PL136853B1 - Agent for microetching of copper foil,used especially in the process of printed circuits manufacture - Google Patents

Agent for microetching of copper foil,used especially in the process of printed circuits manufacture Download PDF

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Publication number
PL136853B1
PL136853B1 PL23973582A PL23973582A PL136853B1 PL 136853 B1 PL136853 B1 PL 136853B1 PL 23973582 A PL23973582 A PL 23973582A PL 23973582 A PL23973582 A PL 23973582A PL 136853 B1 PL136853 B1 PL 136853B1
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PL
Poland
Prior art keywords
copper foil
agent
printed circuits
sulfuric acid
amount
Prior art date
Application number
PL23973582A
Other languages
Polish (pl)
Other versions
PL239735A1 (en
Inventor
Kazimierz Czekala
Krzysztof Piprek
Original Assignee
Zaklady Elektroniczne Elwro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Zaklady Elektroniczne Elwro filed Critical Zaklady Elektroniczne Elwro
Priority to PL23973582A priority Critical patent/PL136853B1/en
Publication of PL239735A1 publication Critical patent/PL239735A1/en
Publication of PL136853B1 publication Critical patent/PL136853B1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/18Acidic compositions for etching copper or alloys thereof

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)

Description

Przedmiotem wynalazku jest srodek do mikrotrawienia folii miedzianej, 9tosowany zwlaszcza w procesie produkcji obwodów drukowanych. Na róznych etapach wytwarzania plytek z obwodami drukowanymi stosuje sie operacje mijcrotrawienia,tzn. nieznacznego nadtrawienia folii miedzianej w celu dokladnego oczyszczenia powierzchni folii z tle¬ nków miedzi i utworzenia na niej mikronierównosci.Operacje mikrotrawienia folii miedzianej stosuje sie na przyklad przed operacje miedziowania chemicznego, przed operacje pogrubiania miedzie elektrolityczne sciezek obwodu drukowanego oraz scianek otworów metalizowanych, a takze przed pokryciem top¬ nikiem lub spoiwem cynowo-olowiowym sciezek obwodu jednostronnie drukowanego bez me¬ talizowanych otworów. Operacje mikrotrawienia wykonuje sie równiez przed nakladaniem powlok innych metali na folie miedziane, na przyklad przy zloceniu powierzchni folii miedzianej* Znanymi srodkami do mikrotrawienia folii miedzianej se roztwory wodne nadsiarcza¬ nu amonowego, nadsiarczanu sodowego lub chlorku miedziowego. Stosowanie tych roztwo¬ rów wykazuje jednak szereg wadjtakich jak: koniecznosc stosowania dodatkowej obróbki w roztworach kwasu siarkowego lub solnego, krótki "czas zycia" stosowanego roztworu, a takze wysoki koszt, wynikajecy z ceny stosowanych materialów oraz nie zawsze opla¬ calnej regeneracji. Neutralizacja zuzytych kepieli, opartych na nadsiarczanie amonu, jest uciazliwa 1 kosztowna.Innymi, znanymi z literatury technicznej, srodkami do glebokiego trawienia mie¬ dzi se roztwory zawierajece kwas siarkowy i nadtlenek wodoru, na przyklad roztwory o skladzie: kwas siarkowy stezony w ilosci 76,3 cm3/dm , perhydrol w ilosci 157 cm /dm # mocznik - 80 g/dm , chlorek rteciowy -'6,8 mg/dm lub roztwór o skladzie: woda - 63 %2 136 853 objetosciowych, kwas siarkowy stezony - 10 55 objetosciowych i perhydrol - 27 % obje¬ tosciowych z dodatkiem: fenycytyny w ilosci 500 mg/kg roztworu, metafosforanu sodu w ilosci 100 mg/kg roztworu 1 chlorku rteciowego w ilosci 20 mg/kg roztworu.Powyzsza srodki se jednak praktycznie nieprzydatne do mikrotrawlenia folii mie¬ dzianej w procesie produkcji obwodów drukowanych, bowiem wykazuje one wysoke niesta¬ bilnosc, objawiajece sie w zuzyciu nadtlenku wodoru w stopniu dalekim od stechiometry- cznego i nie stabilizuje w stopniu dostatecznym tych roztworów w czaeie przerw w pro¬ cesie produkcyjnym.Srodek do mikrotrawlenia folii miedzianej wedlug wynalazku zawiera kwas siarkowy stezony w ilosci 55 * 83 cm /dm , nadtlenek wodoru p stezeniu 30 % w ilosci 80 * 120 cm /dni oraz stabilizatory o stezeniu 0,1 * 1,0 g/dm. Stabilizatorami kepiell do mikrotrawlenia wedlug wynalazku se hydroksykwasy aromatyczne, aminokwasy aromatyczne lub aromatyczne aminy acylowane.Srodek do mikrotrawlenia folii miedzianej wedlug wynalazku pozbawiony jest wad, które wykazuje srodki znane, a ponadto posiada dodatkowe zalety: stale szybkosc tra¬ wienie i dobre adhezje miedzi chemicznej do folii miedzianej, 3 Tl Przyklad I# Kwas siarkowy stezony /o gestosci d * 1,84 g/cm / - 80 cm /dur nadtlenek wodoru o stezeniu 30 % - 120 em /dm, kwas sulfosalicylowy - 1 g/dm .Przyklad II. Kwas siarkowy stezony - 80 er, /dm3, nadtlenek wodoru o ste- 33 3 zeniu 30 % - 120 cm /dm , kwas paraaminobenzoesowy - 1 g/dm .Przyklad III. Oo roztworu kwasu siarkowego 1 nadtlenku wodoru jak w przykladzie I i II dodaje sie stabilizatory: acetanilid o stezsniu 0,1 g/dm3 i kwas sulf osalicylowy.