NO943839L - Optisk system for avbildning av en mönsterskive - Google Patents

Optisk system for avbildning av en mönsterskive

Info

Publication number
NO943839L
NO943839L NO943839A NO943839A NO943839L NO 943839 L NO943839 L NO 943839L NO 943839 A NO943839 A NO 943839A NO 943839 A NO943839 A NO 943839A NO 943839 L NO943839 L NO 943839L
Authority
NO
Norway
Prior art keywords
disk
image
resolution
high resolution
low
Prior art date
Application number
NO943839A
Other languages
English (en)
Norwegian (no)
Other versions
NO943839D0 (no
Inventor
Anthony M Ledger
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of NO943839D0 publication Critical patent/NO943839D0/no
Publication of NO943839L publication Critical patent/NO943839L/no

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
NO943839A 1993-10-12 1994-10-11 Optisk system for avbildning av en mönsterskive NO943839L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/134,729 US5436725A (en) 1993-10-12 1993-10-12 Cofocal optical system for thickness measurements of patterned wafers

Publications (2)

Publication Number Publication Date
NO943839D0 NO943839D0 (no) 1994-10-11
NO943839L true NO943839L (no) 1995-04-18

Family

ID=22464720

Family Applications (1)

Application Number Title Priority Date Filing Date
NO943839A NO943839L (no) 1993-10-12 1994-10-11 Optisk system for avbildning av en mönsterskive

Country Status (6)

Country Link
US (1) US5436725A (fr)
EP (1) EP0647828B1 (fr)
JP (1) JP2515090B2 (fr)
DE (1) DE69424246T2 (fr)
IL (1) IL111218A (fr)
NO (1) NO943839L (fr)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5555474A (en) * 1994-12-21 1996-09-10 Integrated Process Equipment Corp. Automatic rejection of diffraction effects in thin film metrology
US5640242A (en) * 1996-01-31 1997-06-17 International Business Machines Corporation Assembly and method for making in process thin film thickness measurments
WO2000055686A1 (fr) * 1997-05-21 2000-09-21 Joseph Lyons Support de tranche passif ayant pour but de corriger la courbure du champ
US6337698B1 (en) * 1998-11-20 2002-01-08 Microsoft Corporation Pen-based interface for a notepad computer
US6690473B1 (en) * 1999-02-01 2004-02-10 Sensys Instruments Corporation Integrated surface metrology
US6122064A (en) * 1999-05-28 2000-09-19 Philips Electronics North America Corporation Method for measuring thickness of films
US9607301B2 (en) * 2000-04-27 2017-03-28 Merck Patent Gmbh Photovoltaic sensor facilities in a home environment
KR20010100724A (ko) * 2000-05-06 2001-11-14 임쌍근 마이크로 머신기술로 제작된 멀티미러 어레이의 평가계측장비
US7095511B2 (en) * 2000-07-06 2006-08-22 Filmetrics, Inc. Method and apparatus for high-speed thickness mapping of patterned thin films
US6940592B2 (en) * 2001-10-09 2005-09-06 Applied Materials, Inc. Calibration as well as measurement on the same workpiece during fabrication
EP1446703A2 (fr) * 2001-11-07 2004-08-18 Applied Materials, Inc. Imprimante a matrice en grille de points optique
US6946655B2 (en) 2001-11-07 2005-09-20 Applied Materials, Inc. Spot grid array electron imaging system
US6639201B2 (en) * 2001-11-07 2003-10-28 Applied Materials, Inc. Spot grid array imaging system
CN1602451A (zh) 2001-11-07 2005-03-30 应用材料有限公司 无掩膜光子电子点格栅阵列光刻机
WO2004084279A1 (fr) * 2003-03-14 2004-09-30 Midwest Research Institute Caracteristiques de plaquettes par reflectometrie
KR100546796B1 (ko) * 2003-07-21 2006-01-25 동부아남반도체 주식회사 두께와 광학 이미지의 라이브러리를 이용한 절연막검사방법
US7084966B2 (en) * 2003-10-20 2006-08-01 Infineon Technologies Ag Optical measurement of device features using lenslet array illumination
WO2005083352A1 (fr) * 2004-02-11 2005-09-09 Filmetrics, Inc. Procede et appareil de cartographie d'epaisseur a grande vitesse pour couches minces configurees
US7910822B1 (en) * 2005-10-17 2011-03-22 Solaria Corporation Fabrication process for photovoltaic cell
US8227688B1 (en) 2005-10-17 2012-07-24 Solaria Corporation Method and resulting structure for assembling photovoltaic regions onto lead frame members for integration on concentrating elements for solar cells
US7444198B2 (en) 2006-12-15 2008-10-28 Applied Materials, Inc. Determining physical property of substrate
US7840375B2 (en) * 2007-04-02 2010-11-23 Applied Materials, Inc. Methods and apparatus for generating a library of spectra
US7910392B2 (en) 2007-04-02 2011-03-22 Solaria Corporation Method and system for assembling a solar cell package
US20090056806A1 (en) * 2007-09-05 2009-03-05 Solaria Corporation Solar cell structure including a plurality of concentrator elements with a notch design and predetermined radii and method
US8119902B2 (en) 2007-05-21 2012-02-21 Solaria Corporation Concentrating module and method of manufacture for photovoltaic strips
US7910035B2 (en) 2007-12-12 2011-03-22 Solaria Corporation Method and system for manufacturing integrated molded concentrator photovoltaic device
KR101151274B1 (ko) * 2010-01-07 2012-06-14 주식회사 쓰리비 시스템 결점 검사장치
CN101825760B (zh) * 2010-03-24 2011-12-14 苏州大学 一种大口径球面主镜
JP5365581B2 (ja) * 2010-05-28 2013-12-11 信越半導体株式会社 薄膜付ウェーハの評価方法
USD699176S1 (en) 2011-06-02 2014-02-11 Solaria Corporation Fastener for solar modules
CN103673884B (zh) * 2013-12-26 2016-09-14 北京信息科技大学 双三角光学测头的光路系统
US9891048B2 (en) * 2014-01-29 2018-02-13 Advanced Semiconductor Engineering, Inc. Measurement equipment
CN105937885B (zh) * 2016-04-29 2018-08-14 浙江大学 一种自由曲面子孔径拼接干涉检测中被测面定位匹配方法
DE102016115827A1 (de) * 2016-08-25 2018-03-01 Nanofocus Ag Verfahren und Vorrichtung zur optischen Oberflächenmessung mit Hilfe eines chromatisch konfokalen Sensors
US20180172425A1 (en) * 2016-12-21 2018-06-21 The Penn State Research Foundation High definition optical coherence tomography imaging for non-invasive examination of heritage works

