NO990150L - Fjerning av materiale ved strÕling fra skrÕ vinkel - Google Patents

Fjerning av materiale ved strÕling fra skrÕ vinkel

Info

Publication number
NO990150L
NO990150L NO990150A NO990150A NO990150L NO 990150 L NO990150 L NO 990150L NO 990150 A NO990150 A NO 990150A NO 990150 A NO990150 A NO 990150A NO 990150 L NO990150 L NO 990150L
Authority
NO
Norway
Prior art keywords
substrate
removal
angle
radiation
unwanted material
Prior art date
Application number
NO990150A
Other languages
English (en)
Other versions
NO990150D0 (no
Inventor
Audrey C Engelsberg
Andrew W Johnson
William P Parker
Original Assignee
Cauldron Lp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cauldron Lp filed Critical Cauldron Lp
Publication of NO990150D0 publication Critical patent/NO990150D0/no
Publication of NO990150L publication Critical patent/NO990150L/no

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/12—Cleaning before device manufacture, i.e. Begin-Of-Line process by dry cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/142—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor for the removal of by-products
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/1462—Nozzles; Features related to nozzles

Landscapes

  • Optics & Photonics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Laser Beam Processing (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Drying Of Semiconductors (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning In General (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Vending Machines For Individual Products (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Confectionery (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Road Signs Or Road Markings (AREA)

Abstract

Apparat (10) og fremgangsmåte for fjerning av uønsket materiale fra overflaten av et substrat (12) frembringer en strøm (18) av inert gass over overflaten av uønsket materiale/substrat mens det uønskede materialet bestråles (11) med høyenergetiske fotoner som rettes i en vinkel (8) som er skrå i forhold til substratet (12). Oppfinnelsen muliggjør fjerning av uønsket materiale uten endring av de fysikalske egenskaper til materiale som ligger under eller i tilstøtning til det fjernende, uønskede materialet. Under visse omstendigheter, tillater den ikke vinkelrette innfallsvinkel effektiv fjerning hvor normal vinkel forårsaker skade på substratet eller dårlig fjerning eller begge deler.
NO990150A 1996-07-26 1999-01-13 Fjerning av materiale ved strÕling fra skrÕ vinkel NO990150L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/686,523 US5800625A (en) 1996-07-26 1996-07-26 Removal of material by radiation applied at an oblique angle
PCT/US1997/013317 WO1998004366A1 (en) 1996-07-26 1997-07-22 Removal of material by radiation applied at an oblique angle

Publications (2)

Publication Number Publication Date
NO990150D0 NO990150D0 (no) 1999-01-13
NO990150L true NO990150L (no) 1999-03-02

Family

ID=24756659

Family Applications (1)

Application Number Title Priority Date Filing Date
NO990150A NO990150L (no) 1996-07-26 1999-01-13 Fjerning av materiale ved strÕling fra skrÕ vinkel

Country Status (17)