-o stezeniu 0,5 g/dm . Stosujec wskazane w przykladach wykonania roz¬ twory trawiece w temperaturze pracy 20°C uzyskuje sie szybkosci trawienia okolo 1,5 im/min, a przy glebokosci trawienia wynoszecej 3jun 1 dm3 roztworu pozwala na wy- 2 2 trawienie okolo 180 dm powierzchni folii miedzianej, w porównaniu do 60 dm przy sto¬ sowaniu roztworu trawiecego opartego o nadsiarczan amonu. Wskazujec na powyzsze efe¬ kty techniczne wynalazku nalezy równiez miec na uwadze efekty ekonomiczne, tj• kilka¬ krotne obnizenie ceny 1 dm roztworu trawiecego opartego o sklad wedlug wynalazku w porównaniu do ceny roztworu przygotowanego na bazie nadsiarczanu amonu.Zastrzezenia patentowe 1. srodek do mikrotrawlenia folii miedzianej, stosowany zwlaszcza w procesie pro¬ dukcji obwodów drukowanych, zawierajecy kwas siarkowy i nadtlenek wodoru, z n e m i e- n n y tym, ze zawiera kwas siarkowy stezony w ilosci 55 *• 83 cm /dm , nadtlenek 3 3 wodoru o stezeniu 30 ^ w ilosci 60 -r 120 om /dm oraz stabilizatory o stezeniu 0,1 - 1,0 g/dm . 2. srodek wedlug zastrz. 1, znamienny tym, ze Jako stabilizatory zawiera hydroksykwasy aromatyczne, aminokwasy aromatyczna lub aromatyczne aminy acy¬ lowane* Pracownia Poligraficzna UP PRL. Naklad 100 egz.Cena 100 zl. PLThe subject of the invention is a copper foil micro-etch agent, used in particular in the production of printed circuits. Micro-etch operations are used at the various stages in the manufacture of printed circuit boards, i.e. slight etching of the copper foil in order to thoroughly clean the surface of the foil from copper oxides and create a micro-unevenness on it. coating with a flux or a tin-lead binder of the paths of a single-sided printed circuit without metallic holes. Micro-etching operations are also performed prior to the application of other metal coatings to copper foils, for example in the case of gilding the surface of a copper foil. The use of these solutions, however, has a number of disadvantages, such as the need for additional treatment in sulfuric or hydrochloric acid solutions, the short "life time" of the solution used, and also the high cost due to the cost of the materials used, and the not always efficient regeneration. Neutralization of spent baths based on ammonium persulfate is cumbersome and expensive. Other means for deep copper etching known from technical literature are solutions containing sulfuric acid and hydrogen peroxide, for example solutions with the following composition: sulfuric acid in the amount of 76, 3 cm3 / dm3, perhydrol in the amount of 157 cm / dm # urea - 80 g / dm3, mercury chloride -'6.8 mg / dm or solution composed of: water - 63% 2 136 853 volumetric, concentrated sulfuric acid - 10 55 by volume and perhydrol - 27% by volume with the addition of: phenicithin in the amount of 500 mg / kg of solution, sodium metaphosphate in the amount of 100 mg / kg of mercuric chloride solution 1 in the amount of 20 mg / kg of solution. of copper in the production process of printed circuits, because they show high instability, manifested in the consumption of hydrogen peroxide to a degree far from stoichiometric, and it does not sufficiently stabilize these solutions in Partial breaks in the production process. According to the invention, the copper foil micro-engraving agent contains sulfuric acid in the amount of 55 * 83 cm / dm, hydrogen peroxide at a concentration of 30% in the amount of 80 * 120 cm / day and stabilizers with a concentration of 0.1 * 1.0 g / dm. According to the invention, Kepiel's stabilizers for micro-engraving according to the invention are aromatic hydroxy acids, aromatic amino acids or aromatic acylated amines. copper foil, 3 Tl Example I # Sulfuric acid, concentrated / d * 1.84 g / cm / - 80 cm / dm, hydrogen peroxide at a concentration of 30% - 120 em / dm, sulfosalicylic acid - 1 g / dm. Example II . Concentrations of sulfuric acid - 80 er / dm3, 30% hydrogen peroxide - 120 cm / dm, para-aminobenzoic acid - 1 g / dm. Example III. The following stabilizers are added to the sulfuric acid solution and hydrogen peroxide as in examples I and II: acetanilide with a concentration of 0.1 g / dm3 and sulfosalicylic acid with a concentration of 0.5 g / dm. Using the grass solutions indicated in the examples, at a working temperature of 20 ° C, an etching speed of about 1.5 μm / min is obtained, and with an etching depth of 3 µm / dm3 of the solution, it allows for an etching of approximately 180 dm of the copper foil surface, compared to 60 dm3 when using an ammonium persulfate etch solution. When pointing to the above technical effects of the invention, one should also take into account the economic effects, i.e. a several-fold reduction in the price of 1 dm3 of etching solution based on the composition according to the invention compared to the price of a solution prepared on the basis of ammonium persulfate. copper foil, used especially in the production of printed circuits, containing sulfuric acid and hydrogen peroxide, with the fact that it contains sulfuric acid in the amount of 55 * 83 cm / dm3, hydrogen peroxide with a concentration of 30 ° C the amount of 60 -r 120 ohm / dm and stabilizers with a concentration of 0.1 - 1.0 g / dm. 2. a measure according to claim A method as claimed in claim 1, characterized in that it contains aromatic hydroxy acids, aromatic amino acids or aromatic acylated amines as stabilizers. Mintage 100 copies Price PLN 100. PL

