NO764338L - - Google Patents

Info

Publication number
NO764338L
NO764338L NO764338A NO764338A NO764338L NO 764338 L NO764338 L NO 764338L NO 764338 A NO764338 A NO 764338A NO 764338 A NO764338 A NO 764338A NO 764338 L NO764338 L NO 764338L
Authority
NO
Norway
Prior art keywords
group
hydrogen
formula
mol
phenyl
Prior art date
Application number
NO764338A
Other languages
English (en)
Norwegian (no)
Inventor
A P Gates
S C Hinch
C V Withers
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers Ltd filed Critical Vickers Ltd
Publication of NO764338L publication Critical patent/NO764338L/no

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C205/00—Compounds containing nitro groups bound to a carbon skeleton
    • C07C205/44—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by —CHO groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C205/00—Compounds containing nitro groups bound to a carbon skeleton
    • C07C205/49—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups
    • C07C205/56—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups bound to carbon atoms of six-membered aromatic rings and carboxyl groups bound to acyclic carbon atoms of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C47/00—Compounds having —CHO groups
    • C07C47/20—Unsaturated compounds having —CHO groups bound to acyclic carbon atoms
    • C07C47/24—Unsaturated compounds having —CHO groups bound to acyclic carbon atoms containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C57/00—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms
    • C07C57/30—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing six-membered aromatic rings
    • C07C57/42—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing six-membered aromatic rings having unsaturation outside the rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40—Unsaturated compounds
    • C07C59/58—Unsaturated compounds containing ether groups, groups, groups, or groups
    • C07C59/64—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings
    • C07C59/66—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings
    • C07C59/68—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings the oxygen atom of the ether group being bound to a non-condensed six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
NO764338A 1975-12-23 1976-12-22 NO764338L (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB52522/75A GB1572441A (en) 1975-12-23 1975-12-23 Photopolymerisable polymers with free carboxyl groups and printing plates therefrom

Publications (1)

Publication Number Publication Date
NO764338L true NO764338L (cs) 1977-06-24

Family

ID=10464243

Family Applications (1)

Application Number Title Priority Date Filing Date
NO764338A NO764338L (cs) 1975-12-23 1976-12-22

Country Status (27)

Country Link
US (1) US4263394A (cs)
JP (1) JPS5286488A (cs)
AT (1) AT348552B (cs)
AU (1) AU510145B2 (cs)
BE (1) BE849803A (cs)
BR (1) BR7608579A (cs)
CA (1) CA1107444A (cs)
CH (1) CH629314A5 (cs)
CS (1) CS212783B2 (cs)
DE (1) DE2658272A1 (cs)
DK (1) DK579976A (cs)
ES (1) ES454521A1 (cs)
FI (1) FI64863C (cs)
FR (1) FR2336707A1 (cs)
GB (1) GB1572441A (cs)
IE (1) IE44405B1 (cs)
IT (1) IT1065419B (cs)
KE (1) KE3336A (cs)
LU (1) LU76465A1 (cs)
MW (1) MW5276A1 (cs)
NL (1) NL7614259A (cs)
NO (1) NO764338L (cs)
NZ (1) NZ182955A (cs)
PL (1) PL103094B1 (cs)
SE (1) SE424642B (cs)
ZA (1) ZA767635B (cs)
ZM (1) ZM15276A1 (cs)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4343888A (en) 1980-05-01 1982-08-10 E. I. Du Pont De Nemours And Company Use of radiation crosslinkable polyesters and polyesterethers in printing plates
US4284710A (en) 1980-05-01 1981-08-18 E. I. Du Pont De Nemours And Company Radiation crosslinkable polyesters and polyesterethers
US4592816A (en) * 1984-09-26 1986-06-03 Rohm And Haas Company Electrophoretic deposition process
DE3528929A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern
WO1996034316A1 (en) * 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
US5925497A (en) 1995-04-27 1999-07-20 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
US6159658A (en) * 1996-03-19 2000-12-12 Toray Industries, Inc. Photosensitive resin composition with polymer having an ionic group and having a polymerizable group in the side chain and printing plate materials
AU2001248201B2 (en) * 2000-04-13 2006-12-14 Hsc Research And Development Limited Partnership Compounds for modulating cell proliferation
CA2407755A1 (en) * 2002-10-11 2004-04-11 The Hospital For Sick Children Inhibition of vegf secretion
WO2005012234A1 (en) * 2003-07-30 2005-02-10 The Hospital For Sick Children Compounds for modulating cell proliferation
WO2005092904A1 (en) * 2004-03-26 2005-10-06 Hsc Research And Development Limited Partnership Novel compounds for modulating cell proliferation
US8778568B2 (en) * 2010-12-14 2014-07-15 General Electric Company Optical data storage media and methods for using the same
CN113031394B (zh) * 2019-12-09 2025-07-22 北京鼎材科技有限公司 一种感光树脂组合物及其应用

