7810885A (nl)	1977-11-07	1978-11-01	Voor electronen gevoelige beschermingsmaterialen of beschermingslagen.

Country Status (8)

Country	Link
US (1)	US4269962A (cs)
JP (1)	JPS5476135A (cs)
BE (1)	BE871801A (cs)
CS (1)	CS193322B1 (cs)
DE (1)	DE2848254A1 (cs)
FR (1)	FR2422984A1 (cs)
GB (1)	GB2009759A (cs)
NL (1)	NL7810885A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5614232A (en) *	1979-07-16	1981-02-12	Mitsubishi Rayon Co Ltd	Negative type resist resin
CA2377081A1 (en)	2002-03-15	2003-09-15	Quantiscript Inc.	Method of producing an etch-resistant polymer structure using electron beam lithography

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3480441A (en) *	1966-08-09	1969-11-25	Ibm	Photosensitive compositions
US3885060A (en) *	1968-08-23	1975-05-20	Hitachi Ltd	Production of insolubilized organic polymers
US3840449A (en) *	1968-12-13	1974-10-08	Bridgestone Tire Co Ltd	Novel method of producing two-component and multi-component copolymers containing conjugated diene compounds and conjugated polar vinyl monomers using photo polymerization
US3615469A (en) *	1969-06-02	1971-10-26	Goodrich Co B F	Polymeric printing plates
BE794343A (fr) *	1972-01-21	1973-07-19	Westinghouse Electric Corp	Methode de protection d'une partie d'un substrat soumis a l'action d'1n faisceau electronique
US3787212A (en) *	1972-08-04	1974-01-22	Monsanto Co	Polymeric photosensitive compositions and methods using same
GB1448838A (en) *	1972-11-14	1976-09-08	Kansai Paint Co Ltd	Lithography
US3865597A (en) *	1973-03-26	1975-02-11	Western Electric Co	Additives to negative photoresists which increase the sensitivity thereof
US4061799A (en) *	1973-11-05	1977-12-06	Texas Instruments Incorporated	Method of patterning styrene diene block copolymer electron beam resists
US3931435A (en) *	1974-12-20	1976-01-06	International Business Machines Corporation	Electron beam positive resists containing acetate polymers
JPS51116893A (en) *	1975-04-08	1976-10-14	Ube Ind Ltd	Photo-setting compositions
US4130424A (en) *	1976-08-06	1978-12-19	Bell Telephone Laboratories, Incorporated	Process using radiation curable epoxy containing resist and resultant product

1977
- 1977-11-07 CS CS777258A patent/CS193322B1/cs unknown
1978
- 1978-10-27 GB GB7842258A patent/GB2009759A/en not_active Withdrawn
- 1978-10-27 US US05/955,457 patent/US4269962A/en not_active Expired - Lifetime
- 1978-11-01 NL NL7810885A patent/NL7810885A/xx not_active Application Discontinuation
- 1978-11-06 JP JP13592378A patent/JPS5476135A/ja active Pending
- 1978-11-06 FR FR7831321A patent/FR2422984A1/fr active Pending
- 1978-11-06 BE BE191560A patent/BE871801A/xx unknown
- 1978-11-07 DE DE19782848254 patent/DE2848254A1/de not_active Withdrawn

Also Published As

Publication number	Publication date
GB2009759A (en)	1979-06-20
JPS5476135A (en)	1979-06-18
DE2848254A1 (de)	1979-05-10
FR2422984A1 (fr)	1979-11-09
CS193322B1 (en)	1979-10-31
US4269962A (en)	1981-05-26
BE871801A (fr)	1979-03-01

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Legal Events

Date	Code	Title	Description
1980-09-25	BA	A request for search or an international-type search has been filed
1982-07-01	BV	The patent application has lapsed