NO20051492L - Stabilisert, vandig silisiumdioksiddispergering. - Google Patents

Stabilisert, vandig silisiumdioksiddispergering.

Info

Publication number: NO20051492L
Authority: NO; Norway
Prior art keywords: silica dispersion; aqueous silica; stabilized aqueous; cation; range
Prior art date: 2002-08-22

Application number

NO20051492A

Other languages

English (en)

Norwegian (no)

Inventor

Gerrit Schneider

Wolfgang Lortz

Christoph Batz-Sohn

Gabriele Perlet

Werner Will

Peter Neugebauer

Original Assignee

Degussa

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-08-22

Filing date

2005-03-21

Publication date

2005-05-13

2005-03-21 Application filed by Degussa filed Critical Degussa

2005-05-13 Publication of NO20051492L publication Critical patent/NO20051492L/no

Links

VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 5
150000001875 compounds Chemical class 0.000 abstract 2
239000006185 dispersion Substances 0.000 abstract 2
239000000843 powder Substances 0.000 abstract 2
239000000377 silicon dioxide Substances 0.000 abstract 2
239000012736 aqueous medium Substances 0.000 abstract 1
239000002184 metal Substances 0.000 abstract 1
238000005498 polishing Methods 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/146—After-treatment of sols
- C01B33/149—Coating
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3045—Treatment with inorganic compounds
- C09C1/3054—Coating
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
- C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Health & Medical Sciences (AREA)
Composite Materials (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Dispersion Chemistry (AREA)
Inorganic Chemistry (AREA)
Silicon Compounds (AREA)
Colloid Chemistry (AREA)
Mechanical Treatment Of Semiconductor (AREA)

NO20051492A 2002-08-22 2005-03-21 Stabilisert, vandig silisiumdioksiddispergering. NO20051492L (no)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE10238463A DE10238463A1 (de)	2002-08-22	2002-08-22	Stabilisierte, wässerige Siliciumdioxid-Dispersion
PCT/EP2003/008333 WO2004018359A1 (en)	2002-08-22	2003-07-29	Stabilized, aqueous silicon dioxide dispersion

Publications (1)

Publication Number	Publication Date
NO20051492L true NO20051492L (no)	2005-05-13

Family

ID=31197230

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO20051492A NO20051492L (no)	2002-08-22	2005-03-21	Stabilisert, vandig silisiumdioksiddispergering.

Country Status (10)

Country	Link
EP (1)	EP1529014A1 (pl)
JP (1)	JP4448030B2 (pl)
KR (1)	KR100772258B1 (pl)
CN (1)	CN100447082C (pl)
AU (1)	AU2003250188A1 (pl)
CA (1)	CA2496467C (pl)
DE (1)	DE10238463A1 (pl)
NO (1)	NO20051492L (pl)
PL (1)	PL203972B1 (pl)
WO (1)	WO2004018359A1 (pl)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TW200613485A (en) *	2004-03-22	2006-05-01	Kao Corp	Polishing composition
DE102004021092A1 (de) *	2004-04-29	2005-11-24	Degussa Ag	Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel
AT500776B1 (de) *	2004-08-18	2008-12-15	Wagner Friedrich	Verwendung einer zusammensetzung zum aufbringen einer rutschhemmenden, höhenaufbauenden strukturbeschichtung
AT502282B1 (de) *	2005-07-26	2008-12-15	Friedrich Wagner	Rutschhemmender sprühauftrag für bewegliche bodenbeläge
WO2006046463A1 (ja) *	2004-10-28	2006-05-04	Konica Minolta Photo Imaging, Inc.	カチオン性微粒子分散体及びインクジェット記録用紙
DE102005012409A1 (de)	2005-03-17	2006-09-21	Wacker Chemie Ag	Wäßrige Dispersionen teilhydrophober Kieselsäuren
DE102005062606A1 (de) *	2005-12-23	2007-07-05	Deutsche Institute Für Textil- Und Faserforschung Denkendorf	Nanoskalige Teilchen auf der Basis von SiO2 und Mischoxiden hiervon, deren Herstellung und Verwendung zur Behandlung textiler Materialien
JP2007258606A (ja) *	2006-03-24	2007-10-04	Fujifilm Corp	化学的機械的研磨用研磨液
CN101490200B (zh) *	2006-07-12	2012-09-05	卡伯特微电子公司	含有金属的基板的化学机械抛光方法
DE102006049526A1 (de) *	2006-10-20	2008-04-24	Evonik Degussa Gmbh	Stabile wässrige Dispersionen von Siliciumdioxid
PL2222793T3 (pl) *	2007-11-19	2018-03-30	Grace Gmbh & Co. Kg	Cząstki antykorozyjne
DE102007059861A1 (de) *	2007-12-12	2009-06-18	Evonik Degussa Gmbh	Verfahren zur Herstellung von Siliciumdioxid-Dispersionen
DE102008041466A1 (de)	2008-08-22	2010-02-25	Wacker Chemie Ag	Wäßrige Dispersionen hydrophober Kieselsäuren
CN101838479B (zh) *	2010-03-19	2013-11-20	福建师范大学	一种可分散超细二氧化硅的制备方法
JP6414547B2 (ja) *	2013-06-10	2018-10-31	日産化学株式会社	シリカゾル及びシリカゾルの製造方法
CN105778775B (zh) *	2014-12-23	2021-03-02	安集微电子（上海）有限公司	一种中性胶体二氧化硅的制备方法
CN104830300A (zh) *	2015-04-30	2015-08-12	河南大学	一种小粒径纳米聚硅乳液及其制备方法
CN108751204A (zh) *	2018-05-14	2018-11-06	江苏联瑞新材料股份有限公司	一种亚微米二氧化硅分散液的制备方法
CN111777949A (zh) *	2020-07-13	2020-10-16	长沙金硅地环保科技有限公司	一种高分子纳米硅与水溶胶聚合物及其应用
JP7602347B2 (ja) *	2020-10-21	2024-12-18	山口精研工業株式会社	シリカ分散液、及び研磨剤組成物
CN114044520B (zh) *	2021-11-29	2024-06-28	苏州西丽卡电子材料有限公司	一种高铝超纯合成石英砂的制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2892797A (en) *	1956-02-17	1959-06-30	Du Pont	Process for modifying the properties of a silica sol and product thereof
US3007878A (en) *	1956-11-01	1961-11-07	Du Pont	Aquasols of positively-charged coated silica particles and their production
SE501214C2 (sv) *	1992-08-31	1994-12-12	Eka Nobel Ab	Silikasol samt förfarande för framställning av papper under användande av solen
AU6281399A (en) *	1998-10-02	2000-04-26	Cabot Corporation	Silica dispersion, coating composition and recording medium

