PL1625246T3 - Elektrolit do elektrochemicznego polerowania powierzchni metalowych - Google Patents

Elektrolit do elektrochemicznego polerowania powierzchni metalowych

Info

Publication number
PL1625246T3
PL1625246T3 PL04730514T PL04730514T PL1625246T3 PL 1625246 T3 PL1625246 T3 PL 1625246T3 PL 04730514 T PL04730514 T PL 04730514T PL 04730514 T PL04730514 T PL 04730514T PL 1625246 T3 PL1625246 T3 PL 1625246T3
Authority
PL
Poland
Prior art keywords
electrolyte
metallic surfaces
alloys
electrochemically polishing
polishing metallic
Prior art date
Application number
PL04730514T
Other languages
English (en)
Inventor
Siegfried Piesslinger-Schweiger
Razmik Abedian
Olaf Böhme
Original Assignee
Poligrat Holding Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Poligrat Holding Gmbh filed Critical Poligrat Holding Gmbh
Publication of PL1625246T3 publication Critical patent/PL1625246T3/pl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • C25F3/22Polishing of heavy metals
    • C25F3/26Polishing of heavy metals of refractory metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
PL04730514T 2003-05-09 2004-04-30 Elektrolit do elektrochemicznego polerowania powierzchni metalowych PL1625246T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10320909A DE10320909A1 (de) 2003-05-09 2003-05-09 Elektrolyt zum elektrochemischen Polieren von Metalloberflächen
PCT/EP2004/004600 WO2004100283A2 (de) 2003-05-09 2004-04-30 Elektrolyt zum elektrochemischen polieren von metalloberflächen
EP04730514A EP1625246B1 (de) 2003-05-09 2004-04-30 Elektrolyt zum elektrochemischen polieren von metalloberflächen

Publications (1)

Publication Number Publication Date
PL1625246T3 true PL1625246T3 (pl) 2006-12-29

Family

ID=33305203

Family Applications (1)

Application Number Title Priority Date Filing Date
PL04730514T PL1625246T3 (pl) 2003-05-09 2004-04-30 Elektrolit do elektrochemicznego polerowania powierzchni metalowych

Country Status (10)

Country Link
US (1) US7807039B2 (pl)
EP (1) EP1625246B1 (pl)
JP (1) JP4592683B2 (pl)
AT (1) ATE339534T1 (pl)
CA (1) CA2525138A1 (pl)
DE (2) DE10320909A1 (pl)
DK (1) DK1625246T3 (pl)
ES (1) ES2271882T3 (pl)
PL (1) PL1625246T3 (pl)
WO (1) WO2004100283A2 (pl)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006047713B3 (de) * 2006-10-09 2008-03-27 Poligrat Gmbh Elektropolierverfahren für Niob und Tantal und Elektrolyt
DE102007011632B3 (de) 2007-03-09 2008-06-26 Poligrat Gmbh Elektropolierverfahren für Titan
US20100213078A1 (en) * 2009-02-25 2010-08-26 Ryszard Rokicki Electrolyte composition for electropolishing niobium and tantalum and method for using same
US20110017608A1 (en) * 2009-07-27 2011-01-27 Faraday Technology, Inc. Electrochemical etching and polishing of conductive substrates
WO2011063353A2 (en) * 2009-11-23 2011-05-26 Metcon, Llc Electrolyte solution and electropolishing methods
US20110303553A1 (en) * 2010-06-11 2011-12-15 Inman Maria E Electrochemical system and method for machining strongly passivating metals
US8580103B2 (en) 2010-11-22 2013-11-12 Metcon, Llc Electrolyte solution and electrochemical surface modification methods
CN102225504B (zh) * 2011-04-06 2013-12-25 宝鸡鑫泽钛镍有限公司 高精度钛及钛合金板制备工艺
CN102677142B (zh) * 2012-05-16 2015-07-08 安徽华东光电技术研究所 一种用于行波管螺旋线的电化学抛光方法
KR101600428B1 (ko) * 2014-07-15 2016-03-07 한국화학연구원 중이온 가속관의 나이오븀 식각방법
EP3109348B1 (en) * 2015-06-24 2020-06-03 Airbus Defence and Space GmbH Electrolyte and process for the electrolytic polishing of a metallic substrate
WO2018102845A1 (de) * 2016-12-09 2018-06-14 Hirtenberger Engineered Surfaces Gmbh Elektropolierverfahren und elektrolyt hierzu
CN107937977A (zh) * 2017-12-20 2018-04-20 西安泰金工业电化学技术有限公司 一种阴极辊电解抛光液及抛光方法
JP6671763B2 (ja) * 2018-02-28 2020-03-25 三愛プラント工業株式会社 電解研磨液及び電解研磨方法
JP7313664B2 (ja) * 2019-06-17 2023-07-25 マルイ鍍金工業株式会社 電解研磨方法
DE102020200815A1 (de) 2020-01-23 2021-07-29 Mahle International Gmbh Zusammensetzung als Elektrolyt zum Auflösen und/oder Abscheiden von Metallen, Metalloxiden und/oder Metalllegierungen sowie Verwendungen dieser Zusammensetzung