Claims (2)

Zastrzezenia patentowe 1. srodek do mikrotrawlenia folii miedzianej, stosowany zwlaszcza w procesie pro¬ dukcji obwodów drukowanych, zawierajecy kwas siarkowy i nadtlenek wodoru, z n e m i e- n n y tym, ze zawiera kwas siarkowy stezony w ilosci 55 *• 83 cm /dm , nadtlenek 3 3 wodoru o stezeniu 30 ^ w ilosci 60 -r 120 om /dm oraz stabilizatory o stezeniu 0,1 - 1,0 g/dm .Claims 1. An agent for micro-engraving of copper foil, used especially in the production of printed circuits, containing sulfuric acid and hydrogen peroxide, especially that it contains sulfuric acid in the amount of 55 * • 83 cm / dm3, peroxide 3 3 hydrogen at a concentration of 30 ° C in the amount of 60 120 ohm / dm and stabilizers at a concentration of 0.1 - 1.0 g / dm. 2. srodek wedlug zastrz. 1, znamienny tym, ze Jako stabilizatory zawiera hydroksykwasy aromatyczne, aminokwasy aromatyczna lub aromatyczne aminy acy¬ lowane* Pracownia Poligraficzna UP PRL. Naklad 100 egz. Cena 100 zl. PL2. a measure according to claim A method as claimed in claim 1, characterized in that it contains aromatic hydroxy acids, aromatic amino acids or aromatic acylated amines as stabilizers. Mintage 100 copies. Price PLN 100. PL
PL23973582A 1982-12-22 1982-12-22 Agent for microetching of copper foil,used especially in the process of printed circuits manufacture PL136853B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL23973582A PL136853B1 (en) 1982-12-22 1982-12-22 Agent for microetching of copper foil,used especially in the process of printed circuits manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL23973582A PL136853B1 (en) 1982-12-22 1982-12-22 Agent for microetching of copper foil,used especially in the process of printed circuits manufacture

Publications (2)

Publication Number Publication Date
PL239735A1 PL239735A1 (en) 1984-07-30
PL136853B1 true PL136853B1 (en) 1986-03-31

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PL23973582A PL136853B1 (en) 1982-12-22 1982-12-22 Agent for microetching of copper foil,used especially in the process of printed circuits manufacture

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Publication number Publication date
PL239735A1 (en) 1984-07-30

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