2002
- 2002-08-22 DE DE10238463A patent/DE10238463A1/de not_active Ceased
2003
- 2003-07-29 WO PCT/EP2003/008333 patent/WO2004018359A1/en not_active Ceased
- 2003-07-29 AU AU2003250188A patent/AU2003250188A1/en not_active Abandoned
- 2003-07-29 JP JP2004530060A patent/JP4448030B2/ja not_active Expired - Fee Related
- 2003-07-29 CA CA002496467A patent/CA2496467C/en not_active Expired - Fee Related
- 2003-07-29 CN CNB038198096A patent/CN100447082C/zh not_active Expired - Lifetime
- 2003-07-29 PL PL373839A patent/PL203972B1/pl unknown
- 2003-07-29 KR KR1020057002730A patent/KR100772258B1/ko not_active Expired - Fee Related
- 2003-07-29 EP EP03792235A patent/EP1529014A1/en not_active Withdrawn
2005
- 2005-03-21 NO NO20051492A patent/NO20051492L/no not_active Application Discontinuation

Also Published As

Publication number	Publication date
CA2496467C (en)	2008-12-09
CN100447082C (zh)	2008-12-31
CA2496467A1 (en)	2004-03-04
KR20050050646A (ko)	2005-05-31
CN1675128A (zh)	2005-09-28
PL373839A1 (pl)	2005-09-19
PL203972B1 (pl)	2009-11-30
AU2003250188A1 (en)	2004-03-11
KR100772258B1 (ko)	2007-11-01
WO2004018359A1 (en)	2004-03-04
EP1529014A1 (en)	2005-05-11
JP4448030B2 (ja)	2010-04-07
DE10238463A1 (de)	2004-03-04
JP2005536426A (ja)	2005-12-02

Legal Events

Date	Code	Title	Description
2017-12-11	FC2A	Withdrawal, rejection or dismissal of laid open patent application

Publication	Publication Date	Title
NO20051492L (no)	2005-05-13	Stabilisert, vandig silisiumdioksiddispergering.
ATE403936T1 (de)	2008-08-15	Polierfluid und polierverfahren
DK1100344T3 (da)	2004-10-11	Chitosanholdige flydende præparater og fremgangsmåder til deres fremstilling og anvendelse
MXPA03007291A (es)	2003-12-04	Fluido para la fractura hidraulica, que comprende un copolimero de bloques, que contiene al menos un bloque soluble en agua y un bloque hidrofobico.
AU6379500A (en)	2001-03-13	Chemical mechanical polishing systems and methods for their use
WO2002074748A8 (en)	2004-04-22	Metalloproteinase inhibitors
WO2003032966A1 (en)	2003-04-24	Compositions for potentiating glutatthione
WO2005058283A3 (en)	2006-05-18	Stabilised compositions of factor vii polypeptides
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GB2392978A (en)	2004-03-17	Identification and use of conserved noncoding sequences
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DE69923676D1 (de)	2005-03-17	Bestimmte heteroaryl substituierte thiol inhibitoren von endothelin wechselnden enzymen
HUP0400520A2 (hu)	2004-07-28	Klindamicint és cinksót tartalmazó dermatológiai készítmények
WO2002068575A8 (en)	2003-11-06	Liquid detergent composition exhibiting enhanced α-amylase enzyme stability
PT1543826E (pt)	2008-12-12	Solução aquosa concentrada de ambroxol
AU762955C (en)	2005-03-24	Methods and compositions useful for modulation of angiogenesis using tyrosine kinase SRC
AU2001277648A1 (en)	2002-04-15	Plant cyclin-dependent kinase inhibitors
WO2001053352A3 (en)	2002-04-04	Sperm specific proteins
GB2413582A (en)	2005-11-02	Stabilized colloidal and colloidal-like systems
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SI1531667T2 (sl)	2011-07-29	Mikroinkapsulirani agrokemični sestavek