Country Link
US (1) US5800625A (no)
EP (1) EP0921871B1 (no)
JP (1) JP2000515811A (no)
KR (1) KR100476814B1 (no)
CN (1) CN1231623A (no)
AT (1) ATE242065T1 (no)
AU (1) AU3966397A (no)
BR (1) BR9710764A (no)
CZ (1) CZ19899A3 (no)
DE (1) DE69722633T2 (no)
EA (1) EA199900160A1 (no)
HU (1) HUP9903927A3 (no)
LV (1) LV12345A (no)
MY (1) MY113873A (no)
NO (1) NO990150L (no)
TW (1) TW388075B (no)
WO (1) WO1998004366A1 (no)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10244392A (ja) * 1997-03-04 1998-09-14 Semiconductor Energy Lab Co Ltd レーザー照射装置
US6494217B2 (en) * 1998-03-12 2002-12-17 Motorola, Inc. Laser cleaning process for semiconductor material and the like
CA2333320A1 (en) * 1998-05-26 1999-12-02 Schering Aktiengesellschaft Treatment of infertility with camp-increasing compounds alone or in combination with at least one meiosis-stimulating compound
US6333485B1 (en) * 1998-12-11 2001-12-25 International Business Machines Corporation Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed beam
US7649153B2 (en) * 1998-12-11 2010-01-19 International Business Machines Corporation Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed laser beam
DE19964443B4 (de) * 1999-04-07 2007-08-16 Shell Solar Gmbh Vorrichtung zum Abtragen von Schichten auf einem Werkstück
US6881687B1 (en) 1999-10-29 2005-04-19 Paul P. Castrucci Method for laser cleaning of a substrate surface using a solid sacrificial film
US6582857B1 (en) 2000-03-16 2003-06-24 International Business Machines Corporation Repair of masks to promote adhesion of patches
US6805751B2 (en) 2000-07-24 2004-10-19 Alkansas State University Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition
AU2001282862A1 (en) * 2000-07-24 2002-02-05 Florida State University Research Foundation Method and apparatus for removing minute particles from a surface
US20020029956A1 (en) * 2000-07-24 2002-03-14 Allen Susan Davis Method and apparatus for removing minute particles from a surface
US6425956B1 (en) * 2001-01-05 2002-07-30 International Business Machines Corporation Process for removing chemical mechanical polishing residual slurry
US6635845B2 (en) * 2001-05-19 2003-10-21 Imt Co., Ltd. Dry surface cleaning apparatus using a laser
US20030062126A1 (en) * 2001-10-03 2003-04-03 Scaggs Michael J. Method and apparatus for assisting laser material processing
WO2003066245A1 (en) * 2002-02-01 2003-08-14 Metastable Instruments, Inc. Method and apparatus for cleaning with electromagnetic radiation
AU2003251606A1 (en) * 2002-07-25 2004-02-16 Arkansas State University Method and apparatus for removing minute particle(s) from a surface
KR20040016406A (ko) * 2002-08-15 2004-02-21 호야 가부시키가이샤 광 모듈
US6852946B2 (en) * 2002-12-20 2005-02-08 Caterpillar Inc Laser-induced plasma micromachining
US6747243B1 (en) 2002-12-24 2004-06-08 Novellus Systems, Inc. Spot cleaning of particles after inspection
US7006222B2 (en) * 2003-01-08 2006-02-28 Kla-Tencor Technologies Corporation Concurrent measurement and cleaning of thin films on silicon-on-insulator (SOI)
US7247986B2 (en) * 2003-06-10 2007-07-24 Samsung Sdi. Co., Ltd. Organic electro luminescent display and method for fabricating the same
US7341695B1 (en) * 2003-12-16 2008-03-11 Stuart Garner Anti-fouling apparatus and method
DE102005020072B4 (de) * 2005-04-22 2007-12-06 Forschungsverbund Berlin E.V. Verfahren zum Feinpolieren/-strukturieren wärmeempfindlicher dielektrischer Materialien mittels Laserstrahlung
DE202005021296U1 (de) * 2005-05-27 2007-10-04 Emag Laser Tec Gmbh Vorrichtung zur Behandlung von Werkstückoberflächen
US20070022623A1 (en) * 2005-07-29 2007-02-01 Board Of Regents Of University Of Nebraska Laser surface drying
JP2008073760A (ja) * 2006-09-25 2008-04-03 Sumitomo Electric Ind Ltd 付着物除去方法