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3799915A (en) * 1971-08-20 1974-03-26 Western Litho Plate & Supply Photopolymers
US3993684A (en) * 1971-08-20 1976-11-23 Western Litho Plate & Supply Co. Monomeric compounds
US4065430A (en) * 1973-02-13 1977-12-27 Fuji Photo Film Co., Ltd. Functional group containing polymer and method of preparing the same

Also Published As

Publication number Publication date
ZA767635B (en) 1977-11-30
SE7614315L (sv) 1977-06-24
NL7614259A (nl) 1977-06-27
CH629314A5 (de) 1982-04-15
SE424642B (sv) 1982-08-02
MW5276A1 (en) 1978-02-08
AU510145B2 (en) 1980-06-12
NZ182955A (en) 1979-04-26
IT1065419B (it) 1985-02-25
CA1107444A (en) 1981-08-18
AT348552B (de) 1979-02-26
FI763683A7 (cs) 1977-06-24
IE44405B1 (en) 1981-11-18
KE3336A (en) 1983-11-04
DE2658272A1 (de) 1977-07-14
GB1572441A (en) 1980-07-30
CS212783B2 (en) 1982-03-26
AU2081876A (en) 1978-06-29
PL103094B1 (pl) 1979-05-31
FR2336707A1 (fr) 1977-07-22
ES454521A1 (es) 1977-12-01
US4263394A (en) 1981-04-21
BE849803A (fr) 1977-06-23
FR2336707B1 (cs) 1983-04-29
LU76465A1 (cs) 1977-06-15
BR7608579A (pt) 1977-12-27
FI64863C (fi) 1984-01-10
FI64863B (fi) 1983-09-30
ZM15276A1 (en) 1978-03-21
JPS5286488A (en) 1977-07-18
ATA964076A (de) 1978-07-15
IE44405L (en) 1977-06-23
DK579976A (da) 1977-06-24

Similar Documents

Publication Publication Date Title
US3849137A (en) Lithographic printing plates and photoresists comprising a photosensitive polymer
US4736055A (en) Oxime sulfonates containing reactive groups
CA1168792A (en) Mixture which is polymerizable by radiation, and radiation-sensitive copying material prepared therewith
US4496447A (en) Aromatic-aliphatic ketones useful as photoinitiators
CA1267656A (en) Photoinitiators for photopolymerization of unsaturated systems
US5200299A (en) Quinoline and acridine compounds effective as photoinitiators and containing polymerizable (meth)acryloyl substituents
US4263394A (en) Aqueous alkaline soluble photopolymerizable material
CN110330501B (zh) 长波长香豆素肟酯类化合物及其制备和应用
NO169313B (no) Bestraalingssensitiv plate
EP0520574B1 (en) Thioxanthone derivatives
JP2013530994A (ja) チオキサントン−4−カルボン酸エステル及び製造方法並びに光開始剤組成物及び応用
CN112279864A (zh) 双官能团香豆素肟酯类化合物及其制备和应用
CN115583931B (zh) 醚官能化香豆素肟酯类化合物及其制备和应用
CN110551098B (zh) 包含五元芳杂环结构的肟酯类光引发剂及其制备和用途
US2824084A (en) Light-sensitive, unsaturated polymeric maleic and acrylic derivatives
US2816091A (en) Polymeric chalcones and their use as light-sensitive polymers
US5834157A (en) 2-acylamino-9-arylacridines, process for their preparation and photosensitive mixtures containing them
US4117039A (en) Light sensitive materials
JP3302759B2 (ja) 光重合開始剤
US4254244A (en) Light-sensitive materials
FI62911C (fi) Ljuskaensliga material
US4569901A (en) Poly(N-benzyl acrylamide) polymer containing negative photoresist compositions
US5358999A (en) Process for preparation of photosensitive compositions of stilbazolium quaternary
JPS5869208A (ja) 光不溶化性ポリビニルアルコ−ル誘導体の製造方法
US5286603A (en) Radiation sensitive plates