NL8601466A - Werkwijze en inrichting voor het verwijderen van polymeer dat het stencil vormt op een drukplaat. - Google Patents

Werkwijze en inrichting voor het verwijderen van polymeer dat het stencil vormt op een drukplaat. Download PDF

Info

Publication number: NL8601466A
Authority: NL; Netherlands
Prior art keywords: screen; reduced pressure; under reduced; electrode; gas
Prior art date: 1985-06-10

Application number

NL8601466A

Other languages

English (en)

Dutch (nl)

Original Assignee

Elitex Zavody Textilniho

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-06-10

Filing date

1986-06-06

Publication date

1987-01-02

1986-06-06 Application filed by Elitex Zavody Textilniho filed Critical Elitex Zavody Textilniho

1987-01-02 Publication of NL8601466A publication Critical patent/NL8601466A/nl

Links

229920000642 polymer Polymers 0.000 title claims description 25
238000000034 method Methods 0.000 title claims description 23
239000007789 gas Substances 0.000 claims description 38
238000007639 printing Methods 0.000 claims description 10
239000007795 chemical reaction product Substances 0.000 claims description 9
239000000126 substance Substances 0.000 claims description 8
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
239000001301 oxygen Substances 0.000 claims description 5
229910052760 oxygen Inorganic materials 0.000 claims description 5
230000008569 process Effects 0.000 claims description 5
230000005684 electric field Effects 0.000 claims description 2
238000010022 rotary screen printing Methods 0.000 claims description 2
239000007787 solid Substances 0.000 claims description 2
229920002120 photoresistant polymer Polymers 0.000 description 22
239000012495 reaction gas Substances 0.000 description 12
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
238000006243 chemical reaction Methods 0.000 description 6
239000000047 product Substances 0.000 description 5
239000003570 air Substances 0.000 description 4
239000000203 mixture Substances 0.000 description 4
229910052759 nickel Inorganic materials 0.000 description 4
230000008901 benefit Effects 0.000 description 3
230000008859 change Effects 0.000 description 3
238000000576 coating method Methods 0.000 description 3
238000002485 combustion reaction Methods 0.000 description 3
230000008878 coupling Effects 0.000 description 3
238000010168 coupling process Methods 0.000 description 3
238000005859 coupling reaction Methods 0.000 description 3
MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
239000002245 particle Substances 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
230000009471 action Effects 0.000 description 2
238000005273 aeration Methods 0.000 description 2
231100000481 chemical toxicant Toxicity 0.000 description 2
239000011248 coating agent Substances 0.000 description 2
239000000498 cooling water Substances 0.000 description 2
238000007689 inspection Methods 0.000 description 2
239000012212 insulator Substances 0.000 description 2
230000007246 mechanism Effects 0.000 description 2
230000003287 optical effect Effects 0.000 description 2
230000001105 regulatory effect Effects 0.000 description 2
239000002904 solvent Substances 0.000 description 2
239000012209 synthetic fiber Substances 0.000 description 2
229920002994 synthetic fiber Polymers 0.000 description 2
239000004753 textile Substances 0.000 description 2
239000003440 toxic substance Substances 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical class [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
230000004913 activation Effects 0.000 description 1
230000006978 adaptation Effects 0.000 description 1
239000012080 ambient air Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
229910002090 carbon oxide Inorganic materials 0.000 description 1
239000013043 chemical agent Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
239000003086 colorant Substances 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
230000006835 compression Effects 0.000 description 1
238000007906 compression Methods 0.000 description 1
230000001276 controlling effect Effects 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000010616 electrical installation Methods 0.000 description 1
238000000295 emission spectrum Methods 0.000 description 1
238000000605 extraction Methods 0.000 description 1
239000004744 fabric Substances 0.000 description 1
239000012530 fluid Substances 0.000 description 1
-1 freon Chemical compound 0.000 description 1
239000011521 glass Substances 0.000 description 1
230000036541 health Effects 0.000 description 1
238000003780 insertion Methods 0.000 description 1
230000037431 insertion Effects 0.000 description 1
238000009434 installation Methods 0.000 description 1
238000009413 insulation Methods 0.000 description 1
239000000543 intermediate Substances 0.000 description 1
239000004922 lacquer Substances 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
239000000463 material Substances 0.000 description 1
239000012528 membrane Substances 0.000 description 1
239000002184 metal Substances 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000012986 modification Methods 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
229910052756 noble gas Inorganic materials 0.000 description 1
150000002835 noble gases Chemical class 0.000 description 1
238000013021 overheating Methods 0.000 description 1
238000006552 photochemical reaction Methods 0.000 description 1
238000009832 plasma treatment Methods 0.000 description 1
230000008092 positive effect Effects 0.000 description 1
230000009257 reactivity Effects 0.000 description 1
230000009467 reduction Effects 0.000 description 1
238000007789 sealing Methods 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
238000000926 separation method Methods 0.000 description 1
229910052814 silicon oxide Inorganic materials 0.000 description 1
238000004611 spectroscopical analysis Methods 0.000 description 1
230000000087 stabilizing effect Effects 0.000 description 1
239000002344 surface layer Substances 0.000 description 1
238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
230000000007 visual effect Effects 0.000 description 1
238000011179 visual inspection Methods 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/427—Stripping or agents therefor using plasma means only
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
General Physics & Mathematics (AREA)
Physical Or Chemical Processes And Apparatus (AREA)

NL8601466A 1985-06-10 1986-06-06 Werkwijze en inrichting voor het verwijderen van polymeer dat het stencil vormt op een drukplaat. NL8601466A (nl)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
CS411885A CS250295B1 (en)	1985-06-10	1985-06-10	Method of polymer removal forming pattern of printing plates especially rotating ones for silk-screen printing and device for realization of this method
CS411885		1985-06-10

Publications (1)

Publication Number	Publication Date
NL8601466A true NL8601466A (nl)	1987-01-02

Family

ID=5383223

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NL8601466A NL8601466A (nl)	1985-06-10	1986-06-06	Werkwijze en inrichting voor het verwijderen van polymeer dat het stencil vormt op een drukplaat.

Country Status (4)

Country	Link
AT (1)	ATA157286A (cs)
CS (1)	CS250295B1 (cs)
DE (1)	DE3618872A1 (cs)
NL (1)	NL8601466A (cs)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB2285141B (en) *	1993-12-23	1998-03-11	Motorola Ltd	Method of removing photo resist

1985
- 1985-06-10 CS CS411885A patent/CS250295B1/cs unknown
1986
- 1986-06-05 DE DE19863618872 patent/DE3618872A1/de not_active Withdrawn
- 1986-06-06 NL NL8601466A patent/NL8601466A/nl not_active Application Discontinuation
- 1986-06-10 AT AT157286A patent/ATA157286A/de not_active Application Discontinuation

Also Published As

Publication number	Publication date
CS250295B1 (en)	1987-04-16
DE3618872A1 (de)	1986-12-11
ATA157286A (de)	1992-06-15

Legal Events

Date	Code	Title	Description
1991-02-01	BV	The patent application has lapsed

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