US20100183987A1 (en) * 2006-12-08 2010-07-22 Canon Kabushiki Kaisha Exposure apparatus
JP5202876B2 (ja) * 2007-06-06 2013-06-05 日東電工株式会社 レーザー加工方法及びレーザー加工品
US8002899B2 (en) * 2008-09-30 2011-08-23 Applied Materials, Inc. Method and apparatus for mask pellicle adhesive residue cleaning
KR20120101982A (ko) * 2009-06-23 2012-09-17 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
US8310670B2 (en) * 2009-07-08 2012-11-13 Universidade De Vigo Method for removal of wax from porous stones in historical monuments
JP2011085642A (ja) * 2009-10-13 2011-04-28 Hitachi High-Technologies Corp Ｆｐｄパネル実装装置及び実装方法
US20120132629A1 (en) * 2010-11-30 2012-05-31 Electro Scientific Industries, Inc. Method and apparatus for reducing taper of laser scribes
CN102380491A (zh) * 2011-08-01 2012-03-21 迪普干冰制造(大连)有限公司 一种加热吸尘搭配干冰清洗的表面脱漆处理设备及方法
KR101507215B1 (ko) * 2013-02-07 2015-03-30 주식회사 아이엠티 유리 단차부 이물의 건식 세정 방법 및 장치
CN203936519U (zh) * 2014-05-30 2014-11-12 宁德新能源科技有限公司 锂离子电池极片涂层清洗装置
DE112015002860B4 (de) * 2014-06-19 2024-07-25 Magna International Inc. Verfahren und Vorrichtung für laserunterstütztes Kraftreinigen
WO2017109544A1 (fr) * 2015-12-22 2017-06-29 Arcelormittal Procede de preparation d'une tole pre-revetue, avec enlevement du revetement a l'aide d'un faisceau laser incline; tôle correspondante
CN105772447B (zh) * 2016-05-17 2019-02-22 上海临仕激光科技有限公司 一种铝合金氧化膜焊前激光清洗的方法
CN106391591B (zh) * 2016-11-29 2019-11-22 苏州热工研究院有限公司 激光工作头及激光清洗系统
CN107695040B (zh) * 2017-10-20 2021-01-15 大族激光科技产业集团股份有限公司 激光清洗系统及方法
CN108554936A (zh) * 2018-04-08 2018-09-21 苏州珮凯科技有限公司 半导体8寸晶元薄膜制程的e-max工艺的石英零部件的再生方法
US11467508B2 (en) 2018-07-25 2022-10-11 Applied Materials, Inc. Pellicle adhesive residue removal system and methods
CN109226096A (zh) * 2018-08-15 2019-01-18 中车青岛四方机车车辆股份有限公司 一种Al-Mg-Zn合金工件表面激光清洗工艺
CN111463122B (zh) * 2020-04-20 2021-04-20 天津大学 基于极紫外光的原子级材料可控去除方法
CN113690280B (zh) * 2021-08-11 2023-11-28 深圳市华星光电半导体显示技术有限公司 阵列基板的修复方法和阵列基板
CN114378052B (zh) * 2021-12-13 2023-04-11 海目星激光智能装备（江苏）有限公司 一种极片清洗系统以及方法
CN115301636A (zh) * 2022-08-12 2022-11-08 阳程科技股份有限公司 激光除胶方法及采用该方法的除胶设备
CN118253509B (zh) * 2024-05-29 2024-08-30 浙江珏芯微电子有限公司 一种去除杜瓦内部多余物的装置及吸附体的制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
US5024968A (en) * 1988-07-08 1991-06-18 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
US5099557A (en) * 1988-07-08 1992-03-31 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
US5643472A (en) * 1988-07-08 1997-07-01 Cauldron Limited Partnership Selective removal of material by irradiation
US4987286A (en) * 1989-10-30 1991-01-22 University Of Iowa Research Foundation Method and apparatus for removing minute particles from a surface
US5023424A (en) * 1990-01-22 1991-06-11 Tencor Instruments Shock wave particle removal method and apparatus
US5204517A (en) * 1991-12-24 1993-04-20 Maxwell Laboratories, Inc. Method and system for control of a material removal process using spectral emission discrimination
US5281798A (en) * 1991-12-24 1994-01-25 Maxwell Laboratories, Inc. Method and system for selective removal of material coating from a substrate using a flashlamp
US5319183A (en) * 1992-02-18 1994-06-07 Fujitsu Limited Method and apparatus for cutting patterns of printed wiring boards and method and apparatus for cleaning printed wiring boards
CZ238294A3 (en) * 1992-03-31 1996-02-14 Cauldron Lp Device for removing surface polluting matters by irradiation
WO1995007152A1 (en) * 1993-09-08 1995-03-16 Uvtech Systems, Inc. Surface processing
FR2711557B1 (fr) * 1993-10-26 1996-01-05 Saint Gobain Emballage Procédé et dispositif pour le nettoyage d'éléments solides.
IL115933A0 (en) * 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Process and apparatus for oblique beam revolution for the effective laser stripping of sidewalls