Family Cites Families (15)

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NL93969C (pl) 1955-05-09
DK574274A (pl) * 1973-12-06 1975-07-28 Ciba Geigy Ag
DE3461202D1 (en) * 1983-08-23 1986-12-11 Bbc Brown Boveri & Cie Process for electrolytically polishing a work piece made of a nickel, cobalt or iron based alloy
JPH02310400A (ja) * 1989-05-22 1990-12-26 Nec Corp マグネシウム上のめっき皮膜を剥離する方法
JPH0394100A (ja) * 1989-09-04 1991-04-18 Canon Inc 電解研磨液及び電解研磨方法
JP3291512B2 (ja) * 1995-03-16 2002-06-10 日本パーオキサイド株式会社 過酸化水素、フッ化水素アンモニウム、及び硫酸を含有する酸性溶液の安定剤、及びこれを用いた鉄−ニッケル合金の化学的溶解処理液
US5861535A (en) * 1997-09-23 1999-01-19 Eastman Kodak Company Reductive alkylation process to prepare tertiary aminoaryl compounds
US6447664B1 (en) 1999-01-08 2002-09-10 Scimed Life Systems, Inc. Methods for coating metallic articles
JP3318656B2 (ja) * 1999-04-08 2002-08-26 独立行政法人産業技術総合研究所 チタン複合材料
FR2795433B1 (fr) 1999-06-25 2001-08-31 Org Europeene De Rech Composition de bain pour le polissage electrolytique du titane, et son procede d'utilisation
US6352636B1 (en) * 1999-10-18 2002-03-05 General Electric Company Electrochemical system and process for stripping metallic coatings
KR100400030B1 (ko) 2000-06-05 2003-09-29 삼성전자주식회사 금속막의 화학 및 기계적 연마용 슬러리 및 그 제조방법과상기 슬러리를 이용한 반도체 소자의 금속 배선 형성 방법
US7128825B2 (en) * 2001-03-14 2006-10-31 Applied Materials, Inc. Method and composition for polishing a substrate
JP3484525B2 (ja) * 2001-07-06 2004-01-06 株式会社ケミカル山本 ステンレス鋼表面の清浄、不動態化処理方法
US7357854B1 (en) * 2002-08-19 2008-04-15 Advanced Cardiovascular Systems, Inc. Process for electropolishing a device made from cobalt-chromium

Also Published As

Publication number Publication date
JP2006526071A (ja) 2006-11-16
ATE339534T1 (de) 2006-10-15
DE10320909A1 (de) 2004-11-18
ES2271882T3 (es) 2007-04-16
DE502004001497D1 (de) 2006-10-26
US20070029209A1 (en) 2007-02-08
WO2004100283A2 (de) 2004-11-18
DK1625246T3 (da) 2006-11-13
WO2004100283A3 (de) 2004-12-09
EP1625246A2 (de) 2006-02-15
EP1625246B1 (de) 2006-09-13
US7807039B2 (en) 2010-10-05
CA2525138A1 (en) 2004-11-18
JP4592683B2 (ja) 2010-12-01

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