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2046432B (en) * 1979-04-09 1983-05-11 Infrared Eng Ltd Apparatus for determining the thickness moisture content or other parameter of a film or coating
JPS57167651A (en) * 1981-04-07 1982-10-15 Mitsubishi Electric Corp Inspecting device for surface of semiconductor wafer
US4845373A (en) * 1984-02-22 1989-07-04 Kla Instruments Corporation Automatic alignment apparatus having low and high resolution optics for coarse and fine adjusting
JPS6157805U (fr) * 1984-09-20 1986-04-18
US4659220A (en) * 1984-10-22 1987-04-21 International Business Machines Corporation Optical inspection system for semiconductor wafers
JPS61155804A (ja) * 1984-12-28 1986-07-15 Toshiba Electron Syst Kk 光学式水膜厚計
US4651200A (en) * 1985-02-04 1987-03-17 National Biomedical Research Foundation Split-image, multi-power microscopic image display system and method
JPH01110243A (ja) * 1987-10-23 1989-04-26 Hitachi Vlsi Eng Corp 外観検査装置
SU1755244A1 (ru) * 1990-07-23 1992-08-15 Ленинградский Институт Точной Механики И Оптики Препаравальна лупа
CA2033130C (fr) * 1990-12-24 1996-12-31 Brian William Petelka Systeme de bache impermeable roulant vers les cotes
US5291269A (en) * 1991-12-06 1994-03-01 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations
US5293214A (en) * 1991-12-06 1994-03-08 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser

Also Published As

Publication number Publication date
US5436725A (en) 1995-07-25
EP0647828A2 (fr) 1995-04-12
NO943839D0 (no) 1994-10-11
EP0647828B1 (fr) 2000-05-03
EP0647828A3 (fr) 1996-11-13
JP2515090B2 (ja) 1996-07-10
IL111218A (en) 1996-11-14
DE69424246D1 (de) 2000-06-08
JPH07181019A (ja) 1995-07-18
IL111218A0 (en) 1994-12-29
DE69424246T2 (de) 2000-12-14

Similar Documents

Publication Publication Date Title
NO943839L (no) Optisk system for avbildning av en mönsterskive
JP7087198B2 (ja) ハイブリッドスペクトルイメージャ
KR102048793B1 (ko) 표면 컬러를 이용한 표면 토포그래피 간섭측정계
US6819415B2 (en) Assembly for increasing the depth discrimination of an optical imaging system
TW200626887A (en) Optical inspection of test surfaces
CN107113370B (zh) 图像记录设备及记录图像方法
WO2019039663A1 (fr) Dispositif et procédé améliorés de reconstruction holographique
CN107077722B (zh) 图像记录设备及用于记录图像的方法
NO941768L (no) Anordning og fremgangsmåte for utförelse av tynnfilmsjikt-tykkelsesmetrologi med höy romopplösning
US7819526B2 (en) Fundus camera
JP4845607B2 (ja) ３次元形状測定方法及び装置
CN101627899A (zh) 微循环双通道仿立体伪彩色显微视频成像系统
JPH11211668A (ja) 欠陥検査方法および欠陥検査装置
US11954766B2 (en) Method for carrying out a shading correction and optical observation device system
JP5799473B2 (ja) 撮影装置とその撮影方法
KR20220035890A (ko) 개선된 홀로그래픽 복원 장치 및 방법
JP2019204002A (ja) 顕微鏡、画像解析装置、観察方法、解析プログラム
JP4826124B2 (ja) 位置測定装置
WO2001044852A3 (fr) Procede et dispositif de microscopie
KR20190082171A (ko) 개선된 홀로그래픽 복원 장치 및 방법
CN109330547A (zh) 光源的调节方法、装置、设备及内窥镜
JP7123403B2 (ja) 画像検査装置
US20070083123A1 (en) Apparatus for displaying a tissue containing a fluorescent dye
CN114485459A (zh) 一种高精度三维扫描系统
CN117784405B (zh) 一种基于衍射微透镜阵列的晶圆明场光瞳调制方法