Also Published As

Publication number Publication date
HUP9903927A3 (en) 2000-05-29
JP2000515811A (ja) 2000-11-28
KR100476814B1 (ko) 2005-03-18
LV12345A (lv) 1999-09-20
TW388075B (en) 2000-04-21
KR20000029533A (ko) 2000-05-25
CZ19899A3 (cs) 1999-09-15
EP0921871A1 (en) 1999-06-16
CN1231623A (zh) 1999-10-13
US5800625A (en) 1998-09-01
EA199900160A1 (ru) 1999-08-26
ATE242065T1 (de) 2003-06-15
HU9903927A (en) 2000-04-28
DE69722633T2 (de) 2004-04-29
AU3966397A (en) 1998-02-20
MY113873A (en) 2002-06-29
WO1998004366A1 (en) 1998-02-05
DE69722633D1 (de) 2003-07-10
NO990150D0 (no) 1999-01-13
BR9710764A (pt) 1999-08-17
EP0921871B1 (en) 2003-06-04

Similar Documents

Publication Publication Date Title
NO990150L (no) Fjerning av materiale ved strÕling fra skrÕ vinkel
NO971090L (no) Selektiv fjerning av materiale ved bestråling
AU5989296A (en) Removal of material by polarized radiation and back side application of radiation
NO963198D0 (no) Fremgangsmåte til fjerning av karbondioksid fra gasser
DK0502596T3 (da) Apparat til fremgangsmåde til fjernelse af carbondioxid fra forbrændingsafgangsgas
NO903707D0 (no) Fremgangsmaate og apparat for rensing av luft, roekgasser og lignende.
TW357406B (en) Method and apparatus for cleaning and drying a substrate
NO20003559L (no) FremgangsmÕte og apparat for Õ motvirke forfalskning, ved bruk av digitalt raster
DK555885D0 (da) Fremgangsmaade til udskillelse af skadelige stoffer fra roeggasser og apparat til gennemfoerelse af fremgangsmaaden
NO951661D0 (no) Fremgangsmåte og apparat for kondensering av naturgass
NO308628B1 (no) FremgangsmÕte for Õ fjerne nitrogen fra naturgass, og apparatur for utførelse av samme
SG81300A1 (en) Arrangement configured to support substrate during dicing process, and apparatus and method for cutting tapeless substrate using the arrangement
NO306816B1 (no) Fremgangsmåter til fjerning av svovelforbindelser fra vann, og til behandling av svovelholdig röykgass
DK1129232T3 (da) Apparat til coating af genstande ved hjælp af PVD
DK0750580T3 (da) Fremgangsmåde og apparat til overførsel af æg
DK64781A (da) Faststof fra salinomycin-kultursubstratet og fremgangsmaade til dets isolering
FI903858A0 (fi) Anordning och foerfarande foer maetning av halten av en gas.
DK139085D0 (da) Fremgangsmaade og apparat til brug ved fjernelse af koed fra ben
CA2259910A1 (en) Removal of material by radiation applied at an oblique angle
NO993032L (no) FremgangsmÕte for Õ preparere partikler dekket med et lag av vannglass og gjenstander som omfatter slike dekkede partikler
DK218088A (da) Fremgangsmaade til automatisk frasortering fra en maengde af behandlede objekter af mindst et manglende eller defekt objekt, apparat til udfoerelse af denne fremgangsmaade og klargoeringsmaskine til objekter, som behandles i dette apparat.
TW341717B (en) Semiconductor substrate dry cleaning method
NO166622C (no) Fremgangsmaate og apparat for opprettsholdelse av gasstroemning ved faststoffoverfoering.
NO175392C (no) Framgangsmåte ved kondensering av hydrokarbongasser og et apparat for utförelse av samme