NL8400916A - Werkwijze voor het vervaardigen van een isfet en een aldus vervaardigde isfet. - Google Patents

Werkwijze voor het vervaardigen van een isfet en een aldus vervaardigde isfet. Download PDF

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Publication number
NL8400916A
NL8400916A NL8400916A NL8400916A NL8400916A NL 8400916 A NL8400916 A NL 8400916A NL 8400916 A NL8400916 A NL 8400916A NL 8400916 A NL8400916 A NL 8400916A NL 8400916 A NL8400916 A NL 8400916A
Authority
NL
Netherlands
Prior art keywords
coating
polymer
vinyl
oxidic surface
metal ion
Prior art date
Application number
NL8400916A
Other languages
English (en)
Dutch (nl)
Original Assignee
Stichting Ct Voor Micro Elektr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stichting Ct Voor Micro Elektr filed Critical Stichting Ct Voor Micro Elektr
Priority to NL8400916A priority Critical patent/NL8400916A/nl
Priority to EP85901604A priority patent/EP0177544B1/de
Priority to PCT/NL1985/000013 priority patent/WO1985004480A1/en
Priority to JP60501475A priority patent/JPS61501726A/ja
Priority to DE8585901604T priority patent/DE3586478T2/de
Priority to AT85901604T priority patent/ATE79472T1/de
Priority to US06/807,508 priority patent/US4735702A/en
Publication of NL8400916A publication Critical patent/NL8400916A/nl

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403—Cells and electrode assemblies
    • G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/667—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of alloy material, compound material or organic material contacting the insulator, e.g. TiN workfunction layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Organic Insulating Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Formation Of Insulating Films (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Silicon Polymers (AREA)
NL8400916A 1984-03-22 1984-03-22 Werkwijze voor het vervaardigen van een isfet en een aldus vervaardigde isfet. NL8400916A (nl)

Priority Applications (7)

Application Number Priority Date Filing Date Title
NL8400916A NL8400916A (nl) 1984-03-22 1984-03-22 Werkwijze voor het vervaardigen van een isfet en een aldus vervaardigde isfet.
EP85901604A EP0177544B1 (de) 1984-03-22 1985-03-22 Verfahren zur herstellung eines isfet und nach diesem verfahren hergestellte isfet
PCT/NL1985/000013 WO1985004480A1 (en) 1984-03-22 1985-03-22 Method of producing an isfet and same isfet
JP60501475A JPS61501726A (ja) 1984-03-22 1985-03-22 Ｉｓｆｅｔを製造する方法およびそのｉｓｆｅｔ
DE8585901604T DE3586478T2 (de) 1984-03-22 1985-03-22 Verfahren zur herstellung eines isfet und nach diesem verfahren hergestellte isfet.
AT85901604T ATE79472T1 (de) 1984-03-22 1985-03-22 Verfahren zur herstellung eines isfet und nach diesem verfahren hergestellte isfet.
US06/807,508 US4735702A (en) 1984-03-22 1985-03-22 Method of producing an ISFET and same ISFET

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8400916A NL8400916A (nl) 1984-03-22 1984-03-22 Werkwijze voor het vervaardigen van een isfet en een aldus vervaardigde isfet.
NL8400916 1984-03-22

Publications (1)

Publication Number Publication Date
NL8400916A true NL8400916A (nl) 1985-10-16

Family

ID=19843690

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8400916A NL8400916A (nl) 1984-03-22 1984-03-22 Werkwijze voor het vervaardigen van een isfet en een aldus vervaardigde isfet.

Country Status (7)

Country Link
US (1) US4735702A (de)
EP (1) EP0177544B1 (de)
JP (1) JPS61501726A (de)
AT (1) ATE79472T1 (de)
DE (1) DE3586478T2 (de)
NL (1) NL8400916A (de)
WO (1) WO1985004480A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5380423A (en) * 1992-10-15 1995-01-10 Priva Agro Holding B.V. Anion-selective membrane and a sensor provided therewith

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8602242A (nl) * 1986-09-05 1988-04-05 Stichting Ct Voor Micro Elektr Werkwijze voor het vervaardigen van een refet of een chemfet, en de vervaardigde refet of chemfet.
JPS63131056A (ja) * 1986-11-20 1988-06-03 Terumo Corp Ｆｅｔ電極
US4859538A (en) * 1986-11-20 1989-08-22 Ribi Hans O Novel lipid-protein compositions and articles and methods for their preparation
US5074977A (en) * 1987-05-05 1991-12-24 The Washington Technology Center Digital biosensors and method of using same
CA1318353C (en) * 1987-05-05 1993-05-25 Peter Wing-Poon Cheung System employing a biosensor to monitor a characteristic of a select component in a medium
IT1215491B (it) * 1987-05-15 1990-02-14 Enricerche Spa Biosensore con membrana enzimatica legata chimicamente a un dispositivo semiconduttore.
IT1222121B (it) * 1987-07-24 1990-08-31 Eniricerche Spa Sensore per ioni contenente una membrana organica selettiva
DE3876602T2 (de) * 1987-10-13 1993-07-01 Taiyo Yuden Kk Ionensensor.
IT1228120B (it) * 1988-12-23 1991-05-28 Eniricerche Spa Procedimento per ottenere un sensore multifunzionale a membrana ionoselettiva
CA2047991A1 (en) * 1991-02-04 1992-08-05 John Musacchio Solid contact system for potentiometric sensors
US5958201A (en) * 1996-08-26 1999-09-28 Dade Behring Inc. Sodium ion-selective-electrode membrane having extended uselife
TW465055B (en) 2000-07-20 2001-11-21 Univ Nat Yunlin Sci & Tech Method and apparatus for measurement of temperature parameter of ISFET using amorphous silicon hydride as sensor membrane
FR2813208B1 (fr) * 2000-08-30 2003-03-28 Commissariat Energie Atomique Structure complexante, dispositif et procede de traitement d'effluents liquides
GB0022360D0 (en) * 2000-09-13 2000-10-25 British Nuclear Fuels Plc Improvemnts in and related to sensors
EP1711803A1 (de) 2004-02-06 2006-10-18 Micronas GmbH Sensor und verfahren zu dessen herstellung
US7829150B2 (en) * 2004-06-17 2010-11-09 Cornell Research Foundation, Inc. Growth of inorganic thin films using self-assembled monolayers as nucleation sites
US20080108164A1 (en) * 2006-11-06 2008-05-08 Oleynik Vladislav A Sensor System and Method
CN102132361B (zh) * 2008-09-02 2015-03-25 丰田自动车株式会社 压粉磁芯用粉末、压粉磁芯和它们的制造方法
DE102015121344B4 (de) * 2015-12-08 2023-11-02 Infineon Technologies Austria Ag Halbleitervorrichtung und verfahren zu ihrer herstellung
US10794853B2 (en) 2016-12-09 2020-10-06 Applied Materials, Inc. Methods for depositing polymer layer for sensor applications via hot wire chemical vapor deposition

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2019099C3 (de) * 1970-04-21 1975-11-20 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur Herstellung eines stabilen Oberflachenschutzes fur Halbleiterbauelemente
US4146585A (en) * 1977-03-02 1979-03-27 Union Carbide Corporation Process for preparing silane grafted polymers
US4302530A (en) * 1977-12-08 1981-11-24 University Of Pennsylvania Method for making substance-sensitive electrical structures by processing substance-sensitive photoresist material
JPS5825221B2 (ja) * 1977-12-12 1983-05-26 株式会社クラレ Ｆｅｔ比較電極
JPS5853745A (ja) * 1981-09-28 1983-03-30 Hitachi Ltd ２次元電気泳動装置
JPS58103656A (ja) * 1981-12-16 1983-06-20 Hitachi Ltd 電気泳動用装置
US4476003A (en) * 1983-04-07 1984-10-09 The United States Of America As Represented By The United States Department Of Energy Chemical anchoring of organic conducting polymers to semiconducting surfaces
JPS59210356A (ja) * 1983-05-13 1984-11-29 Kuraray Co Ltd トリグリセライドセンサ
JPS60177256A (ja) * 1984-02-23 1985-09-11 Shimadzu Corp イオンセンサ−

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5380423A (en) * 1992-10-15 1995-01-10 Priva Agro Holding B.V. Anion-selective membrane and a sensor provided therewith

Also Published As

Publication number Publication date
JPS61501726A (ja) 1986-08-14
US4735702A (en) 1988-04-05
EP0177544B1 (de) 1992-08-12
DE3586478D1 (de) 1992-09-17
ATE79472T1 (de) 1992-08-15
EP0177544A1 (de) 1986-04-16
DE3586478T2 (de) 1993-02-25
WO1985004480A1 (en) 1985-10-10

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A1B A search report has been drawn up
BC A request for examination has been filed
CNR Transfer of rights (patent application after its laying open for public inspection)

Free format text: PRIVA AGRO HOLDING B.V.

BV The patent application has lapsed